公开(公告)号：US07148957B2

公开(公告)日：2006-12-12

申请号：US10863938

申请日：2004-06-09

申请人： William A. Tolbert ,  James M. Nelson ,  Thomas A. Isberg ,  Andrew L. Hightower ,  Dean Faklis

发明人： William A. Tolbert ,  James M. Nelson ,  Thomas A. Isberg ,  Andrew L. Hightower ,  Dean Faklis

IPC分类号： G03B27/54 ,  G03C8/00 ,  B41J2/45 ,  B41J2/47

CPC分类号： G03B27/306 ,  G03B27/16 ,  G03F7/70383

摘要： An optical imaging system is disclosed for selective thermal transfer of a material from a donor film to a substrate. The imaging system includes a light source assembly that is configured to emit a patterned light beam. The patterned light beam includes a plurality of discrete output light segments where the segments at most partially overlap. The imaging system further includes a light relay assembly that receives and projects the plurality of discrete output light segments onto a transfer plane so as to form a projected light segment by a substantial superposition of the plurality of discrete output light segments. When a donor film that includes a transferable material is placed proximate a substrate that lies in the transfer plane, the projected light segment is capable of inducing a transfer of the transferable material onto the substrate.

摘要翻译： 公开了一种光学成像系统，用于将材料从施主膜选择性地热传递到基底。 成像系统包括被配置为发射图案化光束的光源组件。 图案化的光束包括多个离散的输出光段，其中段最多部分重叠。 成像系统还包括光继电器组件，其接收并将多个离散输出光段投影到转移平面上，以便通过多个离散输出光段的实质叠加来形成投影光段。 当包括可转移材料的供体膜放置在位于转印平面中的基底附近时，投影光段能够引起可转移材料转移到基底上。

公开(公告)号：US20060211153A1

公开(公告)日：2006-09-21

申请号：US11383905

申请日：2006-05-17

申请人： Paul Farrar

发明人： Paul Farrar

IPC分类号： H01L21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/78 ,  G03F7/70383 ,  G03F7/70533 ,  H01J37/3174 ,  H01J2237/30488 ,  H01L27/0207 ,  H01L27/222 ,  Y02P90/265

摘要： The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. Various method embodiments relate to forming a magnetic random access memory (MRAM) array. Various embodiments include forming a first wiring layer of approximately parallel conductors, a second wiring layer of approximately parallel conductors and a third wiring layer of approximately parallel conductors such that the first, second and third wiring layers cross at a number of intersections. At least one of the first, second and third wiring layers are formed so as to be non-orthogonal with respect to a remaining at least one of the first, second and third wiring layers. The method further includes forming a layer of magnetic storage elements proximately located to the intersections. Other aspects are provided herein.

摘要翻译： 本主题允许以与正交线相同的厚度形成非正交线，从而促进紧凑的设计，形成均匀的线边缘，并且有效地形成。 各种方法实施例涉及形成磁随机存取存储器（MRAM）阵列。 各种实施例包括形成大致平行的导体的第一布线层，大致平行的导体的第二布线层和大致平行的导体的第三布线层，使得第一布线层和第三布线层在多个交点处交叉。 第一，第二和第三布线层中的至少一个形成为相对于第一，第二和第三布线层中剩余的至少一个布线不正交。 该方法还包括形成一个靠近相交处的磁存储元件层。 本文提供了其他方面。

公开(公告)号：US07105841B2

公开(公告)日：2006-09-12

申请号：US10928771

申请日：2004-08-27

申请人： Paul A. Farrar

发明人： Paul A. Farrar

IPC分类号： H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/78 ,  G03F7/70383 ,  G03F7/70533 ,  H01J37/3174 ,  H01J2237/30488 ,  H01L27/0207 ,  H01L27/222 ,  Y02P90/265

摘要： The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. One aspect of the present subject matter relates to a method for forming non-orthogonal images in a raster-based photolithographic system. According to various embodiments of the method, a first image corresponding to a first data set is formed on a reticle when the reticle is at a first rotational position θ1. The reticle is adjusted to a second rotational position θ2. A second image corresponding to a second data set is formed on the reticle when the reticle is at the second rotational position θ2. The second image is non-orthogonal with respect to the first image. Other aspects are provided herein.

公开(公告)号：US20060183057A1

公开(公告)日：2006-08-17

申请号：US11055623

申请日：2005-02-11

申请人： Katsuhiko Mitani ,  Hiroshi Fukuda

发明人： Katsuhiko Mitani ,  Hiroshi Fukuda

IPC分类号： G03F7/00

CPC分类号： G03F7/2051 ,  G03F7/70383

摘要： Formation of a photomask in the conventional art requires significant cost and time. The invention provides a patterning method of forming a desired latent image pattern by irradiating a resist film formed on a substrate with focused light beam. The method comprising adjusting intensity of the focused light beam or size thereof on the resist film depending on a design of the pattern to irradiate the resist film, thereby achieving a desired pattern with reasonable cost and time.

