摘要:
A photoelectric sensor is disclosed that comprises a sensor unit having a casing. The casing includes one surface having a first display and a second display. The first display is structured and arranged to display a threshold value that may be set by an operator of the photoelectric sensor. The second display is structured and arranged to display the actual conditions sensed by said photoelectric sensor. The sensor also includes a selection device for selecting different operational values to display on the second display. The selection device can include a mechanism disposed on the casing for changing the different operational values on the second display. The selection device can also include an adjustment switch disposed on the casing. The adjustment switch allows the operator to adjust the threshold value shown on the first display while the second display shows at least one of the actual conditions sensed by the photoelectric sensor. The photoelectric sensor can be an integrated sensor or can include at least two parts, namely a sensor head and a main body unit. The sensor also can have a plurality of different display setting modes that can be shown on the displays and an operator may set these modes. These different modes include a power setting mode, a hold setting mode and a timer setting mode, each of which can have a plurality of displayable conditions.
摘要:
A tolerance-level display portion 12 is provided in a casing 11 of a head 1 of a photoelectric switch. A light reception signal output from the head 1 is transmitted through a cable 31b of a main body 2. The casing 21 of the main body 2 contains a received light amount display portion 22, a tolerance-level display portion 24, adjust switches 28 and setting switches 29. The CPU in the main body 2 calculates a ratio of a light reception signal to a threshold value to obtain a tolerance level, and applies a control signal corresponding to the obtained tolerance level to a variable power supply circuit. The variable power supply circuit applies a variable voltage, which is dependent on the control signal, through a cable 31a to the head 1. The tolerance-level display portion 12 of the head 1 displays a tolerance level on the basis of the variable voltage by turning on the tolerance-level display LEDs 12a, 12b and 12c.
摘要:
A silver halide photographic material is disclosed, comprising a support having thereon at least one light-sensitive silver halide emulsion layer, wherein at least 30 mol % of silver halide grains contained in the emulsion of the emulsion layer are silver chloride, the emulsion contains not more than 1.times.10.sup.-6 mol per mol of silver of a rhodium compound and/or not more than 1.times.10.sup.-5 mol per mol of silver of an iridium compound, and the silver halide grains have been selenium-sensitized. There is also disclosed a method for processing the silver halide photographic material.
摘要:
A field effect transistor includes a substrate and a semiconductor layer provided on the substrate, wherein the semiconductor layer includes a lower barrier layer provided on the substrate, Ga-face grown, lattice relaxed, and having a composition In1-zAlzN (0≦z≦1), a channel layer having a composition of: AlxGa1-xN (0≦x≦1) or InyGa1-yN (0≦y≦1). Or GaN provided on and lattice-matched to the lower barrier layer, a source electrode and a drain electrode having ohmic contact to an upper part of the semiconductor layers, disposed spaced to each other, and a gate electrode arranged via a gate insulating film in a region lying between the source electrode and the drain electrode.
摘要翻译:场效应晶体管包括衬底和设置在衬底上的半导体层,其中半导体层包括设置在衬底上的下阻挡层,生长Ga面,晶格弛豫并具有组成In 1-z Al z N(0&nl; z&nl E; 1),具有以下组成的沟道层:Al x Ga 1-x N(0& nlE; x≦̸ 1)或In y Ga 1-y N(0≦̸ y≦̸ 1)。 或提供在栅极绝缘膜上并与栅极绝缘膜配置的栅电极,栅极配置在栅极绝缘膜上,栅电极配置在栅极绝缘膜上, 位于源电极和漏电极之间的区域。
摘要:
Disclosed are a method of producing fine particulate alkali metal niobate in a liquid phase system, wherein the size and shape of particles of the fine particulate alkali metal niobate can be controlled; and fine particulate alkali metal niobate having a controlled shape and size. Specifically disclosed are a method of producing particulate sodium-potassium niobate represented by the formula (1): NaxK(1-x)NbO3 (1), the method including four specific steps, wherein a high-concentration alkaline solution containing Na+ ion and K+ ion is used as an alkaline solution; and particulate sodium-potassium niobate having a controlled shape and size.
