公开(公告)号：US06383948B1

公开(公告)日：2002-05-07

申请号：US09734922

申请日：2000-12-13

申请人： Takahiro Kitano ,  Masateru Morikawa ,  Yukihiko Esaki ,  Nobukazu Ishizaka ,  Norihisa Koga ,  Kazuhiro Takeshita ,  Hirofumi Ookuma ,  Masami Akimoto

发明人： Takahiro Kitano ,  Masateru Morikawa ,  Yukihiko Esaki ,  Nobukazu Ishizaka ,  Norihisa Koga ,  Kazuhiro Takeshita ,  Hirofumi Ookuma ,  Masami Akimoto

IPC分类号： H01L2131

CPC分类号： H01L21/6715 ,  B05C5/0208 ,  B05C5/0216 ,  B05C5/0291 ,  H01L21/0271

摘要： A coating area of wafer W is divided into, for example, three regions. The wafer W and/or a supply nozzle are driven in a predetermined coating direction and/or a coating direction such that coating start positions of the adjacent divided regions are not next to each other and/or the coating is not continuously performed in order of a coating end position and a coating start position when the coating end position of one region of the adjacent divided regions and the coating start position of the other region are adjacent to each other, whereby forming a liquid film of a resist liquid for each divided region of the surface of wafer W. As a result, a phenomenon, in which the resist liquid is drawn to the coating start position, so as to increase the film thickness of this portion, occurs in only the corresponding region. Resultantly, uniformity of an inner surface of the film thickness can be improved.

公开(公告)号：US06200633B1

公开(公告)日：2001-03-13

申请号：US09369835

申请日：1999-08-09

申请人： Takahiro Kitano ,  Katsuya Okumura ,  Shinichi Ito

发明人： Takahiro Kitano ,  Katsuya Okumura ,  Shinichi Ito

IPC分类号： B05D312

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G05D11/132 ,  Y10T137/87652

摘要： Disclosed is a coating apparatus, comprising: a first stream-combining valve communicating with each of a first solvent tank and a resist solution tank, a first pump for supplying an initial resist solution from the resist solution tank toward said first stream-combining valve, a second pump for supplying a solvent from said first solvent supply toward said first stream-combining valve, a first mixer for mixing under stirring the initial resist solution flowing out of said first stream-combining valve with a solvent, a second stream-combining valve arranged downstream of said first mixer and communicating with each of the first mixer and said second solvent supply, a third pump for supplying the solvent from said second solvent supply toward the second stream-combining valve, a second mixer for mixing under stirring said primary mixed liquid material coming out of said second stream-combining valve with a solvent so as to prepare a final mixed liquid material, a nozzle equipped with a liquid spurting port for spurting said final mixed liquid material prepared in said second mixer toward the substrate, and a controller for controlling each of the first, second, third pumps and the first and second stream-combining valves so as to control the mixing ratio of the initial resist solution to the solvent and to control the mixing ratio of the primary mixed liquid material to the solvent.

摘要翻译： 公开了一种涂布装置，包括：与第一溶剂罐和抗蚀剂溶液罐中的每一个连通的第一流合并阀，用于从抗蚀剂溶液箱朝向所述第一流合并阀提供初始抗蚀剂溶液的第一泵， 用于从所述第一溶剂供应源向所述第一流合并阀供应溶剂的第二泵，用于在搅拌下混合从所述第一流合并阀流出的初始抗蚀剂溶液与溶剂混合的第一混合器，第二流合并阀 布置在所述第一混合器的下游并与所述第一混合器和所述第二溶剂供应源连通;第三泵，用于从所述第二溶剂供应源向第二流合并阀供应溶剂;第二混合器，用于在搅拌下混合， 用溶剂从所述第二流合并阀出来的液体材料，以制备最终的混合液体材料，配备有喷嘴的喷嘴 用于将在所述第二混合器中制备的所述最终混合液体材料喷射到基板的液体喷出口，以及用于控制第一，第二和第三泵以及第一和第二流合并阀中的每一个的控制器，以便控制混合比 初始抗溶液溶解于溶剂，并控制初级混合液体材料与溶剂的混合比例。