摘要翻译： 在传统技术中形成光掩模需要大量的成本和时间。 本发明提供一种通过用聚焦光束照射形成在基板上的抗蚀剂膜来形成期望的潜像图案的图案化方法。 该方法包括根据用于照射抗蚀剂膜的图案的设计来调整抗蚀剂膜上的聚焦光束的强度或其尺寸，从而以合理的成本和时间实现期望的图案。

公开(公告)号：US20060170893A1

公开(公告)日：2006-08-03

申请号：US11392970

申请日：2006-03-28

申请人： Hans Opower ,  Stefan Scharl

发明人： Hans Opower ,  Stefan Scharl

IPC分类号： G03B27/52

CPC分类号： G03F7/7005 ,  G03F7/70383 ,  G03F7/704

摘要： In order to design a lithography exposure device comprising a mounting device for the layer sensitive to light, an exposure unit comprising several laser radiation sources and an optical focusing means associated with the laser radiation sources, a movement unit for generating a relative movement between the optical focusing means and the mounting device and a control for controlling intensity and position of the exposure spots in such a manner that exposed structures which are as precisely structured as possible can be produced, it is suggested that the optical focusing means have an end lens which generates focal points of the laser radiation exiting from each of the laser radiation sources close to the light-sensitive layer, that a laser radiation field propagate in the direction of the light-sensitive layer for generating each of the exposure spots from the respective focal points and have a power density which leads in the conversion area in the light-sensitive layer to the formation of a channel which penetrates the light-sensitive layer with an index of refraction increased in relation to its surroundings due to the Kerr effect and guides the respective laser radiation field in a spatially limited manner.

摘要翻译： 为了设计包括用于对光敏感的层的安装装置的光刻曝光装置，包括若干激光辐射源和与激光辐射源相关联的光学聚焦装置的曝光单元，用于在光学器件之间产生相对运动的移动单元 聚焦装置和安装装置以及用于控制曝光点的强度和位置的控制，使得可以产生尽可能精确地构造的暴露结构，使得光学聚焦装置具有产生 激光辐射从靠近感光层的每个激光辐射源射出的焦点，激光辐射场沿着感光层的方向传播，用于从各个焦点产生每个曝光点，以及 具有在感光层的转换区域中导致格式的功率密度 由于克尔效应，折射率相对于其周围环境增加的透射感光层的通道的离子以空间有限的方式引导相应的激光辐射场。

公开(公告)号：US07084413B2

公开(公告)日：2006-08-01

申请号：US10215214

申请日：2002-08-08

申请人： Paul A. Farrar

发明人： Paul A. Farrar

IPC分类号： G03F7/23 ,  G05B19/18 ,  H01J37/302

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/78 ,  G03F7/70383 ,  G03F7/70533 ,  H01J37/3174 ,  H01J2237/30488 ,  H01L27/0207 ,  H01L27/222 ,  Y02P90/265

摘要： The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. One aspect of the present subject matter relates to a method for forming non-orthogonal images in a raster-based photolithographic system. According to various embodiments of the method, a first image corresponding to a first data set is formed on a reticle when the reticle is at a first rotational position θ1. The reticle is adjusted to a second rotational position θ2. A second image corresponding to a second data set is formed on the reticle when the reticle is at the second rotational position θ2. The second image is non-orthogonal with respect to the first image. Other aspects are provided herein.

摘要翻译： 本主题允许以与正交线相同的厚度形成非正交线，从而促进紧凑的设计，形成均匀的线边缘，并且有效地形成。 本主题的一个方面涉及在基于光栅的光刻系统中形成非正交图像的方法。 根据该方法的各种实施例，当标线片处于第一旋转位置θ1时，在掩模版上形成对应于第一数据组的第一图像。 将掩模版调整到第二旋转位置θ2。 当标线片处于第二旋转位置θ2时，在掩模版上形成对应于第二数据组的第二图像。 第二图像相对于第一图像是非正交的。 本文提供了其他方面。

公开(公告)号：US20060153045A1

公开(公告)日：2006-07-13

申请号：US10874236

申请日：2004-06-24

申请人： Chih Lee ,  Liang Yu ,  Jiunn Liaw ,  Ding Lin ,  Jyi Yeh ,  Yu Chiu ,  Chun Chen ,  Chyan Wu ,  Chau Yeh ,  You Chang ,  Kuo Huang ,  Yi Chen ,  Yeong Wang

发明人： Chih Lee ,  Liang Yu ,  Jiunn Liaw ,  Ding Lin ,  Jyi Yeh ,  Yu Chiu ,  Chun Chen ,  Chyan Wu ,  Chau Yeh ,  You Chang ,  Kuo Huang ,  Yi Chen ,  Yeong Wang

IPC分类号： G11B7/135 ,  G11B7/00

CPC分类号： G03F7/70383 ,  G01Q60/22 ,  G01Q80/00 ,  G02B27/58 ,  G11B7/1387

摘要： The present invention provides an optical head with a single or multiple sub-wavelength light beams, which can be used in arenas such as photolithography, optical storage, optical microscopy, to name a few. The present invention includes a transparent substrate, a thin film, and a surface structure with sub-wavelength surface profile. The incident light transmits through the transparent substrate, forms a surface plasma wave along the sub-wavelength aperture located within the thin film, and finally re-emits through spatial coupling with the sub-wavelength profile of the surface structure. As the coupled re-emitting light beam or light beams can maintain the waist less than that of the diffraction limit for a few micrometers out of the surface with sub-wavelength profile in many cases, this invention can have applications ranging from micro or nano manufacturing, metrology, and manipulation by using light beams with waist smaller than the diffraction limit.

