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    System and method for model-based sub-resolution assist feature generation
    71.
    发明授权
    System and method for model-based sub-resolution assist feature generation 有权
    用于基于模型的分解辅助特征生成的系统和方法

    公开(公告)号：US07882480B2

    公开(公告)日：2011-02-01

    申请号：US11757805

    申请日：2007-06-04

    申请人： Jun Ye ,  Yu Cao ,  Hanying Feng

    发明人： Jun Ye ,  Yu Cao ,  Hanying Feng

    IPC分类号： G06F17/50

    CPC分类号： G03F1/36

    摘要： Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine tune already-placed SRAFs. In another embodiment the SRAF guidance map is used directly to place SRAFs in a mask layout.

    摘要翻译： 公开了创建有效的基于模型的子分辨率辅助特征（MB-SRAF）的方法。 创建SRAF指南图，其中每个设计目标边缘位置对于给定的场点投票，放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。 在一个实施例中，SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 在另一个实施例中，SRAF引导图被直接用于将SRAF放置在掩模布局中。

    System and method for measuring and analyzing lithographic parameters and determining optimal process corrections
    72.
    发明授权
    System and method for measuring and analyzing lithographic parameters and determining optimal process corrections 有权
    用于测量和分析光刻参数并确定最佳过程校正的系统和方法

    公开(公告)号：US07749666B2

    公开(公告)日：2010-07-06

    申请号：US11462022

    申请日：2006-08-02

    申请人： Michael J. Gassner ,  Stefan Hunsche ,  Yu Cao ,  Jun Ye ,  Moshe E. Preil

    发明人： Michael J. Gassner ,  Stefan Hunsche ,  Yu Cao ,  Jun Ye ,  Moshe E. Preil

    IPC分类号： G03C5/00 ,  G01B9/00 ,  G01B9/08 ,  G01B11/00 ,  G01N21/00

    CPC分类号： G03F7/70666 ,  G03F7/70641

    摘要： A method of using an in-situ aerial image sensor array is disclosed to separate and remove the focal plane variations caused by the image sensor array non-flatness and/or by the exposure tool by collecting sensor image data at various nominal focal planes and by determining best focus at each sampling location by analysis of the through-focus data. In various embodiments, the method provides accurate image data at best focus anywhere in the exposure field, image data covering an exposure-dose based process window area, and a map of effective focal plane distortions. The focus map can be separated into contributions from the exposure tool and contributions due to topography of the image sensor array by suitable calibration or self-calibration procedures. The basic method enables a wide range of applications, including for example qualification testing, process monitoring, and process control by deriving optimum process corrections from analysis of the image sensor data.

    摘要翻译： 公开了一种使用原位空间图像传感器阵列的方法，以分离和去除由图像传感器阵列非平坦度引起的焦平面变化和/或通过曝光工具通过在各种标称焦平面处收集传感器图像数据，并且通过 通过分析焦点数据确定每个采样位置的最佳焦点。 在各种实施例中，该方法在曝光区域的任何地方提供最佳焦点上的精确图像数据，覆盖基于曝光剂量的过程窗口区域的图像数据和有效焦平面失真的映射。 焦点图可以通过适当的校准或自校准程序分为曝光工具的贡献和由于图像传感器阵列的形貌造成的贡献。 基本方法可以通过从图像传感器数据分析中得出最佳的过程校正，实现广泛的应用，包括例如鉴定测试，过程监控和过程控制。

    SYSTEM AND METHOD FOR MEASURING AND ANALYZING LITHOGRAPHIC PARAMETERS AND DETERMINING OPTIMAL PROCESS CORRECTIONS
    73.
    发明申请
    SYSTEM AND METHOD FOR MEASURING AND ANALYZING LITHOGRAPHIC PARAMETERS AND DETERMINING OPTIMAL PROCESS CORRECTIONS 有权
    用于测量和分析光刻参数的系统和方法以及确定最佳过程校正

