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公开(公告)号：US20110249110A1
公开(公告)日：2011-10-13
申请号：US13139315
申请日：2009-11-24
申请人： Nobuhiro Okai , Yasunari Sohda
发明人： Nobuhiro Okai , Yasunari Sohda
IPC分类号： H04N7/18
CPC分类号： G01B15/00 , H01J37/222 , H01J37/28
摘要： Provided is a scanning electron microscope including: an image recording unit (112) which stores a plurality of acquired frame images; a correction analyzing handling unit (113) which calculates a drift amount between frame images and a drift amount between a plurality of field images constituting a frame image; and a data handling unit (111) which corrects positions of respective field images constituting the plurality of fields images according to the drift amount between the field images and superimposes the field images on one another so as to create a new frame image. This provides a scanning electron microscope which can obtain a clear frame image even if an image drift is caused during observation of a pattern on a semiconductor substrate or an insulating object.
摘要翻译： 提供一种扫描电子显微镜，包括：图像记录单元，其存储多个获取的帧图像; 校正分析处理单元，其计算帧图像之间的漂移量和构成帧图像的多个场图像之间的漂移量; 以及数据处理单元（111），其根据场图像之间的漂移量校正构成多个场图像的各个场图像的位置，并将场图像彼此叠加，从而创建新的帧图像。 这提供了即使在观察半导体衬底或绝缘物体上的图案时引起图像漂移，也可以获得清晰的帧图像的扫描电子显微镜。
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公开(公告)号：US07745237B2
公开(公告)日：2010-06-29
申请号：US11626402
申请日：2007-01-24
申请人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
发明人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
IPC分类号： H01L21/66 , H01L21/461 , G01R31/26
CPC分类号： G03F9/7049 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7084 , G03F9/7088
摘要： Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
摘要翻译： 通过纳米压印技术形成图案的方法开始于在其表面上制备具有纳米结构的模具。 将模具压在涂有树脂膜的基板或板上。 检测在涂覆有树脂膜的板的后表面上形成的对准标记的位置。 因此，执行模具和涂覆有树脂膜的板之间的相对对准。
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公开(公告)号：US07655907B2
公开(公告)日：2010-02-02
申请号：US11704227
申请日：2007-02-09
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/04735 , H01J2237/216 , H01J2237/2817
摘要： It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.
摘要翻译： 它是提供一种能够通过初级带电粒子束快速处理衬底上许多测量点的技术。 在控制系统中，对于晶片上的每个测量点（初级带电粒子束的照射位置），计算器获得从相对测量点的表面电位分布函数获得的相关测量点的表面电位的概率， 并存储在数据存储单元中。 基于概率，计算器确定相关测量点处的带电粒子光学器件的设定参数（例如延迟电压）的幅度。 然后，计算器通过在确定的幅度的范围内改变设定参数来检查主要带电粒子束的聚焦状态，并确定要用于测量的设定参数。
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64.发明授权Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus 有权带电粒子束曝光装置，装置制造方法和带电粒子束施加装置公开(公告)号：US06903353B2
公开(公告)日：2005-06-07
申请号：US10125439
申请日：2002-04-19
IPC分类号： G03F7/20 , H01J37/04 , H01J37/09 , H01J37/305 , H01J37/317 , H01L21/027 , H01J37/153
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3177 , H01J2237/0437 , H01J2237/31774
摘要： A high-precision multi-charged-particle-beam exposure apparatus has a charged particle source (ES) that emits a charged particle beam. An aperture array (AA) having plural apertures divides the charged particle beam from the charged particle source (ES) into plural charged particle beams and a lens array (LA) having plural electron lens forms plural intermediate images of the charged particle source (ES) on substantially one plane with the plural charged particle beams from the aperture array (AA). A blanker array (BA) located on the plane where the plurality of intermediate images are to be formed has plural blankers, and a reduction electron optical system that reduces and projects the images of the charged particle source (ES) onto a substrate.
摘要翻译： 高精度多带电粒子束曝光装置具有发射带电粒子束的带电粒子源（ES）。 具有多个孔的孔径阵列（AA）将带电粒子束从带电粒子源（ES）分割成多个带电粒子束，并且具有多个电子透镜的透镜阵列（LA）形成带电粒子源（ES）的多个中间图像， 在基本上一个平面上具有来自孔径阵列（AA）的多个带电粒子束。 位于要形成多个中间图像的平面上的消隐阵列（BA）具有多个消隐器，以及还原电子光学系统，其将带电粒子源（ES）的图像减少并投影到基板上。
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公开(公告)号：US5387799A
公开(公告)日：1995-02-07
申请号：US885608
申请日：1992-05-19
申请人： Yasunari Sohda , Hideo Todokoro , Hiroyuki Itoh , Shinichi Kato
发明人： Yasunari Sohda , Hideo Todokoro , Hiroyuki Itoh , Shinichi Kato
IPC分类号： H01J37/21 , H01J37/30 , H01J37/305 , H01L21/027 , G21K1/093
CPC分类号： H01J37/3007 , H01J2237/04924 , H01J2237/30461 , H01J2237/3175
摘要： An electron beam writing system which permits a relatively low voltage to be applied to perform high speed focus correction with high accuracy. The electron beam writing system includes a focus corrector arranged inside a lens which provides the largest product of the magnification factors of the lens and all succeeding lenses and the optical path length of the lens at issue. Thus, the electron beam provides high sensitivity and a small change in the magnification ratio due to the correction.
