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1.发明授权公开(公告)号：US07172493B2
公开(公告)日：2007-02-06
申请号：US11252483
申请日：2005-10-18
IPC分类号： B24B49/00
CPC分类号： B24B37/042 , B24B37/005 , B24B37/30 , B24B41/068
摘要： A polishing apparatus (10) for polishing a device (12) with a polishing pad (48) includes a pad holder (50) and an actuator assembly (432). The pad holder (50) retains the polishing pad (48). The actuator assembly (432) includes a plurality of spaced apart actuators (438F) (438S) (438T) that are coupled to the pad holder (50). The actuators (438F) (438S) (438T) cooperate to direct forces on the pad holder (50) to alter the pressure of the polishing pad (48) on the device (12). At least one of the actuators (438F) (438S) (438T) includes a first actuator subassembly (440) and a second actuator subassembly (442) that interacts with the first actuator subassembly (440) to direct a force on the pad holder (50). The second actuator subassembly (442) is coupled to the pad holder (50) and the second actuator subassembly (442) rotates with the pad holder (50) relative to the first actuator subassembly (440).
摘要翻译： 用于用抛光垫（48）抛光装置（12）的抛光装置（10）包括垫保持器（50）和致动器组件（432）。 垫保持器（50）保持抛光垫（48）。 致动器组件（432）包括多个间隔开的致动器（438F）（438S）（438T），其联接到所述垫保持器（50）。 致动器（438F）（438S）（438T）协作以引导焊盘保持器（50）上的力，以改变设备（12）上的抛光垫（48）的压力。 致动器（438F）（438T）（438T）中的至少一个包括与第一致动器子组件（440）相互作用的第一致动器子组件（440）和第二致动器子组件（442），以将力 垫座（50）。 第二致动器子组件（442）联接到焊盘保持器（50），并且第二致动器子组件（442）相对于第一致动器子组件（440）与焊盘保持器（50）一起旋转。
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公开(公告)号：US06963821B2
公开(公告)日：2005-11-08
申请号：US10361700
申请日：2003-02-11
申请人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
发明人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
CPC分类号： G03F7/70766 , B23Q11/0032 , G03F7/70725
摘要： A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.
摘要翻译： 晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。 第一和第二阶段以一个或多个自由度移动。 反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。 然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。 为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。 第二实施例还考虑到X位置，以消除扭矩的阶段。
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3.发明授权公开(公告)号：US07333179B2
公开(公告)日：2008-02-19
申请号：US10918182
申请日：2004-08-13
申请人： Bausan Yuan , Martin E. Lee , W. Thomas Novak
发明人： Bausan Yuan , Martin E. Lee , W. Thomas Novak
CPC分类号： G03F7/70775 , G03F7/70725 , G03F7/70758 , G03F7/70766
摘要： Methods and apparatus for providing a stage with a relatively high positioning bandwidth and low transmissibility are disclosed. According to one aspect of the present invention, a method for positioning a stage including providing a first force of a first magnitude to the stage using a primary actuator and providing a second force of a second magnitude to the stage using a secondary actuator. The first force is arranged to cause the stage to translate along a first axis. The secondary actuator is also arranged to cause the stage to translate along the first axis, and has a relatively high positioning bandwidth. The first force is arranged to enable the stage to be relatively coarsely positioned and the second force is arranged to enable the stage to be relatively finely positioned. In one embodiment, the secondary actuator is one of a voice coil motor and a piezoelectric motor.
摘要翻译： 公开了提供具有相对高的定位带宽和低传输性的平台的方法和装置。 根据本发明的一个方面，一种用于定位平台的方法，包括使用主致动器向舞台提供第一幅度的第一力，并使用辅助致动器向舞台提供第二大小的第二力。 第一力布置成使得台架沿着第一轴线平移。 次级致动器还被布置成使得平台沿着第一轴线平移，并且具有相对较高的定位带宽。 第一力被布置成使得台架能够相对粗略地定位，并且第二力被布置成使得台架能够相对精细地定位。 在一个实施例中，次级致动器是音圈电动机和压电电动机之一。
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公开(公告)号：US20110031416A1
公开(公告)日：2011-02-10
申请号：US12923948
申请日：2010-10-15
CPC分类号： G03F7/70341
摘要： A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a semiconductor wafer disposed on the wafer stage and the lens, along a direction away from the semiconductor wafer at its edge.
