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公开(公告)号：US20110014570A1
公开(公告)日：2011-01-20
申请号：US12921354
申请日：2009-03-13
CPC分类号： G03F7/0045 , C08F8/12 , C08F12/24 , C09D125/14 , G03F7/0046 , G03F7/0392 , G03F7/0397 , C08F212/14 , C08F2220/1825
摘要： A resist composition and a pattern forming method using the composition are provided, the resist composition including: (A) a resin that decomposes by an action of an acid to increase a solubility of the resin (A) in an alkali developer; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a compound represented by formula (C1); and (D) a solvent: wherein n represents an integer of 1 to 6; w represents an integer of 1 to 6; p represents an integer of 1 to 6; m represents an integer of 1 to 6; Ra, Rb, Rc and Rd each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, provided that Ra and Rb may combine together to form a ring, and Rc and Rd may combine together to form a ring.
摘要翻译： 提供了使用该组合物的抗蚀剂组合物和图案形成方法，该抗蚀剂组合物包括：（A）通过酸的作用分解以提高树脂（A）在碱性显影剂中的溶解度的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）由式（C1）表示的化合物; 和（D）溶剂：其中n表示1至6的整数; w表示1〜6的整数， p表示1〜6的整数， m表示1〜6的整数， Ra，Rb，Rc和Rd各自独立地表示氢原子，烷基，环烷基，芳基或芳烷基，条件是Ra和Rb可以结合在一起形成环，Rc和Rd可以结合在一起 形成一个戒指。
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72.发明授权公开(公告)号：US07625690B2
公开(公告)日：2009-12-01
申请号：US11717618
申请日：2007-03-14
CPC分类号： G03F7/0392 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。
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73.发明授权公开(公告)号：US07592118B2
公开(公告)日：2009-09-22
申请号：US12053675
申请日：2008-03-24
CPC分类号： G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
摘要翻译： 正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度， 在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。
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公开(公告)号：US20080241743A1
公开(公告)日：2008-10-02
申请号：US12053675
申请日：2008-03-24
CPC分类号： G03F7/0392 , G03F7/091 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.
摘要翻译： 正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度， 在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。
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75.发明授权Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same 有权用于电子束，EUV光或X射线的正性抗蚀剂组合物，以及使用其的图案形成方法公开(公告)号：US07344821B2
公开(公告)日：2008-03-18
申请号：US11090864
申请日：2005-03-28
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/115 , Y10S430/122 , Y10S430/167 , Y10S430/168
摘要： A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of the resin (B) in an alkaline developer by an action of an acid, wherein the resin (B) comprises a repeating unit having an alicyclic group connected with a fluorine-substituted alcohol residue; and a pattern formation method using the composition.
摘要翻译： 一种用于电子束，EUV光或X射线的正性抗蚀剂组合物，所述正性抗蚀剂组合物包含：（A）至少一种在通过光化学射线和辐射之一处理后产生酸的化合物; 和（B）通过酸作用增加树脂（B）在碱性显影剂中的溶解度的树脂，其中树脂（B）包含具有与氟取代的醇残基相连的脂环基的重复单元; 以及使用该组合物的图案形成方法。
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公开(公告)号：US20060210919A1
公开(公告)日：2006-09-21
申请号：US11373188
申请日：2006-03-13
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , G03F7/0397 , G03F7/0758 , Y10S430/123
摘要： A photosensitive composition comprises (A) a specific compound, which is excellent in sensitivity, resolution, and defocus latitude (DOF), and a pattern-forming method using the photosensitive composition is provided.
摘要翻译： 光敏组合物包含（A）灵敏度，分辨率和散焦纬度（DOF）优异的特定化合物，以及使用该感光性组合物的图案形成方法。
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公开(公告)号：US20060172226A1
公开(公告)日：2006-08-03
申请号：US11336912
申请日：2006-01-23
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397
摘要： A resist composition comprising (A) an acid generator represented by formula (1): wherein S1 to S8 each independently represents a substituent; a, n, m, l, k, o, p, q and r each independently represents an integer of 0 to 2; X represents a single bond or a divalent linking group; R1 and R2 each independently represents a hydrogen atom or a substituent, and R1 and R2 may combine with each other to represent a single bond or a divalent linking group; and Y− and Z− each independently represents an organic sulfonate anion.
