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23 条记录 (耗时 0.026 秒)

    Apparatus and method for flow of process gas in an ultra-clean environment
    2.
    发明授权
    Apparatus and method for flow of process gas in an ultra-clean environment 有权
    在超清洁环境中工艺气体流动的装置和方法

    公开(公告)号：US06949202B1

    公开(公告)日：2005-09-27

    申请号：US09649569

    申请日：2000-08-28

    申请人： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald

    发明人： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald

    IPC分类号： B81B3/00 ,  C23F1/00 ,  C23F1/08 ,  C23F1/12

    CPC分类号： C23F1/08 ,  B81C1/00587 ,  B81C99/0025 ,  B81C2201/0138 ,  B82Y30/00 ,  H01L21/67017

    摘要： Processes for the addition or removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the use of recirculation of the process gas. Recirculation is effected by a pump that has no sliding or abrading parts that contact the process gas, nor any wet (such as oil) seals or purge gas in the pump. Improved processing can be achieved by a process chamber that contains a baffle, a perforated plate, or both, appropriately situated in the chamber to deflect the incoming process gas and distribute it over the workpiece surface. In certain embodiments, a diluent gas is added to the recirculation loop and continuously circulated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop. Also, cooling of the process gas, etching chamber and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample of microscopic dimensions.

    摘要翻译： 通过使用工艺气体的再循环来增强在制造微结构时通过与工艺气体接触而从工件材料中添加或除去层或区域的工艺。 循环由不具有接触工艺气体的滑动或研磨部件的泵以及泵中的任何湿的（例如油）密封件或吹扫气体来实现。 改进的处理可以通过包含挡板，多孔板或两者的处理室来实现，该处理室适当地位于室中以偏转进入的工艺气体并将其分布在工件表面上。 在某些实施方案中，将稀释气体加入再循环回路并在其中连续循环，随后将工艺气体（例如蚀刻剂气体）渗入再循环回路中。 此外，工艺气体，蚀刻室和/或样品台的冷却可以帮助蚀刻工艺。 该方法对于从微观尺寸的样品中添加或除去材料特别有用。

    Method for achieving improved selectivity in an etching process
    3.
    发明授权
    Method for achieving improved selectivity in an etching process 有权
    在蚀刻过程中实现改进的选择性的方法

    公开(公告)号：US06942811B2

    公开(公告)日：2005-09-13

    申请号：US09954864

    申请日：2001-09-17

    申请人： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

    发明人： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

    IPC分类号： B44C1/22 ,  B81B3/00 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F1/08 ,  C23F1/12

    CPC分类号： B81B3/00 ,  B81B2201/045 ,  B81C1/00476 ,  B81C1/00531 ,  B81C1/00595 ,  B81C99/0025 ,  B81C2201/0138 ,  B82Y30/00 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/32135

    摘要： The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. Also, the etch selectivity can be improved by doping the sacrificial material.

    摘要翻译： 通过使用作为惰性气体氟化物或卤素氟化物的蚀刻剂气体在诸如微机电结构的微结构中蚀刻牺牲硅部分，相对于微结构的其它部分，通过减慢蚀刻速率对硅部分具有更大的选择性 。 蚀刻速率优选为30um / hr或更小，并且可以为3um / hr或甚至更小。 通过向蚀刻剂气体中添加非蚀刻剂气体添加剂也提高了选择性。 优选地，具有低于分子氮的摩尔平均配方重量的非蚀刻剂气态添加剂相对于具有较高配方重量的气体添加剂提供了显着的优点，通过在更短的时间段内完成蚀刻，同时仍然实现相同的改进 选择性。 通过精确确定去除步骤的终点的能力也可以增强蚀刻工艺。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。 此外，通过掺杂牺牲材料可以改善蚀刻选择性。

    Universal cantilever support bracket
    6.
    发明授权
    Universal cantilever support bracket 失效
    通用悬臂支架

    公开(公告)号：US06202966B1

    公开(公告)日：2001-03-20

    申请号：US09060915

    申请日：1998-04-15

    申请人： Douglas B. MacDonald ,  Robert J. Hoeft

    发明人： Douglas B. MacDonald ,  Robert J. Hoeft

    IPC分类号： A47G2902

    CPC分类号： A47B57/425 ,  A47B96/1416

    摘要： A multi-position bracket includes a cantilever body defining first and second sides, and including rear and upper orthogonal edges. The rear edge includes at least one hook shaped to removably engage slots of an upright. The multi-position bracket further includes a mounting plate interconnected with the cantilever body in a selected one of first and second offset positions and a center position relative to the cantilever body. The mounting plate defines a center portion and first and second opposite side portions. The center portion of the mounting plate includes a center connector interconnecting the mounting plate in the cantilever body with the mounting plate in the center position for supporting adjacent side edges of a pair of side-by-side hang-on furniture units. The first side portion of the mounting plate includes a connector interconnecting the mounting plate and the cantilever body with the mounting plate offset to the first side of the cantilever body for supporting a side edge of a hang-on furniture unit disposed on the first side of the cantilever body. The second side portion of the mounting plate includes a connector interconnecting the mounting plate and the cantilever body with the mounting plate offset to the second side of the cantilever body for supporting a side edge of a hang-on furniture unit disposed on the second side of the cantilever body.

