LEAD FRAME FOR ASSEMBLING SEMICONDUCTOR DEVICE
    82.
    发明申请
    LEAD FRAME FOR ASSEMBLING SEMICONDUCTOR DEVICE 有权
    用于组装半导体器件的引线框架

    公开(公告)号:US20130234306A1

    公开(公告)日:2013-09-12

    申请号:US13605990

    申请日:2012-09-06

    IPC分类号: H01L23/495 H01L21/60

    摘要: A lead frame has a flag, a peripheral frame, and main tie bars coupling the flag to the peripheral frame. At least one cross tie bar extends between two of the main tie bars and an inner row of external connector pads extending from an inner side of the cross tie bar and an outer row of external connector pads extending from an outer side of the cross tie bar. Both an inner non-electrically conductive support bar and an outer non-electrically conductive support bar are attached across the two of the main tie bars. The inner non-electrically conductive support bar is attached to upper surfaces of the two of the main tie bars and to upper surfaces of the inner row of the external connector pads.

    摘要翻译: 引线框架具有标志,外围框架和将标志耦合到外围框架的主连接条。 至少一个交叉连接杆在两个主连接杆之间延伸,以及从交叉连接杆的内侧延伸的内排的外部连接器焊盘以及从交叉连接杆的外侧延伸的外部排的外部连接器焊盘 。 内部非导电支撑杆和外部非导电支撑杆都穿过两个主连接杆。 内部非导电支撑杆附接到两个主连杆的上表面和外部连接器垫的内排的上表面。

    Method and system for providing a magnetic recording transducer including an assist pole having surfaces angled with respect to the ABS
    84.
    发明授权
    Method and system for providing a magnetic recording transducer including an assist pole having surfaces angled with respect to the ABS 有权
    用于提供包括具有相对于ABS成角度的表面的辅助杆的磁记录换能器的方法和系统

    公开(公告)号:US08320076B1

    公开(公告)日:2012-11-27

    申请号:US12147364

    申请日:2008-06-26

    申请人: Yong Shen Zhigang Bai

    发明人: Yong Shen Zhigang Bai

    IPC分类号: G11B5/127 G11B5/147

    摘要: A method and system provide a magnetic transducer that includes an underlayer. The method and system include providing a recessed region in the underlayer. The recessed region includes a front having an angle from horizontal. The angle is greater than zero and less than ninety degrees. The method and system further includes providing an assist pole layer in the recessed region and providing a main pole layer. A portion of the main pole layer resides on the assist pole layer. A main pole is defined from the assist pole layer and the main pole layer.

    摘要翻译: 一种方法和系统提供包括底层的磁换能器。 该方法和系统包括在底层中设置凹陷区域。 凹陷区域包括具有与水平方向成角度的前部。 角度大于零,小于九十度。 该方法和系统还包括在凹陷区域中提供辅助极层并提供主极层。 主极层的一部分位于辅助极层上。 主极由辅助极层和主极层限定。

    Writer shields with modified shapes for reduced flux shunting
    86.
    发明申请
    Writer shields with modified shapes for reduced flux shunting 有权
    作者盾牌具有改进的形状,用于减少通量分流

    公开(公告)号:US20120044598A1

    公开(公告)日:2012-02-23

    申请号:US12806803

    申请日:2010-08-20

    IPC分类号: G11B5/17

    摘要: A perpendicular magnetic recording (PMR) head is fabricated with a configuration of leading edge shields and trailing edge shields that reduce the leakage of flux between the main pole and the shields. The reduction of leakage is achieved by eliminating the sharp 90° corner between the backside surfaces of the shields and the surfaces adjacent to the main pole. In one embodiment the corner is replaced by two successive acute angles, in another embodiment it is replaced by a rounded surface. In a final embodiment, leakage between the pole and trailing edge shield is achieved by shortening the length of the write gap by forming the shield with a double taper.

