公开(公告)号：US20200234995A1

公开(公告)日：2020-07-23

申请号：US16738798

申请日：2020-01-09

申请人： Jagan Rangarajan ,  Edward Golubovsky ,  Shaun Van Der Veen ,  Justin Ho Kuen Wong ,  Steven M. Zuniga

发明人： Jagan Rangarajan ,  Edward Golubovsky ,  Shaun Van Der Veen ,  Justin Ho Kuen Wong ,  Steven M. Zuniga

IPC分类号： H01L21/687 ,  B24B41/06 ,  H01L21/677

摘要： A wafer processing device may include a wafer exchanger including two or more blades, each of the two or more blades may be configured to receive a wafer, the two or more blades may be rotatable about an axis on a single horizontal plane, and the two or more blades may be movable between at least a load cup and a robot access location; wherein the load cup may include a wafer station that is vertically moveable relative a blade located in the load cup and may be configured to remove a wafer from a blade located in the load cup and place a wafer on a blade located in the load cup. Other devices, load cups and methods are also disclosed herein.

公开(公告)号：US08545660B1

公开(公告)日：2013-10-01

申请号：US13424984

申请日：2012-03-20

申请人： Steven M. Zuniga ,  Robert D. Tolles ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Anthony J. Senn ,  Keenan Leon Guerrero

发明人： Steven M. Zuniga ,  Robert D. Tolles ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Anthony J. Senn ,  Keenan Leon Guerrero

IPC分类号： B32B37/00

CPC分类号： B32B37/003 ,  B32B37/10 ,  B32B37/1009 ,  B32B38/004 ,  B32B2309/60 ,  B32B2309/68 ,  B32B2457/14 ,  H01L21/67092 ,  H01L21/67748 ,  H01L21/6875

摘要： A bonding apparatus and method holds first and second bodies peripherally, one above the other, on respective shelves. A lower heat-transfer body is configured to lift the first body from below and press the first and second bodies against an upper heat-transfer body to enable bonding between the first and second bodies.

摘要翻译： 接合装置和方法将第一和第二主体周边地彼此上下放置在相应的搁架上。 下部传热体构造成从下方提升第一体，并且将第一和第二体压靠在上部传热体上，以使第一和第二体之间的粘结。

公开(公告)号：US08360409B2

公开(公告)日：2013-01-29

申请号：US12636328

申请日：2009-12-11

申请人： Steven M. Zuniga ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Keenan Leon Guerrero ,  Harish K. Bolla ,  Aditya Agarwal

发明人： Steven M. Zuniga ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Keenan Leon Guerrero ,  Harish K. Bolla ,  Aditya Agarwal

IPC分类号： B23Q3/00

CPC分类号： H01L21/68728 ,  H01L21/6719 ,  H01L21/68707 ,  H01L21/68764 ,  H01L21/68771

摘要： A system for simultaneously treating multiple workpieces is configured with sites, configured to hold respective workpieces, affixed on a rotatable base. Each site has a shelf accommodating an interior space and may be positioned by base rotation in alignment with a station of fixed location. Each station is equipped with an active component. The active components are movable simultaneously within respective stations into the respective interior spaces of respective aligned sites.

摘要翻译： 用于同时处理多个工件的系统被配置有被固定在可旋转底座上的各个工件的位置。 每个场地具有容纳内部空间的搁架，并且可以通过基座旋转定位成与固定位置的工位对准。 每个车站都配有一个有源组件。 有源部件可以在相应的站内同时移动到各个对准的位置的相应的内部空间中。

公开(公告)号：US20120325395A1

公开(公告)日：2012-12-27

申请号：US13603876

申请日：2012-09-05

申请人： Steven M. Zuniga ,  Thomas H. Osterheld

发明人： Steven M. Zuniga ,  Thomas H. Osterheld

IPC分类号： B32B43/00 ,  B32B37/12

CPC分类号： B24B41/06 ,  B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.

摘要翻译： 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。

公开(公告)号：US08334191B2

公开(公告)日：2012-12-18

申请号：US12636410

申请日：2009-12-11

申请人： Steven M. Zuniga ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Kirk G. Liebscher ,  John M. Alexander ,  Keenan Leon Guerrero

发明人： Steven M. Zuniga ,  Derek G. Aqui ,  Andrew J. Nagengast ,  Kirk G. Liebscher ,  John M. Alexander ,  Keenan Leon Guerrero

IPC分类号： H01L21/30 ,  H01L21/46

CPC分类号： H01L21/67092 ,  H01L21/67766 ,  H01L21/67781 ,  H01L21/68728 ,  H01L21/68771

摘要： A system for treating distinct batches of workpieces to serial procedures comprises first and second multi-site structures. In each multi-site structure the sites are rotatable for alignment in turn with loading and unloading stations together constituting treatment or process stations. Workpieces of a batch are loaded onto all of the treatment sites and then simultaneously and identically treated by operation of treatment stations with which the process sites are aligned. After treatment in the first structure, workpieces of a batch are transferred from the unloading stations of the first structure to the loading stations of the second structure for further processing.

