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公开(公告)号：US20100297561A1
公开(公告)日：2010-11-25
申请号：US12768883
申请日：2010-04-28
申请人： Ruud Antonius Catharina Maria BEERENS , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
发明人： Ruud Antonius Catharina Maria BEERENS , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
摘要翻译： 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。
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公开(公告)号：US08334983B2
公开(公告)日：2012-12-18
申请号：US12768883
申请日：2010-04-28
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
IPC分类号： G01B11/02
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
摘要翻译： 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。
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公开(公告)号：US09141003B2
公开(公告)日：2015-09-22
申请号：US12902847
申请日：2010-10-12
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
CPC分类号： G03F7/7085 , G01B9/02 , G01B9/02049 , G01B11/14 , G01B2290/70 , G03F7/70766 , G03F7/70775
摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。
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公开(公告)号：US20110085180A1
公开(公告)日：2011-04-14
申请号：US12902847
申请日：2010-10-12
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G01B11/14
CPC分类号： G03F7/7085 , G01B9/02 , G01B9/02049 , G01B11/14 , G01B2290/70 , G03F7/70766 , G03F7/70775
摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。
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公开(公告)号：US07486384B2
公开(公告)日：2009-02-03
申请号：US10813687
申请日：2004-03-31
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
摘要翻译： 本发明涉及具有支撑结构以支撑和移动物体（如基底）的光刻投影装置。 支撑结构可以是具有机器人臂的机器人，其具有支撑框架的支撑框架，例如。 底物。 支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。 机器人手臂包括一个或多个柔顺部件。 夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。 为了更好地去夹紧，可以向夹具提供RF AC衰减的去钳位电压。 该装置可以仅用一个单一的衬底清洁。
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公开(公告)号：US20130077078A1
公开(公告)日：2013-03-28
申请号：US13597831
申请日：2012-08-29
申请人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Antonius Franciscus Johannes De Groot , Hubert Marie Segers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Johannes Charles Adrianus Van Den Berg , Jan Steven Christiaan Westerlaken , Yang-Shan Huang , Christiaan Louis Valentin
发明人： Raymond Wilhelmus Louis LAFARRE , Sjoerd Nicolaas Lambertus Donders , Antonius Franciscus Johannes De Groot , Hubert Marie Segers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Johannes Charles Adrianus Van Den Berg , Jan Steven Christiaan Westerlaken , Yang-Shan Huang , Christiaan Louis Valentin
IPC分类号： G03B27/58
CPC分类号： G03F7/70708
摘要： A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.
摘要翻译： 一种光刻设备包括：基板台，其构造成保持基板和夹持器，所述夹具布置成将基板定位在基板台上。 夹持器包括布置成将基板夹在其顶侧的静电夹。 静电夹具被布置成夹持衬底的顶表面的周向外部区域的至少一部分。 本发明提供了一种基板处理方法，包括通过夹持器将基板定位在光刻设备的基板台上。 通过使用夹持器的静电夹持器将基板夹在其顶侧。
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公开(公告)号：US20090168042A1
公开(公告)日：2009-07-02
申请号：US12292962
申请日：2008-12-01
申请人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
发明人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Gerardus Arnoldus Hendricus Franciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
IPC分类号： G03B27/60
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.
摘要翻译： 公开了一种浸没式光刻投影装置。 所述设备包括用于保持基板的基板台，所述基板台被构造和布置成允许液体从所述基板流出并且超过所述基板台的顶表面的边缘，以及用于收集所述边缘下方的液体流的槽 。 描述了用于改善液体回收的几个特征。
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公开(公告)号：US20090168037A1
公开(公告)日：2009-07-02
申请号：US12292963
申请日：2008-12-01
申请人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
发明人： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.
摘要翻译： 公开了一种浸没式光刻投影装置。 该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。 该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。 可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。
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9.发明公开公开(公告)号：US20230251579A1
公开(公告)日：2023-08-10
申请号：US18299534
申请日：2023-04-12
申请人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
发明人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC分类号： G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06
CPC分类号： G03F7/70341 , B23K26/354 , B23K26/342 , G03F7/70416 , G03F7/707 , G03F7/70708 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , G03F7/70716 , B05D3/06 , B05D5/00 , G03F7/70733 , B33Y10/00 , B33Y80/00 , B22F7/062 , G03F7/708 , B22F10/25
摘要： A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US09632425B2
公开(公告)日：2017-04-25
申请号：US11984825
申请日：2007-11-21
申请人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
发明人： Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Harry Sewell , Louis John Markoya , Marcus Martinus Petrus Adrianus Vermeulen , Diane Czop McCafferty
CPC分类号： G03F7/70341
摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
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