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    Process and apparatus for the curing of coatings on sensitive substrates by electron irradiation
    81.
    发明授权
    Process and apparatus for the curing of coatings on sensitive substrates by electron irradiation 失效
    用于通过电子辐射固化敏感基材上的涂层的方法和设备

    公开(公告)号：US4246297A

    公开(公告)日：1981-01-20

    申请号：US940034

    申请日：1978-09-06

    Applicant: Sam V. Nablo ,  Alfred D. Fussa

    Inventor： Sam V. Nablo ,  Alfred D. Fussa

    IPC: B41F23/00 ,  D06B11/00 ,  D06B19/00 ,  F26B3/28 ,  G21K5/00 ,  B05D3/06

    CPC classification number: B41F23/00 ,  D06B11/0076 ,  D06B19/007 ,  F26B3/28 ,  G21K5/00

    Abstract: This disclosure deals with a new process and apparatus for using a critically adjusted electron beam to cure protective and decorative coatings, including opaque, heavily pigmented coatings, on paper, fabric and other thin substrates which are sensitive to heat or various forms of radiation. The process utilizes restricted dose, energy and process rates to obviate degradation of the substrate during curing and to achieve previously unattainable line speeds in the curing of coatings on products of web, sheet and filamentary geometry.

    Abstract translation: 本公开涉及一种用于使用严格调整的电子束来固化保护性和装饰性涂层（包括不透明的，重度着色的涂层）在纸张，织物和其它对热或各种形式的辐射敏感的薄基材上的新方法和装置。 该方法利用限制剂量，能量和加工速率来消除固化期间底物的降解，并且在卷材，片材和丝状几何形状的产品上的涂层固化中达到先前无法达到的线速度。

    PARABOLIC CASSEGRAIN-TYPE REFLECTOR FOR ABLATION LOADING
    86.
    发明公开
    PARABOLIC CASSEGRAIN-TYPE REFLECTOR FOR ABLATION LOADING 审中-公开

    公开(公告)号：US20240019614A1

    公开(公告)日：2024-01-18

    申请号：US18472835

    申请日：2023-09-22

    Applicant: lonQ, Inc. ,  Duke University

    Inventor： Kenneth WRIGHT ,  Jason Madjdi AMINI ,  Jungsang KIM

    IPC: G02B5/10 ,  G21K5/00

    CPC classification number: G02B5/10 ,  G21K5/00

    Abstract: Aspects of the present disclosure describe techniques for using a parabolic Cassegrain-type reflector for ablation. For example, a system for ablation loading of a trap is described that includes a reflector having a hole aligned with a loading aperture of the trap, and an atomic source positioned at a focal point of the reflector, where one or more laser beams are reflected from a reflective front side of the reflector and focused on a surface of the atomic source to produce an atomic plume, and the atomic plume once produced passing through the hole in the reflector and through a loading aperture of the trap for loading the trap. A method for ablation loading of a trap within a chamber in a trapped ion system is also described.

    Atomic beam source
    88.
    发明授权
    Atomic beam source 有权

    公开(公告)号：US09947428B2

    公开(公告)日：2018-04-17

    申请号：US15429408

    申请日：2017-02-10

    Applicant: NGK INSULATORS, LTD.

    Inventor： Hiroyuki Tsuji ,  Tomonori Takahashi ,  Yoshimasa Kondo ,  Kazumasa Kitamura ,  Takayoshi Akao ,  Tomoki Nagae

    IPC: G21G4/00 ,  G21K5/00

    CPC classification number: G21K5/00 ,  G21K5/02 ,  H05H1/46 ,  H05H3/02

    Abstract: An atomic beam source includes a tubular cathode that includes an emission portion that includes an emission port through which an atomic beam can be emitted, a rod-shaped first anode disposed inside the cathode, and a rod-shaped second anode disposed inside the cathode and spaced from the first anode. At least one selected from the group consisting of a shape of the cathode, a shape of the first anode, a shape of the second anode, and a positional relationship between the cathode, the first anode, and the second anode is predetermined so that emission of sputter particles resulting from collision of cations, which have been generated by plasma between the first anode and the second anode, with at least one selected from the cathode, the first anode, and the second anode is reduced.

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