公开(公告)号：US20070177122A1

公开(公告)日：2007-08-02

申请号：US11341894

申请日：2006-01-30

申请人： Erik Loopstra ,  Adrianus Engelen ,  Bernardus Luttikhuis ,  Maria Rubingh ,  Johannes Hazenberg ,  Laurentius Jorritsma ,  Johannes Klerk ,  Bernhard Geuppert ,  Aart Van Beuzekom ,  Petrus Franciscus Mandigers ,  Franz Sorg ,  Peter Deufel

发明人： Erik Loopstra ,  Adrianus Engelen ,  Bernardus Luttikhuis ,  Maria Rubingh ,  Johannes Hazenberg ,  Laurentius Jorritsma ,  Johannes Klerk ,  Bernhard Geuppert ,  Aart Van Beuzekom ,  Petrus Franciscus Mandigers ,  Franz Sorg ,  Peter Deufel

IPC分类号： G03B27/54

CPC分类号： G03F7/70308 ,  G03F7/70825 ,  G03F7/70933

摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。

公开(公告)号：US20070114655A1

公开(公告)日：2007-05-24

申请号：US11281901

申请日：2005-11-18

申请人： Sven Antoin Johan Hol ,  Angelo Cesar De Klerk ,  Erik Loopstra ,  Fransicus Jacobs ,  Mark Scholten

发明人： Sven Antoin Johan Hol ,  Angelo Cesar De Klerk ,  Erik Loopstra ,  Fransicus Jacobs ,  Mark Scholten

IPC分类号： H01L23/34

CPC分类号： G03F7/70875 ,  F28D11/02 ,  G03F7/70758 ,  H02K9/22 ,  H02N13/00

摘要： A cooling apparatus is disclosed that has a first cooling structure, in thermal contact with a heat source having a temperature greater than a cool structure, comprising a channel through which a cooling fluid is passed, an isolator between the heat source and the cool structure, the isolator in thermal contact with the first cooling structure and comprising a material of low thermal conductivity, and a second cooling structure between the isolator and the cool structure, the second cooling structure comprising a channel through which cooling fluid is passed.

摘要翻译： 公开了一种冷却装置，其具有与具有大于冷结构的温度的热源热接触的第一冷却结构，包括冷却流体通过的通道，在热源和冷结构之间的隔离器， 所述隔离器与所述第一冷却结构热接触并且包括低导热性的材料，以及在所述隔离器和所述冷结构之间的第二冷却结构，所述第二冷却结构包括冷却流体通过的通道。

公开(公告)号：US20070108848A1

公开(公告)日：2007-05-17

申请号：US11273634

申请日：2005-11-15

申请人： Sven Hol ,  Angelo De Klerk ,  Erik Loopstra ,  Fransicus Jacobs ,  Mark Scholten ,  Arjan Bakker

发明人： Sven Hol ,  Angelo De Klerk ,  Erik Loopstra ,  Fransicus Jacobs ,  Mark Scholten ,  Arjan Bakker

IPC分类号： H02K41/00 ,  G03B27/42

CPC分类号： H02K41/03 ,  G03F7/70758 ,  H02K2201/18

摘要： A motor includes a magnet assembly to generate a magnetic field. The field includes along the first direction parts which are alternately orientated in the first and the second direction. The parts extend in a third direction which is perpendicular to the first and the second direction. The motor further includes a first coil winding to carry a first current. The first coil winding to extend in the first direction between parts of the magnetic field orientated in the second direction, to generate the force in the first direction. The motor also includes a second coil winding to carry a second current. The second coil winding to extend in the first direction between parts of the magnetic field substantially orientated in the first direction, to generate the force in the second direction.