    摘要翻译： 多位置支架包括限定第一和第二侧面的悬臂体，并且包括后部和上部正交边缘。 后边缘包括至少一个钩形，以可移除地接合直立的槽。 多位置支架还包括与第一和第二偏移位置中选定的一个中的悬臂体互相连接的安装板和相对于悬臂体的中心位置。 安装板限定中心部分和第一和第二相对侧部分。 安装板的中心部分包​​括将悬臂体中的安装板与安装板连接在中心位置的中心连接器，用于支撑一对并排的悬挂式家具单元的相邻侧边缘。 安装板的第一侧部包括将安装板和悬臂体连接的连接器，其中安装板偏移到悬臂体的第一侧，用于支撑设置在第一侧的悬挂式家具单元的侧边缘 悬臂体。 安装板的第二侧部包括将安装板和悬臂体连接的连接器，其中安装板偏移到悬臂体的第二侧，用于支撑设置在第二侧的悬挂式家具单元的侧边缘 悬臂体。

    Modular window for partition panels
    7.
    发明授权
    Modular window for partition panels 失效
    分区面板的模块化窗口

    公开(公告)号：US6058667A

    公开(公告)日：2000-05-09

    申请号：US60911

    申请日：1998-04-15

    申请人： Douglas B. MacDonald ,  Theodore Q. Chau ,  Kevin J. Longhurst ,  Richard S. Hand

    发明人： Douglas B. MacDonald ,  Theodore Q. Chau ,  Kevin J. Longhurst ,  Richard S. Hand

    IPC分类号： E04B2/74

    CPC分类号： E04B2/7435 ,  E04B2002/7487 ,  E04B2002/749

    摘要： A knock-down transparent module includes a module frame with a pair of vertical side frame members, each having an upper end and a lower end. Upper and lower horizontal frame members have opposite ends and extend generally horizontally between the vertical side frame members adjacent the upper and lower ends thereof and interconnect the same adjacent the upper and lower ends to define a central opening through the module frame. A transparent sheet is secured to the module frame and extends across the central opening. The module frame defines outer faces having at least one hook shaped to engage an opening in a partition frame member, thereby permitting the module frame to be removably supported within a partition.

    摘要翻译： 一个压倒透明模块包括具有一对垂直侧框架构件的模块框架，每个具有上端和下端。 上下水平框架构件具有相对的端部并且在垂直侧框架构件的上端和下端之间大致水平地延伸，并且在垂直侧框架构件的上端和下端之间互相连接，以限定通过模块框架的中心开口。 透明片材固定在模块框架上并延伸穿过中央开口。 模块框架限定具有至少一个钩状的外表面，以便与分隔框架构件中的开口接合，从而允许模块框架可移除地支撑在分隔件内。

    Bracket arrangement for hang-on furniture unit
    8.
    发明授权
    Bracket arrangement for hang-on furniture unit 失效
    悬挂式家具装置的支架布置

    公开(公告)号：US5437426A

    公开(公告)日：1995-08-01

    申请号：US82599

    申请日：1993-06-25

    申请人： Douglas B. MacDonald

    发明人： Douglas B. MacDonald

    IPC分类号： A47B57/40 ,  A47B57/42 ,  A47B96/06

    CPC分类号： A47B57/42 ,  A47B57/408

    摘要： A furniture arrangement includes a hang-on furniture unit such as a worksurface, an upright support such as an office partition panel, and a system of brackets adapted to lockingly engage the upright support and support the hang-on furniture unit. The system of brackets includes a cantilever bracket with teeth adapted to engage slots in the upright support, and an upper edge for supporting the hang-on furniture unit. The system of brackets further includes a locking bracket adapted with second teeth, the first and second teeth being adapted to form an interlocking arrangement in the slots in the upright support. The locking bracket also includes a safety tab that engages a tab mount on the upper edge of the cantilever bracket, the safety tab being configured so that the second teeth must be properly located in the slots in order to allow the safety tab to engage the tab mount. The hang-on furniture unit is attached to the cantilever bracket and the locking bracket to form a rigid unit that cannot be inadvertently disengaged from the upright support. The locking bracket is reversible to minimize the number of parts that must be used.

    摘要翻译： 家具装置包括挂式家具单元，例如工作台面，直立支架（例如办公室分隔板）和适于锁定地接合直立支架并支撑挂式家俱单元的支架系统。 支架系统包括具有适于接合直立支撑件中的槽的齿的悬臂支架和用于支撑挂式家具单元的上边缘。 支架系统还包括适于第二齿的锁定支架，第一和第二齿适于在直立支撑件的槽中形成互锁装置。 锁定支架还包括安全突片，其接合悬臂支架的上边缘上的突片安装件，安全突片被构造成使得第二齿必须正确地定位在槽中，以便允许安全突片接合突片 安装。 悬挂式家具单元连接到悬臂支架和锁定支架，以形成一个刚性单元，不能无意中与直立支架脱离。 锁定支架是可逆的，以最小化必须使用的零件数量。

    Apparatus and method for detecting an endpoint in a vapor phase etch
    9.
    发明授权
    Apparatus and method for detecting an endpoint in a vapor phase etch 有权
    用于检测气相蚀刻中的端点的装置和方法

    公开(公告)号：US07189332B2

    公开(公告)日：2007-03-13

    申请号：US10269149

    申请日：2002-10-11

    申请人： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald ,  Hongqin Shi

    发明人： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Niles K. MacDonald ,  Hongqin Shi

    IPC分类号： C23F3/12

    CPC分类号： H01J37/32963 ,  B81C1/00476 ,  B81C1/00587 ,  B81C99/0065 ,  B81C2201/0132 ,  B81C2201/0138 ,  H01J37/32449 ,  H01J37/32935

    摘要： Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber.

    摘要翻译： 通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。