摘要翻译： 用于制造半导体器件的光刻工具包括晶片台，透镜和液体分配组件，通过该液体分配组件将液体沿着远离所述晶片台的方向引导到设置在晶片台上的半导体晶片的表面和透镜之间 半导体晶片在其边缘。
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公开(公告)号：US07688421B2
公开(公告)日：2010-03-30
申请号：US11628942
申请日：2004-12-20
申请人： Douglas C. Watson , W. Thomas Novak
发明人： Douglas C. Watson , W. Thomas Novak
CPC分类号： G03F7/70258 , G03F7/70341 , G03F7/70833 , G03F7/709
摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.
摘要翻译： 一种浸没式光刻系统，用于补偿由浸液引起的光学位移。 该系统包括光学组件（14），用于将由标线片（12）限定的图像投影到晶片（20）上。 光学组件包括通过间隙（24）与晶片间隔开的最终光学元件（16）。 提供浸入元件（22）以将浸没流体供应到间隙中并且回收逸出间隙的任何浸没流体。 为由于浸没流体的压力变化引起的光学组件的最终光学元件上的力提供流体补偿系统。 由变化的压力产生的所产生的力可能导致最终的光学元件变位。 流体补偿系统被配置为在光学组件上提供基本相等但相反的力，以防止最终光学元件的位移。
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公开(公告)号：US07443482B2
公开(公告)日：2008-10-28
申请号：US11236759
申请日：2005-09-28
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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公开(公告)号：US07932989B2
公开(公告)日：2011-04-26
申请号：US11808850
申请日：2007-06-13
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译： 用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，通过该曝光区域将图像图案投影到诸如晶片的工件上。 这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。 流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴并且使所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立期望的流动模式 为了方便浸没光刻。
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公开(公告)号：US07821615B2
公开(公告)日：2010-10-26
申请号：US11808850
申请日：2007-06-13
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
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公开(公告)号：US06815695B2
公开(公告)日：2004-11-09
申请号：US10056017
申请日：2002-01-28
申请人： W. Thomas Novak , Douglas C. Watson
发明人： W. Thomas Novak , Douglas C. Watson
IPC分类号： H01L2100
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70741 , G03F7/70975 , H01J37/16
摘要： A simplified reticle removal system used with an electron beam system. The simplified reticle removal system includes a reticle chamber having an angled opening and a maintenance panel removably or pivotably attached thereto. The angled opening provides access to a reticle stage housed within the reticle chamber. The angled opening further permits removal of the reticle stage from the reticle chamber without having to disassemble and remove the optics system of the electron beam system. This reduces maintenance and repair costs, as well as reduces down time of the electron beam system.
摘要翻译： 与电子束系统一起使用的简化掩模版去除系统。 简化的掩模版去除系统包括具有成角度的开口的标线室和可拆卸地或可枢转地附接到其上的维护面板。 倾斜的开口提供了进入分隔板室内的掩模版阶段。 成角度的开口还允许从标线室移除光罩台，而不必拆卸和移除电子束系统的光学系统。 这样可以减少维护和修理成本，同时减少电子束系统的停机时间。
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公开(公告)号：US20120019792A1
公开(公告)日：2012-01-26
申请号：US13200982
申请日：2011-10-06
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.
摘要翻译： 液浸光刻设备包括其上保持晶片的台。 投影系统通过浸没液将图案图像投影到曝光区域，以露出台上的晶片。 多个供应开口布置成围绕曝光区域，液体从曝光区域的上方供应。 多个恢复开口被布置成围绕曝光区域，通过该曝光区域从曝光区域上方收集液体。 选择供给开口的一部分，以便在台架移动的方向上将曝光区域前方的液体供给。
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