公开(公告)号：US08599488B2

公开(公告)日：2013-12-03

申请号：US13313399

申请日：2011-12-07

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G02B3/12

CPC分类号： G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

摘要： A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.

摘要翻译： 光刻投影装置包括具有球面透镜元件的投影系统，曝光光从该球面透镜元件的球面透镜元件下方的空间中通过液体投射;与透镜元件的与透镜元件不同的透镜元件的表面附近设置的元件 在球面透镜元件的表面之间形成间隙。 该间隙与空间连通并且包括下部和上部。 晶片在球面透镜元件和构件之下移动并且相对于球形透镜元件和构件移动，并且液体保持在球面透镜元件与另一侧的晶片的一侧的构件和晶片的上表面之间。 液体局部地覆盖晶片的上表面的一部分，以通过空间中的液体将曝光光投影到晶片上而露出晶片。

公开(公告)号：US08493545B2

公开(公告)日：2013-07-23

申请号：US12382078

申请日：2009-03-09

申请人： Hidemi Kawai ,  W. Thomas Novak

发明人： Hidemi Kawai ,  W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

摘要翻译： 浸渍光刻设备和浸没式光刻设备中的清理方法，其中在浸没式光刻工艺期间将浸没液体供应到投影光学元件的光学元件和工件之间的间隙。 与工件不同的物体的表面设置在光学元件的下方，供给口和回收口。 在净化过程中，清洁液体被供应到物体上，使得清洁液仅覆盖物体表面的一部分。

公开(公告)号：USRE41232E1

公开(公告)日：2010-04-20

申请号：US10876201

申请日：2004-06-24

申请人： Andrew J. Hazelton ,  W. Thomas Novak ,  Akimitsu Ebihara

发明人： Andrew J. Hazelton ,  W. Thomas Novak ,  Akimitsu Ebihara

IPC分类号： H01L21/68 ,  G03F9/00 ,  G03B27/42 ,  H02K41/00 ,  G05B11/16

CPC分类号： H02K41/03 ,  G03F7/70716 ,  G03F7/70758 ,  H02K2201/18

摘要： A positioning stage assembly having a coarse stage which includes a planar motor driveable in at least two degrees of freedom, and a fine stage positioned on the coarse stage which is driveable in at least three degrees of freedom with respect to the coarse stage. More preferably, the fine stage is driveable in six degrees of freedom and includes variable reluctance actuators for positioning in three degrees of freedom.

摘要翻译： 一种具有粗糙台阶的定位台组件，其包括可以至少两个自由度驱动的平面电机，以及位于粗糙台上的精细台，所述精细平台可相对于粗略平台至少三个自由度驱动。 更优选地，精细级可以在六个自由度中驱动，并且包括用于以三个自由度定位的可变磁阻致动器。

公开(公告)号：US07570431B2

公开(公告)日：2009-08-04

申请号：US11606914

申请日：2006-12-01

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G02B3/12

CPC分类号： G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

摘要： An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

摘要翻译： 将自动聚焦单元提供给浸没式光刻设备，其中流体设置在工件的目标表面上，并且图像图案通过流体投影到该目标表面上。 自动对焦单元具有相对设置在目标表面上方的投影透镜等光学元件。 自动对焦光源被布置成以特定角度倾斜地投射光束，使得该光束通过流体并被在光学元件下方的指定反射位置处被工件的目标表面反射。 接收器接收并分析反射光。 校正透镜可以设置在光束的光路上，用于校正光束的传播。

公开(公告)号：US20090047608A1

公开(公告)日：2009-02-19

申请号：US12191108

申请日：2008-08-13

申请人： W. Thomas Novak ,  Daniel Gene Smith

发明人： W. Thomas Novak ,  Daniel Gene Smith

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/2028 ,  G03F7/70216 ,  G03F7/70425 ,  G03F7/70991

