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    Method of manufacturing parts or powders of a nitride compound of silicon or of a metal by reacting silicon or metal parts or powders in the solid state with a nitrogen-containing reactive gas
    84.
    发明授权
    Method of manufacturing parts or powders of a nitride compound of silicon or of a metal by reacting silicon or metal parts or powders in the solid state with a nitrogen-containing reactive gas 失效
    通过使硅或金属部件或固体状态的粉末与含氮反应气体反应来制造硅或金属的氮化物化合物的部件或粉末的方法

    公开(公告)号：US4576923A

    公开(公告)日：1986-03-18

    申请号：US598912

    申请日：1984-04-10

    Applicant: Daniel Broussaud ,  William Mustel ,  Louis Minjolle

    Inventor： Daniel Broussaud ,  William Mustel ,  Louis Minjolle

    IPC: B22F9/00 ,  B01J15/00 ,  B01J19/00 ,  C01B21/06 ,  C01B21/068 ,  C01B21/082 ,  C01B33/00 ,  C04B35/591 ,  C04B35/58 ,  F27D19/00

    CPC classification number: C04B35/591 ,  B01J15/00 ,  B01J19/0006

    Abstract: In a method of manufacturing parts or powders made of a compound of silicon or of a metal by exothermally reacting parts or powders of silicon or a metal in the solid state with a gas, wherein the differential flow rate or the pressure variation of the reactive gas in contact with the part or the powder is sensed, and the reaction is performed at increasing temperatures as a function of the said differential flow rate or pressure of the reactive gas:the improvement wherein a maximum differential flow rate or a maximum speed of pressure drop of the reactive gas is predetermined as a function of the chemical nature of the parts or powders, and optionally as a function of the density and the size of the parts, and the rise in temperature is suspended when the differential flow rate or the speed of pressure drop of the reactive gas reaches the predetermined maximum value, beyond which the reaction would run away and prevent complete transformation of the parts or the powders being obtained.

    Abstract translation: 在制造由硅或金属的化合物制成的零件或粉末的方法中，通过将固体状态的硅或金属的一部分或粉末与气体放热反应，其中反应气体的不同流量或压力变化 与部分或粉末接触，并且响应于所述不同流量或反应气体压力的函数在升高的温度下进行反应：其中最大差分流速或最大压降速度 的反应气体的预定值是部件或粉末的化学性质的函数，并且任选地作为部件的密度和尺寸的函数，并且当差动流量或速度 反应气体的压降达到预定的最大值，超过此值将使反应脱离，并防止获得的零件或粉末的完全转化 d。

    Reactor for the fixation of a gas on a solid which may be used in particular for chlorination of windscreen wiper blades
    85.
    发明授权
    Reactor for the fixation of a gas on a solid which may be used in particular for chlorination of windscreen wiper blades 失效
    用于将气体固定在固体上的反应器，其可特别用于挡风玻璃刮水器叶片的氯化

    公开(公告)号：US4539185A

    公开(公告)日：1985-09-03

    申请号：US557435

    申请日：1983-12-02

    Applicant: Guy L. Muller ,  Daniel F. Fraioli ,  Michel B. Oulie

    Inventor： Guy L. Muller ,  Daniel F. Fraioli ,  Michel B. Oulie

    IPC: B01J19/00 ,  B01J15/00 ,  B29C71/00 ,  C08J7/12

    CPC classification number: B01J15/00

    Abstract: A reactor for chlorinating rubber has an inlet opening which closely surrounds the rubber material entering the reactor therethrough, and hence any tendency for escape of chlorine is countered by absorption of that chlorine by the entering completely non-chlorinated rubber. The chlorinated rubber emerging from the outlet opening of the chamber is immersed in water before leaving the reactor and hence the outlet is sealed, by the water, against escape of the chlorine treatment gas. The rubber and chlorine displacements through the reactor are counter current to one another.

