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    MANAGING ENTITLEMENTS IN A MULTI-TENANT DATABASE ENVIRONMENT
    3.
    发明申请
    MANAGING ENTITLEMENTS IN A MULTI-TENANT DATABASE ENVIRONMENT 审中-公开
    管理多个数据库环境中的执行

    公开(公告)号：US20110282907A1

    公开(公告)日：2011-11-17

    申请号：US12977578

    申请日：2010-12-23

    申请人： Michael Ramsey ,  Marco S. Casalaina ,  Benjamin Tsai ,  Michael Tang ,  Luke Fu ,  Rachel Wang

    发明人： Michael Ramsey ,  Marco S. Casalaina ,  Benjamin Tsai ,  Michael Tang ,  Luke Fu ,  Rachel Wang

    IPC分类号： G06F17/30

    CPC分类号： G06F21/6218

    摘要： A system and method for managing entitlements in a multi-tenant database system. In one embodiment, a method includes receiving service level definitions for one or more entitlements, and maintaining the one or more entitlements. The method further includes verifying if one or more users are eligible for the one or more entitlements, and enforcing the one or more entitlements based on the service level definitions.

    摘要翻译： 一种用于管理多租户数据库系统中的权利的系统和方法。 在一个实施例中，一种方法包括接收一个或多个授权的服务级别定义，以及维护一个或多个授权。 该方法还包括验证一个或多个用户是否符合一个或多个授权的资格，以及基于服务级别定义来执行一个或多个授权。

    Optical inspection of a specimen using multi-channel responses from the specimen
    4.
    发明申请
    Optical inspection of a specimen using multi-channel responses from the specimen 审中-公开
    使用样品的多通道响应对样本进行光学检查

    公开(公告)号：US20080285023A1

    公开(公告)日：2008-11-20

    申请号：US12214858

    申请日：2008-06-23

    申请人： Bin-Ming Benjamin Tsai ,  Russell M. Pon

    发明人： Bin-Ming Benjamin Tsai ,  Russell M. Pon

    IPC分类号： G01N21/956

    CPC分类号： G01N21/956 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/9505 ,  G01N21/95607 ,  G01N2021/8825 ,  G01N2021/95615 ,  G01N2021/95676

    摘要： A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

    摘要翻译： 一种方法和检查系统，用于在第二图案已知对至少一个探针具有响应的情况下检查样本上的第一图案的缺陷，以防止相同的第二图案。 通过将至少一个探针施加到样品上的第一图案的点上以从样品产生至少两个响应来进行检查。 然后从第一模式检测第一和第二响应，然后将每个响应与来自第二模式的相同点的相应响应进行比较，以产生第一和第二响应差信号。 然后，第一和第二响应差信号被一起处理以单方面地确定第一模式缺陷列表。

    Confocal wafer inspection method and apparatus using fly lens arrangement
    5.
    发明授权
    Confocal wafer inspection method and apparatus using fly lens arrangement 有权
    共焦晶片检查方法和使用飞行透镜装置的装置

    公开(公告)号：US07399950B2

    公开(公告)日：2008-07-15

    申请号：US11521930

    申请日：2006-09-15

    申请人： Christopher R. Fairley ,  Tao-Yi Fu ,  Bin-Ming Benjamin Tsai ,  Scott A. Young

    发明人： Christopher R. Fairley ,  Tao-Yi Fu ,  Bin-Ming Benjamin Tsai ,  Scott A. Young

    IPC分类号： G02B7/04

    CPC分类号： G01N21/9501 ,  G02B3/0056 ,  G02B21/0024 ,  G02B21/0028 ,  G02B21/008 ,  G02B27/40

    摘要： A semiconductor wafer inspection system and method is provided which uses a multiple element arrangement, such as an offset fly lens array. The preferred embodiment uses a laser to transmit light energy toward a beam expander, which expands the light energy to create an illumination field. An offset fly lens array converts light energy from the illumination field into an offset pattern of illumination spots. A lensing arrangement, including a first lens, a transmitter/reflector, an objective, and a Mag tube imparts light energy onto the specimen and passes the light energy toward a pinhole mask. The pinhole mask is mechanically aligned with the offset fly lens array. Light energy passing through each pinhole in the pinhole mask is directed toward a relay lens, which guides light energy onto a sensor. The offset fly lens array corresponds to the pinhole mask. The offset pattern of the offset fly lens array is chosen such that spots produced can be recombined into a continuous image, and the system utilizes a time delay and integration charge coupled device for rapid sensing along with an autofocus system that measures and cancels topological features of the specimen.

