公开(公告)号：US07923394B2

公开(公告)日：2011-04-12

申请号：US12132922

申请日：2008-06-04

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03C3/06 ,  C03C3/04 ,  C03C3/076

CPC classification number: C03B19/1423 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1453 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  G03F7/0002

Abstract: In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds.

Abstract translation: 在纳米压印光刻中，在365nm处具有高达10％的内部透射率分布的二氧化钛掺杂石英玻璃适合用作纳米压印模具。

公开(公告)号：US07906446B2

公开(公告)日：2011-03-15

申请号：US12556848

申请日：2009-09-10

Applicant: Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

Inventor： Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

IPC: C03C3/06

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/54

Abstract: Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.

Abstract translation: 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当在大约193nm处的准分子激光脉冲具有约40μJ·cm-2·pulse-1的注量和脉冲长度时，石英玻璃具有在633nm处测量的偏振诱发双折射小于约0.1nm / cm 对于5×109脉冲，约25ns。

公开(公告)号：US20100323871A1

公开(公告)日：2010-12-23

申请号：US12868900

申请日：2010-08-26

Applicant: Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。 本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

公开(公告)号：US20100317505A1

公开(公告)日：2010-12-16

申请号：US12862174

申请日：2010-08-24

Applicant: Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio KOIKE ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54

Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。 本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。 在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。

公开(公告)号：US20090288448A1

公开(公告)日：2009-11-26

申请号：US12512436

申请日：2009-07-30

Applicant: Shigeru MAIDA ,  Motoyuki YAMADA

Inventor： Shigeru MAIDA ,  Motoyuki YAMADA

IPC: C03C17/23

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。

公开(公告)号：US07592063B2

公开(公告)日：2009-09-22

申请号：US11514997

申请日：2006-09-05

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa

IPC: B32B3/00 ,  B32B17/06 ,  B32B18/00 ,  B32B3/16 ,  C03C3/112 ,  C03C3/06 ,  C03C10/16 ,  G01N23/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

Abstract translation: 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

公开(公告)号：US20090122281A1

公开(公告)日：2009-05-14

申请号：US12351998

申请日：2009-01-12

Applicant: Yasutomi IWAHASHI ,  Akio Koike

Inventor： Yasutomi IWAHASHI ,  Akio Koike

IPC: G03B27/00 ,  C03C3/04

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US07501367B2

公开(公告)日：2009-03-10

申请号：US11403267

申请日：2006-04-13

Applicant: Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

Inventor： Bodo Kuehn ,  Stephan Ochs ,  Steffen Kaiser ,  Denis Kassube

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件，用于工作波长低于250nm的浸没式光刻，其被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应显示几种性能的组合：特别是基本上没有氧缺陷的玻璃结构，羟基的平均含量小于60重量ppm，氟的平均含量小于 10重量ppm，氯的平均含量小于1重量ppm。 一种制造这种光学元件的方法包括以下方法步骤：在还原条件下制备和干燥SiO 2烟炱体，并在玻璃化之前或期间用与石英玻璃结构的氧缺陷反应的试剂处理干燥的烟炱体。

公开(公告)号：US20080274869A1

公开(公告)日：2008-11-06

申请号：US11597087

申请日：2005-05-11

Applicant: Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

Inventor： Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

IPC: C03C3/06 ,  C03B29/00

CPC classification number: C03B19/1469 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

Abstract translation: 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）由TiO 2分布（<0.05％TIO 2 2）的局部方差引起的微不均匀性，其平均值在 （5umum）相对于TiO 2含量的平均值），b）主要功能方向上的热膨胀系数Deltaalpha的绝对最大不均匀性（ <5ppb / K），c）在石英玻璃坯料的可用表面上的热膨胀系数的径向变化不大于0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的Deltaalpha的特定进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。

公开(公告)号：US20080066497A1

公开(公告)日：2008-03-20

申请号：US11630405

申请日：2006-03-30

Applicant: Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

Inventor： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC: C03C3/06 ,  C03B19/14 ,  H01L21/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其假想温度低于1250℃，在1200℃的温度下其粘度至少为10-13Pa。制备这种石英玻璃的经济方法包括以下方法步骤 ：将SiO 2原料熔化，得到石英玻璃坯料，将SiO 2原料或石英玻璃坯料进行脱水处理，加热SiO _{2 原料或石英玻璃坯料，在含氨气氛中在1050℃至1850℃的范围内的氮化温度，使用石英玻璃的石英玻璃 将玻璃坯料设定为1250℃以下的假想温度，进行表面处理 石英玻璃夹具形成石英玻璃夹具。}