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公开(公告)号：US07029727B1
公开(公告)日：2006-04-18
申请号：US09696220
申请日：2000-10-26
CPC分类号： G02F1/13439 , G02F1/136286 , G02F2001/13629 , G02F2001/136295 , G02F2201/07 , G02F2202/28 , G02F2203/02 , H01L27/12 , H01L27/124 , Y10T428/10 , Y10T428/1059 , Y10T428/1064 , Y10T428/1086 , Y10T428/1095 , Y10T428/31678
摘要： A thin film transistor (TFT) is formed on an insulating substrate, and a photosensitive resin film as an interlayer insulating film is formed so as to cover the TFT. Contact holes are formed in the photosensitive resin, and smooth concave and convex portions are provided on an upper surface of the resin. A film including molybdenum nitride (MoN) and a reflective pixel electrode film are successively laminated on the photosensitive resin. The nitrogen content in the MoN film may be between 5 atomic % and 30 atomic % inclusive.
摘要翻译： 在绝缘基板上形成薄膜晶体管（TFT），形成作为层间绝缘膜的感光性树脂膜，以覆盖TFT。 在感光性树脂中形成有接触孔，在树脂的上表面设置有平滑的凹凸部。 在感光性树脂上依次层叠包含氮化钼（MoN）和反射像素电极膜的膜。 MoN膜中的氮含量可以在5原子％至30原子％之间。
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2.发明授权Metal material and its manufacturing method, thin-film device and its manufacturing method, element-side substrate and its manufacturing method, and liquid crystal display and its manufacturing method 失效金属材料及其制造方法，薄膜器件及其制造方法，元件侧基板及其制造方法以及液晶显示器及其制造方法公开(公告)号：US08125595B2
公开(公告)日：2012-02-28
申请号：US11908043
申请日：2006-02-23
IPC分类号： G02F1/1343
CPC分类号： G02F1/13439 , C23F4/00 , G02B5/0808 , G02F1/133555 , H01L27/124 , H01L29/458 , H01L29/66765 , Y10T428/12493
摘要： A difference of work functions in different metal thin films is suppressed without causing the increase of the manufacturing steps or the decrease of the optical performance. In a semi-transmissive reflective liquid crystal display apparatus 1 including a reflective electrode 62 and a transmissive electrode 63 in the pixel electrode 64, the surface of the reflective electrode 62 is subject to a plasma treatment, so that the work function of the reflective electrode 62 is controlled by changing by a value of 0.1 eV from the original value. Thus, it is possible to place the work function of the reflective electrode 62 within a difference of ±0.2 eV with respect to the work function of the transmissive electrode 63. As a result, a number of the manufacturing steps is not increased or no optical performance is decreased, unlike conventional liquid crystal display apparatuses. Even if the optimum direct current offset voltage is applied to one of the reflective electrode 62 and the transmissive electrode 63, it is possible to reduce the deterioration of an image display quality resulting from the difference with the optimum direct current offset voltage for the other electrode. As such, it is possible to improve the display quality of the liquid crystal display apparatus 1.