    Abstract translation: 用于氯化橡胶的反应器具有入口开口，其紧密地围绕通过其进入反应器的橡胶材料，因此通过进入完全非氯化橡胶吸收氯来抵消氯的逸出的任何倾向。 从室的出口开口出来的氯化橡胶在离开反应器之前被浸入水中，因此出口被水密封以防止氯处理气体逸出。 通过反应器的橡胶和氯位移相互逆流。

    Plasma processor
    86.
    发明授权
    Plasma processor 失效
    等离子处理器

    公开(公告)号：US4123316A

    公开(公告)日：1978-10-31

    申请号：US729987

    申请日：1976-10-06

    Applicant: Takashi Tsuchimoto

    Inventor： Takashi Tsuchimoto

    IPC: B01J15/00 ,  C23C16/513 ,  C23C16/54 ,  H01J37/32 ,  H05H1/30 ,  B01K1/00

    CPC classification number: H01J37/32431 ,  B01J15/00 ,  C23C16/513 ,  C23C16/54 ,  H05H1/30

    Abstract: A plasma processor comprising a plasma generating chamber which has a plasma outflow port, an evacuated plasma processing chamber which receives therein a member to be processed, such as a semiconductor substrate, and coaxial magnet means to form coaxial magnetic fields for transporting plasma from the plasma outflow port of the plasma generating chamber to the member to be processed, the distance between the plasma outflow port and the member to be processed being made shorter than the mean free path of gas remaining in the plasma processing chamber.

    Abstract translation: 一种等离子体处理器，包括具有等离子体流出口的等离子体产生室，其中容纳诸如半导体衬底的待处理部件的真空等离子体处理室和同轴磁体装置，以形成用于从等离子体输送等离子体的同轴磁场 等离子体产生室的流出口到待处理的构件，等离子体流出口和待处理构件之间的距离比等离子体处理室中剩余的气体的平均自由程短。

    Apparatus for preparation of finely particulate silicon oxides
    88.
    发明授权
    Apparatus for preparation of finely particulate silicon oxides 失效
    制备细颗粒硅氧化物的装置

    公开(公告)号：US3817711A

    公开(公告)日：1974-06-18

    申请号：US20525071

    申请日：1971-12-06

    Applicant: LONZA AG

    Inventor： KUGLER T ,  SILBIGER J

    IPC: B01J15/00 ,  C01B33/18 ,  H05H1/34 ,  C01B33/00 ,  B01J1/00

    CPC classification number: B82Y30/00 ,  B01J15/00 ,  C01B33/182 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/80 ,  H05H1/3405 ,  H05H2001/3452

    Abstract: A LIQUID STABILIZED PLASMA BURNER HAVING A CATHODE AND AN ANODE SPACED THEREFROM, TOGETHER WITH CHARGING MEANS INCLUDING STABILIZING LIQUID MEDIUM INLET PORTS FOR FEEDING A LIQUID STABILIZING MEDIUM TO THE PLASMA BURNER, AND WITHDRAWING MEANS INCLUDING OUTLET PORTS FOR WITHDRAWING LIQUID STABILIZING MEDIUM FROM THE BURNER TOGETHER WITH A GASEOUS PORTION THAT IS EVAPORATED AND DECOMPOSED IN THE ARC ZONE OF THE BURNER IS PROVIDED WITH AN INPUT CONDUIT IN THE VICINITY OF THE ANODE CONNECTED WITH A PNEUMATIC POWDER CONVEYER INTO WHICH IS FED COARSE PARTICULATE SILICON DIOXIDE AND THE GASEOUS EVAPORATED STABILIZING MEDIUM FROM THE WITHDRAWING MEANS USED TO CONVEY THE PARTICULATE SILICON DIOXIDE TO THE PLASMA ARC, THE OUTLET PORTS OF THE PLASMA BURNER CONNECTED TO CONVEY THE EVAPORATED AND LIQUID STABILIZING MEDIUM TO A SEPARATING DEVICE FROM WHICH LIQUID STABILIZING MEDIUM IS RECYCLED BACK TO THE INLET PORTS OF THE PLASMA BURNER AND THE EVAPORATED STABILIZING MEDIUM IS CONVEYED MEDIUM, AN PNEUMATIC POWDER CONVEYOR FOR CONVEYING MEDIUM, AN INSULATED VESSEL HAVING AN AXIALLY DIRECTED REACTION SPACE POSITIONED OUTWARDLY OF THE ANODE AND IN ALIGNMENT WITH THE CATHODE AND BOUNDED IN THE RADIAL DIRECTION AND A QUENCHING DEVICE POSITIONED IN AXIAL ALIGMENT THEREWITH AND CONTAINING A QUENCHING SPRAY THEREIN TO FORM FINELY PARTICULATE SILICON MONOXIDE. A REOXIDATION VESSEL HAVING A REOXIDATION SPACE AXIALLY POSITIONED BETWEEN THE INSULATED VESSEL AND A QUENCHING DEVICE MAY BE UTILIZED WITH A REOXIDATION SPRAY THEREIN FOR PRODUCING SILICON DIOXIDE.

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