Abstract:
A phase lock loop (PLL) includes a PLL feedback circuit having a feedback divider. The feedback divider has a first dynamic latch, a first logic circuit, and a plurality of serially connected dynamic latches. Each of the serially connected dynamic latches receives and forwards additional data signals to subsequent ones of the serially connected dynamic latches in series. The second-to-last dynamic latch in the series outputs a fourth data signal to a last dynamic latch in the series. The last dynamic latch receives the fourth data signal and outputs a fifth data signal. A first feedback loop receives the fourth data signal from the second-to-last dynamic latch and the fifth data signal from the last dynamic latch. The first feedback loop comprises a NAND circuit that combines the fourth and fifth data signals and the first feedback loop outputs the first feedback signal.
Abstract:
A frequency modulation continuous wave (FMCW) system includes a first memory receiving a clock signal and storing voltage digital values of I FMCW signals, a second memory receiving the clock signal and storing the voltage digital values of the Q FMCW signals, a first digital-to-analog converter (DAC) connected to the first memory and receiving the clock signal for converting the voltage digital values of the I FMCW signal to a first analog voltage, a second digital-to-analog converter (DAC) connected to the second memory and receiving the clock signal for converting the voltage digital values of the Q FMCW signal to a second analog voltage, an I low-pass filter connected to the first DAC smoothing the I FMCW signal and a Q low-pass filter connected to the second DAC smoothing the Q FMCW signal.
Abstract:
A single pole double throw (SPDT) semiconductor switch includes a series connection of a first transmitter-side transistor and a first reception-side transistor between a transmitter node and a reception node. Each of the two first transistors is provided with a gate-side variable impedance circuit, which provides a variable impedance connection between a complementary pair of gate control signals. Further, the body of each first transistor can be connected to a body bias control signal through a body-side variable impedance circuit. In addition, the transmitter node is connected to electrical ground through a second transmitter-side transistor, and the reception node is connected to electrical ground through a second reception-side transistor. Each of the second transistors can have a body bias that is tied to the body bias control signals for the first transistors so that switched-off transistors provide enhanced electrical isolation.
Abstract:
A test structure for a through-silicon-via (TSV) in a semiconductor chip includes a first contact, the first contact being electrically connected to a first TSV; and a second contact, wherein the first contact, second contact, and the first TSV form a first channel, and a depth of the first TSV is determined based on a resistance of the first channel.
Abstract:
A first field effect transistor includes a gate dielectric and a gate electrode located over a first portion of a top semiconductor layer in a semiconductor-on-insulator (SOI) substrate. A second field effect transistor includes a portion of a buried insulator layer and a source region and a drain region located underneath the buried insulator layer. In one embodiment, the gate electrode of the second field effect transistor is a remaining portion of the top semiconductor layer. In another embodiment, the gate electrode of the second field effect transistor is formed concurrently with the gate electrode of the first field effect transistor by deposition and patterning of a gate electrode layer. The first field effect transistor may be a high performance device and the second field effect transistor may be a high voltage device. A design structure for the semiconductor structure is also provided.
Abstract:
An embedded decoupling capacitor wearout monitor for power transmission line, which can be integrated and fabricated in any standard CMOS or BiCMOS circuits. The embedded noise monitor is employed to detect the degraded capacitor and disable it from further operation, which will extend the operation lifetime of the circuit system and prevent subsequent catastrophic failure as a result of hard-breakdown (or capacitor short). In one aspect, the monitor circuit and method detects early degradation signal before catastrophic decoupling capacitor failure and, further can pin-point a degraded decoupling capacitor and disable it, avoiding impact from decoupling capacitor breakdown failure. The monitor circuit and method provides for decoupling capacitor redundancy and includes an embedded and self-diagnostic circuit for functionality and reliability.
Abstract:
A semiconductor structure and design structure includes at least a first trench and a second trench having different depths arranged in a substrate, a capacitor arranged in the first trench, and a via arranged in the second trench.
Abstract:
An accelerated failure indicator embedded on a semiconductor chip includes an insulating region; a circuit located inside the insulating region; a heating element located inside the insulating region, the heating element configured to heat the circuit to a temperature higher than an operating temperature of the semiconductor chip; and a reliability monitor configured to monitor the circuit for degradation, and further configured to trigger an alarm in the event that the degradation of the circuit exceeds a predetermined threshold. A method of operating an accelerated failure indicator embedded on a semiconductor chip includes determining an operating temperature of the semiconductor chip; heating a circuit located inside an insulating region of the accelerated failure indicator to a temperature higher than the determined operating temperature; monitoring the circuit for degradation; and triggering an alarm in the event that the degradation of the circuit exceeds a predetermined threshold.
Abstract:
A high-density deep trench capacitor array with a plurality of leakage sensors and switch devices. Each capacitor array further comprises a plurality of sub-arrays, wherein the leakage in each sub-array is independently controlled by a sensor and switch unit. The leakage sensor comprises a current mirror, a transimpedance amplifier, a voltage comparator, and a timer. If excessive leakage current is detected, the switch unit will automatically disconnect the leaky capacitor module to reduce stand-by power and improve yield. An optional solid-state resistor can be formed on top of the deep trench capacitor array to increase the temperature and speed up the leakage screening process.
Abstract:
The present invention provides a method. The method includes operating a plurality of field-effect-transistors (FETs) under a first operation condition; reversing an operation direction for at least one of the plurality of FETs for a brief period of time; measuring a second operation condition of the one of the plurality of FETs during the brief period of time; computing a difference between the second operation condition and a reference operation condition; and providing a reliability indicator based upon the difference between the second and the reference operation conditions, wherein the plurality of FETs are employed in a single integrated circuit (IC).