    摘要翻译： 提供了使用多重元件布置的半导体晶片检查系统和方法，例如偏移飞行透镜阵列。 优选实施例使用激光将光能传递到光束扩展器，其扩展光能以产生照明场。 偏移飞行透镜阵列将来自照明场的光能转换成照明点的偏移图案。 包括第一透镜，发射器/反射器，物镜和Mag管的透镜装置将光能量施加到样本上并将光能传递给针孔掩模。 针孔掩模与偏置飞行透镜阵列机械对准。 通过针孔掩模中的每个针孔的光能被引向中继透镜，该中继透镜将光能引导到传感器上。 偏移飞行透镜阵列对应于针孔掩模。 选择偏移飞行透镜阵列的偏移图案，使得所产生的斑点可以重新组合成连续图像，并且系统利用时间延迟和积分电荷耦合器件与快速感测以及自动对焦系统一起测量和消除拓扑特征 标本。

    Multi-pixel methods and apparatus for analysis of defect information from test structures on semiconductor devices
    7.
    发明授权
    Multi-pixel methods and apparatus for analysis of defect information from test structures on semiconductor devices 有权
    用于分析半导体器件上测试结构的缺陷信息的多像素方法和装置

    公开(公告)号：US06771806B1

    公开(公告)日：2004-08-03

    申请号：US09648381

    申请日：2000-08-25

    申请人： Akella V. S. Satya ,  David L. Adler ,  Bin-Ming Benjamin Tsai ,  David J. Walker

    发明人： Akella V. S. Satya ,  David L. Adler ,  Bin-Ming Benjamin Tsai ,  David J. Walker

    IPC分类号： G06K900

    CPC分类号： H01L22/34 ,  G01N21/66 ,  G01N21/9501 ,  G01N21/956 ,  G01R31/2884 ,  G01R31/307

    摘要： Disclosed is a method for detecting electrical defects on test structures of a semiconductor die. The test structures includes a plurality of electrically-isolated test structures and a plurality of non-electrically-isolated test structures. The test structures each has a portion located partially within a scan area. The portion of the test structures located within the scan area is scanned to obtain voltage contrast images of the test structures' portions. In a multi-pixel processor, the obtained voltage contrast images are analyzed to determine whether there are defects present within the test structures. In a preferred embodiment, the multi-pixel processor operates with pixel resolution sizes in a range of about 25 nm to 200 nm. In another aspect, the processor operates with a pixel size nominally equivalent to two times a width of the test structure's line width to maximize throughput at optimal signal to noise sensitivity. A computer readable medium having programming instructions for performing the above described methods is also disclosed.

    摘要翻译： 公开了一种用于检测半导体管芯的测试结构上的电缺陷的方法。 测试结构包括多个电隔离测试结构和多个非电隔离测试结构。 测试结构各自具有部分位于扫描区域内的部分。 扫描区域内的测试结构部分被扫描，以获得测试结构部分的电压对比度图像。 在多像素处理器中，分析获得的电压对比图像，以确定测试结构内是否存在缺陷。 在优选实施例中，多像素处理器以约25nm至200nm的范围内的像素分辨率尺寸进行操作。 在另一方面，处理器以标称等于测试结构线宽度的两倍的像素大小进行操作，以在最佳信噪比灵敏度下最大化吞吐量。 还公开了一种具有用于执行上述方法的编程指令的计算机可读介质。