公开(公告)号：US5968268A

公开(公告)日：1999-10-19

申请号：US15066

申请日：1998-01-28

申请人： Takahiro Kitano ,  Katsuya Okumura ,  Shinichi Ito

发明人： Takahiro Kitano ,  Katsuya Okumura ,  Shinichi Ito

IPC分类号： G03F7/16 ,  B05C11/08 ,  B05D1/36 ,  B05D1/40 ,  G05D11/13 ,  H01L21/00 ,  H01L21/027 ,  B05B13/04 ,  A01G25/00 ,  B05B7/06 ,  G05D11/00

CPC分类号： H01L21/6715 ,  G05D11/132 ,  G03F7/162 ,  Y10T137/87652

摘要： Disclosed is a coating apparatus, comprising: a first stream-combining valve communicating with each of a first solvent tank and a resist solution tank, a first pump for supplying an initial resist solution from the resist solution tank toward said first stream-combining valve, a second pump for supplying a solvent from said first solvent supply toward said first stream-combining valve, a first mixer for mixing under stirring the initial resist solution flowing out of said first stream-combining valve with a solvent, a second stream-combining valve arranged downstream of said first mixer and communicating with each of the first mixer and said second solvent supply, a third pump for supplying the solvent from said second solvent supply toward the second stream-combining valve, a second mixer for mixing under stirring said primary mixed liquid material coming out of said second stream-combining valve with a solvent so as to prepare a final mixed liquid material, a nozzle equipped with a liquid spurting port for spurting said final mixed liquid material prepared in said second mixer toward the substrate, and a controller for controlling each of the first, second, third pumps and the first and second stream-combining valves so as to control the mixing ratio of the initial resist solution to the solvent and to control the mixing ratio of the primary mixed liquid material to the solvent.

摘要翻译： 公开了一种涂布装置，包括：与第一溶剂罐和抗蚀剂溶液罐中的每一个连通的第一流合并阀，用于从抗蚀剂溶液箱朝向所述第一流合并阀提供初始抗蚀剂溶液的第一泵， 用于从所述第一溶剂供应源向所述第一流合并阀供应溶剂的第二泵，用于在搅拌下混合从所述第一流合并阀流出的初始抗蚀剂溶液与溶剂混合的第一混合器，第二流合并阀 布置在所述第一混合器的下游并与所述第一混合器和所述第二溶剂供应源连通;第三泵，用于从所述第二溶剂供应源向第二流合并阀供应溶剂;第二混合器，用于在搅拌下混合， 用溶剂从所述第二流合并阀出来的液体材料，以制备最终的混合液体材料，配备有喷嘴的喷嘴 用于将在所述第二混合器中制备的所述最终混合液体材料喷射到基板的液体喷出口，以及用于控制第一，第二和第三泵以及第一和第二流合并阀中的每一个的控制器，以便控制混合比 初始抗溶液溶解于溶剂，并控制初级混合液体材料与溶剂的混合比例。

公开(公告)号：US08808798B2

公开(公告)日：2014-08-19

申请号：US13569345

申请日：2012-08-08

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05D3/12 ,  H01L21/67 ,  H01L21/683 ,  H01L21/027 ,  G03F7/16

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/027 ,  H01L21/67051 ,  H01L21/6838

摘要： A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.

摘要翻译： 一种涂布方法，包括将涂布液从涂布喷嘴供给到保持在基板保持部件上的基板的前侧中央部，使基板保持部件绕垂直轴旋转，使涂布液朝向基板的周边部分扩散， 离心力，从而形成涂布液的膜，形成用于防止来自涂布液的污染物沉积或残留在基板的背面周边部分上的处理液的液膜，并且阻尼垂直摆动 通过姿势调节机构，在从形成有液膜的周边部分的内侧将来自输送孔的气体输送到基板的背面侧，同时旋转基板的周边部。

公开(公告)号：US08808609B2

公开(公告)日：2014-08-19

申请号：US13503167

申请日：2010-09-17

申请人： Takahiro Kitano ,  Fujio Okino

发明人： Takahiro Kitano ,  Fujio Okino

IPC分类号： C01B31/02 ,  C01B31/04 ,  D01D5/00 ,  D01D5/20 ,  D01F9/145 ,  D01F9/20 ,  D04H3/002

CPC分类号： D01F9/145 ,  B01D39/2065 ,  D01D5/0038 ,  D01D5/20 ,  D01F9/20 ,  D04H1/4242 ,  D04H1/728 ,  D04H3/002 ,  D04H13/00 ,  D10B2101/12 ,  H01G11/26 ,  H01G11/34 ,  H01G11/40 ,  H01G11/44 ,  H01M4/133 ,  H01M4/583 ,  H01M4/587 ,  H01M4/80 ,  H01M4/806 ,  Y02E60/13 ,  Y10T428/2918 ,  Y10T442/60 ,  Y10T442/61 ,  Y10T442/681

