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122 条记录 (耗时 0.056 秒)

    Impurity-doped layer formation apparatus and electrostatic chuck protection method
    71.
    发明授权
    Impurity-doped layer formation apparatus and electrostatic chuck protection method 有权
    杂质掺杂层形成装置和静电卡盘保护方法

    公开(公告)号：US09312163B2

    公开(公告)日：2016-04-12

    申请号：US13548254

    申请日：2012-07-13

    申请人： Masaru Tanaka ,  Masashi Kuriyama ,  Hiroki Murooka

    发明人： Masaru Tanaka ,  Masashi Kuriyama ,  Hiroki Murooka

    IPC分类号： H01J37/32 ,  H01L21/683 ,  H01L21/687

    CPC分类号： H01L21/68764 ,  H01J37/32871 ,  H01J2237/02 ,  H01J2237/0203 ,  H01L21/6831 ,  H01L21/6833 ,  Y10T29/49

    摘要： An electrostatic chuck protection method includes providing an exposed chuck surface with a protective surface for preventing adherence of foreign materials including a substance exhibiting volatility in a vacuum environment, and removing the protective surface in order to perform a process of forming a substrate electrostatically held on the chuck surface with a surface layer including a substance having volatility in a vacuum chamber. The protective surface may be provided when a low vacuum pumping mode of operation is performed in a vacuum environment surrounding the chuck surface.

    摘要翻译： 静电卡盘保护方法包括：将露出的卡盘表面提供有保护表面，用于防止在真空环境中包括表现出挥发性的物质的异物附着，以及去除保护表面，以便进行静电保持在基板上的基板的形成工艺 卡盘表面具有包括在真空室中具有挥发性的物质的表面层。 当在围绕卡盘表面的真空环境中执行低真空泵送操作模式时，可以提供保护表面。

    Inverter system
    74.
    发明授权
    Inverter system 失效
    变频器系统

    公开(公告)号：US07492162B2

    公开(公告)日：2009-02-17

    申请号：US11616623

    申请日：2006-12-27

    申请人： Seiji Hachisuka ,  Masaru Tanaka ,  Minoru Senba ,  Shuuichi Yadoori

    发明人： Seiji Hachisuka ,  Masaru Tanaka ,  Minoru Senba ,  Shuuichi Yadoori

    IPC分类号： G01R31/08

    CPC分类号： G01R15/18 ,  G01R31/026 ,  G01R31/42 ,  G09G3/006 ,  G09G3/3406 ,  G09G2330/04 ,  H01F38/30 ,  H02H1/0007 ,  H02H1/0015 ,  H02H7/122 ,  H05B41/2851 ,  H05B41/2855

    摘要： An inverter system which converts DC input into AC output and supplies the AC output to a load such as an FL tube detects change in a circuit current due to anomaly such as discharge without contacting with a current route. Relating to an inverter which converts DC input into AC output and supplies the AC output to a load, change in a circuit current of the inverter is detected through the medium of magnetic flux change due to the change in the circuit current caused by discharge. For example, if change in a current occurs in the circuit current of the inverter by disconnection discharge or ground-fault discharge occurring in a current route including a load of the inverter, magnetic flux change occurs in circuit wiring and a space of a core gap of a transformer of the inverter. The change in the circuit current is detected through the medium of the magnetic flux change without contacting with the circuit wiring or the transformer.

    摘要翻译： 将DC输入转换为AC输出并将AC输出提供给诸如FL管的负载的逆变器系统检测由于诸如放电之类的异常而导致的电路电流的变化，而不与当前路径接触。 关于将DC输入转换为AC输出并将AC输出提供给负载的逆变器，由于由放电引起的电路电流的变化，通过磁通量变化的介质来检测逆变器的电路电流的变化。 例如，如果在包括逆变器的负载的当前路径中发生的断线放电或接地故障放电，在逆变器的电路电流中发生电流变化，则电路布线中发生磁通变化，并且芯间隙的空间 的变压器变压器。 通过磁通量介质来检测电路电流的变化，而不与电路布线或变压器接触。

    Manufacturing inspection/analysis system analyzing device, analyzing device control program, storage medium storing analyzing device control program, and method for manufacturing inspection and analysis
    79.
    发明申请
    Manufacturing inspection/analysis system analyzing device, analyzing device control program, storage medium storing analyzing device control program, and method for manufacturing inspection and analysis 有权
    制造检验/分析系统分析装置，分析装置控制程序，存储分析装置控制程序的存储介质以及制造检验和分析的方法

    公开(公告)号：US20060203230A1

    公开(公告)日：2006-09-14

    申请号：US11369934

    申请日：2006-03-08

    申请人： Nobuyuki Ohminami ,  Masaru Tanaka ,  Takeshi Umemoto

    发明人： Nobuyuki Ohminami ,  Masaru Tanaka ,  Takeshi Umemoto

    IPC分类号： G01N21/88

    CPC分类号： G01N21/956 ,  G01N21/94 ,  G01N21/9501

    摘要： A position change section of a processing device changes the position of a treatment object, at the time of performing a process by a process section, to correspond to a predetermined position in conformity to the treatment object. An inspection device inspects the occurrence of a defect on the treatment object having been subjected to processes by a plurality of processing devices. Then an analyzing process for specifying in which processing device the defect occurred is carried out based on (i) positional information of the treatment object, in each of the processing devices, and (ii) defect information defected by the inspection device. With this arrangement, during the process of manufacture of treatment objects, it is possible to precisely specify which processing device or processing device group caused the defect, without performing processes such as attaching, to the treatment object, information regarding processing devices which have conducted processes.

    摘要翻译： 处理装置的位置改变部分在执行处理部分的处理时改变处理对象的位置，以对应于与处理对象一致的预定位置。 检查装置检查已经经过多个处理装置的处理的处理对象的缺陷的发生。 然后，根据（i）处理对象的位置信息，每个处理装置，以及（ii）检测装置所缺陷的缺陷信息，进行用于指定哪个处理装置发生缺陷的分析处理。 通过这种布置，在处理对象的制造过程中，可以精确地指定哪个处理装置或处理装置组造成缺陷，而不进行诸如将处理对象附加到已经进行处理的处理装置的信息的处理 。