公开(公告)号：US20090067158A1

公开(公告)日：2009-03-12

申请号：US12293096

申请日：2006-11-02

申请人： Tetsuya Hamada

发明人： Tetsuya Hamada

IPC分类号： G02F1/13357

CPC分类号： G02F1/133603 ,  G02F1/133605 ,  G02F1/133608 ,  G02F2001/133601 ,  H05B33/0803

摘要： In a direct backlight, a substrate on which LEDs are provided includes a plurality of module substrates. Each module substrates can be reduced in warping or deformation after a blanking process. In addition, each module substrate can be formed thin since bending due to its own weight is small. Consequently, the substrate as a whole and the backlight can be formed thin.

摘要翻译： 在直接背光源中，设置有LED的基板包括多个模块基板。 在消隐过程之后，每个模块基板可以减少翘曲或变形。 此外，每个模块基板可以形成为薄的，因为其自重的弯曲小。 因此，可以将基板整体和背光源形成得较薄。

公开(公告)号：US20080033154A1

公开(公告)日：2008-02-07

申请号：US11629517

申请日：2005-06-02

申请人： Yoshihisa Inoue ,  Setsuko Funaki ,  Tetsuya Hamada ,  Yoshihiro Yamamoto ,  Isao Hara ,  Takaomi Hayashi ,  Miyuki Konno ,  Shinobu Aoki

发明人： Yoshihisa Inoue ,  Setsuko Funaki ,  Tetsuya Hamada ,  Yoshihiro Yamamoto ,  Isao Hara ,  Takaomi Hayashi ,  Miyuki Konno ,  Shinobu Aoki

IPC分类号： C07D307/02 ,  C07H5/06

CPC分类号： C07D307/14

摘要： A 3-aminomethyltetrahydrofuran derivative is produced by preparing a 3-cyanotetrahydrofuran derivative in a high yield from a malic acid derivative, and reducing the cyano group of the 3-cyanotetrahydrofuran derivative. The process can produce the 3-cyanotetrahydrofuran derivative in a high yield from inexpensive industrial materials.

摘要翻译： 通过从苹果酸衍生物制备高收率的3-氰基四氢呋喃衍生物，并还原3-氰基四氢呋喃衍生物的氰基，制备3-氨基甲基四氢呋喃衍生物。 该方法可以从廉价的工业材料以高产率生产3-氰基四氢呋喃衍生物。

公开(公告)号：US20070190437A1

公开(公告)日：2007-08-16

申请号：US11670108

申请日：2007-02-01

申请人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

发明人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda ,  Tetsuya Hamada

IPC分类号： G03C5/00

CPC分类号： G03F7/70925 ,  G03F7/168 ,  G03F7/7075 ,  G03F7/70916 ,  G03F7/70991 ,  G11B5/8404 ,  G11B7/261 ,  H01L21/67051 ,  H01L21/67225 ,  Y10S134/902

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block in the substrate processing apparatus. The exposure device subjects a substrate to exposure processing by means of an immersion method. In the edge cleaning unit in the cleaning/drying processing block, a blush abuts against an end of the rotating substrate, so that the edge of the substrate before the exposure processing is cleaned. At this time, the position where the substrate is cleaned is corrected.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块，清洁/干燥处理块，以及 一个接口块。 曝光装置被布置成与基板处理装置中的界面块相邻。 曝光装置通过浸渍方法使基板进行曝光处理。 在清洁/干燥处理块中的边缘清洁单元中，腮红与旋转基板的端部抵接，从而清洁曝光处理之前的基板的边缘。 此时，校正基板被清洁的位置。

公开(公告)号：US20070177870A1

公开(公告)日：2007-08-02

申请号：US11627726

申请日：2007-01-26

申请人： Tetsuya Hamada

发明人： Tetsuya Hamada

IPC分类号： G03D5/00

CPC分类号： H01L21/67178 ,  H01L21/67051 ,  H01L21/67742 ,  H01L21/67748

摘要： A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes a placement/bake unit. A substrate that has been subjected to exposure processing in the exposure device is subjected to cleaning and drying processing in a second cleaning/drying processing unit, and is then transported to a placement/heating unit. In the placement/heating unit, the substrate is subjected to post-exposure bake processing.

