公开(公告)号：US20100245795A1

公开(公告)日：2010-09-30

申请号：US12721493

申请日：2010-03-10

申请人： Fardad A. Hashemi ,  Hiroshi Shirasu ,  Douglas C. Watson

发明人： Fardad A. Hashemi ,  Hiroshi Shirasu ,  Douglas C. Watson

IPC分类号： G03B27/54 ,  H01J9/00

CPC分类号： G03F7/70841 ,  G03B27/54 ,  G03F7/70525 ,  G03F7/70808

摘要： A chamber assembly (226) for providing a sealed chamber (38) adjacent to a workpiece (28) includes a chamber housing (244), a chamber pressure source (246) and a seal assembly (250). The chamber housing (244) cooperates with the workpiece (28) to define at least a portion of the sealed chamber (38). The chamber pressure source (246) controls a chamber pressure within the sealed chamber (38) to be different than the environmental pressure. The seal assembly (250) seals the chamber housing (244) to the workpiece (28). The seal assembly (250) can include a first seal contact region (270) and a second seal contact region (272) that cooperate to define a seal gap (274) adjacent to at least one of the chamber housing (244) and the workpiece (28). The seal assembly (250) may further include a seal pressure source (276) for controlling a seal pressure within the seal gap (274) so that the seal pressure is different than the chamber pressure and the environmental pressure. The first seal contact region (270) and the second seal contact region (272) cooperate to exert a first force (284) on a surface (278). The seal pressure source (276) generates a second force (286) on the surface (278). The first force (284) is approximately equal in magnitude and opposite in direction to the second force (286).

摘要翻译： 用于提供与工件（28）相邻的密封腔（38）的腔室组件（226）包括腔室壳体（244），腔室压力源（246）和密封组件（250）。 腔室壳体（244）与工件（28）配合以限定密封腔室（38）的至少一部分。 腔室压力源（246）控制密封腔室（38）内的腔室压力不同于环境压力。 密封组件（250）将腔室壳体（244）密封到工件（28）。 密封组件（250）可以包括第一密封接触区域（270）和第二密封接触区域（272），第一密封接触区域（270）和第二密封接触区域（272）协作以限定邻近腔室壳体（244）和工件 （28）。 密封组件（250）还可以包括用于控制密封间隙（274）内的密封压力的密封压力源（276），使得密封压力不同于腔室压力和环境压力。 第一密封接触区域（270）和第二密封接触区域（272）协作以在表面（278）上施加第一力（284）。 密封压力源（276）在表面（278）上产生第二力（286）。 第一力（284）的大小相等并且在与第二力（286）相反的方向上相反。

公开(公告)号：US07683506B2

公开(公告)日：2010-03-23

申请号：US11306134

申请日：2005-12-16

申请人： Douglas C. Watson

发明人： Douglas C. Watson

IPC分类号： H02K41/02

CPC分类号： H02K41/02 ,  G03F7/70716 ,  G03F7/70758 ,  H02N15/00

摘要： Methods and apparatus for providing relatively long travel in a transverse direction for a magnetic levitation stage apparatus are disclosed. According to one aspect of the present invention, a linear actuator includes a first core, a second core, and at least one coil wrapped around the first core. The first core includes a body portion and a plurality of rails. The body portion has a first axis and a second axis, and the rails have longitudinal axes that are perpendicular to the first axis and parallel to the second axis. The dimensions of the rails along the longitudinal axes are substantially larger than a dimension of the body portion along the second axis. The second core has a third axis that is oriented perpendicularly to the longitudinal axes and to the second axis, and is levitated relative to the first core when a current is provided through the coil.

摘要翻译： 公开了用于磁悬浮台装置在横向方向上提供较长行程的方法和装置。 根据本发明的一个方面，线性致动器包括第一芯，第二芯和围绕第一芯缠绕的至少一个线圈。 第一芯包括主体部分和多个导轨。 主体部分具有第一轴线和第二轴线，并且轨道具有垂直于第一轴线并且平行于第二轴线的纵向轴线。 轨道沿着纵向轴线的尺寸基本上大于主体部分沿第二轴线的尺寸。 第二芯具有垂直于纵向轴线和第二轴线定向的第三轴线，并且当通过线圈提供电流时相对于第一铁芯悬浮。