    Methods and apparatus for optimizing semiconductor inspection tools
    9.
    发明授权
    Methods and apparatus for optimizing semiconductor inspection tools 有权
    优化半导体检测工具的方法和设备

    公开(公告)号：US06433561B1

    公开(公告)日：2002-08-13

    申请号：US09648096

    申请日：2000-08-25

    申请人： Akella V. S. Satya ,  Gustavo A. Pinto ,  Robert Thomas Long ,  Bin-Ming Benjamin Tsai ,  Brian C. Leslie

    发明人： Akella V. S. Satya ,  Gustavo A. Pinto ,  Robert Thomas Long ,  Bin-Ming Benjamin Tsai ,  Brian C. Leslie

    IPC分类号： G01R31308

    CPC分类号： H01L22/34 ,  G01N21/66 ,  G01N21/956 ,  G01R31/2884 ,  G01R31/307 ,  H01J2237/2817

    摘要： Disclosed is a method of inspecting a sample. At least a portion of the sample is illuminated. Signals received from the illuminated portion are detected, and the detected signals are processed to find defects present on the sample. The processing of the detected signals is optimized, at least in part, based upon results obtained from voltage contrast testing. In one implementation, the illumination is an optical illumination. In another embodiment, the processing comprises automated defect classification, and setup of the automated classification is optimized using the results obtained from voltage contrast testing. In another implementation, the results relate to a probability that a feature present on the sample represents an electrical defect.

    摘要翻译： 公开了一种检查样品的方法。 样品的至少一部分被照亮。 检测从照明部分接收到的信号，并且处理检测到的信号以发现样品上存在的缺陷。 检测到的信号的处理被优化，至少部分地基于从电压对比度测试获得的结果。 在一个实施方案中，照明是光学照明。 在另一个实施例中，处理包括自动化缺陷分类，并且使用从电压对比度测试获得的结果来优化自动化分类的建立。 在另一实现中，结果涉及样品上存在的特征表示电缺陷的概率。

    System and method for analyzing topological features on a surface
    10.
    发明授权
    System and method for analyzing topological features on a surface 失效
    用于分析表面拓扑特征的系统和方法

    公开(公告)号：US6137570A

    公开(公告)日：2000-10-24

    申请号：US107391

    申请日：1998-06-30

    申请人： Yung-Ho Chuang ,  J. Joseph Armstrong ,  David L. Brown ,  Jason Z. Lin ,  Bin-Ming Benjamin Tsai

    发明人： Yung-Ho Chuang ,  J. Joseph Armstrong ,  David L. Brown ,  Jason Z. Lin ,  Bin-Ming Benjamin Tsai

    IPC分类号： G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G03F7/7065 ,  G01N21/4788 ,  G01N21/95692

    摘要： Disclosed is a method and apparatus for using far field scattered and diffracted light to determine whether a collection of topological features on a surface (e.g., a semiconductor wafer) conforms to an expected condition or quality. This determination is made by comparing the far field diffraction pattern of a surface under consideration with a corresponding diffraction pattern (a "baseline"). If the baseline diffraction pattern and far field diffraction pattern varies by more than a prescribed amount or in characteristic ways, it is inferred that the surface features are defective. The method may be implemented as a die-to-die comparison of far field diffraction patterns of two dies on a semiconductor wafer. The portion of the far field scattered and diffracted light sensitive to a relevant condition or quality can also be reimaged to obtain an improved signal-to-noise ratio.

    摘要翻译： 公开了一种使用远场散射和衍射光来确定表面（例如，半导体晶片）上的拓扑特征的集合是否符合预期状态或质量的方法和装置。 通过将考虑的表面的远场衍射图与相应的衍射图案（“基线”）进行比较来进行该确定。 如果基线衍射图案和远场衍射图案变化超过规定量或以特征方式，则推断表面特征是有缺陷的。 该方法可以实现为半导体晶片上的两个管芯的远场衍射图案的管芯与管芯的比较。 对于相关条件或质量敏感的远场散射和衍射光的部分也可以被重新成像以获得改善的信噪比。