摘要翻译： 一种允许施加相对较低电压以高精度执行高速聚焦校正的电子束写入系统。 电子束写入系统包括布置在透镜内部的聚焦校正器，其提供透镜的放大系数和所有后续透镜的最大乘积以及所涉及的透镜的光路长度。 因此，由于校正，电子束提供高灵敏度和放大率的小的变化。
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公开(公告)号：US08735814B2
公开(公告)日：2014-05-27
申请号：US13879051
申请日：2011-10-05
CPC分类号： H01J37/023 , H01J37/153 , H01J37/28 , H01J2237/1534
摘要： The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.
摘要翻译： 电子束装置包括电子源和物镜偏转器。 电子束装置基于通过投射的电子束从材料发射的二次电子等的信号获得图像。 电子束装置还包括偏置色差校正元件，该偏置色差校正元件还包括位于比物镜偏转器更靠近电子源的电磁偏转器和具有比电磁偏转器更窄的内径的静电偏转器， 在电磁偏转器内，使得材料的高度位置与电磁偏转器重叠，并且能够施加偏移电压。 因此，可以提供一种电子束装置，通过该电子束装置可以减轻由偏转引起的几何像差（寄生像差），并且在高分辨率的宽视角上实现偏转。
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公开(公告)号：US08704175B2
公开(公告)日：2014-04-22
申请号：US13812451
申请日：2011-08-26
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/153 , H01J2237/1506 , H01J2237/1532 , H01J2237/2826
摘要： Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam column and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position displacement of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
摘要翻译： 本发明提供一种扫描电子显微镜，其配备有当由电子束柱产生的散光和从测量样品的周围产生的散光存在时使用的高速和高精度散光测量装置。 该扫描电子显微镜的特征在于以高速和高精度控制像散校正器（201），以通过使用从改变后获得的二维图像的质量获得散光的方法来校正像散 散光校正器（201）的强度，以及根据使用倾斜偏转器（202）使电子束倾斜时发生的电子束的位置偏移的变化来测量像散的方法。
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公开(公告)号：US20120286160A1
公开(公告)日：2012-11-15
申请号：US13451596
申请日：2012-04-20
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/1532 , H01J2237/1536 , H01J2237/2811
摘要： A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.
摘要翻译： 一种带电粒子仪器，包括用于控制带电粒子源的控制和操作单元，偏转装置和聚焦改变装置，以及通过由检测器检测的电信号为图像提供数据;以及记录单元，用于保持记录的校正系数 在每次图像获取期间，控制和操作单元在改变焦点的同时获取多个图像，并且控制光学条件，使得当基于以下步骤获得用于测量的图像时，带电粒子束的着陆角变为垂直 图像中的标记的位置偏移量和登记到记录单元的校正系数。
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公开(公告)号：US20120286158A1
公开(公告)日：2012-11-15
申请号：US13521254
申请日：2011-02-18
CPC分类号： H01J37/28 , H01J37/09 , H01J37/145 , H01J2237/1506 , H01J2237/1534 , H01J2237/2611
摘要： Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
摘要翻译： 提供了一种具有最小像差的高分辨率扫描电子显微镜，并且具有能够形成具有广角偏振和期望角度的倾斜光束而不干扰电磁透镜的电光结构。 在扫描电子显微镜中，电磁偏转器（201）设置在磁性透镜（207）的上方，并且设置使电子加速或减速的控制电极（202）重叠（以使得高度位置重叠 相对于垂直方向）与电磁偏转器（201）。 在宽场极化中，电极被加速，并且在倾斜的波束形成中，电子被减速。
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公开(公告)号：US20070172967A1
公开(公告)日：2007-07-26
申请号：US11626402
申请日：2007-01-24
申请人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
发明人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
IPC分类号： H01L21/66
CPC分类号： G03F9/7049 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7084 , G03F9/7088
摘要： Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
摘要翻译： 通过纳米压印技术形成图案的方法开始于在其表面上制备具有纳米结构的模具。 将模具压在涂有树脂膜的基板或板上。 检测在涂覆有树脂膜的板的后表面上形成的对准标记的位置。 因此，执行模具和涂覆有树脂膜的板之间的相对对准。
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