摘要:
Provided is a semiconductor device capable of suppressing an occurrence of a punch-through phenomenon.A semiconductor device includes a substrate 1, a first n-type semiconductor layer 2, a p-type semiconductor layer 3, a second n-type semiconductor layer 4, a drain electrode 13, a source electrode 11, a gate electrode 12, and a gate insulation film 21, wherein the first n-type semiconductor layer 2, the p-type semiconductor layer 3, and the second n-type semiconductor layer 4 are laminated on the substrate 1 in this order. The drain electrode 13 is in ohmic-contact with the first n-type semiconductor layer 2. The source electrode 11 is in ohmic-contact with the second n-type semiconductor layer 4. An opening portion to be filled or a notched portion that extends from an upper surface of the second n-type semiconductor layer 4 to an upper part of the first n-type semiconductor layer 2 is formed at a part of the p-type semiconductor layer 3 and a part of the second n-type semiconductor layer 4. The gate electrode 12 is in contact with an upper surface of the first n-type semiconductor layer 2, side surfaces of the p-type semiconductor layer 3, and side surfaces of the second n-type semiconductor layer 4 at inner surfaces of the opening portion to be filled or a surface of the notched portion via the gate insulation film 21. The p-type semiconductor layer 3 has a positive polarization charge at a first n-type semiconductor layer 2 side in a state where a voltage is applied to none of the electrodes.
摘要:
There is provided a semiconductor apparatus capable of achieving both a reverse blocking characteristic and a low on-resistance. The semiconductor apparatus includes a first semiconductor layer including a channel layer, a source electrode formed on the first semiconductor layer, a drain electrode formed at a distance from the source electrode on the first semiconductor layer, and a gate electrode formed between the source electrode and the drain electrode on the first semiconductor layer. The drain electrode includes a first drain region where reverse current between the first semiconductor layer and the first drain region is blocked, and a second drain region formed at a greater distance from the gate electrode than the first drain region, where a resistance between the first semiconductor layer and the second drain region is lower than a resistance between the first semiconductor layer and the first drain region.
摘要:
The present invention provides a field effect transistor which can achieve both of a high threshold voltage and a low on-state resistance, a method for producing the same, and an electronic device. In the field effect transistor, each of a buffer layer 112, a channel layer 113, a barrier layer 114, and a spacer layer 115 is formed of a group-III nitride semiconductor, and each of the upper surfaces thereof is a group-III atomic plane that is perpendicular to a (0001) crystal axis. The lattice-relaxed buffer layer 112, the channel layer 113 having a compressive strain, and the barrier layer 114 having a tensile strain, and the spacer layer 115 having a compressive strain are laminated on a substrate 100 in this order. The gate insulating film 14 is arranged on the spacer layer 115. The gate electrode 15 is arranged on the gate insulating film 14. The source electrode 161 and the drain electrode 162 are electrically connected to the channel layer 113 directly or via another component.
摘要:
A bipolar transistor includes: a substrate; a collector and a base layer with a p-conductive-type, an emitter layer with an n-conductive-type. The collector layer is formed above the substrate and includes a first nitride semiconductor. The base layer with the p-conductive-type is formed on the collector layer and includes a second nit ride semiconductor. The emitter layer with the n-conductive-type is formed on the base layer and includes a third nitride semiconductor. The collector layer, the base layer and the emitter layer are formed so that crystal growing directions with respect to a surface of the substrate are in parallel to a [0001] direction of the substrate. The first nitride semiconductor includes: InycAlxcGa1-xc-ycN (0≦xc≦1, 0≦yc≦1, 0
摘要:
A medical system includes an insertion slave apparatus to be inserted into a body, a treatment slave apparatus to be inserted into the body together with the insertion slave apparatus to treat an object, an insertion master portion having a similar figure to the insertion slave apparatus and including a movable portion, wherein the insertion slave apparatus is to perform following actuation according to operation input to the insertion master portion, a treatment master portion to be operated by an operator, wherein the treatment slave apparatus is to perform following actuation according to operation input to the treatment master portion, and a connecting portion coupling the insertion master portion and the treatment master portion to each other, wherein the movable portion is to be moved through the connecting portion to operate the insertion master portion by holding and operating the treatment master portion.