摘要翻译： 抑制不同的金属薄膜的功函数差，而不会导致制造步骤的增加或光学性能的降低。 在像素电极64中包括反射电极62和透射电极63的半透射反射型液晶显示装置1中，对反射电极62的表面进行等离子体处理，使得反射电极的功函数 62通过从原始值改变0.1eV的值来控制。 因此，可以将反射电极62的功函数相对于透射电极63的功函数设定在±0.2eV的差值内。结果，制造步骤的数量不增加或没有光学 与传统的液晶显示装置不同，性能下降。 即使将最佳的直流偏移电压施加到反射电极62和透射电极63中的一个，也可以减少由与另一个电极的最佳直流偏移电压的差异导致的图像显示质量的劣化 。 因此，可以提高液晶显示装置1的显示质量。
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3.发明申请公开(公告)号：US20100033670A1
公开(公告)日：2010-02-11
申请号：US11908043
申请日：2006-02-23
CPC分类号： G02F1/13439 , C23F4/00 , G02B5/0808 , G02F1/133555 , H01L27/124 , H01L29/458 , H01L29/66765 , Y10T428/12493
摘要： A difference of work functions in different metal thin films is suppressed without causing the increase of the manufacturing steps or the decrease of the optical performance. In a semi-transmissive reflective liquid crystal display apparatus 1 including a reflective electrode 62 and a transmissive electrode 63 in the pixel electrode 64, the surface of the reflective electrode 62 is subject to a plasma treatment, so that the work function of the reflective electrode 62 is controlled by changing by a value of 0.1 eV from the original value. Thus, it is possible to place the work function of the reflective electrode 62 within a difference of ±0.2 eV with respect to the work function of the transmissive electrode 63. As a result, a number of the manufacturing steps is not increased or no optical performance is decreased, unlike conventional liquid crystal display apparatuses. Even if the optimum direct current offset voltage is applied to one of the reflective electrode 62 and the transmissive electrode 63, it is possible to reduce the deterioration of an image display quality resulting from the difference with the optimum direct current offset voltage for the other electrode. As such, it is possible to improve the display quality of the liquid crystal display apparatus 1.
摘要翻译： 抑制不同的金属薄膜的功函数差，而不会导致制造步骤的增加或光学性能的降低。 在像素电极64中包括反射电极62和透射电极63的半透射反射型液晶显示装置1中，对反射电极62的表面进行等离子体处理，使得反射电极的功函数 62通过从原始值改变0.1eV的值来控制。 因此，可以将反射电极62的功函数相对于透射电极63的功函数设定在±0.2eV的差值内。结果，制造步骤的数量不增加或没有光学 与传统的液晶显示装置不同，性能下降。 即使将最佳的直流偏移电压施加到反射电极62和透射电极63中的一个，也可以减少由与另一个电极的最佳直流偏移电压的差异导致的图像显示质量的劣化 。 因此，可以提高液晶显示装置1的显示质量。
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4.发明授权Substrate, liquid crystal display having the substrate, and method for producing substrate 有权基板，具有该基板的液晶显示器及其制造方法公开(公告)号：US07476936B2
公开(公告)日：2009-01-13
申请号：US10511427
申请日：2003-04-14
申请人： Masafumi Kokura , Yoshiharu Kataoka
发明人： Masafumi Kokura , Yoshiharu Kataoka
IPC分类号： H01L27/12
CPC分类号： H01L29/66765 , G02F1/136227 , G02F2001/13629 , H01L29/458
摘要： The substrate (10) of the present invention includes: a first electrode (26) and a second electrode (30). The second electrode (30) is formed on an insulation film (52) covering at least a part of the first electrode (26) and electrically connected with the first electrode (26) through a contact hole (50) formed in the insulation film (52). The first electrode (26) includes a laminated structure of a metal film (42) and a protective film (44). An etching rate of the metal film (42) is almost equal to an etching rate of the protective film (44) with respect to a first etching for forming the metal film (42) and the protective film (44). An etching rate of the protective film (44) is almost zero with respect to a second etching for forming the contact hole (50).
摘要翻译： 本发明的基板（10）包括：第一电极（26）和第二电极（30）。 第二电极（30）形成在覆盖第一电极（26）的至少一部分的绝缘膜（52）上，并通过形成在绝缘膜（26）中的接触孔（50）与第一电极 52）。 第一电极（26）包括金属膜（42）和保护膜（44）的叠层结构。 相对于用于形成金属膜（42）和保护膜（44）的第一蚀刻，金属膜（42）的蚀刻速率几乎等于保护膜（44）的蚀刻速率。 相对于用于形成接触孔（50）的第二蚀刻，保护膜（44）的蚀刻速率几乎为零。
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5.发明授权Electrode substrate, method for producing the same, and display device including the same 有权电极基板及其制造方法以及包括该电极基板的显示装置公开(公告)号：US06568978B2
公开(公告)日：2003-05-27
申请号：US09814168
申请日：2001-03-22
IPC分类号： H01L21443
CPC分类号： G02F1/13439
摘要： A method for producing an electrode substrate, having an organic insulating region formed of an organic insulating material and an inorganic insulating region formed of an inorganic insulating material on an identical side thereof, includes the steps of performing a plasma treatment of the organic insulating region; forming a first transparent conductive layer in contact with the organic insulating region and a second transparent conductive layer in contact with the inorganic insulating region; and etching the first transparent conductive layer and the second transparent conductive layer in the same step.