    公开(公告)号：US20070035712A1

    公开(公告)日：2007-02-15

    申请号：US11462022

    申请日：2006-08-02

    申请人： Michael Gassner ,  Stefan Hunsche ,  Yu Cao ,  Jun Ye ,  Moshe Preil

    发明人： Michael Gassner ,  Stefan Hunsche ,  Yu Cao ,  Jun Ye ,  Moshe Preil

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70666 ,  G03F7/70641

    摘要： A method of using an in-situ aerial image sensor array is disclosed to separate and remove the focal plane variations caused by the image sensor array non-flatness and/or by the exposure tool by collecting sensor image data at various nominal focal planes and by determining best focus at each sampling location by analysis of the through-focus data. In various embodiments, the method provides accurate image data at best focus anywhere in the exposure field, image data covering an exposure-dose based process window area, and a map of effective focal plane distortions. The focus map can be separated into contributions from the exposure tool and contributions due to topography of the image sensor array by suitable calibration or self-calibration procedures. The basic method enables a wide range of applications, including for example qualification testing, process monitoring, and process control by deriving optimum process corrections from analysis of the image sensor data.

    摘要翻译： 公开了一种使用原位空间图像传感器阵列的方法，以分离和去除由图像传感器阵列非平坦度引起的焦平面变化和/或通过曝光工具通过在各种标称焦平面处收集传感器图像数据，并且通过 通过分析焦点数据确定每个采样位置的最佳焦点。 在各种实施例中，该方法在曝光区域的任何地方提供最佳焦点上的精确图像数据，覆盖基于曝光剂量的过程窗口区域的图像数据和有效焦平面失真的映射。 焦点图可以通过适当的校准或自校准程序分为曝光工具的贡献和由于图像传感器阵列的形貌造成的贡献。 基本方法可以通过从图像传感器数据分析中得出最佳的过程校正，实现广泛的应用，包括例如鉴定测试，过程监控和过程控制。

    Method and system for lithography process-window-maximixing optical proximity correction
    74.
    发明授权
    Method and system for lithography process-window-maximixing optical proximity correction 有权
    光刻过程窗口最大化光学邻近校正的方法和系统

    公开(公告)号：US09360766B2

    公开(公告)日：2016-06-07

    申请号：US12642436

    申请日：2009-12-18

    申请人： Jun Ye ,  Yu Cao ,  Hanying Feng

    发明人： Jun Ye ,  Yu Cao ,  Hanying Feng

    IPC分类号： G06F17/50 ,  G03F7/20 ,  G03F1/00 ,  G03F1/36

    CPC分类号： G03F1/36 ,  G03F1/144 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5081 ,  G06F2217/12

    摘要： The present invention relates to an efficient OPC method of increasing imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and optimizing target gray level for each evaluation point in each OPC iteration based on this function. In one given embodiment, the function is approximated as a polynomial function of focus and exposure, R(ε, f )=P0+f2·Pb with a threshold of T+Vε for contours, where P0 represents image intensity at nominal focus, f represents the defocus value relative to the nominal focus, ε represents the exposure change, V represents the scaling of exposure change, and parameter “Pb” represents second order derivative images. In another given embodiment, the analytical optimal gray level is given for best focus with the assumption that the probability distribution of focus and exposure variation is Gaussian.

    摘要翻译： 本发明涉及一种提高用于成像具有多个特征的目标设计的光刻工艺的成像性能的有效OPC方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并基于此功能对每个OPC迭代中的每个评估点优化目标灰度级。 在一个给定的实施例中，函数近似为焦点和曝光的多项式函数，R（＆egr; f）= P0 + f2·Pb，阈值为T + V＆egr; 对于轮廓，其中P0表示标称焦点处的图像强度，f表示相对于标称焦点的散焦值， 表示曝光变化，V表示曝光变化的缩放，参数“Pb”表示二阶导数图像。 在另一个给定的实施例中，假设聚焦和曝光变化的概率分布为高斯，给出最佳聚焦的分析最佳灰度级。

    Computational process control
    75.
    发明授权
    Computational process control 有权
    计算过程控制

    公开(公告)号：US08856694B2

    公开(公告)日：2014-10-07

    申请号：US13481564

    申请日：2012-05-25

    申请人： Jun Ye ,  Yu Cao ,  James Patrick Koonmen

    发明人： Jun Ye ,  Yu Cao ,  James Patrick Koonmen

    IPC分类号： G06F17/50 ,  G05B13/04 ,  G03F7/20

    CPC分类号： G03F7/70525 ,  B29C64/386 ,  G03F9/7096 ,  G05B13/04

    摘要： The present invention provides a number of innovations in the area of computational process control (CPC). CPC offers unique diagnostic capability during chip manufacturing cycle by analyzing temporal drift of a lithography apparatus/ process, and provides a solution towards achieving performance stability of the lithography apparatus/process. Embodiments of the present invention enable optimized process windows and higher yields by keeping performance of a lithography apparatus and/or parameters of a lithography process substantially close to a pre-defined baseline condition. This is done by comparing the measured temporal drift to a baseline performance using a lithography process simulation model. Once in manufacturing, CPC optimizes a scanner for specific patterns or reticles by leveraging wafer metrology techniques and feedback loop, and monitors and controls, among other things, overlay and/or CD uniformity (CDU) performance over time to continuously maintain the system close to the baseline condition.

