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101 条记录 (耗时 0.032 秒)

    Method and Apparatus for Imaging
    71.
    发明申请
    Method and Apparatus for Imaging 有权
    成像方法和装置

    公开(公告)号：US20090180192A1

    公开(公告)日：2009-07-16

    申请号：US12339551

    申请日：2008-12-19

    申请人： Bob van Someren ,  Pieter Kruit

    发明人： Bob van Someren ,  Pieter Kruit

    IPC分类号： G02B27/10 ,  H01J3/14

    CPC分类号： H01J29/488 ,  G02B3/0056 ,  Y10S359/90

    摘要： A method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means of the redirecting organ depending on the distance of that beamlet to a central axis of the beam, such that the beamlets converge in a common point with the beamlets from the beam source being focused to foci located in the redirecting organ, and with the beamlets originating from these foci being focussed in the common imaging point.

    摘要翻译： 一种在操作期间形成光束源的图像的方法提供一个光束，并且其中光束被分割以将光束分成子束，其中使用重定向器件，每个单独的子束通过该重定向器被重定向到预定的程度， 取决于该子束到该光束的中心轴的距离，通过重定向装置重定向每个子束的程度，使得子束在与源光束的子束被聚焦到位于 重定向器官以及源自这些焦点的子束聚焦在共同的成像点中。

    Method Of Inspecting A Specimen Surface, Apparatus And Use Of Fluorescent Material
    74.
    发明申请
    Method Of Inspecting A Specimen Surface, Apparatus And Use Of Fluorescent Material 有权
    检测样品表面的方法，荧光材料的使用和使用

    公开(公告)号：US20070272856A1

    公开(公告)日：2007-11-29

    申请号：US11572398

    申请日：2005-07-21

    申请人： Michiel Nijkerk ,  Pieter Kruit

    发明人： Michiel Nijkerk ,  Pieter Kruit

    IPC分类号： G01N23/00 ,  G01N21/64

    CPC分类号： H01J37/244 ,  G01N23/2251 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/1503 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2482

    摘要： The invention relates to a method of inspecting a specimen surface. The method comprises the steps of generating a plurality of primary beams directed towards the specimen surface, focussing the plurality of primary beams onto respective loci on the specimen surface, collecting a plurality of secondary beams of charged particles originating from the specimen surface upon incidence of the primary beams, converting at least one of the collected secondary beams into an optical beam, and detecting the optical beam.

    摘要翻译： 本发明涉及一种检查样品表面的方法。 该方法包括以下步骤：产生指向样品表面的多个主光束，将多个主光束聚焦在样品表面上的相应位置上，在发射的样品表面上收集多个源自样品表面的带电粒子的次光束 主波束，将所收集的次波束中的至少一个转换成光束，以及检测光束。

    Adjustment in a MAPPER system
    77.
    发明授权
    Adjustment in a MAPPER system 失效
    调整MAPPER系统

    公开(公告)号：US07019312B2

    公开(公告)日：2006-03-28

    申请号：US10600953

    申请日：2003-06-20

    申请人： Pieter Kruit

    发明人： Pieter Kruit

    IPC分类号： G21G5/00 ,  H01L29/06

    CPC分类号： H01J37/065 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/24514

    摘要： The present invention relates to a lithography system comprising: means for generating a plurality of light beamlets, and an electron source, arranged to be illuminated by said light beamlets, said electron source comprising a plurality of converter elements at an element distance from each other for converting a light beamlet impinging onto it into an electron beamlet directed towards and focussed on an object plane, said lithography system further comprising control means for manipulating the mutual positions of the light beamlets with respect to the converter elements. These control means can be of optical, thermal, mechanical or magnetical nature, and work on for instance the micro lens array, the converter plate, and the mask.

    摘要翻译： 光刻系统技术领域本发明涉及一种光刻系统，包括：用于产生多个光束的装置和被所述光束照射的电子源，所述电子源包括彼此间距离的多个转换器元件， 将照射到其上的光束转换成指向并聚焦在物平面上的电子束，所述光刻系统还包括用于操纵光束相对于转换器元件的相互位置的控制装置。 这些控制装置可以具有光学，热学，机械或磁性，并且例如工作在微透镜阵列，转换器板和掩模上。

    Method and a device for furnishing an ion stream
    79.
    发明授权
    Method and a device for furnishing an ion stream 失效
    用于提供离子流的方法和装置

    公开(公告)号：US4500787A

    公开(公告)日：1985-02-19

    申请号：US404044

    申请日：1982-08-02

    申请人： Jan B. Le Poole ,  Pieter Kruit

    发明人： Jan B. Le Poole ,  Pieter Kruit

    IPC分类号： H01J3/04 ,  H01J27/20 ,  H01J49/14 ,  H01J27/00

    CPC分类号： H01J49/14

    摘要： Method and device for furnishing an ion stream by causing gas to flow through a discharge aperture having a diameter of at most 20 .mu.m into an evacuated chamber and ionizing said gas by means of one or a plurality of focused electron beams downstream of said aperture in which the ionization is effected immediately downstream of said discharge aperture.

    摘要翻译： 用于通过使气体通过直径至多为20μm的排放孔流入抽真空室来提供离子流的方法和装置，并通过所述孔下游的一个或多个聚焦电子束使所述气体离子化 电离在紧邻所述放电孔的下游进行。