摘要翻译： 基板处理装置包括接口块。 曝光装置设置在接口块附近。 接口块包括放置/烘烤单元。 在曝光装置中经受曝光处理的基板在第二清洗/干燥处理单元中进行清洗和干燥处理，然后被运送到放置/加热单元。 在放置/加热单元中，对基板进行曝光后烘烤处理。

公开(公告)号：US20070172233A1

公开(公告)日：2007-07-26

申请号：US11623231

申请日：2007-01-15

申请人： Tetsuya Hamada

发明人： Tetsuya Hamada

IPC分类号： G03D5/00

CPC分类号： G03D3/00 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67225

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes a substrate replacement group. The substrate replacement group has a stack of three cleaning/drying processing units. The cleaning/drying processing unit subjects the substrate after exposure processing to cleaning and drying processing.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 接口块包括基板更换组。 基板更换组具有三个清洁/干燥处理单元的堆叠。 清洁/干燥处理单元在曝光处理之后对基板进行清洁和干燥处理。

公开(公告)号：US20060120716A1

公开(公告)日：2006-06-08

申请号：US11294268

申请日：2005-12-05

申请人： Tetsuya Hamada

发明人： Tetsuya Hamada

IPC分类号： G03D5/00

CPC分类号： H01L21/67225 ,  G03F7/168 ,  G03F7/2006 ,  H01L21/67748

摘要： When a first substrate transferred outwardly from an indexer cell is the last substrate prior to reticle change in an exposure apparatus, the outward transfer of a second substrate to be processed subsequently to the first substrate from the indexer cell is temporarily stopped. After a lapse of time corresponding to reticle replacement time, the outward substrate transfer is restarted, and the second substrate is transferred outwardly from the indexer cell. For the exposure apparatus, the second substrate subjected to a resist coating process is received at the instant when the reticle replacement is completed after the completion of the exposure process of the first substrate. This provides a constant time interval between the completion of the resist coating process of substrates and the execution of the exposure process thereof without the decrease in processing efficiency. As a result, a uniform processing history for the substrates is achieved to further improve the line width uniformity of a pattern.

公开(公告)号：US06807455B2

公开(公告)日：2004-10-19

申请号：US10459833

申请日：2003-06-11

申请人： Takushi Yoshida ,  Tetsuya Hamada

发明人： Takushi Yoshida ,  Tetsuya Hamada

IPC分类号： G06F1900

CPC分类号： H01L21/6715 ,  G05B2219/32192 ,  G05B2219/33284 ,  G05B2219/45031 ,  H01L21/67253 ,  Y02P90/22

摘要： A reference command value is transmitted from an apparatus server (90) through a network (96d) to spin processing units (SR1-SR4) of a substrate processing apparatus (1). Next, a plurality of correction amounts for making processing states in the respective spin processing units (SR1-SR4) substantially the same are computed from a plurality of measured values corresponding to the respective spin processing units (SR1-SR4) and the reference command value, and are additionally stored in a correction amount database (90a). For execution of substrate processing, a plurality of correction amounts corresponding to the reference command value are extracted from the database, and corresponding ones of the correction amounts plus the reference command value are transmitted to the respective spin processing units (SR1-SR4).

公开(公告)号：US5867389A

公开(公告)日：1999-02-02

申请号：US757069

申请日：1996-11-26

申请人： Tetsuya Hamada ,  Hidekazu Inoue

发明人： Tetsuya Hamada ,  Hidekazu Inoue

IPC分类号： G11B7/26 ,  G05B19/418 ,  H01L21/02 ,  H01L21/66 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L22/20 ,  G05B19/41865 ,  G05B2219/31151 ,  G05B2219/31206 ,  G05B2219/32129 ,  G05B2219/45031 ,  Y02P90/18 ,  Y02P90/20

摘要： A substrate processing system includes a plurality of processing stations for processing substrates, and a management station connected with the plurality of processing stations to constitute a computer network. Each processing station includes a plurality of processing units for treating the substrates, first storage device for storing processing recipes, and inter-station recipe copy unit for copying a desired processing recipe from another processing station and storing the copied processing recipe into the first storage device. Each processing recipe defines an order of conveyance of each substrate among the plurality of processing units and processing conditions in each processing unit. The management station includes second storage means for storing processing recipes for the plurality of processing stations, and specification upload/download means for transferring a desired processing recipe between the second storage means and the first storage means included in each of the plurality of processing stations and for storing the transferred processing recipe therein.