摘要翻译： 本发明提供了具有单个或多个亚波长光束的光学头，其可以用于诸如光刻，光学存储，光学显微镜等领域。 本发明包括透明基板，薄膜和具有亚波长表面轮廓的表面结构。 入射光透过透明基板，沿着位于薄膜内的亚波长孔径形成表面等离子体波，最后通过与表面结构的亚波长分布的空间耦合重新发射。 由于耦合的再发射光束或光束在许多情况下可以使具有亚波长分布的表面中几微米外的衍射极限的腰部保持较小，所以本发明可以具有从微或纳米制造的应用 ，计量和使用腰围小于衍射极限的光束进行操纵。

公开(公告)号：US07019908B2

公开(公告)日：2006-03-28

申请号：US10909167

申请日：2004-07-29

申请人： Johannes Christiaan van 't Spijker ,  Marco Jan-Jaco Wieland ,  Ernst Habekotte ,  Floris Pepijn van der Wilt

发明人： Johannes Christiaan van 't Spijker ,  Marco Jan-Jaco Wieland ,  Ernst Habekotte ,  Floris Pepijn van der Wilt

IPC分类号： G02B27/10 ,  G02B26/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70383 ,  H01J37/3177 ,  H01J2237/0435

摘要： The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.

摘要翻译： 本发明涉及一种用于调制多子束光刻系统中的子束幅度的调制器，所述调制器包括至少一个影响子束方向的装置，用于接收来自调制光束的光的光敏元件和转换器 将所述光转换为信号，以及离散化装置，耦合到所述光敏元件和至少一个用于影响从所述光敏元件接收的信号转换成具有从一组预定离散值中选择的离散值的离散信号的装置 值，并将所述离散信号提供给所述用于影响的装置。

公开(公告)号：US06975443B2

公开(公告)日：2005-12-13

申请号：US10275623

申请日：2001-06-25

申请人： Torbjorn Sandstrom

发明人： Torbjorn Sandstrom

IPC分类号： G02B26/10 ,  G02B19/00 ,  G02B26/08 ,  G03F7/20 ,  H01L21/027 ,  G02B26/00

CPC分类号： G03F7/70383 ,  G02B26/0816 ,  G03F7/70358 ,  G03F7/704

摘要： A scanning pattern generator and a method for microlithographic multi-beam writing of high precision patterns on a photosensitive substrate (11), the system comprising a light source (1), preferably a laser, for generating at least two light beams, a computer-controlled light modulator (4), a deflector for scanning the beams on the substrate and an objective lens (10) to contract the at least one light beam from the light source before it reaches the substrate, wherein at least the objective lens is arranged on a carrier (22) being movable relative to the substrate (11) and the light source (1). Hereby, the carrier defines a movable optical path relative to the remaining, stationary optical path. Further, the system comprises means for altering the stationary optical path in order to maintain telecentricity for the beams as they impinge on the photosensitive substrate during the movement of the carrier and the movable optical path.

摘要翻译： 一种扫描图形生成器和用于在感光基板（11）上进行高精度图案的微光刻多光束写入的方法，该系统包括用于产生至少两个光束的光源（1），优选地是激光器， 控制光调制器（4），用于扫描基板上的光束的偏转器和物镜（10），以在到达基板之前收缩来自光源的至少一个光束，其中至少物镜布置在 载体（22）可相对于基板（11）和光源（1）移动。 因此，载体限定相对于剩余的固定光路的可移动光路。 此外，该系统包括用于改变固定光路的装置，以便在载体和可移动光路移动过程中当光束撞击感光基板时保持光束的远心度。

公开(公告)号：US20050083509A1

公开(公告)日：2005-04-21

申请号：US10941308

申请日：2004-09-14

申请人： Hans Opower ,  Stefan Scharl

发明人： Hans Opower ,  Stefan Scharl

IPC分类号： G03F7/20 ,  G03B27/58

CPC分类号： G03F7/70383 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70766

摘要： The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.

摘要翻译： 本发明涉及一种用于曝光衬底材料的装置，包括：至少一个光学曝光装置，至少一个衬底平台; 用于在两个横向上产生曝光装置和基板平台之间的相对位移的装置，由此在主方向上的相对位移以比在次方向上更大的动态响应发生; 用于产生主要方向上的相对位移的至少一个主驱动器; 以及用于产生次要方向上的相对位移的至少一个次级驱动器。 本发明的目的是以最大可能的准确度和尽可能最大的动态响应来定位衬底平台。 为了实现这一点，该装置包括在主要方向上基本上彼此相对移动的两个基板平台。