中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

66 records (took 0.014 seconds)

    Scanning Electron Microscope
    61.
    发明申请
    Scanning Electron Microscope 有权
    扫描电子显微镜

    公开(公告)号：US20150108351A1

    公开(公告)日：2015-04-23

    申请号：US14397079

    申请日：2013-03-25

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Takeshi Ogashiwa ,  Mitsugu Sato ,  Mitsuru Konno

    IPC: H01J37/22 ,  H01J37/21 ,  H01J37/28

    CPC classification number: H01J37/222 ,  H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/24475 ,  H01J2237/24507 ,  H01J2237/2802 ,  H01J2237/2804 ,  H01J2237/2805 ,  H01J2237/2826

    Abstract: Conventionally, in a general-purpose scanning electron microscope, the maximum accelerating voltage which can be set is low, and hence thin crystal samples which can be observed under normal high-resolution observation conditions are limited to samples with large lattice spacing. For this reason, there has no means for accurately performing magnification calibration. As means for solving this problem, the present invention includes an electron source which generates an electron beam, a deflector which deflects the electron beam so as to scan a sample with the electron beam, an objective lens which focuses the electron beam on the sample, a detector which detects an elastically scattered electron and an inelastically scattered electron which are transmitted through the sample, and an aperture disposed between the sample and the detector to control detection angles of the elastically scattered electron and the inelastically scattered electron. The electron beam enters the sample at a predetermined convergence semi-angle, and a lattice image is acquired at a second convergence semi-angle larger than a first convergence semi-angle at which a beam diameter is minimized on the sample.

    Abstract translation: 通常，在通用扫描电子显微镜中，可以设定的最大加速电压低，因此在正常高分辨率观察条件下可以观察到的薄晶体样品限于具有大格子间距的样品。 因此，没有准确地执行放大校准的方法。 作为解决该问题的手段，本发明包括产生电子束的电子源，使电子束偏转以使电子束扫描样品的偏转器，将电子束聚焦在样品上的物镜， 检测器，其检测透射通过样品的弹性散射电子和非弹性散射电子;以及孔，设置在样品和检测器之间，以控制弹性散射电子和非弹性散射电子的检测角。 电子束以预定的会聚半角进入样品，并且以比样品上的光束直径最小化的第一会聚半角的第二会聚半角获取晶格图像。

    CHARGED PARTICLE BEAM APPARATUS
    62.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号：US20150014530A1

    公开(公告)日：2015-01-15

    申请号：US14379291

    申请日：2013-02-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Hiroyuki Ito ,  Mitsugu Sato ,  Sukehiro Ito

    IPC: H01J37/28 ,  H01J37/09 ,  H01J37/18

    CPC classification number: H01J37/28 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/0451 ,  H01J2237/06341 ,  H01J2237/10 ,  H01J2237/1405 ,  H01J2237/164 ,  H01J2237/2608 ,  H01J2237/2801

    Abstract: Provided is a charged particle beam apparatus (111) to and from which a diaphragm (101) can be easily attached and detached, and in which a sample (6) can be arranged under vacuum and under high pressure. The charged particle beam apparatus includes: a lens barrel (3) holding a charged particle source (110) and an electron optical system (1,2,7); a first housing (4) connected to the lens barrel (3); a second housing (100) recessed to inside the first housing (4); a first diaphragm (10) separating the space inside the lens barrel (3) and the space inside the first housing (4), and through which the charged particle beam passes; a second diaphragm (101) separating the spaces inside and outside the recessed section (100a) in the second housing (100), and through which the charged particle beam passes; and a pipe (23) connected to a third housing (22) accommodating the charged particle source (110). The first diaphragm (10) is attached to the pipe (23), and the pipe (23) and the third housing (22) can be attached to and detached from the lens barrel (3) in the direction of the optical axis (30). A space (105) surrounded by the first housing (4) and the second housing (100) is depressurized, and the sample (6) arranged inside the recessed section (100a) is irradiated with a charged particle beam.

    Abstract translation: 提供了一种带电粒子束装置（111），隔膜（101）可以从其中容易地附接和拆卸，并且其中样品（6）可以在真空和高压下布置。 带电粒子束装置包括：保持带电粒子源（110）和电子光学系统（1,2,7）的镜筒（3）; 连接到镜筒（3）的第一壳体（4）; 第二壳体（100），其凹入到所述第一壳体（4）的内部; 分离透镜筒（3）内的空间与第一壳体（4）内的空间的第一隔膜（10），带电粒子束通过该第一隔膜 第二隔膜（101），其分离所述第二壳体（100）中的所述凹部（100a）的内部和外部的空间，并且所述带电粒子束通过所述第二隔膜; 以及连接到容纳所述带电粒子源（110）的第三壳体（22）的管道（23）。 第一隔膜（10）附接到管道（23），并且管道（23）和第三壳体（22）可以沿着光轴（30）的方向附接到镜筒（3）并从镜筒 ）。 由第一壳体（4）和第二壳体（100）围绕的空间（105）被减压，并且将配置在凹部（100a）内部的样品（6）照射带电粒子束。

    Particle-optical projection system
    66.
    发明申请
    Particle-optical projection system 审中-公开
    粒子投影系统

    公开(公告)号：US20050201246A1

    公开(公告)日：2005-09-15

    申请号：US11080578

    申请日：2005-03-15

    Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

    IPC: H01L21/027 ,  G03F7/20 ,  G11B7/09 ,  H01J37/02 ,  H01J37/147 ,  H01J37/15 ,  H01J37/20 ,  H01J37/21 ,  H01J37/304 ,  H01J37/317

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

    Abstract: In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.

    Abstract translation: 在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。 所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。 为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸， 该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

Patent Agency Ranking