公开(公告)号：US07029727B1

公开(公告)日：2006-04-18

申请号：US09696220

申请日：2000-10-26

申请人： Masafumi Kokura ,  Yoshiharu Kataoka ,  Takayuki Shimada

发明人： Masafumi Kokura ,  Yoshiharu Kataoka ,  Takayuki Shimada

IPC分类号： C09K19/00 ,  G02F1/133 ,  G02F1/136

CPC分类号： G02F1/13439 ,  G02F1/136286 ,  G02F2001/13629 ,  G02F2001/136295 ,  G02F2201/07 ,  G02F2202/28 ,  G02F2203/02 ,  H01L27/12 ,  H01L27/124 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1064 ,  Y10T428/1086 ,  Y10T428/1095 ,  Y10T428/31678

摘要： A thin film transistor (TFT) is formed on an insulating substrate, and a photosensitive resin film as an interlayer insulating film is formed so as to cover the TFT. Contact holes are formed in the photosensitive resin, and smooth concave and convex portions are provided on an upper surface of the resin. A film including molybdenum nitride (MoN) and a reflective pixel electrode film are successively laminated on the photosensitive resin. The nitrogen content in the MoN film may be between 5 atomic % and 30 atomic % inclusive.

摘要翻译： 在绝缘基板上形成薄膜晶体管（TFT），形成作为层间绝缘膜的感光性树脂膜，以覆盖TFT。 在感光性树脂中形成有接触孔，在树脂的上表面设置有平滑的凹凸部。 在感光性树脂上依次层叠包含氮化钼（MoN）和反射像素电极膜的膜。 MoN膜中的氮含量可以在5原子％至30原子％之间。

公开(公告)号：US20050255622A1

公开(公告)日：2005-11-17

申请号：US10511427

申请日：2003-04-14

申请人： Masafumi Kokura ,  Yoshiharu Kataoka

发明人： Masafumi Kokura ,  Yoshiharu Kataoka

IPC分类号： G02F1/1362 ,  H01L21/336 ,  H01L29/45 ,  H01L21/00 ,  H01L21/44 ,  H01L21/84

CPC分类号： H01L29/66765 ,  G02F1/136227 ,  G02F2001/13629 ,  H01L29/458

摘要： The substrate (10) of the present invention includes: a first electrode (26) and a second electrode (30). The second electrode (30) is formed on an insulation film (52) covering at least a part of the first electrode (26) and electrically connected with the first electrode (26) through a contact hole (50) formed in the insulation film (52). The first electrode (26) includes a laminated structure of a metal film (42) and a protective film (44). An etching rate of the metal film (42) is almost equal to an etching rate of the protective film (44) with respect to a first etching for forming the metal film (42) and the protective film (44). An etching rate of the protective film (44) is almost zero with respect to a second etching for forming the contact hole (50).

摘要翻译： 本发明的基板（10）包括：第一电极（26）和第二电极（30）。 第二电极（30）形成在覆盖第一电极（26）的至少一部分的绝缘膜（52）上，并且通过形成在绝缘膜（26）中的接触孔（50）与第一电极 52）。 第一电极（26）包括金属膜（42）和保护膜（44）的叠层结构。 相对于用于形成金属膜（42）和保护膜（44）的第一蚀刻，金属膜（42）的蚀刻速率几乎等于保护膜（44）的蚀刻速率。 相对于用于形成接触孔（50）的第二蚀刻，保护膜（44）的蚀刻速率几乎为零。

公开(公告)号：US20050190322A1

公开(公告)日：2005-09-01

申请号：US11063607

申请日：2005-02-24

申请人： Satoshi Okabe ,  Taketo Maruyama ,  Masafumi Kokura ,  Yoshiharu Kataoka

发明人： Satoshi Okabe ,  Taketo Maruyama ,  Masafumi Kokura ,  Yoshiharu Kataoka

IPC分类号： C23F1/20 ,  C23F1/26 ,  G02F1/1335 ,  G02F1/1343

CPC分类号： C23F1/20 ,  C23F1/26 ,  G02F1/133555 ,  G02F1/13439

摘要： The etching composition of the invention is capable of simultaneously etching the films of a three-layered laminate film comprising an uppermost amorphous transparent electrode film made of IZO, etc., an intermediate reflective electrode film made of Al, etc. and a lowermost galvanic corrosion-inhibiting film made of Mo, etc. or a two-layered laminate film comprising an upper amorphous transparent electrode film and a lower reflective electrode film by a sole use thereof in a single etching operation to provide an etched laminate film having an edge of a good normal-tapered or stepwise shape. The etching composition comprises an aqueous water containing 30 to 40% by weight of phosphoric acid, 15 to 35% by weight of nitric acid, an organic acid and a cation-generating component.