    摘要翻译： 本发明提供了计算过程控制（CPC）领域的许多创新。 CPC通过分析光刻设备/工艺的时间漂移​​，在芯片制造周期中提供独特的诊断功能，并为实现光刻设备/工艺的性能稳定性提供了解决方案。 本发明的实施例通过保持光刻设备的性能和/或基本上接近预定义基线条件的光刻工艺的参数来实现优化的工艺窗口和更高的产量。 这通过使用光刻过程模拟模型将测量的时间漂移​​与基线性能进行比较来完成。 一旦制造，CPC通过利用晶片计量技术和反馈回路来优化扫描仪的特定图案或掩模版，以及监视和控制其他方面的覆盖和/或CD均匀性（CDU）性能，以持续保持系统接近 基线条件。

    Lens heating compensation systems and methods
    78.
    发明授权
    Lens heating compensation systems and methods 有权
    镜头加热补偿系统及方法

    公开(公告)号：US08570485B2

    公开(公告)日：2013-10-29

    申请号：US12475071

    申请日：2009-05-29

    申请人： Jun Ye ,  Peng Liu ,  Yu Cao

    发明人： Jun Ye ,  Peng Liu ,  Yu Cao

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70441 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/70533 ,  G03F7/706 ,  G03F7/70891 ,  G06F17/50

    摘要： Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.

    摘要翻译： 公开了用于校准光刻系统的方法。 生成用于掩模版设计的冷透镜轮廓和用于掩模版设计的至少一个热透镜轮廓，由此定义处理窗口。 由透镜操纵器诱导的畸变在机械手模型中表征，并且使用机械手模型优化过程窗口。 像差的特征在于识别由多个操纵器设置的透镜操纵引起的关键尺寸的变化，以及通过将操纵器的行为建模为机械手设置和像差之间的关系。 可以通过最小化一组关键位置的成本函数来优化过程窗口。

    SENTIMENT-TARGETING FOR ONLINE ADVERTISEMENT
    80.
    发明申请
    SENTIMENT-TARGETING FOR ONLINE ADVERTISEMENT 审中-公开
    感谢在线广告的宣传

    公开(公告)号：US20130066716A1

    公开(公告)日：2013-03-14

    申请号：US13230720

    申请日：2011-09-12

    申请人： Luoqi Chen ,  Jun Ye ,  Ya Luo ,  Yu Cao ,  Wei Zhuang ,  Hanying Feng

    发明人： Luoqi Chen ,  Jun Ye ,  Ya Luo ,  Yu Cao ,  Wei Zhuang ,  Hanying Feng

    IPC分类号： G06Q30/00

    CPC分类号： G06Q30/00

    摘要： The various embodiments described in the present disclosure, in at least one aspect, relate to computer-implemented methods of online advertisement. In one embodiment, a method includes, in response to receiving a request for an ad to be provided to a user in an online session, identifying a plurality of ads as candidates for consideration, determining one or more sentiments of a content of the online session, and ranking the plurality of identified ads based at least in part on (i) a correlation between the content of the online session and a content of each identified ad, and (ii) a correlation between the one or more sentiments of the content of the online session and the content of each identified ad.

    摘要翻译： 在至少一个方面，在本公开中描述的各种实施例涉及计算机实现的在线广告的方法。 在一个实施例中，一种方法包括响应于在在线会话中接收到要提供给用户的广告的请求，将多个广告标识为候选作为考虑，确定在线会话的内容的一个或多个情绪 并且至少部分地基于（i）在线会话的内容与每个所识别的广告的内容之间的相关性，以及（ii）所述内容的一个或多个情绪之间的相关性来对多个所识别的广告进行排名 在线会话和每个已识别广告的内容。