公开(公告)号：US20110005143A1

公开(公告)日：2011-01-13

申请号：US12886810

申请日：2010-09-21

申请人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

发明人： Kenji Aoki ,  Toru Yamazaki ,  Takehiro Watanabe ,  Naoyuki Hamada

IPC分类号： C09K3/14 ,  C09G1/02

CPC分类号： H01L21/02024 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1472 ,  H01L29/1608

摘要： A hard crystal substrate such as a GaN substrate or a SiC substrate is polished by using polishing oil slurry having abrading particles of artificial diamond clusters dispersed in a dispersant. The artificial diamond clusters include approximately spherical agglomerate particles with average particle size D50 of 20 nm or more and 50 nm or less, having primary particles with particle diameters of 2 nm or more and 10 nm or less. A rough polishing process is carried out first such that an average surface roughness of 0.5 nm or more and 1 nm or less is obtained, followed by a finishing process such that the average surface roughness of said surface becomes 0.2 nm or less.

摘要翻译： 通过使用分散在分散剂中的具有研磨人造金刚石颗粒的抛光油浆来研磨诸如GaN衬底或SiC衬底的硬质晶体衬底。 人造金刚石团簇包括具有粒径为2nm以上且10nm以下的一次粒子的平均粒径D 50为20nm以上且50nm以下的近似球状的聚集体颗粒。 首先进行粗抛光处理，使得得到0.5nm以上且1nm以下的平均表面粗糙度，然后进行表面的平均表面粗糙度为0.2nm以下的精加工。

公开(公告)号：US07776793B2

公开(公告)日：2010-08-17

申请号：US12064942

申请日：2007-07-05

申请人： Takehiro Watanabe ,  Sanaki Horimoto ,  Takuya Nagamine ,  Yuji Horie

发明人： Takehiro Watanabe ,  Sanaki Horimoto ,  Takuya Nagamine ,  Yuji Horie

IPC分类号： H01L39/24

CPC分类号： B24B7/13

摘要： A polishing system and a method are presented for uniformly polishing efficiently at a fast rate the surface of a tape-like metallic base material of several hundred meters in length. The polishing system is provided not only with devices for causing the base material to travel continuously and applying a specified tension in the base material but also with a first polishing device for randomly polishing the target surface and a second polishing device for carrying out a final polishing on the target surface in the direction of travel of the base material. Polishing marks are formed in the direction of travel on the target surface by the final polishing.

摘要翻译： 提出了一种抛光系统和方法，用于以高达数百米长的带状金属基材的表面快速均匀地均匀研磨。 抛光系统不仅具有用于使基材连续行进并在基材中施加特定张力的装置，而且还提供用于随机抛光目标表面的第一抛光装置和用于进行最终抛光的第二抛光装置 在基材的行进方向上的目标表面上。 通过最终研磨，在目标表面上的行进方向上形成抛光标记。

公开(公告)号：US20100203809A1

公开(公告)日：2010-08-12

申请号：US12707904

申请日：2010-02-18

申请人： Noriyuki Kumasaka

发明人： Noriyuki Kumasaka

IPC分类号： B24B1/00

CPC分类号： C09K3/1409 ,  C01B32/25 ,  C01B32/28

摘要： Polishing particles are made of artificial diamond produced by a shock method, having density of 3.0-3.35 g/cm3 and including secondary particles with average particle diameter of 30 nm-500 nm. Such polishing particles are produced by firstly obtaining a product containing artificial diamond by a shock method, then subjecting this product to an acid treatment by using one or more strong acids such as concentrated sulfuric acid, concentrated nitric acid and concentrated hydrochloric acid to thereby remove impurities from and wash the product, thereafter subjecting the product to a classification process to thereby separate artificial diamond of a first kind having secondary particles with particle diameters of 30 nm-500 nm and artificial diamond of a second kind having secondary particles with particle diameters in excess of 500 nm and selecting artificial diamond of a third kind having density of 3.0-3.35 g/cm3 out of the artificial diamond of the first kind. It is the artificial diamond of the third kind that is to be used as the diamond polishing particles.

