公开(公告)号：US06468384B1

公开(公告)日：2002-10-22

申请号：US09710083

申请日：2000-11-09

申请人： Vikram Singh ,  Robert J. Whiting ,  Paul K. Shufflebotham ,  Ajay Saproo

发明人： Vikram Singh ,  Robert J. Whiting ,  Paul K. Shufflebotham ,  Ajay Saproo

IPC分类号： C23F100

CPC分类号： H01L21/67248 ,  H01J37/3299 ,  H01J2237/2001 ,  H01L21/6831

摘要： The present invention provides plasma processing systems and methods for providing a set-point temperature for substrates during plasma processing by controlling clamping force or RF power. The plasma processing system includes a plasma chamber, a controller, and an electrostatic power supply. The plasma chamber is arranged to receive an RF power and a source gas for producing plasma. The plasma chamber includes an electrostatic chuck for clamping a substrate in place during plasma processing. The electrostatic chuck includes an electrode and a sensor, which is arranged to monitor temperature of the substrate being processed. The controller is coupled to the sensor to receive the substrate temperature and is configured to generate a control signal for driving the substrate temperature to the set-point temperature. The electrostatic power supply is coupled between the controller and the electrode in the electrostatic chuck. The electrostatic power supply receives the control signal from the controller and generates a voltage adapted to clamp the substrate with a clamping force. In this configuration, the electrostatic power supply provides the voltage to the electrode to clamp the substrate such that the substrate temperature is driven to the set-point temperature.

摘要翻译： 本发明提供等离子体处理系统和方法，用于通过控制夹紧力或RF功率在等离子体处理期间提供基板的设定点温度。 等离子体处理系统包括等离子体室，控制器和静电电源。 等离子体室被布置成接收用于产生等离子体的RF功率和源气体。 等离子体室包括用于在等离子体处理期间将衬底夹持就位的静电吸盘。 静电卡盘包括电极和传感器，其被设置为监测被处理的基板的温度。 控制器耦合到传感器以接收衬底温度，并且被配置为产生用于将衬底温度驱动到设定点温度的控制信号。 静电电源连接在控制器和静电吸盘中的电极之间。 静电电源接收来自控制器的控制信号，并产生适合于用夹紧力夹紧衬底的电压。 在该结构中，静电电源向电极提供电压以夹紧基板，使得基板温度被驱动到设定点温度。

公开(公告)号：US06042687A

公开(公告)日：2000-03-28

申请号：US885346

申请日：1997-06-30

申请人： Vikram Singh ,  Brian McMillin ,  Tom Ni ,  Michael Barnes ,  Richard Yang

发明人： Vikram Singh ,  Brian McMillin ,  Tom Ni ,  Michael Barnes ,  Richard Yang

IPC分类号： H01J37/32 ,  H05H1/00 ,  H01L21/00

CPC分类号： H01J37/3244 ,  H01J37/321

摘要： A plasma processing system and method for processing substrates such as by chemical vapor deposition or etching. The system includes a plasma processing chamber, a substrate support for supporting a substrate within the processing chamber, a dielectric member having an interior surface facing the substrate support, the dielectric member forming a wall of the processing chamber, a primary gas supply supplying a primary gas such as process gas into the chamber, a secondary gas supply supplying a secondary gas such as a substantially inert, a substrate passivating or a reactant scavenging gas into the chamber, and an RF energy source such as a planar coil which inductively couples RF energy through the dielectric member and into the chamber to energize the primary gas into a plasma state. The secondary gas is concentrated near the periphery of the substrate, improving etching/deposition uniformity across the substrate surface.