公开(公告)号：US20100053589A1

公开(公告)日：2010-03-04

申请号：US12548895

申请日：2009-08-27

申请人： Fardad A. Hashemi ,  Douglas C. Watson ,  Christopher Margeson

发明人： Fardad A. Hashemi ,  Douglas C. Watson ,  Christopher Margeson

IPC分类号： G03F7/20 ,  B23P11/00 ,  F16M13/00

CPC分类号： G03F7/709 ,  F16F15/06 ,  Y10T29/49826

摘要： A precision assembly (10) for fabricating a substrate (42) includes a precision fabrication apparatus (12), a pedestal assembly (14) and a suspension system (16). The precision fabrication apparatus (12) fabricates the substrate (42). The pedestal assembly (14) supports at least a portion of the fabrication apparatus (12). The suspension system (16) inhibits the transfer of motion between the mounting base (20) and the pedestal assembly (14). The suspension system (16) can include (i) a first boom (380) that is coupled to the mounting base (20) and the pedestal assembly (14), the first boom (380) being pivotable coupled to at least one of the mounting base (20) and the pedestal assembly (14), and (ii) a first resilient assembly (382) that is coupled between the mounting base (20) and at least one of the first boom (380) and the pedestal assembly (14). The first resilient assembly (382) can function similar to a zero length spring over an operational range of the resilient assembly (382). With this design, the components of the precision fabrication apparatus (12) are better protected by the suspension system (16) during a seismic disturbance. This reduces the likelihood of damage and misalignment of the components of the precision fabrication apparatus (12) during the seismic disturbance.

摘要翻译： 一种用于制造基板（42）的精密组件（10）包括精密制造装置（12），基座组件（14）和悬挂系统（16）。 精密制造装置（12）制造基板（42）。 基座组件（14）支撑制造装置（12）的至少一部分。 悬挂系统（16）禁止在安装基座（20）和基座组件（14）之间的运动传递。 悬挂系统（16）可以包括（i）联接到安装基座（20）和基座组件（14）的第一起重臂（380），第一起重臂（380）可枢转地联接到至少一个 安装基座（20）和基座组件（14），以及（ii）第一弹性组件（382），其联接在安装基座（20）和第一起重臂（380）和基座组件 14）。 第一弹性组件（382）可以在弹性组件（382）的操作范围上类似于零长度弹簧起作用。 通过这种设计，在地震干扰期间，精密制造装置（12）的部件被悬挂系统（16）更好地保护。 这降低了在地震干扰期间精密制造装置（12）的部件的损坏和不对准的可能性。

公开(公告)号：US20090161084A1

公开(公告)日：2009-06-25

申请号：US12379171

申请日：2009-02-13

申请人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

发明人： Andrew J. Hazelton ,  Hidemi Kawai ,  Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

摘要翻译： 光刻设备包括其上保持有基板的基板台，包括最终光学元件的投影系统，所述投影系统将图案化的辐射束通过浸没液投射到邻近最终光学元件的基板上，以在 浸渍光刻工艺，以及包括入口的液体供应系统。 液体供应系统在浸没式光刻工艺期间提供浸没液体，并在净化过程中提供与浸没液体不同的清洗液体。 清理工艺和浸没光刻工艺在不同时间进行。

公开(公告)号：US20090051888A1

公开(公告)日：2009-02-26

申请号：US12232513

申请日：2008-09-18

申请人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

发明人： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.

摘要翻译： 液浸光刻设备包括具有最后元件的投影系统。 投影系统将图像投影到工件上，以通过填充在最后一个元件和工件之间的空间中的液体来暴露工件。 液体供应装置包括在曝光期间将液体从供应入口供应到工件和最后元件之间的空间的供应入口。 最后一个元件包括光学元件和板。 该板防止可能受液体接触影响的光学元件的劣化。

公开(公告)号：US20080316445A1

公开(公告)日：2008-12-25

申请号：US11628942

申请日：2004-12-20

申请人： Douglas C. Watson ,  W. Thomas Novak

发明人： Douglas C. Watson ,  W. Thomas Novak

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70258 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/709

摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

摘要翻译： 一种浸没式光刻系统，用于补偿由浸液引起的光学位移。 该系统包括光学组件（14），用于将由标线片（12）限定的图像投影到晶片（20）上。 光学组件包括通过间隙（24）与晶片间隔开的最终光学元件（16）。 提供浸入元件（22）以将浸没流体供应到间隙中并且回收逸出间隙的任何浸没流体。 为由于浸没流体的压力变化引起的光学组件的最终光学元件上的力提供流体补偿系统。 由变化的压力产生的所产生的力可能导致最终的光学元件变位。 流体补偿系统被配置为在光学组件上提供基本相等但相反的力，以防止最终光学元件的位移。

公开(公告)号：US20080225255A1

公开(公告)日：2008-09-18

申请号：US12047244

申请日：2008-03-12

申请人： Christopher S. Margeson ,  Douglas C. Watson

发明人： Christopher S. Margeson ,  Douglas C. Watson

IPC分类号： G03B27/54 ,  G02B7/00

CPC分类号： G02B7/026 ,  G02B7/182 ,  G03F7/70825 ,  G03F7/7095

摘要： Clamps are disclosed for holding an optical element relative to a support. An exemplary clamp includes first and second arms and a member connecting the arms such that a portion of a mounting feature of the optical element is between the first and second arms. The first arm applies a clamping force toward a respective portion of the mounting feature, and the second arm includes a seat. The seat has at least upper and intermediate portions. The upper portion engages the respective location on the mounting feature. The intermediate portion is situated between the upper portion and the second arm and has a lateral thickness less than the lateral thickness of the upper portion. The intermediate portion exhibits elastic and plastic deformability sufficient for any moment applied by the clamp to the mounting feature to be limited to less than a designated peak moment, while maintaining substantially full engagement of the upper portion with the respective location.