摘要翻译： 一种具有由有机绝缘材料形成的有机绝缘区域和在其同一侧由无机绝缘材料形成的无机绝缘区域的电极基板的制造方法，包括以下步骤：对有机绝缘区域进行等离子体处理; 形成与有机绝缘区域接触的第一透明导电层和与无机绝缘区域接触的第二透明导电层; 并在同一步骤中蚀刻第一透明导电层和第二透明导电层。
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6.发明申请Substrate, liquid crystal display having the substrate, and method for producing substrate 有权基板，具有该基板的液晶显示器及其制造方法公开(公告)号：US20050255622A1
公开(公告)日：2005-11-17
申请号：US10511427
申请日：2003-04-14
申请人： Masafumi Kokura , Yoshiharu Kataoka
发明人： Masafumi Kokura , Yoshiharu Kataoka
IPC分类号： G02F1/1362 , H01L21/336 , H01L29/45 , H01L21/00 , H01L21/44 , H01L21/84
CPC分类号： H01L29/66765 , G02F1/136227 , G02F2001/13629 , H01L29/458
摘要： The substrate (10) of the present invention includes: a first electrode (26) and a second electrode (30). The second electrode (30) is formed on an insulation film (52) covering at least a part of the first electrode (26) and electrically connected with the first electrode (26) through a contact hole (50) formed in the insulation film (52). The first electrode (26) includes a laminated structure of a metal film (42) and a protective film (44). An etching rate of the metal film (42) is almost equal to an etching rate of the protective film (44) with respect to a first etching for forming the metal film (42) and the protective film (44). An etching rate of the protective film (44) is almost zero with respect to a second etching for forming the contact hole (50).
摘要翻译： 本发明的基板（10）包括：第一电极（26）和第二电极（30）。 第二电极（30）形成在覆盖第一电极（26）的至少一部分的绝缘膜（52）上，并且通过形成在绝缘膜（26）中的接触孔（50）与第一电极 52）。 第一电极（26）包括金属膜（42）和保护膜（44）的叠层结构。 相对于用于形成金属膜（42）和保护膜（44）的第一蚀刻，金属膜（42）的蚀刻速率几乎等于保护膜（44）的蚀刻速率。 相对于用于形成接触孔（50）的第二蚀刻，保护膜（44）的蚀刻速率几乎为零。
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7.发明申请Etching composition for laminated film including reflective electrode and method for forming laminated wiring structure 审中-公开包含反射电极的层压膜用蚀刻组合物和形成叠层布线结构的方法公开(公告)号：US20050190322A1
公开(公告)日：2005-09-01
申请号：US11063607
申请日：2005-02-24
IPC分类号： C23F1/20 , C23F1/26 , G02F1/1335 , G02F1/1343
CPC分类号： C23F1/20 , C23F1/26 , G02F1/133555 , G02F1/13439
摘要： The etching composition of the invention is capable of simultaneously etching the films of a three-layered laminate film comprising an uppermost amorphous transparent electrode film made of IZO, etc., an intermediate reflective electrode film made of Al, etc. and a lowermost galvanic corrosion-inhibiting film made of Mo, etc. or a two-layered laminate film comprising an upper amorphous transparent electrode film and a lower reflective electrode film by a sole use thereof in a single etching operation to provide an etched laminate film having an edge of a good normal-tapered or stepwise shape. The etching composition comprises an aqueous water containing 30 to 40% by weight of phosphoric acid, 15 to 35% by weight of nitric acid, an organic acid and a cation-generating component.