摘要翻译： 一种等离子体处理系统和方法，用于通过化学气相沉积或蚀刻来处理衬底。 该系统包括等离子体处理室，用于在处理室内支撑衬底的衬底支撑件，具有面向衬底支撑件的内表面的电介质构件，形成处理室壁的电介质构件， 将诸如工艺气体的气体引入室中，将诸如基本惰性的二次气体，基底钝化或反应物清除气体的二次气体供给到腔室中，以及RF能量源，例如平面线圈，其感应耦合RF能量 通过电介质构件并进入腔室以将主气体激发成等离子体状态。 二次气体集中在衬底的周边附近，从而提高衬底表面的蚀刻/沉积均匀性。

公开(公告)号：US5968275A

公开(公告)日：1999-10-19

申请号：US882222

申请日：1997-06-25

申请人： Changhun Lee ,  Vikram Singh ,  Yun-Yen Jack Yang

发明人： Changhun Lee ,  Vikram Singh ,  Yun-Yen Jack Yang

IPC分类号： H01L21/302 ,  H01J37/32 ,  H01L21/02 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3213 ,  C23C16/00

CPC分类号： H01L21/02071 ,  H01J37/32633 ,  H01L21/31138

摘要： A plasma processing system configured for use in processing a substrate after metal etching. The substrate includes a layer of photoresist disposed thereon. The plasma processing system includes a plasma generating region and a baffle plate disposed between the plasma generating region and the substrate. The baffle plate includes a central blocked portion disposed in a center region of the baffle plate. The baffle plate further includes an annular porous portion surrounding the central blocked portion. The annular porous portion includes a plurality of through holes configured for permitting a H.sub.2 O plasma generated in the plasma generating region to pass through the holes to reach a surface of the substrate. The plasma processing system also includes a chuck disposed below the baffle plate to support the substrate during the processing.

摘要翻译： 一种等离子体处理系统，其配置用于在金属蚀刻之后处理衬底。 基板包括设置在其上的光致抗蚀剂层。 等离子体处理系统包括等离子体产生区域和设置在等离子体产生区域和衬底之间的挡板。 挡板包括设置在挡板中心区域的中央阻挡部分。 挡板还包括围绕中心阻塞部分的环形多孔部分。 环形多孔部分包括多个通孔，其构造成允许在等离子体产生区域中产生的H 2 O等离子体通过孔到达衬底的表面。 等离子体处理系统还包括设置在挡板下方以在处理期间支撑基板的卡盘。

公开(公告)号：USPP10935P

公开(公告)日：1999-06-01

申请号：US855768

申请日：1997-04-22

申请人： Sushil Kumar ,  Bali Ram Tyagi ,  Janak Raj Bahl ,  Hari Singh ,  Vikram Singh ,  Ram Ujagir ,  Suman Preet Singh Khanuja ,  Ajit Kumar Shasany ,  Ram Sajivan Shukla ,  Abdul Sattar ,  Dwijendra Singh ,  Akhtar Haseeb ,  Vijay Pal Singh ,  Paltoo Ram ,  Kambod Singh ,  Saudan Singh ,  Surendra Pratap Singh ,  Nirmal Kumar Patra ,  Mansoor Alam ,  Arif Ali Naqvi ,  Muni Ram ,  Krishan Kumar Agarwal ,  Kailash Singh

发明人： Sushil Kumar ,  Bali Ram Tyagi ,  Janak Raj Bahl ,  Hari Singh ,  Vikram Singh ,  Ram Ujagir ,  Suman Preet Singh Khanuja ,  Ajit Kumar Shasany ,  Ram Sajivan Shukla ,  Abdul Sattar ,  Dwijendra Singh ,  Akhtar Haseeb ,  Vijay Pal Singh ,  Paltoo Ram ,  Kambod Singh ,  Saudan Singh ,  Surendra Pratap Singh ,  Nirmal Kumar Patra ,  Mansoor Alam ,  Arif Ali Naqvi ,  Muni Ram ,  Krishan Kumar Agarwal ,  Kailash Singh

摘要： A new and distinct hybrid plant named `Himalaya` (Mentha arvensis) characterized by its higher yield of oil which is rich in menthol, improved regeneration potential, vigorous growth, deep green broad thick leaves, pinkish white flowers and tolerance to rust such as alternaria leaf blight, corynespora leaf spot and powdery mildew.