摘要： The present invention has an object of providing the carbon fiber (or the nonwoven fabric configured of the aforementioned carbon fiber) of which the surface area, the graphitization degree, and the fiber diameter are large, high, and small, respectively, and yet of which dispersion is small.The method of producing the carbon fiber nonwoven fabric includes a dispersion liquid preparing step of preparing a dispersion liquid containing resin and pitch, an electrospinning step of producing the nonwoven fabric that is comprised of carbon fiber precursors with electrospinning from the aforementioned dispersion liquid, and a modifying step of modifying the carbon fiber precursors of the nonwoven fabric obtained in the aforementioned electrospinning step into the carbon fiber.

摘要翻译： 本发明的目的是提供其表面积，石墨化度和纤维直径分别大，高和小的碳纤维（或由上述碳纤维构成的无纺织物） 该分散体小。 制造碳纤维非织造布的方法包括：制备含有树脂和间距的分散液的分散液制备步骤，由上述分散液静电纺丝制成由碳纤维前体组成的无纺布的静电纺丝步骤，以及 将上述静电纺丝工序中得到的无纺布的碳纤维前体改性为碳纤维的改性工序。

公开(公告)号：US08734684B2

公开(公告)日：2014-05-27

申请号：US13125875

申请日：2009-10-22

申请人： Takahiro Kitano

发明人： Takahiro Kitano

IPC分类号： C01B31/02

CPC分类号： H01B1/24 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/172 ,  C01B32/174

摘要： A method for producing a metallic carbon nanotube, by which a dispersion with a high concentration can be obtained. Specifically disclosed is a method for producing a metallic carbon nanotube, which comprises a fullerene addition step wherein fullerenes are added into a carbon nanotube-containing solution in which metallic carbon nanotubes and semiconductive carbon nanotubes are mixed, and a taking-out step wherein carbon nanotubes dispersed by the added fullerenes are taken out.

摘要翻译： 一种制造金属碳纳米管的方法，通过该方法可以获得高浓度的分散体。 具体公开了一种制造金属碳纳米管的方法，其包括富勒烯添加步骤，其中将富勒烯加入到其中混合有金属碳纳米管和半导体碳纳米管的含碳纳米管的溶液中，以及取出步骤，其中将碳纳米管 被添加的富勒烯分散后取出。

公开(公告)号：US08578953B2

公开(公告)日：2013-11-12

申请号：US12000670

申请日：2007-12-14

申请人： Yasushi Takiguchi ,  Taro Yamamoto ,  Akihiro Fujimoto ,  Shuuichi Nishikido ,  Dai Kumagai ,  Naoto Yoshitaka ,  Takahiro Kitano ,  Yoichi Tokunaga

发明人： Yasushi Takiguchi ,  Taro Yamamoto ,  Akihiro Fujimoto ,  Shuuichi Nishikido ,  Dai Kumagai ,  Naoto Yoshitaka ,  Takahiro Kitano ,  Yoichi Tokunaga

IPC分类号： B08B3/00 ,  B08B1/02

CPC分类号： H01L21/0209 ,  B08B1/002 ,  B08B1/04 ,  B08B3/02 ,  B08B5/02 ,  B08B7/0057 ,  H01L21/67028 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/68742 ,  H01L21/68764

摘要： A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.

摘要翻译： 公开的用于清洁基板的背面的基板清洁装置包括：第一基板支撑部，其构造成在基板的背面的第一区域处支撑基板，所述背面朝下; 第二基板支撑部，其构造成在所述基板的背面的第二区域处支撑所述基板，所述第二区域与所述第一区域分离; 清洗液供给部，构成为向所述基板的背面供给清洗液; 干燥部，其构造成干燥所述基板的背面的第二区域; 以及清洁部，其构造成当所述基板被所述第一基板支撑部支撑所述基板时，清洁所述基板的背面的第三区域，所述第三区域包括所述第二区域以及所述基板的背面的第四区域， 基板由第二基板支撑部分支撑，除了后表面的第二区域之外的第四区域。