摘要翻译： 本发明的蚀刻组合物能够同时蚀刻由IZO等制成的最上层的非晶质透明电极膜，由Al等制成的中间反射电极膜和最低电化学腐蚀的三层叠层膜 由Mo等制成的薄膜等，或者在单次蚀刻操作中通过其唯一的用途将包含上部非晶形透明电极膜和下部反射电极膜的两层叠层膜提供给具有边缘的蚀刻层叠膜 良好的正锥形或逐步形状。 蚀刻组合物包含含有30〜40重量％的磷酸，15〜35重量％的硝酸，有机酸和产生阳离子的成分的含水水。
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公开(公告)号：US20050034675A1
公开(公告)日：2005-02-17
申请号：US10944812
申请日：2004-09-21
IPC分类号： G02F1/13 , C23C14/50 , C23C14/56 , C23C16/458 , H01L21/203 , C23C16/00
CPC分类号： C23C14/564 , C23C14/50
摘要： A susceptor provided as a base of a liquid crystal substrate in a vacuum chamber of a thin film deposition apparatus is provided. The susceptor includes a susceptor main body and a stepped portion provided on the susceptor main body to support the substrate from the bottom. The stepped portion is formed of a size smaller than the substrate. By the provision of the stepped portion, conduction between a film formed at an end plane of the substrate and a film formed at the portion around the substrate can be avoided.
摘要翻译： 提供了一种在薄膜沉积设备的真空室中作为液晶基底的基底设置的基座。 基座包括基座主体和设置在基座主体上以从底部支撑基板的台阶部分。 台阶形状的尺寸比基板小。 通过设置阶梯部，可以避免在基板的端面形成的膜与在基板周围的部分形成的膜之间的导通。
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公开(公告)号：US20100020278A1
公开(公告)日：2010-01-28
申请号：US12529449
申请日：2007-11-15
IPC分类号： G02F1/1335 , G02F1/13
CPC分类号： G02F1/13439 , G02F1/133555 , G02F2001/133397
摘要： The present invention provides a semi-transmissive liquid crystal display device that can suppress flicker by adjusting an optimum value of a direct-current offset voltage that is applied to offset a bias electric field generated inside liquid crystal without increasing the number of production steps, and also provides a preferable production method of the semi-transmissive liquid crystal display device. The liquid crystal display device of the present invention is a semi-transmissive liquid crystal display device including: a substrate on aback face side, including a transmissive electrode and a reflective electrode; a substrate on an observation face side, facing the substrate on the back face side; and a liquid crystal layer arranged between the substrate on the back face side and the substrate on the observation face side, wherein the reflective electrode has a molybdenum-containing surface on a side of the liquid crystal layer.
摘要翻译： 本发明提供一种半透射型液晶显示装置，其可以通过调整用于偏移液晶内部产生的偏置电场的直流偏移电压的最佳值来抑制闪烁，而不增加制造步骤的数量， 还提供了半透射型液晶显示装置的优选制造方法。 本发明的液晶显示装置是一种半透射型液晶显示装置，包括：具有透射电极和反射电极的正面侧的基板; 观察面侧的基板，与背面侧的基板相对; 以及布置在背面侧的基板和观察面侧的基板之间的液晶层，其中，反射电极在液晶层的一侧具有含钼表面。
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公开(公告)号：US06808645B2
公开(公告)日：2004-10-26
申请号：US09813152
申请日：2001-03-21
IPC分类号： B44C122
CPC分类号： C23C14/564 , C23C14/50
摘要： A susceptor provided as a base of a liquid crystal substrate in a vacuum chamber of a thin film deposition apparatus is provided. The susceptor includes a susceptor main body and a stepped portion provided on the susceptor main body to support the substrate from the bottom. The stepped portion is formed of a size smaller than the substrate. By the provision of the stepped portion, conduction between a film formed at an end plane of the substrate and a film formed at the portion around the substrate can be avoided.
摘要翻译： 提供了一种在薄膜沉积设备的真空室中作为液晶基底的基底设置的基座。 基座包括基座主体和设置在基座主体上以从底部支撑基板的台阶部分。 台阶形状的尺寸比基板小。 通过设置阶梯部，可以避免在基板的端面形成的膜与在基板周围的部分形成的膜之间的导通。
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