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公开(公告)号：US07126671B2
公开(公告)日：2006-10-24
申请号：US10806344
申请日：2004-03-23
申请人： Henrikus Herman Marie Cox , Dominicus Jacobus Petrus Adrianus Franken , Nicolaas Rudolf Kemper , Engelbertus Antonius Fransiscus Van Der Pasch , Martijn Johannes Verbunt , Lambertus Adrianus Van Den Wildenberg
发明人： Henrikus Herman Marie Cox , Dominicus Jacobus Petrus Adrianus Franken , Nicolaas Rudolf Kemper , Engelbertus Antonius Fransiscus Van Der Pasch , Martijn Johannes Verbunt , Lambertus Adrianus Van Den Wildenberg
CPC分类号： G03F7/70141 , G03F7/70233 , G03F7/70258 , G03F7/709
摘要： In a projection system for EUV, the positions of mirrors are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors mounted on rigid extensions of the mirrors.
摘要翻译： 在用于EUV的投影系统中，反射镜的位置相对于彼此而不是参考帧被测量和控制。 可以通过安装在反射镜的刚性延伸部上的干涉仪或电容式传感器进行相对位置测量。
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2.发明授权Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless 有权具有用于控制非接触式图案形成装置的平面位置的气体压力装置的平版印刷装置公开(公告)号：US08368868B2
公开(公告)日：2013-02-05
申请号：US12627087
申请日：2009-11-30
申请人： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
发明人： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
摘要翻译： 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。
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3.发明申请LITHOGRAPHIC APPARATUS WITH GAS PRESSURE MEANS FOR CONTROLLING A PLANAR POSITION OF A PATTERNING DEVICE CONTACTLESS 有权用于控制连续装置的平面位置的气体压力装置的平面设备公开(公告)号：US20100159399A1
公开(公告)日：2010-06-24
申请号：US12627087
申请日：2009-11-30
申请人： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
发明人： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
摘要翻译： 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。
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公开(公告)号：US08279407B2
公开(公告)日：2012-10-02
申请号：US12408936
申请日：2009-03-23
申请人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
发明人： Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
CPC分类号： G03F7/70775
摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.
摘要翻译： 舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。 控制器具有每个编码器头的编码器信号。 控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。
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5.发明申请公开(公告)号：US20090279067A1
公开(公告)日：2009-11-12
申请号：US12408936
申请日：2009-03-23
申请人： Ramidin Izair KAMIDI , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
发明人： Ramidin Izair KAMIDI , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
CPC分类号： G03F7/70775
摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.
摘要翻译： 舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。 控制器具有每个编码器头的编码器信号。 控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。
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6.发明授权公开(公告)号：US07483120B2
公开(公告)日：2009-01-27
申请号：US11430196
申请日：2006-05-09
申请人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
摘要翻译： 提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。 位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。
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公开(公告)号：US20100149514A1
公开(公告)日：2010-06-17
申请号：US12714829
申请日：2010-03-01
申请人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03B27/58
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US07602470B2
公开(公告)日：2009-10-13
申请号：US11212921
申请日：2005-08-29
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US08755028B2
公开(公告)日：2014-06-17
申请号：US13223952
申请日：2011-09-01
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US20090303455A1
公开(公告)日：2009-12-10
申请号：US12541755
申请日：2009-08-14
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号： G03B27/54
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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