公开(公告)号：US08507372B2

公开(公告)日：2013-08-13

申请号：US13480204

申请日：2012-05-24

申请人： George D. Papasouliotis ,  Vikram Singh ,  Heyun Yin

发明人： George D. Papasouliotis ,  Vikram Singh ,  Heyun Yin

IPC分类号： H01L21/425

CPC分类号： H01L21/2236 ,  H01L29/66803

摘要： A technique for conformal processing of a substrate having a non-planar surface is disclosed. The technique includes several stages. In a first stage, some surfaces of the substrate are effectively processed. During a second stage, these surfaces are treated to limit or eliminate further processing of these surfaces. During a third stage, other surfaces of the substrate are processed. In some applications, the surfaces that are perpendicular, or substantially perpendicular to the flow of particles are processed in the first and second stages, while other surfaces are processed in the third stage. In some embodiments, the second stage includes the deposition of a film on the substrate.

摘要翻译： 公开了一种用于对具有非平面表面的衬底进行保形加工的技术。 该技术包括几个阶段。 在第一阶段中，有效地处理衬底的某些表面。 在第二阶段期间，处理这些表面以限制或消除这些表面的进一步加工。 在第三阶段期间，处理衬底的其它表面。 在一些应用中，在第一和第二阶段中处理垂直或基本垂直于颗粒流的表面，而在第三阶段处理其它表面。 在一些实施例中，第二阶段包括在衬底上沉积膜。

公开(公告)号：US08184556B2

公开(公告)日：2012-05-22

申请号：US11942225

申请日：2007-11-19

申请人： Vikram Singh

发明人： Vikram Singh

IPC分类号： H04L12/28

CPC分类号： H04L43/0852

摘要： The present invention provides distance-proof N-pass Auto Negotiation systems and methods for Gigabit Ethernet. The present invention distance proofs Auto Negotiation. No matter the distance between two nodes configured according to the systems and methods of the present invention, the link at either end of the two nodes will only come up once each end has negotiated, resolved its link partner's capabilities, and received a similar success signal from the remote node.

摘要翻译： 本发明提供了用于千兆以太网的距离保护N-pass自动协商系统和方法。 本发明距离证明自动谈判。 无论根据本发明的系统和方法配置的两个节点之间的距离，两个节点的任一端的链路只有在每个端点协商后才会出现，解决了其链路伙伴的能力，并且接收到类似的成功信号 从远程节点。

公开(公告)号：US07925539B1

公开(公告)日：2011-04-12

申请号：US09468403

申请日：1999-12-20

申请人： Vikram Singh ,  Lisa McClung ,  Gilbert C. L. Leong ,  Karl-Heinz Hetfleisch

发明人： Vikram Singh ,  Lisa McClung ,  Gilbert C. L. Leong ,  Karl-Heinz Hetfleisch

IPC分类号： G06Q30/00 ,  G06F7/00

CPC分类号： G06Q30/0601 ,  G06Q30/06

摘要： A system and method for screening purchases and sorting the types of products sought to be purchased over a computer network, such as the Internet, is disclosed. The invention includes providing a user interface for a customer to access an automated seller facility, the facility having two types of product categories, unrestricted and restricted. Access to the facility takes place over a global computer network, with the user interface configured to allow the customer to enter customer data for the purpose of purchasing products from the automated seller facility. The invention next includes receiving the customer data, comprising an account number and a product order from the customer, and specifying a desired product to be purchased over the computer network. The invention further includes determining whether the product desired by the customer falls within the restricted product category, and if it does, the system provides for checking whether the customer is in fact an authorized buyer of such a restricted product. A customer authorization code is only issued if the customer is an authorized buyer of restricted products or if the desired product falls within the unrestricted product category. The authorization code therefore indicates that both the customer and the product order have been accepted to purchase the desired product. Conversely, if the customer and product order have not been accepted, the product order is rejected.

摘要翻译： 公开了一种用于筛选购买和分类通过计算机网络（例如因特网）购买的产品类型的系统和方法。 本发明包括为客户提供用于访问自动卖家设备的用户界面，该设施具有两种类型的产品类别，不限制和限制。 通过全球计算机网络访问设施，用户界面被配置为允许客户输入客户数据，以便从自动卖主设备购买产品。 本发明接下来包括接收客户数据，包括来自客户的帐号和产品订单，以及指定要通过计算机网络购买的期望产品。 本发明还包括确定客户所期望的产品是否落入受限制的产品类别内，如果是，该系统提供用于检查客户实际上是否是这种限制产品的授权买家。 仅当客户是限制产品的授权买方或者所需产品属于无限制产品类别时，才会发出客户授权码。 因此，授权代码表示客户和产品订单已被接受以购买所需的产品。 相反，如果客户和产品订单未被接受，产品订单将被拒绝。