摘要： An edge shot (“ES”) exposure apparatus (14) for transferring edge features (ef) to a substrate edge region (222) of a substrate (18) includes a feature transferer (55), and an ES wafer stage assembly (62). The feature transferer (55) transfers one or more edge features (ef) to the substrate edge region (222), while the ES wafer stage assembly (62) rotates the substrate (18) about a substrate axis (23). This allows the feature transferer (55) to transfer the edge features (ef) to a plurality of alternative locations in the substrate edge region (222). The ES exposure apparatus (14) can be used in conjunction with a primary exposure apparatus (12) that transfers usable features (uf) to a substrate usable region (220) of the substrate (18). With this design, the primary exposure apparatus (12) can be transferring usable features (uf) to a first substrate (18A) while the ES exposure apparatus (14) is transferring edge features (ef) to a second substrate (18B). As a result thereof, the overall throughput is improved because the primary exposure apparatus (12) does not need to transfer features to the substrate edge region (222).

摘要翻译： 用于将边缘特征（ef）传送到基板（18）的基板边缘区域（222）的边缘投射（“ES”）曝光装置（14）包括特征转移器（55）和ES晶片台组件 ）。 特征转移器（55）将一个或多个边缘特征（ef）传送到衬底边缘区域（222），而ES晶片台组件（62）围绕衬底轴线（23）旋转衬底（18）。 这允许特征转移器（55）将边缘特征（ef）传送到衬底边缘区域（222）中的多个替代位置。 ES曝光装置（14）可以与将可用特征（uf）传送到基板（18）的基板可用区域（220）的一次曝光装置（12）结合使用。 通过这种设计，当ES曝光装置（14）将边缘特征（ef）传送到第二基板（18B）时，一次曝光装置（12）可以将可用特征（uf）传送到第一基板（18A）。 结果，由于一次曝光装置（12）不需要将特征传送到基板边缘区域（222），所以整体吞吐量得到改善。

公开(公告)号：US07397532B2

公开(公告)日：2008-07-08

申请号：US11235323

申请日：2005-09-27

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/7095

摘要： An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

公开(公告)号：US07072024B2

公开(公告)日：2006-07-04

申请号：US10761436

申请日：2004-01-20

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G01N21/86

CPC分类号： G03F7/7075 ,  G03F9/7003 ,  G03F9/7034

摘要： A lithographic projection apparatus for successively projecting a pattern on wafers by preliminarily determining locations of surface points of each wafer before it is illuminated in a projection station has a pair of measuring stations arranged oppositely with respect to the projection station at the center. Each measuring station has a wafer surface sensor for determining the locations of surface points of the wafer carried on a stage and a stage height sensor for measuring the height of a reference plane on the stage. A wafer on a stage is placed in one of the measuring stations to have measurements taken and ideal height data are collected while another wafer is being illuminated in the projection station. After these measurement and illumination processes are completed, the illuminated wafer is removed from the projection station and replaced with a new wafer to be measured and illuminated. In the meantime, the measured wafer is transported into the projection station while the stage height sensor continues to monitor the height of its reference plane by using a measuring beam. Once inside the projection station, the collected ideal height data are used to control the wafer during exposure.

摘要翻译： 通过预先确定每个晶片在投影站中被照射之前的表面点的位置，在晶片上连续地投影图案的光刻投影装置具有相对于投影站在中心相对布置的一对测量站。 每个测量站具有晶片表面传感器，用于确定载置在载物台上的晶片的表面点的位置和用于测量载物台上参考平面高度的载物台高度传感器。 将台架上的晶片放置在一个测量站中，以进行测量，并且在投影站中照亮另一个晶片时收集理想的高度数据。 在这些测量和照明处理完成之后，将照射的晶片从投影站移除并替换为待测量和照明的新晶片。 同时，测量的晶片被输送到投影站，而台架高度传感器通过使用测量梁继续监视其参考平面的高度。 一旦在投影站内，采集的理想高度数据被用于在曝光期间控制晶片。

公开(公告)号：US06765650B2

公开(公告)日：2004-07-20

申请号：US09927683

申请日：2001-08-09

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G03B2758

CPC分类号： G03F7/70816 ,  G03B27/42 ,  G03F7/70841

摘要： An air bearing stage device which is suitable for use with a vacuum environment is disclosed. According to one aspect of the present invention, a stage apparatus includes a table that is positioned in a system vacuum chamber, a first rod that carries the table, and first and second plates that support the first rod. The first plate includes an air bearing surface that is held against the first side of a first wall by a first vacuum force. A first drive mechanism drives the first plate to move the first rod in a first direction, and also drives the second plate to move the first rod in the first direction, while a second drive mechanism which includes a second rod and a first linear motor causes the second rod to move the first rod in a second direction.