公开(公告)号：US08468943B2

公开(公告)日：2013-06-25

申请号：US13393250

申请日：2010-08-25

申请人： Koukichi Hiroshiro ,  Takanori Nishi ,  Shoichi Terada ,  Takahiro Kitano

发明人： Koukichi Hiroshiro ,  Takanori Nishi ,  Shoichi Terada ,  Takahiro Kitano

IPC分类号： H01L21/27 ,  B29C59/02 ,  B41F1/00 ,  B41F33/00 ,  B05D1/32 ,  B01D5/00 ,  B01D3/02 ,  G01B17/00

CPC分类号： B29C37/0053 ,  B29C33/20 ,  B29C43/021 ,  B29C59/022 ,  B29C2043/025 ,  B29C2043/3488 ,  B29K2105/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： The present invention provides a method for applying an application liquid between a template and a substrate, and transferring the transfer pattern onto the application liquid. The template is inclinedly arranged with respect to the substrate in a manner that a first distance between a first end portion of the template and the substrate is a distance that causes a capillary action of the application liquid to occur, and a second distance between a second end portion of the template that opposes the first end portion and the substrate is a distance that does not cause the capillary action of the application liquid to occur. Thereafter, the application liquid is supplied from an outer side of the first end portion to the first end portion. Thereafter, the second end portion and the substrate are relatively moved so that the second distance becomes equal to the first distance.

摘要翻译： 本发明提供了一种在模板和基板之间施加涂布液并将转印图案转印到涂布液上的方法。 模板相对于基板倾斜地布置，使得模板的第一端部与基板之间的第一距离是引起施加液体的毛细作用的距离，并且第二距离在第二 与第一端部和基板相对的模板的端部是不会引起施加液的毛细作用的距离。 此后，将应用液从第一端部的外侧供给到第一端部。 此后，第二端部和基板相对移动，使得第二距离变得等于第一距离。

公开(公告)号：US20130045024A1

公开(公告)日：2013-02-21

申请号：US13695571

申请日：2011-04-05

申请人： Masanobu Deguchi ,  Shinji Kawamura ,  Takahiro Kitano ,  Wataru Yoshida ,  Hideki Sekino

发明人： Masanobu Deguchi ,  Shinji Kawamura ,  Takahiro Kitano ,  Wataru Yoshida ,  Hideki Sekino

IPC分类号： G03G15/00

CPC分类号： G03G21/1604 ,  G03G2215/00004 ,  G03G2221/1681

摘要： In the state where a handle (2) and a lid (12) are attached to a main body (11), left and right bases (22) of the handle (2) are fitted into recesses (1112, 1113) at coupling portions (111, 112). Left and right shaft supports (91) of the lid (12) are fitted into recesses (1111, 1114). Shaft portions (81) of the left and right bases (22) are fitted from above into a through hole (72) and a through hole (73), respectively, and are supported rotatably about a center axis (200) in the through holes (72, 73). Shafts (93 to 95) of the shaft supports (91, 92) are laterally fitted into through holes (71, 74, 75), respectively, and are supported rotatably about the center axis (200) in the through holes (71, 74, 75). The shaft (94) of the shaft support (92) is laterally fitted into a blind hole (82) of the right base (22).

摘要翻译： 在手柄（2）和盖（12）附接到主体（11）的状态下，手柄（2）的左右基座（22）在联接部分处嵌入凹部（1112,1113） （111,112）。 盖（12）的左右轴支撑（91）装配到凹部（1111,1114）中。 左右基座（22）的轴部（81）分别从上方嵌入贯通孔（72）和贯通孔（73）中，并且能够围绕通孔（200）的中心轴线 （72,73）。 轴支撑件（91,92）的轴（93至95）分别横向嵌入通孔（71,74,75）中，并且在通孔（71,74）中围绕中心轴线（200）可旋转地支撑 ，75）。 轴支撑件（92）的轴（94）横向配合到右基座（22）的盲孔（82）中。

公开(公告)号：US20120213925A1

公开(公告)日：2012-08-23

申请号：US13462880

申请日：2012-05-03

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05D3/12

CPC分类号： G03F7/162 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.

摘要翻译： 一种涂布方法，包括：在基板保持部件上将基板保持为水平状态; 将涂布液供给到保持在所述基板保持部件上的所述基板的前侧中央部; 使基板保持部件绕垂直轴旋转，通过离心力向基板的前侧中央部供给的涂布液扩散; 通过包括气体输送口和吸入口的摆动阻尼机构来抑制基板的摆动，所述气体输送口和吸入口均设置成面对基板的背面，同时从输送口输送气体并将气体吸入吸入口 港口。