摘要翻译： 用于将不同批次的工件处理为串行程序的系统包括第一和第二多站点结构。 在每个多站点结构中，站点可旋转以依次与装载站和卸载站一起构成处理站或处理站。 将批料的​​工件加载到所有处理部位上，然后通过与处理部位对齐的处理站的操作同时并且相同地处理。 在第一结构中处理之后，批次的工件从第一结构的卸载站传送到第二结构的装载站，用于进一步处理。

公开(公告)号：US08029640B2

公开(公告)日：2011-10-04

申请号：US12427642

申请日：2009-04-21

申请人： Steven M. Zuniga ,  Thomas H. Osterheld

发明人： Steven M. Zuniga ,  Thomas H. Osterheld

IPC分类号： B24B5/00 ,  B24B29/00

CPC分类号： B24B41/06 ,  B24B37/30 ,  B24B37/32

摘要： A carrier head for a chemical mechanical polishing apparatus includes a retaining ring having a flexible lower portion and a rigid upper portion.

摘要翻译： 用于化学机械抛光装置的承载头包括具有柔性下部和刚性上部的保持环。

公开(公告)号：US20110076847A1

公开(公告)日：2011-03-31

申请号：US12891525

申请日：2010-09-27

申请人： Derek Aqui ,  Steven M. Zuniga ,  Venkateswaran Subbaraman ,  Kirk Liebscher ,  John Alexander ,  Zhenhua Zhang ,  Virendra V.S. Rana

发明人： Derek Aqui ,  Steven M. Zuniga ,  Venkateswaran Subbaraman ,  Kirk Liebscher ,  John Alexander ,  Zhenhua Zhang ,  Virendra V.S. Rana

IPC分类号： H01L21/768

CPC分类号： H01L21/67207 ,  C23C14/5813 ,  C23C14/5893 ,  C23C16/56 ,  H01L31/0463 ,  H01L31/186 ,  H01L31/1876 ,  Y02E10/50 ,  Y02P70/521

摘要： An apparatus and method for processing the solar cell substrates is provided. In one embodiment, a laser firing chamber for processing solar cell substrates placed in a carrier, comprising a laser module located at a side of the carrier, the laser module being adapted to generate and direct multiple laser beams over an entire surface of a plurality of solar cell substrates, and a transport adapted to convey the carrier through an outputting region of the laser beams.

摘要翻译： 提供了一种用于处理太阳能电池基板的装置和方法。 在一个实施例中，一种用于处理放置在载体中的太阳能电池基板的激光烧制室，包括位于载体一侧的激光模块，所述激光模块适于在多个 太阳能电池基板和适于通过激光束的输出区域传送载体的传送装置。

公开(公告)号：US06517415B2

公开(公告)日：2003-02-11

申请号：US09989498

申请日：2001-11-19

申请人： Boris Govzman ,  Steven M. Zuniga ,  Hung Chen ,  Sasson Somekh

发明人： Boris Govzman ,  Steven M. Zuniga ,  Hung Chen ,  Sasson Somekh

IPC分类号： B24B4900

CPC分类号： B24B37/30 ,  B24B37/0053

摘要： A carrier head for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member connected to the base to define a chamber. A lower surface of the flexible member provides a substrate receiving surface. The substrate sensing mechanism includes a sensor to measure a pressure in the chamber and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface in response to the output signal.

公开(公告)号：US06422927B1

公开(公告)日：2002-07-23

申请号：US09470820

申请日：1999-12-23

申请人： Steven M. Zuniga

发明人： Steven M. Zuniga

IPC分类号： B24B500

CPC分类号： B24B37/32 ,  B24B37/30 ,  B24B49/16

摘要： A carrier head for a chemical mechanical polishing apparatus a flexible membrane that applies a load to a substrate in a loading area with a controllable size. One pressurizable chamber in the carrier head controls the size of the loading area, and another chamber controls the pressure applied to the substrate in the loading area.

摘要翻译： 一种用于化学机械抛光装置的载体头，该柔性膜在具有可控尺寸的装载区域中对基底施加载荷。 载体头中的一个可加压室控制装载区域的尺寸，另一个室控制在装载区域中施加到基板的压力。

公开(公告)号：US06398621B1

公开(公告)日：2002-06-04

申请号：US09296942

申请日：1999-04-22

申请人： Steven M. Zuniga ,  Ming-Kuei Tseng

发明人： Steven M. Zuniga ,  Ming-Kuei Tseng

IPC分类号： B24B4900

CPC分类号： B24B37/30 ,  B24B37/0053 ,  B24B49/00 ,  H01L21/681

摘要： A carrier head for a chemical mechanical polishing system includes a flexible membrane with a substrate receiving surface, a sensor mechanism to determine if a substrate is properly attached to the carrier head, and means for preventing fluid that may be located between the substrate and the flexible membrane from interfering with the substrate detection mechanism.

摘要翻译： 用于化学机械抛光系统的载体头包括具有基底接收表面的柔性膜，用于确定基底是否适当地附接到载体头的传感器机构，以及用于防止可能位于基底和柔性体之间的流体的装置 膜干扰基板检测机制。