摘要翻译： 公开了适用于真空环境的空气轴承平台装置。 根据本发明的一个方面，一种舞台装置包括一个位于系统真空室中的工作台，一个承载工作台的第一个杆以及支撑第一个杆的第一个和第二个板。 第一板包括通过第一真空力保持抵靠第一壁的第一侧的空气轴承表面。 第一驱动机构驱动第一板沿第一方向移动第一杆，并且还驱动第二板以沿第一方向移动第一杆，而包括第二杆和第一线性马达的第二驱动机构导致 所述第二杆沿第二方向移动所述第一杆。

公开(公告)号：US06653639B1

公开(公告)日：2003-11-25

申请号：US09691303

申请日：2000-10-17

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： G01J100

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  G03F7/70708 ,  H01J37/3174 ,  H01J2237/31794

摘要： A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.

摘要翻译： 公开了一种用于处理衬底的光刻系统。 光刻系统包括用于相对于光束移动衬底的台。 光刻系统还包括用于在阶段运动期间牢固地保持衬底的卡盘。 光刻系统还包括支撑组件，用于将卡盘保持在相对于载物台的固定位置，同时在加工期间容纳用于卡盘或台架中的变形，以便相对于载物台精确地定位基板并且减小外部应力 导致基板失真。

公开(公告)号：US06478136B2

公开(公告)日：2002-11-12

申请号：US09755099

申请日：2001-01-08

申请人： W. Thomas Novak

发明人： W. Thomas Novak

IPC分类号： B65G3700

CPC分类号： B23Q7/04 ,  B23Q1/621 ,  B23Q16/02

摘要： In a system and method for automatically transporting and precisely positioning a work piece at a station for processing, a relatively low precision transport mechanism is utilized to transfer a chuck that holds the work piece to and from the processing station. Notwithstanding the use of the low precision transport mechanism, the chuck can be precisely positioned at the processing station by using a quasi-kinematic coupling. More specifically, the chuck is precisely located at the coupling by engaging pre-defined indexing notches at the coupling. The chuck is securely held against the coupling at the processing station by suction. The coupling may be supported on a precision stage, which is configured to further position the chuck with the work piece thereon with high precision for processing at the processing station. In another aspect of the invention, the chuck is configured to securely hold a smooth surface of the work piece by suction. In a further aspect of the invention, the transport mechanism may be configured to transfer the chuck between multiple processing stations. Each processing station has a similar quasi-kinetic coupling. The coupling may be supported on a single precision stage, which further positions the chuck with relatively high precision with respect to the processing apparatus.

摘要翻译： 在用于在工位进行自动运送和精确定位工件以进行处理的系统和方法中，使用相对低精度的传送机构来传送将工件保持在加工站和从处理站的卡盘。 尽管使用了低精度的传送机构，但卡盘可以通过使用准运动学耦合精确地定位在处理站。 更具体地，卡盘通过在联轴器处接合预定义的分度凹槽来精确地位于联接器处。 卡盘通过抽吸牢固地固定在处理站处的联接器上。 联轴器可以被支撑在精密台上，该精密台被配置为进一步将卡盘与其上的工件以高精度进一步放置在处理站处进行处理。 在本发明的另一方面，卡盘构造成通过抽吸可靠地保持工件的光滑表面。 在本发明的另一方面，传送机构可以被配置成在多个处理站之间传送卡盘。 每个处理站具有类似的准动力耦合。 联接器可以被支撑在单个精密平台上，这进一步相对于处理装置以相对较高的精度来定位卡盘。