摘要翻译： 基板处理系统包括用于处理基板的多个处理站，以及与多个处理站连接以构成计算机网络的管理站。 每个处理站包括用于处理基板的多个处理单元，用于存储处理配方的第一存储装置和用于从另一个处理站复制所需处理配方的站间配方复制单元，并将复制的处理配方存储到第一存储装置 。 每个处理配方确定多个处理单元中的每个基板的输送顺序和每个处理单元中的处理条件。 管理站包括用于存储多个处理站的处理配方的第二存储装置和用于在第二存储装置和包括在多个处理站中的每个处理站中的第一存储装置之间传送所需处理配方的规范上载/下载装置，以及 用于存储转移的处理配方。

公开(公告)号：US5515072A

公开(公告)日：1996-05-07

申请号：US455726

申请日：1995-05-31

申请人： Kenichi Yanai ,  Kenichi Oki ,  Tetsuya Hamada ,  Kazuhiro Takahara ,  Yasuyoshi Mishima ,  Tsutomu Tanaka

发明人： Kenichi Yanai ,  Kenichi Oki ,  Tetsuya Hamada ,  Kazuhiro Takahara ,  Yasuyoshi Mishima ,  Tsutomu Tanaka

IPC分类号： G02F1/1362 ,  G09G3/36

CPC分类号： G09G3/3659 ,  G09G3/3648 ,  G02F2001/136245 ,  G02F2201/122 ,  G09G2300/0809 ,  G09G2300/0823 ,  G09G2310/0224 ,  G09G2310/0281 ,  G09G2320/0204 ,  G09G2320/0209 ,  G09G2320/0219 ,  G09G2320/0247 ,  G09G2330/08 ,  G09G3/3614

摘要： In an active matrix-type display device where scan bus lines (S.sub.i) and data bus lines (D.sub.j) are formed on different substrates, two kinds of scan bus lines (SP.sub.i, SN.sub.i) are provided. A first switching element (TFTN.sub.ij) is connected between a reference voltage supply line (V.sub.R) and a display electrode (E.sub.ij), and is controlled by a first scan bus line (SN.sub.i), and a second switching element (TFTP.sub.ij) is connected between the reference voltage supply bus line (V.sub.R) and the display electrode, and is controlled by a second scan bus line (SP.sub.i). The first switching element (TFTN.sub.ij) is turned ON by a positive or negative potential at the first scan bus line.

公开(公告)号：US08865939B2

公开(公告)日：2014-10-21

申请号：US13878090

申请日：2011-10-05

申请人： Naritoshi Yoshimura ,  Shinji Kiyono ,  Tetsuya Hamada ,  Eiji Watanabe ,  Saiko Sawada

发明人： Naritoshi Yoshimura ,  Shinji Kiyono ,  Tetsuya Hamada ,  Eiji Watanabe ,  Saiko Sawada

IPC分类号： C07C209/00 ,  C07C253/34 ,  C07C209/48 ,  C07C253/22 ,  B01J23/44 ,  B01J25/00 ,  B01J25/02

CPC分类号： C07C209/48 ,  B01J23/44 ,  B01J25/00 ,  B01J25/02 ,  C07B2200/09 ,  C07C253/22 ,  C07C253/34 ,  C07C2601/14 ,  C07C255/46 ,  C07C211/18

摘要： A method for producing trans-1,4-bis(aminomethyl)cyclohexane includes a nuclear hydrogenation step of producing a hydrogenated terephthalic acid or terephthalic acid derivative by nuclear hydrogenation of a terephthalic acid or terephthalic acid derivative, the terephthalic acid or terephthalic acid derivative being at least one selected from the group consisting of terephthalic acid, terephthalic acid ester, and terephthalic acid amide; a cyanation step of treating the hydrogenated terephthalic acid or terephthalic acid derivative with ammonia, thereby producing 1,4-dicyanocyclohexane, and producing trans-1,4-dicyanocyclohexane from the obtained 1,4-dicyanocyclohexane; and an aminomethylation step of treating the trans-1,4-dicyanocyclohexane with hydrogen, thereby producing trans-1,4-bis(aminomethyl)cyclohexane. Metal oxide is used as a catalyst in the cyanation step, and the obtained trans-1,4-dicyanocyclohexane has a metal content of 3000 ppm or less.

摘要翻译： 反式-1,4-双（氨基甲基）环己烷的制造方法包括通过对苯二甲酸或对苯二甲酸衍生物的核氢化制造氢化对苯二甲酸或对苯二甲酸衍生物的核氢化工序，对苯二甲酸或对苯二甲酸衍生物为 选自对苯二甲酸，对苯二甲酸酯和对苯二甲酸酰胺中的至少一种; 用氨处理氢化对苯二甲酸或对苯二甲酸衍生物的氰化步骤，从而得到1,4-二氰基环己烷，由所得1,4-二氰基环己烷生产反式-1,4-二氰基环己烷; 和用氢处理反式-1,4-二氰基环己烷的氨基甲基化步骤，从而产生反式-1,4-双（氨基甲基）环己烷。 在氰化步骤中使用金属氧化物作为催化剂，得到的反式-1,4-二氰基环己烷的金属含量为3000ppm以下。