摘要翻译： 抛光颗粒由人造金刚石制成，其具有密度为3.0-3.35g / cm 3的冲击法制备，并且包括平均粒径为30nm-500nm的二次粒子。 通过首先通过冲击法获得含有人造金刚石的产品，然后通过使用一种或多种强酸例如浓硫酸，浓硝酸和浓盐酸对该产物进行酸处理，从而除去杂质， 然后对产品进行洗涤，然后对产品进行分级处理，从而分离具有粒径为30nm-500nm的二次粒子的第一种人造金刚石和具有粒径超过二次粒子的第二种人造金刚石 的500nm的人造金刚石，并且从第一类人造金刚石中选择密度为3.0-3.35g / cm 3的第三种人造金刚石。 是用作金刚石抛光颗粒的第三种人造金刚石。

公开(公告)号：US20090092023A1

公开(公告)日：2009-04-09

申请号：US12241420

申请日：2008-09-30

申请人： Yuji Horie ,  Yasuyuki Yokota ,  Jun Tamura ,  Akihiro Sakamoto ,  Noriyuki Kumasaka

发明人： Yuji Horie ,  Yasuyuki Yokota ,  Jun Tamura ,  Akihiro Sakamoto ,  Noriyuki Kumasaka

IPC分类号： G11B23/50 ,  B05D3/00

CPC分类号： G11B23/505 ,  B08B1/02 ,  B08B7/0028 ,  B24D11/00

摘要： A cleaning tape has a base tape made of a synthetic resin and a cleaning layer formed on a surface of this base tape. The cleaning layer has a binding agent and a large number of spherical particles dispersed in the binding agent in a single particle layer. Such a cleaning tape is capable of removing very small unwanted protrusions and particles on the surface of a target object such as a magnetic hard disk without forming scratches.

摘要翻译： 清洁带具有由合成树脂制成的基带和形成在该基带的表面上的清洁层。 清洁层在单个颗粒层中具有粘合剂和分散在粘合剂中的大量球形颗粒。 这样的清洁带能够在没有形成划痕的情况下去除诸如磁性硬盘的目标物体表面上的非常小的不想要的突起和颗粒。

公开(公告)号：US07374473B2

公开(公告)日：2008-05-20

申请号：US11605497

申请日：2006-11-27

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： B24B29/00 ,  B24B21/04

CPC分类号： C09K3/1463 ,  B24B21/12 ,  B24B37/044 ,  C09G1/02

摘要： Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.

摘要翻译： 通过将指定种类的研磨颗粒分散在指定种类的分散剂中，获得用于磁化硬盘基片的纹理化浆料。 研磨颗粒包括由一次粒径为20nm以下的人造金刚石颗粒形​​成的金刚石簇，并以一定比例包含含氯的杂质。 金刚石簇的簇直径和平均簇直径均在规定的范围内。 为了使衬底表面纹理化，衬底旋转，本发明的纹理浆料被提供给表面，并且指定类型的纹理带在其被运行时被压靠在衬底表面上。

公开(公告)号：US20070231245A1

公开(公告)日：2007-10-04

申请号：US11805458

申请日：2007-05-23

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： C09K3/14 ,  B01J3/06

CPC分类号： G11B5/8404 ,  B24D11/00 ,  C01B32/25 ,  C09K3/1436 ,  C09K3/1463

摘要： Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.

摘要翻译： 金刚石簇用作自由研磨颗粒的抛光材料，每个颗粒是一次粒径为20nm以下的人造金刚石颗粒和附着在这些金刚石颗粒周围的杂质的组合。 杂质中含有的非金刚石碳的密度在95％以上且99％以下的范围，杂质以外的非金刚石碳以外的氯的密度为0.5％以上，优选为3.5 ％ 或更少。 这些金刚石簇的直径在30nm以上且500nm以下的范围内，其平均直径为30nm以上且200nm以下的范围。 首先通过爆炸冲击法制造这种抛光材料，以获得金刚石簇，然后除去杂质，从而调节杂质中包含的非金刚石碳的密度和杂质中除非金刚石碳以外的其它的密度。

公开(公告)号：US07254861B2

公开(公告)日：2007-08-14

申请号：US10289494

申请日：2002-11-05

申请人： Izuru Morioka ,  Satoru Sato

发明人： Izuru Morioka ,  Satoru Sato

IPC分类号： B24B19/00 ,  B24D15/04

CPC分类号： B24D15/04 ,  G01R1/06711 ,  G01R3/00

摘要： A device for cleaning the tip portion and the side surfaces of a probe has two or more different kinds of intermediate sheets affixed to a substrate in a side-by-side relationship with respect to each other. One of these intermediate sheets is an elastic sheet having an elastic property. Another intermediate sheet of a different kind is a plastic sheet which is less elastic. The tip portion of a probe is cleaned by a polishing layer affixed to the elastic sheet. The side surfaces of the probe are cleaned by a polishing layer affixed to the plastic sheet. A porous foamed sheet having openings on its surface and having air bubbles inside may be used as the elastic sheet. A polishing layer is formed on the surface of the foamed sheet, having a porous surface with openings corresponding to the openings on the foamed sheet. A spacer may be provided between the substrate and the plastic sheet for adjusting the heights of the polishing layers formed over the intermediate sheets.

