公开(公告)号：US07710008B2

公开(公告)日：2010-05-04

申请号：US11514595

申请日：2006-09-01

Applicant: Yang Wei ,  Liang Liu ,  Wei Wei ,  Kai-Li Jiang ,  Shou-Shan Fan

Inventor： Yang Wei ,  Liang Liu ,  Wei Wei ,  Kai-Li Jiang ,  Shou-Shan Fan

IPC: H01J1/62

CPC classification number: H01J1/3044 ,  H01J37/073 ,  H01J37/26 ,  H01J2201/30411 ,  H01J2201/30434 ,  H01J2201/30469 ,  H01J2237/06341 ,  H01J2237/28

Abstract: A field emission electron source (10) includes a conductive base (12), a carbon nanotube (14), and a film of metal (16). The conductive base includes a top (122). One end (142) of the carbon nanotube is electrically connected with the top of the conductive base. The other end (144) of the carbon nanotube extends outwardly away from the top of the conductive base. The film of metal is formed on the nearly entire surface of the carbon nanotube and at least on the portion of the top of the conductive base proximate the carbon nanotube. A method for manufacturing the described field emission electron source is also provided.

Abstract translation: 场发射电子源（10）包括导电基底（12），碳纳米管（14）和金属薄膜（16）。 导电基底包括顶部（122）。 碳纳米管的一端（142）与导电性基材的顶部电连接。 碳纳米管的另一端（144）向外远离导电基底的顶部。 金属膜形成在碳纳米管的几乎整个表面上，并且至少在靠近碳纳米管的导电基底顶部的部分上形成。 还提供了一种用于制造所述场致发射电子源的方法。

公开(公告)号：US07633063B2

公开(公告)日：2009-12-15

申请号：US11599611

申请日：2006-11-15

Applicant: Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

Inventor： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

IPC: H01J47/00 ,  G01N23/00

CPC classification number: H01J37/1471 ,  H01J37/265 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/28

Abstract: A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.

Abstract translation: 提供一种带电粒子束装置，其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低，使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时， 轴随时间变化，可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中，在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整，或者提供与对准偏转器的偏转条件相对应的焦点调整量表， 改变对准偏转器的偏转状态，根据该表进行焦点调整。

公开(公告)号：US07605378B2

公开(公告)日：2009-10-20

申请号：US11585049

申请日：2006-10-23

Applicant: Kazuhiro Honda ,  Shinobu Uno

Inventor： Kazuhiro Honda ,  Shinobu Uno

IPC: G21K1/08

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: There is disclosed a charged-particle beam system equipped with a higher-order aberration corrector capable of correcting fifth-order spherical aberration and third-order chromatic aberration such that the primary trajectory of an electron beam is not affected by the strength of a transfer lens. The corrector is so adjusted that the image point of the corrector is located at a position shifted a distance of L0 from the principal plane of an objective lens toward the electron source. The transfer lens is so disposed that the position of the principal plane is coincident with the image point of the corrector. Therefore, the primary trajectory of the electron beam passes through the center of the transfer lens. Consequently, the primary trajectory is not affected by the strength of the transfer lens.

Abstract translation: 公开了一种装有高次像差校正器的带电粒子束系统，其能够校正五阶球面像差和三阶色差，使得电子束的主轨迹不受转印透镜的强度的影响 。 校正器被调整为使得校正器的像点位于从物镜的主平面向电子源偏移L0的位置处的位置。 转印透镜被布置成使得主平面的位置与校正器的图像点一致。 因此，电子束的主要轨迹通过转印透镜的中心。 因此，主轨迹不受转印透镜强度的影响。

公开(公告)号：US07598496B2

公开(公告)日：2009-10-06

申请号：US11874604

申请日：2007-10-18

Applicant: Hidetaka Sawada ,  Fumio Hosokawa

Inventor： Hidetaka Sawada ,  Fumio Hosokawa

IPC: H01J37/14

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/2485 ,  H01J2237/28

Abstract: An aberration for correcting higher-order aberrations with a relatively small number of components is by let N1 being the aberration order at a first location, S1 being the symmetry at the first location, N2 being the aberration order at a second location and S2 being the symmetry at the second location. The produced combination aberration satisfies the following condition set 1 as order=N1+N2−1 and symmetry=|S1+S2| or |S2−S1|. That is two aberration-correcting elements (aberration-introducing elements) corresponding to the first and second locations, respectively. An aberration satisfying the condition set 1 is corrected by making use of the produced combination aberration.