摘要翻译： 电动机包括用于产生磁场的磁体组件。 该场包括沿着第一方向的部分，其沿第一方向和第二方向交替取向。 这些部件在垂直于第一和第二方向的第三方向上延伸。 电动机还包括用于承载第一电流的第一线圈绕组。 所述第一线圈绕组在所述磁场的部分之间沿所述第一方向在所述第二方向上定向，以在所述第一方向上产生力。 电动机还包括用于承载第二电流的第二线圈绕组。 所述第二线圈绕组在所述磁场的各部分之间沿所述第一方向沿所述第一方向大致取向，以在所述第二方向上产生所述力。

公开(公告)号：US20070076184A1

公开(公告)日：2007-04-05

申请号：US10595469

申请日：2003-12-18

申请人： Yim-Bun Kwan ,  Erik Loopstra

发明人： Yim-Bun Kwan ,  Erik Loopstra

IPC分类号： G03B27/54

CPC分类号： G03F7/70258 ,  G02B5/005 ,  G02B13/143 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

摘要： The invention relates to an optical assembly (1) having a plurality of optical elements (2), at least one optical element (2, 2″) being connected to a structure (5) dynamically decoupled from the optical assembly (1), as a result of which it is substantially dynamically decoupled from the remaining optical elements (2) and the optical assembly (1).

摘要翻译： 本发明涉及一种具有多个光学元件（2）的光学组件（1），至少一个与光学组件（1）动态分离的结构（5）连接的光学元件（2,2“）， 其结果是与剩余的光学元件（2）和光学组件（1）基本上动态地分离。

公开(公告)号：US20070070315A1

公开(公告)日：2007-03-29

申请号：US11454129

申请日：2006-06-16

申请人： Johannes Jacobs ,  Igor Bouchoms ,  Nicolaas Kate ,  Nicolaas Kemper ,  Martinus Leenders ,  Erik Loopstra ,  Joost Ottens ,  Martinus Verhagen ,  Yucel Kok ,  Johannes Van Es ,  Herman Boom ,  Franciscus Janssen

发明人： Johannes Jacobs ,  Igor Bouchoms ,  Nicolaas Kate ,  Nicolaas Kemper ,  Martinus Leenders ,  Erik Loopstra ,  Joost Ottens ,  Martinus Verhagen ,  Yucel Kok ,  Johannes Van Es ,  Herman Boom ,  Franciscus Janssen

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

摘要翻译： 使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。 从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

公开(公告)号：US20060227308A1

公开(公告)日：2006-10-12

申请号：US11135655

申请日：2005-05-24

申请人： Marinus Brink ,  Jozef Benschop ,  Erik Loopstra

发明人： Marinus Brink ,  Jozef Benschop ,  Erik Loopstra

IPC分类号： G03B27/42

CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/70725

摘要： The invention relates to a dual stage lithographic apparatus, wherein to substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement for bringing the lithographic apparatus from a first situation, wherein immersion liquid is confined between a first substrate held by the first stage of the said stages and a final element of a projection system of the apparatus, towards a second situation, wherein the said liquid is confined between a second substrate held by the second stage of the two stages and the final element, such that during the joint scan movement the liquid is essentially confined within said space with respect to the final element.

摘要翻译： 本发明涉及一种双级光刻设备，其中基片台被构造和布置为相互协作，以便执行从第一种情况进行光刻设备的联合扫描运动，其中浸没液体被限制在由 所述阶段的第一阶段和装置的投影系统的最终元件朝向第二情况，其中所述液体被限制在由两级的第二级保持的第二基板和最终元件之间，使得 在联合扫描运动期间，液体基本上被限制在相对于最终元件的所述空间内。

公开(公告)号：US07119883B2

公开(公告)日：2006-10-10

申请号：US10962550

申请日：2004-10-13

申请人： Stephen Roux ,  Erik Loopstra ,  Michael L. Nelson

发明人： Stephen Roux ,  Erik Loopstra ,  Michael L. Nelson

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70558 ,  G03F7/70066

摘要： An apparatus for changing an aggregate intensity of a light within an illumination field of a photolithography system having a blade structure and a first actuator. The blade structure is configured to be positioned along an optical path of the photolithography system between an illumination system and a reticle stage so that, when the illumination system provides the light having the illumination field, the blade structure is substantially at a center of the illumination field and a first portion of the light within the illumination field impinges upon the blade structure. The first actuator is coupled between a first portion of the blade structure and a frame of the photolithography system and is configured to move at least the first portion of the blade structure in a first direction so that a second portion of the light within the illumination field impinges upon the blade structure.

