公开(公告)号：US20070268494A1

公开(公告)日：2007-11-22

申请号：US11745749

申请日：2007-05-08

申请人： Shinichi Hara ,  Naoyuki Taketomi ,  Makoto Abbe

发明人： Shinichi Hara ,  Naoyuki Taketomi ,  Makoto Abbe

IPC分类号： G01B11/02

CPC分类号： G01S17/74 ,  G01S17/42 ,  G01S17/66

摘要： To provide a method for estimating an absolute distance L between a tracking laser interferometer and a retroreflector 70, the tracking laser interferometer including; the retroreflector 70 for reflecting and returning incident measurement light A in an incident direction; and a two-axis rotating mechanism 40 for rotationally moving in an exit direction of the measurement light A so that optical axes of the measurement light A and return light B are collimated, which outputs a measurement value according to an increase or decrease in the distance between the interferometer and the retroreflector 70, wherein the absolute distance L between the interferometer and the retroreflector 70 is estimated by performing arithmetic operation based on an angular position variation θ2 of the two-axis rotating mechanism 40 when a deviation amount d of the return light B from the retroreflector 70 relative to a predetermined position is given as a predetermined value d2. This enables an appropriate increase or decrease of the control amount of a tracking control according to a distance between the interferometer and the retroreflector without forcing an operator to perform a troublesome origin return operation and adding an expensive absolute distance sensor.

摘要翻译： 为了提供一种用于估计跟踪激光干涉仪和后向反射器70之间的绝对距离L的方法，所述跟踪激光干涉仪包括： 用于在入射方向上反射和返回入射测量光A的后向反射器70; 以及用于沿测量光A的出射方向旋转移动的双轴旋转机构40，使得测量光A和返回光B的光轴被准直，其根据距离的增减来输出测量值 在干涉仪和后向反射器70之间，其中通过基于两轴旋转机构40的角度位置变化θ2进行算术运算来估计干涉仪和后向反射器70之间的绝对距离L. 来自后向反射器70的返回光B相对于预定位置的偏差量d被给定为预定值d 2。 这使得能够根据干涉仪和后向反射器之间的距离适当地增加或减少跟踪控制的控制量，而不会强迫操作者执行麻烦的原点返回操作并添加昂贵的绝对距离传感器。

公开(公告)号：US20060285093A1

公开(公告)日：2006-12-21

申请号：US11451303

申请日：2006-06-13

申请人： Shinichi Hara ,  Noriyasu Hasegawa

发明人： Shinichi Hara ,  Noriyasu Hasegawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/7095

摘要： An exposure apparatus includes a projection optical system configured to project an image of a pattern of a reticle onto a substrate. The exposure apparatus exposes the substrate via the projection optical system and a liquid that is disposed between the projection optical system and the substrate. The exposure apparatus includes a top plate configured to hold the substrate, an auxiliary plate disposed around the substrate on the top plate and having a surface that is substantially flush with a surface of the substrate, and a mirror disposed on the top plate for use in measuring at least one of a position of the top plate and an orientation of the top plate. The auxiliary plate preferably is formed of a low-thermal-expansion material having a coefficient of linear expansion of no greater than 100 ppb.

摘要翻译： 曝光装置包括：投影光学系统，被配置为将掩模版图案的图像投影到基板上。 曝光装置经由投影光学系统和设置在投影光学系统和基板之间的液体露出基板。 曝光装置包括：被配置为保持基板的顶板，设置在顶板上的基板周围的辅助板，其具有与基板的表面基本齐平的表面;以及设置在顶板上的反射镜，用于 测量顶板的位置和顶板的取向中的至少一个。 辅助板优选由线膨胀系数不大于100ppb的低热膨胀材料形成。

公开(公告)号：US07106413B2

公开(公告)日：2006-09-12

申请号：US10785804

申请日：2004-02-23

申请人： Shinichi Hara

发明人： Shinichi Hara

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70891 ,  G03B27/52

摘要： A cooling mechanism for cooling an optical element disposed in a vacuum atmosphere includes a support part for supporting the optical element, which has a channel having an inlet, into which gas is supplied, and an outlet, from which the gas is exhausted, and a decompression mechanism, connected to the channel, for reducing pressure of the gas to be supplied.

