中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

33 records (took 0.029 seconds)

    Imprinting stamp and nano-imprinting method using the same
    1.
    发明授权
    Imprinting stamp and nano-imprinting method using the same 有权
    印记邮票和使用相同的纳米印记法

    公开(公告)号：US09360751B2

    公开(公告)日：2016-06-07

    申请号：US13617874

    申请日：2012-09-14

    Applicant: Ki-yeon Yang ,  Woong Ko ,  Jae-kwan Kim ,  Du-hyun Lee ,  Byung-kyu Lee

    Inventor： Ki-yeon Yang ,  Woong Ko ,  Jae-kwan Kim ,  Du-hyun Lee ,  Byung-kyu Lee

    IPC: G03F7/00 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00

    CPC classification number: G03F7/0002 ,  B29C59/022 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    Abstract: An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.

    Abstract translation: 提供使用印记印记的印记印记和纳米印记法。 印记印模包括第一基板; 所述第一基板上的一个或多个场区域，所述第一基板包括纳米图案; 以及在所述第一基板上并且与所述场区域相邻的第一虚设图案区域，所述虚设图案区域包括具有比所述纳米图案的尺寸更大的尺寸的第一虚设图案，所述第一虚设图案是多个多边形，每个所述多边形 具有指向从场区域朝向第一虚拟图案区域的第一方向的顶点。

    METHODS OF FABRICATING NANOIMPRINT STAMP
    4.
    发明申请
    METHODS OF FABRICATING NANOIMPRINT STAMP 失效
    制作NANOIMPRINT STAMP的方法

    公开(公告)号：US20120168404A1

    公开(公告)日：2012-07-05

    申请号：US13181660

    申请日：2011-07-13

    Applicant: Du-hyun LEE ,  Byung-kyu LEE ,  Woong KO

    Inventor： Du-hyun LEE ,  Byung-kyu LEE ,  Woong KO

    IPC: C23F1/02

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

    Abstract: A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.

    Abstract translation: 制造纳米压印印模的方法包括通过重复进行压印处理，在印模基板上形成具有纳米尺寸宽度的抗蚀剂图案。 在压印工艺中，依次使用被选择性蚀刻的抗蚀剂层。 使用抗蚀剂图案作为蚀刻掩模蚀刻印模基板。

    ORGANIC- INORGANIC HYBRID MATERIAL AND STAMP FOR NANOIMPRINT MANUFACTURED FROM THE SAME
    5.
    发明申请
    ORGANIC- INORGANIC HYBRID MATERIAL AND STAMP FOR NANOIMPRINT MANUFACTURED FROM THE SAME 审中-公开
    有机无机混合材料和印花从其制造的纳米薄膜

    公开(公告)号：US20120048184A1

    公开(公告)日：2012-03-01

    申请号：US13096471

    申请日：2011-04-28

    Applicant: Du-hyun Lee ,  Byung-kyu Lee ,  Woong Ko

    Inventor： Du-hyun Lee ,  Byung-kyu Lee ,  Woong Ko

    IPC: B29C35/08 ,  C08G77/62 ,  C08G77/02 ,  C08G79/00 ,  B05C1/02 ,  C08G79/10

    CPC classification number: C08G79/00

    Abstract: Organic-inorganic hybrid materials may be inorganic-based materials including more inorganic material than organic material. The organic-inorganic hybrid materials may include a backbone material, a release material, and a photoinitiator. The backbone material may be formed of an inorganic material, and at least one of the release material and the photoinitiator may be formed of an organic material. The backbone material may include a compound (e.g., an oxide or a nitride) containing at least one selected from the group consisting of Si, In, Zn, Al, and Ti. The release material may include at least one selected from the group consisting of alkyl (CnH2n+1), C, F, and Si.