摘要翻译： 一种用于改变具有叶片结构和第一致动器的光刻系统的照明场中的光的聚集强度的装置。 叶片结构被构造成沿着光刻系统的光路在照明系统和标线镜台之间定位，使得当照明系统提供具有照明场的光时，叶片结构基本上处于照明的中心 并且照明场内的光的第一部分撞击在叶片结构上。 第一致动器耦合在叶片结构的第一部分和光刻系统的框架之间，并且被配置成沿着第一方向移动至少第一部分叶片结构，使得第一部分的光在照明区域内 撞击在叶片结构上。

公开(公告)号：US20060196377A1

公开(公告)日：2006-09-07

申请号：US11072686

申请日：2005-03-07

申请人： Erik Loopstra ,  Aleksey Kolesnychenko ,  Helmar Santen

发明人： Erik Loopstra ,  Aleksey Kolesnychenko ,  Helmar Santen

IPC分类号： B41F33/00

CPC分类号： G03F7/0002 ,  B41M3/003 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.

摘要翻译： 公开了一种压印方法，其包括在一个实施例中，将可流动状态的可压印介质的体积重新分布在衬底的表面的目标部分上的不同体积的区域对应于不同图案密度的区域 模板，在可流动状态下与模板接触以在培养基中形成压印图案，使培养基经受条件以将培养基改变为基本上不可流动的状态，并将模板与培养基分离，同时基本上 不可流动状态。

公开(公告)号：US20060144274A1

公开(公告)日：2006-07-06

申请号：US11025600

申请日：2004-12-30

申请人： Aleksey Kolesnychenko ,  Helmar Santen ,  Yvonne Kruijt-Stegeman ,  Erik Loopstra

发明人： Aleksey Kolesnychenko ,  Helmar Santen ,  Yvonne Kruijt-Stegeman ,  Erik Loopstra

IPC分类号： B41F33/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprinting method is disclosed, in which an embodiment involves subjecting an imprintable medium on a substrate to conditions such that the medium is at a first temperature so that it is in a flowable state, the imprintable medium comprising an imprint material selected from a group consisting of: a crystalline material and a polycrystalline material, pressing a template into the medium to form an imprint in the medium, cooling the medium to a second temperature such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while in the substantially non-flowable state.

摘要翻译： 公开了一种压印方法，其中一个实施例涉及使基材上的可压印介质经受使得介质处于第一温度使其处于可流动状态的状态，所述可压印介质包括压印材料，所述压印材料选自 的结晶材料和多晶材料，将模板压入介质以在介质中形成印迹，将介质冷却至第二温度，使得介质处于基本上不可流动状态，同时介质与 模板，并且在基本上不可流动的状态下将模板与介质分离。

公开(公告)号：US20060126036A1

公开(公告)日：2006-06-15

申请号：US11007580

申请日：2004-12-09

申请人： Alexander Kremer ,  Marcel Mathijs Marie Dierichs ,  Erik Loopstra

发明人： Alexander Kremer ,  Marcel Mathijs Marie Dierichs ,  Erik Loopstra

IPC分类号： G03B27/52

CPC分类号： G03F7/70083 ,  G03F7/70066 ,  G03F7/70558

摘要： A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit and a chamber containing a fluid wherein said movable blades are at least partly immersed in said fluid, and wherein the difference between the refractive index of each blade and the refractive index of said fluid is sufficiently small to prevent significant reflection and refraction at the surface of each blade.

摘要翻译： 一种用于改善具有两个长边和两个短边的矩形照明狭缝中的辐射分布的均匀性的均匀性校正模块，包括沿着照明狭缝的每个长边布置的多个可动刀片和包含流体的腔室，其中所述可移动 叶片至少部分地浸没在所述流体中，并且其中每个叶片的折射率与所述流体的折射率之间的差异足够小以防止在每个叶片的表面处的显着的反射和折射。