Methods of forming a photovoltaic cell
    6.
    发明授权
    Methods of forming a photovoltaic cell 失效
    形成光伏电池的方法

    公开(公告)号:US07754519B1

    公开(公告)日:2010-07-13

    申请号:US12465351

    申请日:2009-05-13

    IPC分类号: H01L21/00 H01L21/46

    摘要: In some embodiments, a method of forming a photovoltaic cell includes (1) forming a cleave plane in a donor body so as to define a lamina to be bonded to a receiver element and exfoliated from the donor body; (2) prior to bonding, pre-heating the donor body without the receiver element to a temperature of greater than about 200° C. for a first time period that is less than a time period required for exfoliation of the lamina from the donor body; (3) cooling the donor body after pre-heating the donor body; (4) bonding the donor body to the receiver element; and (5) heating the bonded donor body and receiver element for a second time period so as to complete the exfoliation of the lamina from the donor body. Numerous other aspects are provided.

    摘要翻译: 在一些实施方案中,形成光伏电池的方法包括(1)在施主体中形成解理面,以便限定待结合到受体元件并从供体体剥离的层; (2)在接合之前,将没有接收器元件的施主体预热到大于约200℃的温度,所述第一时间段小于从供体体层剥离薄片所需的时间段 ; (3)在对供体进行预热后冷却供体; (4)将供体体接合到接收器元件; 和(5)加热结合的供体体和受体元件第二时间段,以便完成层从供体体的剥离。 提供了许多其他方面。

    Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane
    7.
    发明授权
    Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane 失效
    化学机械抛光垫调节元件,具有离散点和柔顺膜

    公开(公告)号:US06572446B1

    公开(公告)日:2003-06-03

    申请号:US09664603

    申请日:2000-09-18

    IPC分类号: B24B5100

    摘要: A pad conditioning assembly includes a conditioner head with an end effector movable into contact with a polishing pad,a plurality of downwardly-projecting movable conditioning elements disposed at a bottom of the end effector; and a compliant backing member disposed above and adjacent the conditioning elements, wherein forces applied by the compliant backing member are transferred to the movable conditioning elements to move the conditioning elements. In one aspect, a pressurization circuit applies a pressure from a pressure source to the compliant backing member to flex the compliant backing member against the movable conditioning elements.

    摘要翻译: 垫调节组件包括具有可与抛光垫接触的末端执行器的调节头,设置在末端执行器底部的多个向下突出的可移动调节元件; 以及设置在调节元件上方并与其相邻的柔顺背衬构件,其中由柔性背衬构件施加的力被传递到可移动调节元件以移动调节元件。 在一个方面,加压电路将来自压力源的压力施加到柔性背衬构件上,以使柔顺背衬构件抵靠可动调节元件弯曲。

    Carrier head with layer of conformable material for a chemical mechanical polishing system
    8.
    发明授权
    Carrier head with layer of conformable material for a chemical mechanical polishing system 有权
    载体头,具有用于化学机械抛光系统的适合材料层

    公开(公告)号:US06443823B1

    公开(公告)日:2002-09-03

    申请号:US09478123

    申请日:2000-01-05

    IPC分类号: B24B722

    CPC分类号: B24B37/30

    摘要: A carrier head for a chemical mechanical polishing apparatus. A layer of conformable material is disposed in a recess of the carrier head to provide a mounting surface for a substrate. The conformable material may be elastic and undergo normal strain in response to an applied load. The carrier head may also include a support fixture detachably connected to a backing fixture, a retaining ring connected directly to the conformable material, and a shield ring which projects over a portion of the layer of conformable material.

    摘要翻译: 用于化学机械抛光装置的载体头。 一层适形材料设置在承载头的凹槽中以提供用于基底的安装表面。 适形材料可以是弹性的并且响应于所施加的负载而经历正常应变。 承载头还可以包括可拆卸地连接到背衬固定件的支撑固定件,直接连接到适形材料的保持环,以及在适形材料层的一部分上突出的屏蔽环。

    Method and apparatus for removing a substrate from a polishing pad in a
chemical mechanical polishing system
    10.
    发明授权
    Method and apparatus for removing a substrate from a polishing pad in a chemical mechanical polishing system 失效
    用于在化学机械抛光系统中从抛光垫移除基材的方法和装置

    公开(公告)号:US5899801A

    公开(公告)日:1999-05-04

    申请号:US741662

    申请日:1996-10-31

    IPC分类号: B24B37/34 B24B1/00 B24B29/00

    CPC分类号: B24B37/345

    摘要: A chemical mechanical polishing apparatus has a platen with a cavity with an opening to the top surface of the platen. A polishing pad is located at an upper surface of the platen. A flexible membrane is positioned in the cavity to define a first and a second volume. A pressure source is connected to the second volume to flex the membrane, and a lifting member is positioned in the first volume so that flexing of the membrane extends the lifting member through the opening to lift the substrate off the polishing pad. Alternately, de-ionized water may be forced through a passage in the platen and an aperture in the polishing pad to lift the substrate.

    摘要翻译: 化学机械抛光装置具有带有空腔的台板,该空腔具有通向台板顶表面的开口。 抛光垫位于压板的上表面。 柔性膜定位在空腔中以限定第一和第二体积。 压力源连接到第二体积以弯曲膜,并且提升构件定位在第一体积中,使得膜的弯曲使提升构件延伸穿过开口以将衬底提离抛光垫。 或者,去离子水可以被迫通过压板中的通道和抛光垫中的孔以提升衬底。