摘要翻译： 本发明的蚀刻组合物能够同时蚀刻由IZO等制成的最上层的非晶质透明电极膜，由Al等制成的中间反射电极膜和最低电化学腐蚀的三层叠层膜 由Mo等制成的薄膜等，或者在单次蚀刻操作中通过其唯一的用途将包含上部非晶形透明电极膜和下部反射电极膜的两层叠层膜提供给具有边缘的蚀刻层叠膜 良好的正锥形或逐步形状。 蚀刻组合物包含含有30〜40重量％的磷酸，15〜35重量％的硝酸，有机酸和产生阳离子的成分的含水水。

公开(公告)号：US06876435B2

公开(公告)日：2005-04-05

申请号：US10127765

申请日：2002-04-23

申请人： Yoshiharu Kataoka ,  Tai Hoshi

发明人： Yoshiharu Kataoka ,  Tai Hoshi

IPC分类号： G01B11/00 ,  G01B11/26 ,  G01B21/00 ,  G01B21/02 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F9/7084 ,  G03F7/70458 ,  G03F9/7026 ,  G03F9/7034

摘要： In an exposure system, a predetermined wafer (5) is exposed with the first exposure layout by using a projection optical system (4) for projecting the pattern of a reticle (2) onto the wafer, an illumination device (10) and light-receiving device (11) for detecting a plurality of plane positions on the wafer (5), and a driving unit for driving the wafer (5) along the optical axis of the projection optical system (4). Prior to the second exposure with the second exposure layout at the second exposure field size, a position where a plane position is to be detected is determined on the basis of at least one of the first exposure field size, the first exposure layout, and underlayer information of the first exposure. Then, the plane position is detected.

摘要翻译： 在曝光系统中，通过使用用于将标线片（2）的图案投影到晶片上的投影光学系统（4），通过第一曝光布局来曝光预定晶片（5），照明装置（10） 用于检测晶片（5）上的多个平面位置的接收装置（11）;以及用于沿着投影光学系统（4）的光轴驱动晶片（5）的驱动单元。 在第二曝光场尺寸的第二曝光布局进行第二曝光之前，根据第一曝光场尺寸，第一曝光布局和底层中的至少一个来确定要检测平面位置的位置 第一次曝光的信息。 然后，检测平面位置。

公开(公告)号：US06091470A

公开(公告)日：2000-07-18

申请号：US926574

申请日：1997-09-04

申请人： Takashi Fujikawa ,  Yoshiharu Kataoka

发明人： Takashi Fujikawa ,  Yoshiharu Kataoka

IPC分类号： G02F1/136 ,  G02F1/1362 ,  G02F1/1368 ,  G02F1/1333

CPC分类号： G02F1/136227

摘要： An active-matrix substrate includes: two kinds of lines arranged in a matrix on an insulating plate; switching elements each provided in the vicinity of an intersection of the two kinds of lines; an insulating film for flattening, covering an entire surface of the insulating plate so as to flatten the uneven surface of the insulating plate due to the presence of the lines and the switching elements; and pixel electrodes provided in a matrix on the insulating film for flattening. A concave portion for preventing a short-circuit from occurring between the pixel electrodes during a production process is formed in a region of the insulating film for flattening which corresponds to a gap between pixel electrodes which are adjacent to each other. Also, a method for fabricating the active-matrix substrate includes the step of forming a concave portion for preventing a short-circuit from occurring between the pixel electrodes in an exposed portion of the insulating film for flattening at a gap between the pixel electrodes adjacent to each other, forming the concave portion by an ashing treatment after forming the pixel electrodes in a matrix.

摘要翻译： 有源矩阵基板包括：在绝缘板上以矩阵布置的两种线; 各个设置在两条线路的交点附近的开关元件; 用于平坦化的绝缘膜，覆盖绝缘板的整个表面，以便由于线和开关元件的存在而使绝缘板的不平坦表面变平; 以及设置在绝缘膜上的矩阵中的像素电极用于平坦化。 在用于平坦化的绝缘膜的与彼此相邻的像素电极之间的间隙对应的区域中形成用于防止在制造工艺期间在像素电极之间发生短路的凹部。 此外，制造有源矩阵基板的方法包括形成用于防止在绝缘膜的暴露部分中的像素电极之间发生短路的凹部的步骤，用于在邻近的像素电极之间的间隙处变平 彼此形成像素电极之后通过灰化处理形成凹部。