公开(公告)号：US07822805B1

公开(公告)日：2010-10-26

申请号：US09468752

申请日：1999-12-21

申请人： Vikram Singh ,  Lisa McClung ,  Gilbert C. L. Leong ,  Karl-Heinz Hetfleisch

发明人： Vikram Singh ,  Lisa McClung ,  Gilbert C. L. Leong ,  Karl-Heinz Hetfleisch

IPC分类号： G06F15/16

CPC分类号： G06Q30/0633 ,  G06Q30/02

摘要： A system and method for screening a potential customer and assigning an account number to the potential customer prior to permitting the potential customer to purchase products or services from an automated seller facility over a computer network, such as the Internet, is disclosed. The potential customer enters customer data into a user interface to be received by the seller in the automated seller facility so that the seller can check the potential customer's qualifications. The invention includes performing an initial screening to determine whether the potential customer is qualified to purchase the products or services from the seller. If the potential customer passes the initial screening, an account number is issued to the potential customer. The account number allows the potential customer further access to the automated seller facility so that the potential customer may make an offer to purchase products or services while the automated seller facility performs a complete screening.

摘要翻译： 公开了一种用于筛选潜在客户并在允许潜在客户通过计算机网络（例如因特网）从自动卖主设备购买产品或服务的潜在客户之前分配帐号的系统和方法。 潜在客户将客户数据输入用户界面，以便卖方在自动卖主设备中接收，以便卖方可以检查潜在的客户资质。 本发明包括执行初步筛选以确定潜在客户是否有资格从卖方购买产品或服务。 如果潜在客户通过初始筛选，则向潜在客户发放一个帐号。 帐号允许潜在客户进一步访问自动卖家设施，以便潜在客户可以在自动卖家设备进行完整筛选时提供购买产品或服务。

公开(公告)号：US20090117735A1

公开(公告)日：2009-05-07

申请号：US12255181

申请日：2008-10-21

申请人： Heyun YIN ,  George D. Papasouliotis ,  Vikram Singh

发明人： Heyun YIN ,  George D. Papasouliotis ,  Vikram Singh

IPC分类号： H01L21/768

CPC分类号： H01L21/76846 ,  H01L21/76849 ,  H01L21/76867

摘要： A first species and a second species are implanted into a conductor of a substrate, which may be copper. The first species and second species may be implanted sequentially or at least partly simultaneously. Diffusion of the first species within the conductor of the substrate is prevented by the presence of the second species. In one particular example, the first species is silicon and the second species is nitrogen, although other combinations are possible.

摘要翻译： 第一种和第二种被植入到可以是铜的衬底的导体中。 可以顺序地或至少部分地同时植入第一种和第二种。 通过第二种物质的存在来防止第一种在基底导体内的扩散。 在一个具体实例中，第一种是硅，第二种是氮，尽管其它组合是可能的。

公开(公告)号：US07524743B2

公开(公告)日：2009-04-28

申请号：US11163307

申请日：2005-10-13

申请人： Atul Gupta ,  Vikram Singh ,  Timothy Miller ,  Edmund Jacques Winder

发明人： Atul Gupta ,  Vikram Singh ,  Timothy Miller ,  Edmund Jacques Winder

IPC分类号： H01L21/423 ,  H01L21/425

CPC分类号： H01J37/32623 ,  H01J37/32412 ,  H01J37/32697 ,  H01L21/2236 ,  H01L21/26506 ,  H01L21/26526 ,  H01L21/26586 ,  H01L29/66803

摘要： A method of doping includes depositing a layer of dopant material on nonplanar and planar features of a substrate. Inert ions are generated from an inert feed gas. The inert ions are extracted towards the substrate where they physically knock the dopant material into both the planar and nonplanar features of the substrate.

摘要翻译： 掺杂的方法包括在衬底的非平面和平面特征上沉积掺杂剂材料层。 惰性进料气体产生惰性离子。 向衬底提取惰性离子，在衬底上物理地将掺杂剂材料敲入衬底的平面和非平面特征。