    Abstract translation: 有机 - 无机混合材料可以是包括比有机材料更多的无机材料的无机基材料。 有机 - 无机混合材料可以包括骨架材料，剥离材料和光引发剂。 骨架材料可以由无机材料形成，并且剥离材料和光引发剂中的至少一种可以由有机材料形成。 骨架材料可以包括含有选自Si，In，Zn，Al和Ti中的至少一种的化合物（例如，氧化物或氮化物）。 剥离材料可以包括选自烷基（C n H 2n + 1），C，F和Si中的至少一种。

    STRUCTURE FOR LIGHT COUPLING IN HEAT-ASSISTED MAGNETIC RECORDING
    8.
    发明申请
    STRUCTURE FOR LIGHT COUPLING IN HEAT-ASSISTED MAGNETIC RECORDING 审中-公开
    热辅助磁记录光耦合结构

    公开(公告)号：US20080181560A1

    公开(公告)日：2008-07-31

    申请号：US11844004

    申请日：2007-08-23

    Applicant: Sung Dong SUH ,  Kook Hyun SUN WOO ,  Hoo San LEE ,  Hyun Jei KIM ,  Du Hyun LEE ,  Eun Hyoung CHO

    Inventor： Sung Dong SUH ,  Kook Hyun SUN WOO ,  Hoo San LEE ,  Hyun Jei KIM ,  Du Hyun LEE ,  Eun Hyoung CHO

    IPC: G02B6/26

    CPC classification number: G11B5/314 ,  G11B5/102 ,  G11B2005/0005 ,  G11B2005/0021

    Abstract: A light-coupling structure in a type of heat-assisted magnetic recording is provided, the structure not needing a separate additional slider or a suspension arm through reduction in variation amounts of coupling due to vibrations, and being realized as a high efficient, low-cost structure with compact size. The light-coupling structure in a type of heat-assisted magnetic recording (HAMR) includes: a waveguide having, at its one end, a mirror part inclined at a certain angle; a slider having one of a groove provided along a width direction of one side thereof contacting the waveguide and a via hole provided along a width direction of one side thereof contacting the waveguide; and a fiber butt-connected to the waveguide by means of a connector provided parallel with the slider.

    Abstract translation: 提供了一种热辅助磁记录中的光耦合结构，该结构通过减少由于振动引起的耦合变化量而不需要单独的另外的滑块或悬臂，并且被实现为高效， 成本结构紧凑。 一种热辅助磁记录（HAMR）中的光耦合结构包括：波导，其一端具有以一定角度倾斜的反射镜部分; 滑块，其具有沿着与波导的一侧的宽度方向设置的槽和沿着与波导的一侧的宽度方向设置的通孔; 以及通过与滑块平行设置的连接器对接到波导的光纤。

    SOLVENT-SOLUBLE STAMP FOR NANO-IMPRINT LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    SOLVENT-SOLUBLE STAMP FOR NANO-IMPRINT LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME 审中-公开
    用于纳米印刷机的溶剂溶胶印刷机及其制造方法

    公开(公告)号：US20080149488A1

    公开(公告)日：2008-06-26

    申请号：US11842443

    申请日：2007-08-21

    Applicant: Byung kyu LEE ,  Myung bok LEE ,  Jin Seung SOHN ,  Du hyun LEE ,  Eun Hyung CHO ,  Hae sung KIM

    Inventor： Byung kyu LEE ,  Myung bok LEE ,  Jin Seung SOHN ,  Du hyun LEE ,  Eun Hyung CHO ,  Hae sung KIM

    IPC: B41C3/08 ,  C23C16/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: A method of manufacturing a solvent-soluble stamp for nano-imprint lithography is provided. According to the method, a stamp is formed on a master substrate made of an ultraviolet-transparent material, using a material which is soluble in a solvent, and then a metal stamp or another stamp for a nano-imprint lithography is manufactured using the solvent-soluble stamp. Next, the stamp for nano-imprint lithography can be achieved by melting the soluble stamp. Therefore, it is possible to reuse the master several times. Further, it is possible to solve a problem in which a mold cannot be separated from the stamp. Furthermore, a uniform and clean stamp with a nano size can be obtained.

    Abstract translation: 提供了一种制造用于纳米压印光刻的溶剂可溶性印模的方法。 根据该方法，使用可溶于溶剂的材料，在由紫外线透明材料制成的母基板上形成印模，然后使用溶剂制造金属印模或其他用于纳米压印光刻的印模 可拆的邮票 接下来，可以通过熔化可溶性印模来实现纳米压印光刻的印模。 因此，可以重复使用主机多次。 此外，可以解决模具不能与印模分离的问题。 此外，可以获得具有纳米尺寸的均匀且清洁的印模。

Patent Agency Ranking