公开(公告)号：US08730020B2

公开(公告)日：2014-05-20

申请号：US13305216

申请日：2011-11-28

申请人： Heather Konet ,  Tsuyoshi Kanuma ,  Manabu Sato ,  Toshiyuki Tabata

发明人： Heather Konet ,  Tsuyoshi Kanuma ,  Manabu Sato ,  Toshiyuki Tabata

IPC分类号： B60Q1/00

CPC分类号： B60Q5/008 ,  G10K15/02

摘要： A method for controlling a vehicle to emanate an audible alert. The method includes determining when the vehicle is operating, and controlling a speaker system in the vehicle to emanate the audible alert outside of the vehicle for a period of time when the vehicle is operating. The audible alert has a sound profile that includes a simultaneous emanation of a first audible frequency component at a first sound pressure level and a second audible frequency component at a second sound pressure level, with the first and second sound pressure levels being greater than a sound pressure level of the sound profile at all other frequencies. The method further includes modulating the first sound pressure level of the first audible frequency component.

摘要翻译： 一种用于控制车辆发出可听警报的方法。 该方法包括确定车辆何时运行，并且控制车辆中的扬声器系统在车辆运行的时间段内发出车辆外的可听到的警报。 声音警报具有声音简档，其包括在第一声压级别同时发出第一可听频率分量和在第二声压级别的第二可听频率分量，其中第一和第二声压级别大于声音 在所有其他频率的声音轮廓的压力水平。 该方法还包括调制第一可听频率分量的第一声压级。

公开(公告)号：US08603293B2

公开(公告)日：2013-12-10

申请号：US13186145

申请日：2011-07-19

申请人： Akira Koshiishi ,  Masaru Sugimoto ,  Kunihiko Hinata ,  Noriyuki Kobayashi ,  Chishio Koshimizu ,  Ryuji Ohtani ,  Kazuo Kibi ,  Masashi Saito ,  Naoki Matsumoto ,  Yoshinobu Ohya ,  Manabu Iwata ,  Daisuke Yano ,  Yohei Yamazawa ,  Hidetoshi Hanaoka ,  Toshihiro Hayami ,  Hiroki Yamazaki ,  Manabu Sato

发明人： Akira Koshiishi ,  Masaru Sugimoto ,  Kunihiko Hinata ,  Noriyuki Kobayashi ,  Chishio Koshimizu ,  Ryuji Ohtani ,  Kazuo Kibi ,  Masashi Saito ,  Naoki Matsumoto ,  Yoshinobu Ohya ,  Manabu Iwata ,  Daisuke Yano ,  Yohei Yamazawa ,  Hidetoshi Hanaoka ,  Toshihiro Hayami ,  Hiroki Yamazaki ,  Manabu Sato

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32422 ,  H01J37/32018 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32522 ,  H01J37/32834 ,  H01J2237/2001 ,  H01J2237/334 ,  H01J2237/3344 ,  H01L21/67069 ,  Y10S156/915

摘要： A plasma processing apparatus includes a processing container, an exhaust unit, an exhaust plate, an RF power application unit connected to a second electrode but not connected to the first electrode and configured to apply an RF power with a single frequency, the second electrode being connected to no power supply that applies an RF power other than the RF power with the single frequency, a DC power supply connected to the first electrode but not connected to the second electrode, the first electrode being connected to no power supply that applies an RF power, and a conductive member within the process container grounded to release through plasma a current caused by the DC voltage, the conductive member supported by the first shield part and laterally protruding therefrom only at a position that is located, in a height-wise direction, between a mount face and the exhaust plate and below a bottom of a focus ring.

摘要翻译： 等离子体处理装置包括处理容器，排气单元，排气板，连接到第二电极但未连接到第一电极并被配置为施加具有单一频率的RF功率的RF功率施加单元，第二电极为 连接到没有施加除了单个频率的RF功率之外的RF功率的电源，连接到第一电极但没有连接到第二电极的直流电源，第一电极连接到不施加RF的电源 功率和处理容器内的导电构件接地，以通过等离子体释放由直流电压引起的电流，导电构件由第一屏蔽部分支撑并且仅在位于高度方向的位置处侧向突出 在安装面和排气板之间以及聚焦环的底部之下。