摘要翻译： 用于清洁探针的尖端部分和侧表面的装置具有彼此并排地固定到基板上的两种或更多种不同种类的中间片。 这些中间片之一是具有弹性的弹性片。 另一种不同种类的中间片是弹性较小的塑料片。 探针的尖端部分被固定在弹性片上的抛光层清洁。 探针的侧表面被固定在塑料片上的抛光层清洁。 可以使用在其表面上具有开口并且内部具有气泡的多孔泡沫片作为弹性片。 在发泡片材的表面上形成抛光层，其具有与发泡片材上的开口对应的开口的多孔表面。 可以在衬底和塑料片之间设置间隔件，以调节在中间片上形成的抛光层的高度。

公开(公告)号：US20070123153A1

公开(公告)日：2007-05-31

申请号：US11605497

申请日：2006-11-27

申请人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

发明人： Noriyuki Kumasaka ,  Yuji Horie ,  Mitsuru Saito ,  Kazuei Yamaguchi

IPC分类号： B24B7/30

CPC分类号： C09K3/1463 ,  B24B21/12 ,  B24B37/044 ,  C09G1/02

摘要： Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.

摘要翻译： 通过将指定种类的研磨颗粒分散在指定种类的分散剂中，获得用于磁化硬盘基片的纹理化浆料。 研磨颗粒包括由一次粒径为20nm以下的人造金刚石颗粒形​​成的金刚石簇，并以一定比例包含含氯的杂质。 金刚石簇的簇直径和平均簇直径均在规定的范围内。 为了使衬底表面纹理化，衬底旋转，本发明的纹理浆料被提供给表面，并且指定类型的纹理带在其被运行时被压靠在衬底表面上。

公开(公告)号：US5569063A

公开(公告)日：1996-10-29

申请号：US499286

申请日：1995-07-06

申请人： Izuru Morioka ,  Kenji Kuwano

发明人： Izuru Morioka ,  Kenji Kuwano

IPC分类号： B24B13/015 ,  B24B21/00

CPC分类号： B24B13/015 ,  B24B21/004

摘要： A polishing apparatus, for polishing/cleaning a target object surface by using a polishing tape, has a spindle rotatably placed inside an opening formed in a base plate, a motor for rotating the spindle, a compression roller rotatably supported between a pair of side walls attached to the spindle, supply and take-up rollers supported rotatably by the side walls for advancing the polishing tape, and a motor for the take-up roller. The polishing tape is supplied from the supply roller and taken up by the take-up roller through the compression roller, while rotating around with the spindle. The compression roller has a smaller diameter at its center part than at its end parts for preventing the polishing tape from becoming twisted or wrinkled when the compression roller is rotated by the motion of the spindle while being pressed against a target object and being advanced from the supply roller to the take-up roller.

摘要翻译： 用于通过使用研磨带对目标物体表面进行研磨/清洗的抛光装置具有可旋转地设置在形成于基板的开口内的主轴，用于旋转主轴的马达，可旋转地支撑在一对侧壁 连接到主轴上，由侧壁可旋转地支撑的用于推进研磨带的供应和卷取辊以及用于卷取辊的马达。 研磨带从供给辊供给，并通过压缩辊被卷取辊吸收，同时与主轴一起旋转。 压缩辊在其中心部分的直径比其端部处的直径小，以防止当压缩辊由于主轴的运动而被旋转而被压靠在目标物体上并从前进方向旋转时，抛光带被扭曲或起皱 向卷取辊供给辊。

公开(公告)号：US07927187B2

公开(公告)日：2011-04-19

申请号：US12126383

申请日：2008-05-23

申请人： Jun Watanabe ,  Tetsujiro Tada ,  Takashi Arahata ,  Jun Tamura ,  Moriaki Akazawa ,  Masaru Sakamoto ,  Takahiko Kawasaki

发明人： Jun Watanabe ,  Tetsujiro Tada ,  Takashi Arahata ,  Jun Tamura ,  Moriaki Akazawa ,  Masaru Sakamoto ,  Takahiko Kawasaki

IPC分类号： B24B7/22

CPC分类号： B24B37/26

摘要： A circular polishing pad has grooves formed on the surface in a spiral pattern with its center point offset from the center of the pad. The spiral pattern is an Archimedean spiral pattern or a parabolic spiral pattern. A target object is polished by using such a polishing pad without oscillating the platen to which the polishing pad is pasted or the polishing head that holds the target object.

摘要翻译： 圆形抛光垫具有以螺旋形图案形成在其表面上的凹槽，其中心点偏离垫的中心。 螺旋图案是阿基米德螺旋图案或抛物线螺旋图案。 也就是说，通过使用这样的抛光垫，抛光目标物体，而不会使保持目标物体的抛光头摆动。