Abstract translation: 用相对较少数量的分量校正高阶像差的像差是令N1为第一位置处的像差次数，S1为第一位置处的对称性，N2为第二位置处的像差顺序，S2为第 对称性在第二个位置。 产生的组合像差满足以下条件集合1作为阶数= N1 + N2-1和对称= | S1 + S2 | 或| S2-S1 |。 这是分别对应于第一和第二位置的两个像差修正元件（像差引入元件）。 通过利用所产生的组合像差校正满足条件集合1的像差。

公开(公告)号：US07566892B2

公开(公告)日：2009-07-28

申请号：US11907375

申请日：2007-10-11

Applicant: Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

IPC: G01N23/00

CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

公开(公告)号：US07544937B2

公开(公告)日：2009-06-09

申请号：US11384043

申请日：2006-03-17

Applicant: Juergen Frosien

Inventor： Juergen Frosien

IPC: H01J37/244 ,  H01J37/256 ,  H01J37/28

CPC classification number: H01J37/05 ,  H01J37/244 ,  H01J2237/047 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2538 ,  H01J2237/28

Abstract: The present invention relates to a charged particle device with improved detection scheme. The device has a charged particle source providing a beam of primary charged particles; a first unit for providing a potential; a second unit for providing a potential; and a center unit positioned between the first unit and the second unit. The center unit is capable of providing a potential different from the potential of the first and the second unit for decelerating the primary charged particles to a first low energy and for accelerating the primary charged particles to a second high energy. Therein, the first unit and/or the second unit is a detector for detecting secondary electrons released at a specimen.

Abstract translation: 本发明涉及具有改进的检测方案的带电粒子装置。 该装置具有提供初级带电粒子束的带电粒子源; 提供潜力的第一单元; 用于提供潜力的第二单元; 以及定位在第一单元和第二单元之间的中心单元。 中心单元能够提供与第一和第二单元的电位不同的电位，用于将初级带电粒子减速到第一低能量并且用于将初级带电粒子加速到第二高能量。 其中，第一单元和/或第二单元是用于检测在样本上释放的二次电子的检测器。

公开(公告)号：US20090101818A1

公开(公告)日：2009-04-23

申请号：US12213493

申请日：2008-06-20

Applicant: Joachim Zach

Inventor： Joachim Zach

IPC: G21K7/00 ,  H01J3/14

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: The invention concerns a corrector (10) for chromatic and aperture aberration correction in a scanning electron microscope or a scanning transmission electron microscope, comprising four multipole elements (1, 2, 3, 4) which are consecutively disposed in the optical path (9), the first (1) and fourth (4) of which are used to generate quadrupole fields (5, 6) and the second (2) and third (3) of which are used to generate octupole fields (11, 12) and quadrupole fields (7, 7′, 8, 8′), wherein the latter are superposed magnetic (7, 8) and electric (7′, 8′) fields, and wherein the quadrupole fields (5, 6, 7, 8) of all four multipole elements (1, 2, 3, 4) are successively rotated with respect to one another through 90°. Elimination of errors up to fifth order can be realized with a corrector (10) of this type in that the second (2) and the third (3) multipole elements are designed as twelve-pole elements, and an additional twelve-pole element (13) is inserted between the second (2) and the third (3) multipole element, and is loaded with current and/or voltage, such that an octupole field (14) is generated that is superposed by a twelve-pole field (15).