公开(公告)号：US08241514B2

公开(公告)日：2012-08-14

申请号：US12413999

申请日：2009-03-30

申请人： Masanobu Honda ,  Hiroyuki Nakayama ,  Manabu Sato

发明人： Masanobu Honda ,  Hiroyuki Nakayama ,  Manabu Sato

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： H01L21/31116 ,  H01J37/32027 ,  H01J37/32091 ,  H01L21/67069

摘要： A plasma etching method includes disposing a first electrode and a second electrode to face each other; preparing a part in the processing chamber; supporting a substrate; vacuum-evacuating the processing chamber; supplying an etching gas into a processing space between the first electrode and the second electrode; generating a plasma of the etching gas in the processing space by applying a radio wave power to the first electrode or the second electrode; and etching a film to be processed on a surface of the substrate by using the plasma. Further, a DC voltage is applied to the part during the etching process, the part being disposed away from the substrate and being etched by reaction with reactant species in the plasma.

摘要翻译： 等离子体蚀刻方法包括：将第一电极和第二电极相对配置; 在处理室中准备一部分; 支撑底物; 真空抽真空处理室; 向第一电极和第二电极之间的处理空间提供蚀刻气体; 通过向所述第一电极或所述第二电极施加无线电波来在所述处理空间中产生蚀刻气体的等离子体; 并且通过使用等离子体在基板的表面上蚀刻待处理的膜。 此外，在蚀刻工艺期间，将DC电压施加到该部件，该部分被设置为远离衬底并且通过与等离子体中的反应物物质的反应进行蚀刻。

公开(公告)号：US20120068836A1

公开(公告)日：2012-03-22

申请号：US13305216

申请日：2011-11-28

申请人： Heather Konet ,  Tsuyoshi Kanuma ,  Manabu Sato ,  Toshiyuki Tabata

发明人： Heather Konet ,  Tsuyoshi Kanuma ,  Manabu Sato ,  Toshiyuki Tabata

IPC分类号： B60Q1/00

CPC分类号： B60Q5/008 ,  G10K15/02

摘要： A method for controlling a vehicle to emanate an audible alert. The method includes determining when the vehicle is operating, and controlling a speaker system in the vehicle to emanate the audible alert outside of the vehicle for a period of time when the vehicle is operating. The audible alert has a sound profile that includes a simultaneous emanation of a first audible frequency component at a first sound pressure level and a second audible frequency component at a second sound pressure level, with the first and second sound pressure levels being greater than a sound pressure level of the sound profile at all other frequencies. The method further includes modulating the first sound pressure level of the first audible frequency component.

摘要翻译： 一种用于控制车辆发出可听警报的方法。 该方法包括确定车辆何时运行，并且控制车辆中的扬声器系统在车辆运行的时间段内发出车辆外的可听到的警报。 声音警报具有声音简档，其包括在第一声压级别同时发出第一可听频率分量和在第二声压级别的第二可听频率分量，其中第一和第二声压级别大于声音 在所有其他频率的声音轮廓的压力水平。 该方法还包括调制第一可听频率分量的第一声压级。

公开(公告)号：US20110272097A1

公开(公告)日：2011-11-10

申请号：US13186145

申请日：2011-07-19

申请人： Akira Koshiishi ,  Masaru Sugimoto ,  Kunihiko Hinata ,  Noriyuki Kobayashi ,  Chishio Koshimizu ,  Ryuji Ohtani ,  Kazuo Kibi ,  Masashi Saito ,  Naoki Matsumoto ,  Yoshinobu Ooya ,  Manabu Iwata ,  Daisuke Yano ,  Yohei Yamazawa ,  Hidetoshi Hanaoka ,  Toshihiro Hayami ,  Hiroki Yamazaki ,  Manabu Sato

发明人： Akira Koshiishi ,  Masaru Sugimoto ,  Kunihiko Hinata ,  Noriyuki Kobayashi ,  Chishio Koshimizu ,  Ryuji Ohtani ,  Kazuo Kibi ,  Masashi Saito ,  Naoki Matsumoto ,  Yoshinobu Ooya ,  Manabu Iwata ,  Daisuke Yano ,  Yohei Yamazawa ,  Hidetoshi Hanaoka ,  Toshihiro Hayami ,  Hiroki Yamazaki ,  Manabu Sato

IPC分类号： C23F1/08

CPC分类号： H01J37/32422 ,  H01J37/32018 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32522 ,  H01J37/32834 ,  H01J2237/2001 ,  H01J2237/334 ,  H01J2237/3344 ,  H01L21/67069 ,  Y10S156/915

摘要： A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.