摘要翻译： 一种抗蚀剂组合物，其包含（A）由式（1）表示的酸发生剂：其中S 1至S 8各自独立地表示取代基; a，n，m，l，k，o，p，q和r各自独立地表示0〜2的整数。 X表示单键或二价连接基团; R 1和R 2各自独立地表示氢原子或取代基，R 1和R 2可以 彼此结合以表示单键或二价连接基团; 和Y - Z - 各自独立地表示有机磺酸根阴离子。
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78.发明申请Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same 有权用于电子束，EUV光或X射线的正性抗蚀剂组合物，以及使用其的图案形成方法公开(公告)号：US20050221224A1
公开(公告)日：2005-10-06
申请号：US11090864
申请日：2005-03-28
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
IPC分类号： G03F7/004 , G03F7/033 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/115 , Y10S430/122 , Y10S430/167 , Y10S430/168
摘要： A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of the resin (B) in an alkaline developer by an action of an acid, wherein the resin (B) comprises a repeating unit having an alicyclic group connected with a fluorine-substituted alcohol residue; and a pattern formation method using the composition.
摘要翻译： 一种用于电子束，EUV光或X射线的正性抗蚀剂组合物，所述正性抗蚀剂组合物包含：（A）至少一种在通过光化学射线和辐射之一处理后产生酸的化合物; 和（B）通过酸作用增加树脂（B）在碱性显影剂中的溶解度的树脂，其中树脂（B）包含具有与氟取代的醇残基相连的脂环基的重复单元; 以及使用该组合物的图案形成方法。
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79.发明申请公开(公告)号：US20050164123A1
公开(公告)日：2005-07-28
申请号：US11041384
申请日：2005-01-25
申请人： Kazuyoshi Mizutani
发明人： Kazuyoshi Mizutani
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/111
摘要： A positive resist composition which can be suitably used in an ultramicrolithography process such as production of VLSI or high-capacity microchip and in other photofabrication processes and can ensure good sensitivity, resolution, pattern profile and line edge roughness when irradiated with actinic rays or radiation, particularly, electron beam, X-ray or EUV; and a pattern formation method using the composition, are provided, the positive resist composition comprising (A) a resin comprising a specific acryl-based repeating unit and a specific styrene-based repeating unit, which increases the dissolution rate in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a solvent; and a pattern formation method using the composition.
摘要翻译： 正极抗蚀剂组合物可以适用于超微光刻工艺如VLSI或大容量微芯片的生产和其它光制造工艺中，并且当用光化射线或辐射照射时可以确保良好的灵敏度，分辨率，图案轮廓和线边缘粗糙度， 特别是电子束，X射线或EUV; 和使用该组合物的图案形成方法，正型抗蚀剂组合物包含（A）包含特定的丙烯酸类重复单元和特定苯乙烯基重复单元的树脂，其增加碱显影剂中的溶解速率 酸的作用，（B）在用光化射线或辐射照射时能够产生酸的化合物，和（C）溶剂; 以及使用该组合物的图案形成方法。
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80.发明授权
公开(公告)号：US5143816A
公开(公告)日：1992-09-01
申请号：US555599
申请日：1990-07-23
申请人： Kazuyoshi Mizutani , Toshiaki Aoai
发明人： Kazuyoshi Mizutani , Toshiaki Aoai
IPC分类号： G03F7/022 , C09D11/03 , C09D11/10 , C09D11/102 , G03F7/075 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/0752
摘要： A light-sensitive composition comprising:(a) a polysiloxane compound having at least 1 mol % of a structural unit derived from a product of a thermal cycloaddition reaction between a compound of formula (I), (II), (III) or (IV) and a compound of formula (V), (VI), (VII) or (VIII), and(b) an orthoquinonediazide compound. ##STR1##
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