    摘要翻译: 垂直磁记录(PMR)头被制造成具有前缘屏蔽和后缘屏蔽的结构,其减小主极和屏蔽之间的通量泄漏。 通过消除屏蔽的背面和与主极相邻的表面之间的尖锐的90°角来实现泄漏的减少。 在一个实施例中,角部被两个连续的锐角取代,在另一个实施例中,它被圆形表面所代替。 在最终实施例中,通过用双锥形形成屏蔽来缩短写入间隙的长度来实现极和后缘屏蔽之间的泄漏。

    PMR write with flux choking area
    89.
    发明申请
    PMR write with flux choking area 有权
    PMR写入焊剂阻塞区域

    公开(公告)号:US20110063755A1

    公开(公告)日:2011-03-17

    申请号:US12586249

    申请日:2009-09-17

    IPC分类号: G11B5/10 G11B5/127

    摘要: A PMR writer having a trailing shield structure is disclosed in which a flux choking layer (FCL) formed adjacent to the ABS provides a means to limit the amount of flux flowing from the trailing shield to a first write shield (WS1) near the write pole tip thereby significantly reducing adjacent track erasure. The FCL has a substantially smaller thickness than a top section of the trailing shield to which it is attached along a side opposite the ABS. As a result, pole tip protrusion is reduced compared to prior art PMR writers. The FCL contacts a trailing side of WS1 at the ABS and one or both of the trailing sides of the WS1 and FCL may be tapered or perpendicular with respect to the ABS. The top trailing shield section, FCL, and WS1 may be comprised of NiFe, CoFe, CoFeNi, or alloys thereof.

    摘要翻译: 公开了具有拖尾屏蔽结构的PMR写入器,其中与ABS相邻形成的通量阻塞层(FCL)提供了一种将从后屏蔽流过的磁通量限制在写极附近的第一写屏蔽(WS1)的装置 从而显着地减少相邻轨道擦除。 FCL具有比尾部护罩的顶部部分基本上小的厚度,其沿着与ABS相对的一侧被附接到该顶部部分。 结果,与现有技术的PMR写入器相比,极尖突起减小。 FCL在ABS处接触WS1的后侧,并且WS1和FCL的一个或两个后侧可以相对于ABS呈锥形或垂直。 顶部后屏蔽部分FCL和WS1可以由NiFe,CoFe,CoFeNi或其合金组成。

    Tapered PMR write pole with straight side wall portion
    90.
    发明申请
    Tapered PMR write pole with straight side wall portion 有权
    锥形PMR写柱与直的侧壁部分

    公开(公告)号:US20110051293A1

    公开(公告)日:2011-03-03

    申请号:US12583753

    申请日:2009-08-25

    IPC分类号: G11B5/127

    CPC分类号: G11B5/1278 G11B5/3116

    摘要: A main pole layer with a tapered trailing side is disclosed that has three sections each with a write pole portion along the ABS and a yoke portion. A lower section has a bottom surface including a leading edge at the write pole tip and sidewalls with a bevel angle between 4 and 20 degrees. The middle section has essentially vertical sidewalls with a tapered side starting at the trailing edge and extending to a back side of the write pole and into the yoke. An upper section includes a portion of the tapered side and a top surface of the main pole layer and has a sidewall with a bevel angle from 0 to 45 degrees. The thickness of the middle section is greater than the pole height variation caused by variations in back end processes including ion milling and lapping to reduce erase width (EW) variations.

    摘要翻译: 公开了具有锥形后缘的主极层,其具有三个部分,每个部分具有沿ABS的写极部分和轭部分。 下部具有底表面,该底表面包括位于写入极尖端的前缘和具有4至20度之间的斜角的侧壁。 中间部分具有基本上垂直的侧壁,其具有从后缘开始并延伸到写入极的后侧并进入轭的渐缩侧。 上部包括锥形侧的一部分和主极层的顶表面,并且具有具有0至45度的斜角的侧壁。 中间部分的厚度大于由后端工艺变化引起的极高度变化,包括离子铣削和研磨以减少擦除宽度(EW)变化。