摘要翻译： 等离子体蚀刻装置包括上电极和下电极，在其间产生处理气体的等离子体以在晶片W上进行等离子体蚀刻。该装置还包括设置在晶片周围的冷却环，设置在冷却周围的校正环 环和直接连接到校正环的可变直流电源，所述直流电压被预设为向校正环提供相对于地电位的负偏压，用于吸引等离子体中的离子并将校正环的温度增加到 补偿由于冷却环导致的目标基板的边缘附近的空间的温度的降低。

公开(公告)号：US07906305B2

公开(公告)日：2011-03-15

申请号：US11668182

申请日：2007-01-29

申请人： Manabu Sato ,  Masami Shimizu ,  Minoru Kase ,  Takaaki Watanabe ,  Jun Kohori

发明人： Manabu Sato ,  Masami Shimizu ,  Minoru Kase ,  Takaaki Watanabe ,  Jun Kohori

IPC分类号： C12N11/00

CPC分类号： C12P7/62 ,  C12N11/08 ,  C12N11/14 ,  C12P7/64

摘要： Provided is a process for preparing an immobilized enzyme, which comprises the steps of immobilizing an enzyme used for decomposing oil & fat on a carrier, by adsorption, without drying, bringing the immobilized enzyme into contact with a fatty acid triglyceride or fatty acid partial glyceride, or mixtures thereof, and adjusting the moisture content of the enzyme to 5% to 50% by weight based on the weight of the carrier, wherein the enzyme is used for esterification.

摘要翻译： 提供一种制备固定化酶的方法，其包括以下步骤：将用于分解油脂的酶固定在载体上，通过吸附而不干燥，使固定化酶与脂肪酸甘油三酯或脂肪酸偏甘油酯接触 ，或其混合物，并且基于载体的重量将酶的水分含量调节至5重量％至50重量％，其中该酶用于酯化。

公开(公告)号：US07883632B2

公开(公告)日：2011-02-08

申请号：US11689065

申请日：2007-03-21

申请人： Masanobu Honda ,  Yutaka Matsui ,  Manabu Sato

发明人： Masanobu Honda ,  Yutaka Matsui ,  Manabu Sato

IPC分类号： G06F19/00 ,  C23C14/32 ,  C23C14/00

CPC分类号： H01J37/32174 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/3255 ,  H01J37/32706 ,  H01J37/32862 ,  H01J37/32926 ,  H01L21/02532 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/67069

摘要： A plasma processing apparatus that enables polymer to be removed from an electrically insulated electrode. A susceptor of the plasma processing apparatus is disposed in a substrate processing chamber having a processing space therein. A radio frequency power source is connected to the susceptor. An upper electrode plate is electrically insulated from a wall of the substrate processing chamber and from the susceptor. A DC power source is connected to the upper electrode plate. A controller of the plasma processing apparatus determines a value of a negative DC voltage to be applied to the upper electrode plate in accordance with processing conditions for RIE processing to be carried out.

摘要翻译： 一种使聚合物能够从电绝缘电极移除的等离子体处理装置。 等离子体处理装置的基座设置在其中具有处理空间的基板处理室中。 射频电源连接到基座。 上电极板与基板处理室的壁和基座电绝缘。 直流电源连接到上电极板。 等离子体处理装置的控制器根据要执行的RIE处理的处理条件确定施加到上电极板的负DC电压的值。

公开(公告)号：US20090057122A1

公开(公告)日：2009-03-05

申请号：US12230128

申请日：2008-08-25

申请人： Manabu Sato

发明人： Manabu Sato

IPC分类号： H01H13/02

CPC分类号： H01H9/04 ,  H01H9/061 ,  H01H13/06 ,  H01H2009/066

摘要： Disclosed a trigger switch having an insulative enclosure, a movable contact element and a sliding control device slidably mounted to the insulative enclosure. The insulative enclosure includes a case and a cover. The case has plural terminal subassemblies made of conductive metal members disposed therein. The case has an opening over which the cover is mounted. A fixed contact mounted on one of the terminal subassemblies in the case. The movable contact element has a movable contact mounted at one end of the movable contact element and located opposite to the fixed contact. The movable contact element is swingably supported on another terminal subassembly. A trigger is mounted at one end of the sliding control device. An auxiliary brush is interposed in the movable contact element. A support member is provided with an opening portion in which the auxiliary brush is engaged such that the brush is swingably supported.