摘要翻译： 用于冷却设置在真空气氛中的光学元件的冷却机构包括用于支撑光学元件的支撑部件，该支撑部件具有供给气体的具有入口的通道和排出气体的出口， 连接到通道的减压机构，用于减少供应气体的压力。

公开(公告)号：US20060164622A1

公开(公告)日：2006-07-27

申请号：US11386579

申请日：2006-03-21

申请人： Shinichi Hara

发明人： Shinichi Hara

IPC分类号： G03B27/58

CPC分类号： G03F7/70891 ,  G02B17/0663 ,  G03F7/70216 ,  G03F7/7055 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70875

摘要： An exposure apparatus having an exposure mode that transfers a pattern on a reticle onto an object, and a standby mode that waits for exposure includes an optical system for introducing the exposure light to the object in the exposure mode, and a mechanism for allowing the exposure light to enter the reticle and/or the optical system in the standby mode, and for preventing the exposure light from entering the object in the standby mode.

摘要翻译： 具有将掩模版上的图案转印到物体上的曝光模式的曝光装置和等待曝光的待机模式包括用于在曝光模式下将曝光光引入到物体的光学系统，以及允许曝光的机构 在待机模式中光进入光罩和/或光学系统，并且用于在待机模式下防止曝光光进入对象。

公开(公告)号：US07068348B2

公开(公告)日：2006-06-27

申请号：US10778744

申请日：2004-02-13

申请人： Shinichi Hara

发明人： Shinichi Hara

IPC分类号： G03B27/52 ,  G03B27/42 ,  G02B7/02

CPC分类号： G03F7/70825 ,  G03B27/42 ,  G03F7/70891

摘要： Disclosed is a holding system and an exposure apparatus having the same, wherein deformation of an optical member resulting from its thermal expansion and causing degradation of imaging performance can be reduced to assure desired imaging performance. The holding system for holding an optical member includes a barrel for at least partially surrounding the optical member and/or a heat source, an average of radiation coefficient of an inside surface of the barrel is not less than 0.8.

摘要翻译： 公开了一种保持系统和具有该保持系统的曝光设备，其中可以减少由其热膨胀引起的光学部件的变形并导致成像性能的降低，以确保期望的成像性能。 用于保持光学构件的保持系统包括用于至少部分地围绕光学构件和/或热源的镜筒，镜筒内表面的辐射系数的平均值不小于0.8。

公开(公告)号：US07054705B2

公开(公告)日：2006-05-30

申请号：US10044964

申请日：2002-01-15

申请人： Sumio Ogawa ,  Minoru Ueki ,  Shinichi Hara

发明人： Sumio Ogawa ,  Minoru Ueki ,  Shinichi Hara

IPC分类号： G06F19/00

CPC分类号： H01L22/20 ,  H01L2924/0002 ,  Y10T29/41 ,  H01L2924/00

摘要： A semiconductor device manufacturing system is provided in which chip position information is read without removing resin from a package so that the cause of a failure can be quickly identified and removed and the yield of chips can be rapidly improved. A replacement address reading device reads redundancy addresses from a semiconductor device which is determined as faulty in a test performed after the semiconductor device has been sealed into a package. A chip position analyzing device estimates, from the combination of these redundancy addresses, a lot number, a wafer number and a chip number of the faulty semiconductor device. A failure distribution mapping device maps the distribution of faulty chips in each wafer in the lot based on these numbers thus obtained. A failure cause determining device identifies which manufacturing device or processing step has caused the failures in the wafer process based on the above distribution.

