公开(公告)号：US20150015858A1

公开(公告)日：2015-01-15

申请号：US14504191

申请日：2014-10-01

申请人： ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG

发明人： Christiaan Alexander HOOGENDAM ,  Erik Roelof LOOPSTRA ,  Bob STREEFKERK ,  Bernhard GELLRICH ,  Andreas WURMBRAND

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

公开(公告)号：US08810771B2

公开(公告)日：2014-08-19

申请号：US13323404

申请日：2011-12-12

申请人： Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Bernhard Gellrich ,  Andreas Wurmbrand

发明人： Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Bernhard Gellrich ,  Andreas Wurmbrand

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

公开(公告)号：US20120120377A1

公开(公告)日：2012-05-17

申请号：US13356231

申请日：2012-01-23

申请人： Christiaan Alexander HOOGENDAM ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Bernhard Gellrich ,  Andreas Wurmbrand

发明人： Christiaan Alexander HOOGENDAM ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Bernhard Gellrich ,  Andreas Wurmbrand

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

公开(公告)号：US08174674B2

公开(公告)日：2012-05-08

申请号：US12230979

申请日：2008-09-09

申请人： Johannes Catharinus Hubertus Mulkens ,  Johannes Jacobus Matheus Baselmans ,  Paul Graupner ,  Erik Roelof Loopstra ,  Bob Streefkerk

发明人： Johannes Catharinus Hubertus Mulkens ,  Johannes Jacobus Matheus Baselmans ,  Paul Graupner ,  Erik Roelof Loopstra ,  Bob Streefkerk

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70891 ,  G02B3/14 ,  G02B21/33 ,  G03F7/70341

摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.

摘要翻译： 浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学性质。 该空间可以位于投影系统和基板之间。 调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。

公开(公告)号：US08094287B2

公开(公告)日：2012-01-10

申请号：US12232861

申请日：2008-09-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.

摘要翻译： 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括第一气体调节子环境和第二气体调节子环境。 该装置包括：气体控制单元，被配置为控制经由第一子环境将调节气体进入第一子环境并进入第二子环境，以防止从第二子环境到第一子环境的污染， 环境。 该装置包括：门，该门被配置为以从第二子环境到环境大气的速率泄漏经调节的气体;以及检测器，被配置为检测第二气体条件环境的至少一个性质。

公开(公告)号：US20110211252A1

公开(公告)日：2011-09-01

申请号：US13081394

申请日：2011-04-06

申请人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

发明人： David Shafer ,  Wilhelm Ulrich ,  Aurelian Dodoc ,  Rudolf Von Buenau ,  Hans-Juergen Mann ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G02B17/08

CPC分类号： G02B17/0816 ,  G02B13/16 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0804 ,  G02B17/0812 ,  G02B17/0892 ,  G02B21/02 ,  G02B21/33 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax (Y′−NA2) and wherein the condition COMP1

摘要翻译： 用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax（Y'-NA2），并且其中条件COMP1 <10成立。

公开(公告)号：US20110134403A1

公开(公告)日：2011-06-09

申请号：US11573628

申请日：2005-09-16

申请人： Heiko Feldmann ,  Alexander Epple ,  Vladan Blahnik

发明人： Heiko Feldmann ,  Alexander Epple ,  Vladan Blahnik

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70258 ,  G03F7/70341

摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is designed for dry operation of the projection objective. According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element is replaceable with the dry terminating element. Preferably, the dry terminating element and/or the immersion terminating element is composed of a plurality of plates, which are made of materials having different refractive indices.

摘要翻译： 微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干的终端元件，其不具有屈光力并被设计用于投射物镜的干燥操作。 根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件，并且被设计用于投影物镜的浸入操作。 浸没终端元件可用干端接元件替换。 优选地，干端接元件和/或浸没终端元件由多个由折射率不同的材料制成的板组成。

公开(公告)号：US07952685B2

公开(公告)日：2011-05-31

申请号：US11724331

申请日：2007-03-15

申请人： Michel Fransois Hubert Klaassen ,  Hendrikus Robertus Marie Van Greevenbroek ,  Bernd Geh ,  Emil Peter Schmitt-Weaver

发明人： Michel Fransois Hubert Klaassen ,  Hendrikus Robertus Marie Van Greevenbroek ,  Bernd Geh ,  Emil Peter Schmitt-Weaver

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/701 ,  G03F7/70566

摘要： An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.

摘要翻译： 一种用于光刻设备的照明器，所述照明器包括照明模式限定元件和多个偏振调节器，所述偏振调节器可移动到与具有角度和空间分布的辐射束的部分交叉中，所述辐射束具有由限定 元件。

公开(公告)号：US20110085179A1

公开(公告)日：2011-04-14

申请号：US12895747

申请日：2010-09-30

申请人： Hans-Juergen Mann ,  Wolfgang Singer

发明人： Hans-Juergen Mann ,  Wolfgang Singer

IPC分类号： G01B11/14 ,  G01N21/00

CPC分类号： G03F9/7026 ,  G03F7/70233 ,  G03F7/70666

摘要： An apparatus (10) for microlithographic projection exposure, which includes: an optical system (18) for imaging mask structures (16) onto a surface (21) of a substrate (20) by projecting the mask structures (16) with imaging radiation (13), the optical system (18) being configured to operate in the EUV and/or higher frequency wavelength range, and various structure defining a measurement beam path (36) for guiding measurement radiation (34), the measurement beam path (36) extending within the optical system (18) such that the measurement radiation (34) only partially passes through the optical system (18) during operation of the apparatus (10).

摘要翻译： 一种用于微光刻投影曝光的装置（10），其包括：用于通过用掩模结构（16）投射成像辐射将掩模结构（16）成像到基板（20）的表面（21）上的光学系统（18） 13），所述光学系统（18）被配置为在EUV和/或更高频率波长范围内操作，以及限定用于引导测量辐射（34）的测量光束路径（36），测量光束路径（36） 在光学系统（18）内延伸，使得测量辐射（34）在设备（10）的操作期间仅部分地通过光学系统（18）。

公开(公告)号：US20110069296A1

公开(公告)日：2011-03-24

申请号：US12946380

申请日：2010-11-15

申请人： Toralf GRUNER ,  Daniel KRAEHMER ,  Michael TOTZECK ,  Johannes WANGLER ,  Markus BROTSACK ,  Nils DIECKMANN ,  Aksel GOEHNERMEIER ,  Markus SCHWAB ,  Damian FIOLKA ,  Markus ZENZINGER

发明人： Toralf GRUNER ,  Daniel KRAEHMER ,  Michael TOTZECK ,  Johannes WANGLER ,  Markus BROTSACK ,  Nils DIECKMANN ,  Aksel GOEHNERMEIER ,  Markus SCHWAB ,  Damian FIOLKA ,  Markus ZENZINGER

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。