摘要翻译： 公开了用于相对于支撑件保持光学元件的夹具。 示例性夹具包括第一臂和第二臂以及连接臂的构件，使得光学元件的安装特征的一部分在第一和第二臂之间。 第一臂向安装构件的相应部分施加夹紧力，并且第二臂包括座。 座椅至少具有上部和中间部分。 上部接合安装特征上的相应位置。 中间部分位于上部和第二臂之间，其横向厚度小于上部的横向厚度。 中间部分表现出弹性和塑性可变形性，足以使夹具对安装特征施加的任何时刻被限制在小于指定的峰值时刻，同时保持上部与相应位置的基本上完全接合。

公开(公告)号：US07172493B2

公开(公告)日：2007-02-06

申请号：US11252483

申请日：2005-10-18

申请人： W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

发明人： W. Thomas Novak ,  Douglas C. Watson ,  Pai-Hsueh Yang ,  Bausan Yuan

IPC分类号： B24B49/00

CPC分类号： B24B37/042 ,  B24B37/005 ,  B24B37/30 ,  B24B41/068

摘要： A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).

摘要翻译： 用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。 垫保持器（50）保持抛光垫（48）。 致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。 致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。 致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力 垫座（50）。 第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。

公开(公告)号：US06873478B2

公开(公告)日：2005-03-29

申请号：US10446575

申请日：2003-05-27

申请人： Douglas C. Watson

发明人： Douglas C. Watson

IPC分类号： G02B7/02 ,  G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70833 ,  G02B7/026

摘要： A kinematic lens mount for kinematically mounting an optical element has a holder structure and three clamping units, each affixed to the holder structure and kinematically clamping a peripheral portion of the optical element. Each of these clamping units includes a flexure mount affixed to the holder structure and a spring assembly including a resilient member contacting the optical element. A lens seat is formed integrally with or attached to the flexure mount for supporting the peripheral portion of the optical element thereon. The flexure mount includes a pair of flexure devices. One end of each of these flexure devices is affixed to the holder structure. Each of these flexure devices may be of a pivot type, having an axis along which it is stiff and the axes of this pair of flexure devices intersect each other inside the peripheral portion of the optical element.

摘要翻译： 用于运动学安装光学元件的运动透镜支架具有支架结构和三个夹紧单元，每个夹持单元固定到保持器结构并且运动地夹持光学元件的周边部分。 这些夹持单元中的每一个包括固定到保持器结构的挠性安装件和包括接触光学元件的弹性构件的弹簧组件。 透镜座一体地形成或附接到挠性座上，用于支撑光学元件的周边部分。 挠性安装件包括一对弯曲装置。 这些弯曲装置中的每一个的一端固定在支架结构上。 这些挠性装置中的每一个可以是枢转型的，具有其刚性的轴线，并且该对挠曲装置的轴线在光学元件的周边部分内相交。

公开(公告)号：US06756706B2

公开(公告)日：2004-06-29

申请号：US10053795

申请日：2002-01-18

申请人： Douglas C. Watson

发明人： Douglas C. Watson

IPC分类号： H02K4100

CPC分类号： G21K5/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/20278 ,  H01J2237/3175

摘要： The invention comprises methods and apparatus for cooling electrical leads in an electron beam lithography system. In one embodiment the invention comprises an electron beam projection system including at least one process chamber, containing therein, at least one movable stage and at least one electric stage motor for moving the stage, wherein the electrical stage motor includes magnetic coils encased in a coolant jacket which encloses the coils and encloses a coolant material. The coolant jacket includes coolant input lines for supplying coolant to the coolant jacket and includes coolant return lines for allowing the coolant to flow out of the coolant jacket. The process chamber includes electrical leads for supplying electrical current to systems contained within the process chamber and the electrical leads are cooled by passing them through the coolant lines.

摘要翻译： 本发明包括用于在电子束光刻系统中冷却电引线的方法和装置。 在一个实施例中，本发明包括电子束投影系统，其包括至少一个处理室，其中容纳有至少一个可动台和用于移动该台的至少一个电动电动机，其中电动电动机包括被包裹在冷却剂 夹套包围线圈并封闭冷却剂材料。 冷却剂套管包括用于向冷却剂套管供应冷却剂的冷却剂输入管线，并且包括用于允许冷却剂从冷却剂套管流出的冷却剂返回管线。 处理室包括用于向包含在处理室内的系统提供电流的电引线，并且电引线通过使其通过冷却剂管线来冷却。