Abstract:
A scanning tunnel microscope having an emission tip, specimen holder and xyz movement mechanism as well as devices for applying a voltage between the emission tip and the specimen and for detecting the electrons emanating from the specimen can be used for verifying secondary electrons generated in the same surface region and/or an energy analysis of electrons emitted by the emission tip and scattered by the surface if a cylindrical mirror analyzer with assigned detector is arranged coaxially to the emission tip. With relatively high applied voltages, a cylindrically symmetrical correction electrode between the emission tip and the cylindrical mirror, arranged coaxially to the emission tip, is expedient, with which electrode the imaging properties of the analyzer open toward the specimen are made to approximate those of a conventional cylindrical mirror. A masking device allows a solid angle-oriented detection of scattered and secondary electrons. The outer cylinder of the cylindrical mirror may, at least in part, be made transmissive to photons, which are verified by a detector arranged on the outside. A channel multiplier plate with a fluorescent screen, provided opposite the emissions tip, allows detection of structural and/or emission properties of the emission tip by field ion microscopy or field electron microscopy.
Abstract:
A plasma generating device comprises:a rectangular wave guide for transmitting microwaves, wherein the width of the plasma generating device is decreased in the direction of an electrical field of the microwaves; a plasma generating chamber wherein plasma is generated by absorbing, in a gas, microwave energy transmitted by the rectangular wave guide, and a part of the plasma generating chamber has a rectangular cross-section taken along the plane perpendicular to the microwave propagation direction. A magnetic field generating device is provided having the same axial direction as the direction of propagation of the microwaves and applies a magnetic field having an Electron Cyclotron Resonance intensity to the plasma generating chamber. The magnetic field generating device is provided at least one location outside of the direction of the microwave electrical field direction, and a dielectric window is provided between the rectangular wave guide and the plasma generating chamber to realize a vacuum seal of the plasma generating chamber.
Abstract:
There is disclosed a high speed pulse train generator for generating a train of pulses having arbitrarily close spacing. The apparatus consists of a generator loop comprised of a fiber optic waveguide looped through a directional coupler with the output fiber serving as the input fiber for a similarly structured multiplexer loop. The lengths of the two loops are adjusted such that the time difference in the propagation times of light around the respective loops is small compared to the time of propagation around either loop. The times are adjusted to obtain any arbitrary spacing of the pulses in the output pulse train which is comprised of interleaved pulse trains resulting from each pulse input to the multiplexer loop. Also disclosed is a single loop embodiment for bidirectional data rate transformation and methods of using all the embodiments.
Abstract:
An ion source apparatus of surface ionization type comprises an emitter tip in the form of a round rod having a sharp-pointed end, an ion source material holder for holding the emitter tip coaxially within a crucible made of a material of a high melting point, the crucible having an opening formed in a bottom wall thereof through which the sharp-pointed end of the emitter tip extends outwardly, the ion source material is being filled in the crucible so as to enclose the outer periphery of the sharp-pointed end of the emitter tip, a filament for emitting electrons with which the emitter tip is bombarded from below, a heating power supply for the filament, an ion beam extracting electrode disposed between the emitter tip and the filament and maintained at a potential of a substantially the level as that of the filament, and an accelerating voltage power supply for applying a high voltage between the ion beam extracting electrode and the emitter tip to accelerate the electrons and ion beam.
Abstract:
Thermionic cathode 12 for a plasma ion source 10 has tungsten wire 64 advanced by wheels 56 from supply 50 to take-up spool 58. In chamber 48, the active cathode region 64 acts with anode 16 to supply electrons for ionizing a fuel gas so the ions are discharged from slit 18 for acceleration, separation and implantation.
Abstract:
A plasma discharge ion source for a mass spectrometer, having a magnet forming an axial magnetic field, two cathodes axially spaced in said field and an annular anode between the cathodes. Ions generated by the source emerge via an opening in one cathode and then pass in succession through axially aligned openings in two planar electrodes. The electrode closest said one cathode has a further disc or cone shaped electrode positioned in the opening of that electrode so as to form an annular gap between the peripheries of the disc shaped electrode and opening.Ions from the source opening pass in succession through the annular gap and then through the electrode opening in the electrode furtherest from the source opening. By applying suitable electric potentials to the electrodes ions of an energy above a predetermined level are prevented from passing through the electrodes.A mass spectrometer employing the source is also disclosed this employing an electrostatic ion filter and an ion collector to receive filtered ions from the source via the filter.The collector includes a slow ion deflector arranged to deflect emergent ions from the filter to a collector member of the collector and to which deflector emergent ions of high energy travel directly without such deflection.
Abstract:
A system based on the magnetic compression of ion rings, for generating intense (high-current), high-energy ion pulses that are guided to a target without a metallic wall or an applied external magnetic field includes a vacuum chamber; an inverse reflex tetrode for producing a hollow ion beam within the chamber; magnetic coils for producing a magnetic field, B.sub.o, along the axis of the chamber; a disc that sharpens a magnetic cusp for providing a rotational velocity to the beam and causing the beam to rotate; first and second gate coils for producing fast-rising magnetic field gates, the gates being spaced apart, each gate modifying a corresponding magnetic mirror peak (near and far peaks) for trapping or extracting the ions from the magnetic mirror, the ions forming a ring or layer having rotational energy; a metal liner for generating by magnetic flux compression a high, time-varying magnetic field, the time-varying magnetic field progressively increasing the kinetic energy of the ions, the magnetic field from the second gate coil decreasing the far mirror peak at the end of the compression for extracting the trapped rotating ions from the confining mirror; and a disc that sharpens a magnetic half-cusp for increasing the translational velocity of the ion beam. The system utilizes the self-magnetic field of the rotating, propagating ion beam to prevent the beam from expanding radially upon extraction.
Abstract:
The present invention describes an ion source which is capable of producing relatively high density ion currents. The ion source employs an electrically biased ionic conductor to supply ions from a reservoir of the atomic species.
Abstract:
A multi-beam, multi-aperture ion source of the beam-plasma type comprises three major regions: the first region where there is created a plurality of electron beams useful for the extraction and focusing of ions; the second region where a gaseous discharge is effected with the aid of the electron beams emerging from the first region, and high frequency oscillation or microwave oscillation is provided by utilization of instability due to electron beam-plasma interactions to thereby create high density ions by that heating energy; and the third region where the electron beams from the second region are collected through the use of a collector, and construction and applied voltage is adjusted to facilitate the high frequency oscillation. The numerous ions created within the second region are trapped into the form of finely focused beams by the well of negative potential which is defined by the plurality of the electron beams emerging from the first region. The resulting ion beams are extracted and combined in a direction opposite to the direction of the electron beams, thereby producing a single well-focused ion beam.
Abstract:
The ion source is comprised of two discharge chambers one of which is provided with a filament and an aperture leading into the other chamber which in turn has an extraction orifice. A low voltage arc discharge is operated in an inert gas atmosphere in the filament chamber while an arc of higher voltage is operated in the second ionization chamber which contains a vapor which will give the desired dopant ion species. The entire source is immersed in an axial magnetic field parallel to a line connecting the filament, the aperture between the two chambers and the extraction orifice.