公开(公告)号：US06984362B2

公开(公告)日：2006-01-10

申请号：US10619506

申请日：2003-07-16

申请人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

发明人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

IPC分类号： G05B1/00 ,  G05B23/00

CPC分类号： G05D16/2013

摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

摘要翻译： 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

公开(公告)号：US20050271558A1

公开(公告)日：2005-12-08

申请号：US11201142

申请日：2005-08-11

申请人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

发明人： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

IPC分类号： H01L21/027 ,  G03F7/20 ,  G05D16/00 ,  G05D16/20

CPC分类号： G05D16/2013

摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

摘要翻译： 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

公开(公告)号：US06935576B2

公开(公告)日：2005-08-30

申请号：US09894008

申请日：2001-06-29

申请人： Shinichi Hara

发明人： Shinichi Hara

IPC分类号： B08B3/02 ,  B05B7/04 ,  B05B7/14 ,  B05B15/02 ,  B24C5/02 ,  B24C5/04 ,  B24C7/00 ,  B05B1/28

CPC分类号： B05B7/1431 ,  B05B7/0475 ,  B05B15/55 ,  B24C5/02 ,  B24C5/04 ,  B24C7/0076 ,  B24C11/005

摘要： In a cleaning nozzle, a trumpet-shaped portion made up of multiple inclined portions or a curved portion is formed upstream of a minimum diameter portion of an ejection nozzle portion of a converging-diverging shape, and a gas ejection port is opened to an intermediate part of the trumpet-shaped portion. Inside the gas ejection port is formed a cleaning liquid ejection port. A gas is ejected at a higher speed than that of a cleaning liquid from the cleaning liquid ejection port to transform the cleaning liquid into droplets, which are further accelerated by a tapered portion formed downstream of the minimum diameter portion before being ejected. A small amount of liquid may be supplied to a pressurized gas passage between a powder injection portion and the cleaning nozzle to prevent a possible clogging of passage due to powder.

摘要翻译： 在清洗喷嘴中，形成由多个倾斜部分或弯曲部分组成的喇叭形部分，在会聚发散形状的喷嘴部分的最小直径部分的上游形成一个气体喷射口， 喇叭形部分的一部分。 气体喷出口内设有清洗液喷出口。 以比来自清洗液喷射口的清洗液更高的速度喷出气体​​，将清洗液转换成液滴，在喷出前，形成在最小直径部的下游的锥形部进一步加速。 可以将少量液体供应到粉末喷射部分和清洁喷嘴之间的加压气体通道，以防止由于粉末而导致通道堵塞。

公开(公告)号：US20050121144A1

公开(公告)日：2005-06-09

申请号：US11001116

申请日：2004-12-02

申请人： Ryo Edo ,  Masami Yonekawa ,  Shinichi Hara

发明人： Ryo Edo ,  Masami Yonekawa ,  Shinichi Hara

IPC分类号： B08B7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  C23F1/00

CPC分类号： H01L21/67173 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70916 ,  G03F7/70925 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902 ,  Y10S414/14

摘要： A processing system includes a supplying part for storing an object to be fed and for being maintained at an atmospheric pressure a processing chamber for being maintained at a reduced pressure or vacuum atmosphere and for executing a predetermined processing to the object, the object being fed between the supplying part and the processing chamber, a vacuum chamber, arranged between the supplying part and the processing chamber, for storing the object at a pressure of 100 Pa or less, the vacuum chamber having a replaceable atmosphere, and a first load lock chamber, arranged between the supplying part and said vacuum chamber, for receiving and supplying the object between the supplying part and said vacuum chamber, the first load lock chamber having a replaceable atmosphere.

摘要翻译： 一种处理系统，包括：供给部件，用于储存待进料的物体，并保持在大气压下的处理室，用于保持在减压或真空气氛中，并对所述物体执行预定的处理，所述物体在 供给部和处理室，设置在供给部和处理室之间的真空室，用于在100Pa以下的压力下存储物体，具有可更换气氛的真空室和第一负载锁定室， 布置在供应部分和所述真空室之间，用于在供应部分和所述真空室之间接收和供应物体，第一负载锁定室具有可更换的气氛。