公开(公告)号：US6042926A

公开(公告)日：2000-03-28

申请号：US672548

申请日：1996-06-28

申请人： Keiichi Tanaka ,  Yoshiharu Kataoka ,  Masaya Okamoto ,  Mikio Katayama

发明人： Keiichi Tanaka ,  Yoshiharu Kataoka ,  Masaya Okamoto ,  Mikio Katayama

IPC分类号： G02F1/1333 ,  B32B17/10 ,  B82B1/00 ,  C03C17/00 ,  C03C17/09 ,  C03C19/00 ,  B05D3/12 ,  B32B3/30

CPC分类号： B32B17/10981 ,  B32B17/10018 ,  C03C17/001 ,  C03C17/09 ,  C03C19/00 ,  C03C2218/31 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/24521 ,  Y10T428/2495

摘要： In a glass substrate and thin film combination, the glass substrate has a surface which is at least partially non-smooth, and the thin film is provided on the glass substrate in contact with the non-smooth part of the surface. Such a glass substrate and thin film combination is produced by forming a non-smooth part on at least a part of a surface of a glass substrate; and depositing a thin film on the glass substrate so as to be in contact with the non-smooth part.

摘要翻译： 在玻璃基板和薄膜组合中，玻璃基板具有至少部分不光滑的表面，并且薄膜设置在与表面的非光滑部分接触的玻璃基板上。 通过在玻璃基板的表面的至少一部分上形成非平滑部分来制造这种玻璃基板和薄膜组合体; 以及在所述玻璃基板上沉积薄膜以与所述非平滑部分接触。

公开(公告)号：US5852485A

公开(公告)日：1998-12-22

申请号：US806928

申请日：1997-02-26

申请人： Yoshinori Shimada ,  Tetsuro Koyama ,  Hirohiko Nishiki ,  Yoshiharu Kataoka

发明人： Yoshinori Shimada ,  Tetsuro Koyama ,  Hirohiko Nishiki ,  Yoshiharu Kataoka

IPC分类号： G02F1/1343 ,  G02F1/1368

CPC分类号： G02F1/134363 ,  G02F1/1368

摘要： A liquid crystal display device includes an active-matrix substrate; a counter substrate; and a liquid crystal layer interposed between the active-matrix substrate and the counter substrate. The active-matrix substrate includes a plate; gate lines provided on the plate; a gate insulation layer provided on the plate; source lines provided on the gate insulation layer and Refining picture element areas together with the gate lines; switching elements provided at intersections of gate lines and the source lines, the switching elements each including a source electrode and a drain electrode as well as a gate electrode, connecting electrodes each connected to the drain electrode; an interlayer insulation layer provided on the gate insulation layers covering the gate lines, the source lines, and the switching elements; and picture element electrodes and counter electrodes provided on the interlayer insulation layer for driving liquid crystal molecules in the liquid crystal layer. The picture element electrodes are provided in a first direction of the picture element areas, and the counter electrodes are provided in the first direction of the picture element areas and extending over picture element areas.

摘要翻译： 液晶显示装置包括有源矩阵基板; 相对基板; 以及介于有源矩阵基板和对置基板之间的液晶层。 有源矩阵基板包括板; 设在板上的栅极线; 设置在所述板上的栅极绝缘层; 源极线设置在栅极绝缘层上，并与栅极线一起精细化像素区域; 提供在栅极线和源极线的交叉点处的开关元件，每个开关元件包括源电极和漏电极以及栅电极，每个连接到漏电极的连接电极; 设置在覆盖栅极线，源极线和开关元件的栅极绝缘层上的层间绝缘层; 以及设置在用于驱动液晶层中的液晶分子的层间绝缘层上的像素电极和对电极。 像素电极设置在像素区域的第一方向上，并且对置电极设置在像素区域的第一方向上并在像素区域上延伸。

公开(公告)号：US5361122A

公开(公告)日：1994-11-01

申请号：US11097

申请日：1993-01-29

申请人： Yoshiharu Kataoka ,  Akiyoshi Suzuki ,  Yuichi Yamada

发明人： Yoshiharu Kataoka ,  Akiyoshi Suzuki ,  Yuichi Yamada

IPC分类号： G03F7/207 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F9/7026

摘要： A focusing method is disclosed wherein a substrate is moved substantially along a focal plane of a projection optical system up to a predetermined station adjacent to the focal plane of the projection optical system and then, at the predetermined station, the surface of the substrate is brought into substantial coincidence with the focal plane of the projection optical system. The method includes the steps of detecting a deviation of the surface of the substrate with respect to the focal plane of the projection optical system, before the substrate, being moved substantially along the focal plane of the projection optical system, is moved up to the predetermined station; and substantially correcting the deviation on the basis of the detection.

摘要翻译： 公开了一种聚焦方法，其中基板沿着投影光学系统的焦平面移动直到与投影光学系统的焦平面相邻的预定台，然后在预定的位置，使基板的表面 与投影光学系统的焦平面大致一致。 该方法包括以下步骤：在基板沿着投影光学系统的焦平面移动之前，检测基板相对于投影光学系统的焦平面的表面的偏差， 站; 并且基于检测基本上校正偏差。