Abstract translation: 本发明涉及一种用于扫描电子显微镜或扫描透射电子显微镜中的彩色和孔径像差校正的校正器（10），包括连续设置在光路（9）中的四个多极元件（1,2,3,4） ，其第一（1）和第四（4）用于产生四极场（5,6）和第二（2）和第三（3）用于产生八极场（11,12）和四极杆 （7,7'，8,8'），其中后者是重叠的磁（7,8）和电（7'，8'）场，并且其中四极场（5,6,7,8） 所有四个多极元件（1,2,3,4）相对于彼此依次旋转90°。 可以用这种校正器（10）来实现高达五级的误差的消除，因为第二（2）和第三（3）多极元件被设计为十二极元件和另外的十二极元件 13）插入在第二（2）和第三（3）多极元件之间，并且被加载电流和/或电压，使得产生由十二极场（15）叠加的八极场（14） ）。

公开(公告)号：US20090045335A1

公开(公告)日：2009-02-19

申请号：US11607906

申请日：2006-12-04

Applicant: Kenji Obara ,  Takehiro Hirai

Inventor： Kenji Obara ,  Takehiro Hirai

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/28 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.

Abstract translation: 本发明的目的是提供一种使用电子显微镜观察晶片边缘的合适方法。 电子显微镜包括可以使图像倾斜的列，从而允许从倾斜方向观察晶片边缘。

公开(公告)号：US20090033913A1

公开(公告)日：2009-02-05

申请号：US12184500

申请日：2008-08-01

Applicant: RICHARD B. MOTT

Inventor： RICHARD B. MOTT

IPC: G01J3/00 ,  G01R35/00

CPC classification number: G01R29/02 ,  G01T1/36 ,  H01J2237/2442 ,  H01J2237/28

Abstract: A method of adjusting a response of an energy measuring filter, such as an FIR filter, of a pulse processor based on a slope of a preamplifier signal having a plurality of step edges each corresponding to a respective photon is provided that includes receiving a digital version of the preamplifier signal comprising a plurality of successive digital samples each having a digital value, the preamplifier signal having a portion defined by a first one of the step edges and a second one of the step edges immediately following the first one of the step edges, using the digital values of each of the digital samples associated with the portion to determine an average slope of the portion normalized by a length of the portion, and using the average slope of the portion normalized by a length of the portion to correct the response of the energy measuring filter.

Abstract translation: 提供了一种基于具有各自对应于各个光子的多个阶跃边缘的前置放大器信号的斜率来调整脉冲处理器的诸如FIR滤波器的能量测量滤波器的响应的方法，其包括接收数字版本 所述前置放大器信号包括多个连续的数字样本，每个具有数字值，所述前置放大器信号具有由所述步骤边缘中的第一个边界限定的部分和紧跟在所述台阶边缘中的第一个之后的所述台阶边缘中的第二个， 使用与该部分相关联的每个数字样本的数字值来确定由该部分的长度归一化的部分的平均斜率，并且使用通过该部分的长度归一化的部分的平均斜率来校正响应的响应 能量测量滤波器。

公开(公告)号：US20080308743A1

公开(公告)日：2008-12-18

申请号：US12137128

申请日：2008-06-11

Applicant: Masaki Mizuochi ,  Shoji Tomida

Inventor： Masaki Mizuochi ,  Shoji Tomida

IPC: G21K5/08 ,  H01L21/683

CPC classification number: H01L21/6831 ,  H01J37/20 ,  H01J2237/2008 ,  H01J2237/28 ,  H01J2237/2811 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: An apparatus capable of improving image quality by making it possible to suck specimens of different sizes electrostatically, and uniformalizing an electric field of a specimen edge portion, while suppressing increase in prime cost is provided. Specimen holding means is an electrostatic chuck, a master flat plane part surrounding a specimen of the largest size of specimen sizes, and an opening surrounding a specimen size except for the largest specimen size are included at an outer peripheral portion of the electrostatic chuck, a dummy specimen attachable to and detachable from the electrostatic chuck is included, and at a time of switching the specimen size, a dummy specimen is selected (or may be prevented from being used).

Abstract translation: 提供了一种能够通过静电吸取不同尺寸的试样来提高图像质量并且同时抑制原始成本增加的同时使试样边缘部分的电场均匀化的装置。 样本保持装置是静电卡盘，围绕最大尺寸样本尺寸的样本的主平面部分和围绕最大样本尺寸的样本尺寸的开口包括在静电卡盘的外周部分， 包含可静电卡盘可拆卸的虚拟试样，在切换试样尺寸的情况下，选择虚拟试样（或者可以防止使用）。