摘要翻译： 公开了具有绝缘外壳的触发开关，可动接触元件和可滑动地安装到绝缘外壳的滑动控制装置。 绝缘外壳包括外壳和盖子。 壳体具有设置在其中的由导电金属构件制成的多个端子组件。 壳体具有盖，盖被安装在该开口上。 安装在壳体中的一个端子子组件上的固定触头。 可动接触元件具有安装在可动触点元件的一端并​​与固定触点相对定位的可动触头。 可动接触元件可摆动地支撑在另一端子子组件上。 触发器安装在滑动控制装置的一端。 辅助刷插入在可动接触元件中。 支撑构件设置有开口部分，其中辅助刷子接合，使得刷子可摆动地支撑。

公开(公告)号：US07452823B2

公开(公告)日：2008-11-18

申请号：US11368421

申请日：2006-03-07

申请人： Manabu Sato

发明人： Manabu Sato

IPC分类号： H01L21/302

CPC分类号： H01L21/31116

摘要： An etching method, for selectively etching a silicon nitride film to a silicon oxide film by using a processing gas in a processing chamber including an electrode therein, includes the steps of mounting a target object having the silicon oxide film and the silicon nitride film onto the electrode and etching the silicon nitride film by introducing a gaseous mixture containing CF4 gas, H2 gas and N2 gas as a processing gas into the processing chamber and applying a high frequency power of 0.20 W/cm2 or less to the electrode while maintaining a pressure in the processing chamber to be equal to or smaller than 4 Pa.

摘要翻译： 通过在其中包括电极的处理室中使用处理气体来选择性地将氮化硅膜蚀刻到氧化硅膜上的蚀刻方法包括以下步骤：将具有氧化硅膜和氮化硅膜的目标物体安装到 电极，并通过将含有CF 4气体，H 2气体和N 2气体的气体混合物作为处理气体引入到氮化硅膜中，从而蚀刻氮化硅膜 处理室，并且向处理室施加0.20W / cm 2以下的高频功率，同时保持处理室内的压力为4Pa以下。

公开(公告)号：US07391852B2

公开(公告)日：2008-06-24

申请号：US11401300

申请日：2006-04-11

申请人： Hidero Anno ,  Koichi Kitade ,  Takayuki Kitami ,  Hironori Nakamuta ,  Manabu Sato

发明人： Hidero Anno ,  Koichi Kitade ,  Takayuki Kitami ,  Hironori Nakamuta ,  Manabu Sato

IPC分类号： H01J35/02

CPC分类号： H01J35/105 ,  H01J2235/168 ,  H05G1/025

摘要： An X-ray apparatus includes a rotation-anode type X-ray tube which is configured such that a rotatable anode target and a cathode that is disposed to be opposed to the anode target are accommodated within a vacuum envelope, a stator which generates an induction electromagnetic field for rotating the anode target, a housing which accommodates and holds at least the rotation-anode type X-ray tube, a circulation path which is provided near at least a part of the rotation-anode type X-ray tube, and through which a water-based coolant is circulated, and a cooling unit including a circulation pump, which is provided at a position along the circulation path and forcibly feeds the water-based coolant, and a radiator which radiates heat of the water-based coolant, wherein at least a part of a surface of a metallic component is coated with a coating member to prevent contacting with the water-based coolant.

摘要翻译： X射线装置包括旋转阳极型X射线管，该旋转阳极型X射线管被配置为使得与阳极靶相对设置的可旋转阳极靶和阴极容纳在真空外壳内，产生感应的定子 用于旋转阳极靶的电磁场，容纳并保持至少旋转阳极型X射线管的壳体，设置在旋转阳极型X射线管的至少一部分附近的循环路径， 水冷却剂循环的冷却单元，以及设置在循环路径的位置并强制供给水基冷却剂的循环泵的冷却单元和散发水基冷却剂的散热器， 其中金属部件的表面的至少一部分涂覆有涂覆部件，以防止与水基冷却剂接触。