公开(公告)号：US09563132B2

公开(公告)日：2017-02-07

申请号：US13564210

申请日：2012-08-01

申请人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Rogier Hendrikus Magdalena Cortie ,  Adrianes Johannes Baeten ,  Cornelius Maria Rops

发明人： David Bessems ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Rogier Hendrikus Magdalena Cortie ,  Adrianes Johannes Baeten ,  Cornelius Maria Rops

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  Y10T137/2931

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在被配置为将浸没流体包含在流体处理结构外部的区域的边界处具有：弯液面钉扎特征，以阻止浸没流体径向向外 方向从空间; 至少部分地围绕所述弯液面钉扎特征并径向向外的气体供应开口; 并且可选地，气体供应开口径向向外的气体回收开口，其中气体供应开口或气体回收开口，或气体供应开口和气体回收开口两者具有每米长度的开放面积，其外围具有变化 在空间周围。

公开(公告)号：US09036127B2

公开(公告)日：2015-05-19

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

发明人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US20090296065A1

公开(公告)日：2009-12-03

申请号：US12472099

申请日：2009-05-26

申请人： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Marco Koert STAVENGA ,  Erik Henricus Egidius Catharina EUMMELEN ,  Michel RIEPEN ,  Olga Vladimirovna ELISSEEVA ,  Tijmen Wilfred Mathijs GUNTHER ,  Michaël Christiaan VAN DER WEKKEN

发明人： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Marco Koert STAVENGA ,  Erik Henricus Egidius Catharina EUMMELEN ,  Michel RIEPEN ,  Olga Vladimirovna ELISSEEVA ,  Tijmen Wilfred Mathijs GUNTHER ,  Michaël Christiaan VAN DER WEKKEN

IPC分类号： G03B27/72 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

摘要： A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

摘要翻译： 公开了一种光刻投影装置，其包括工作台，活门构件，流体处理结构和流体抽出系统。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或者（ii）工作台，或（iii）活门构件的表面，或者（iv）选自（ i） - （iii）。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。

公开(公告)号：US20130033692A1

公开(公告)日：2013-02-07

申请号：US13564210

申请日：2012-08-01

申请人： David BESSEMS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Michel RIEPEN ,  Rogier Hendrikus Magdalena CORTIE ,  Adrianes Johannes BAETEN ,  Cornelius Maria ROPS

发明人： David BESSEMS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Michel RIEPEN ,  Rogier Hendrikus Magdalena CORTIE ,  Adrianes Johannes BAETEN ,  Cornelius Maria ROPS

IPC分类号： G03B27/32 ,  B67D7/72

CPC分类号： G03F7/70341 ,  Y10T137/2931

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在被配置为将浸没流体包含在流体处理结构外部的区域的边界处具有：弯液面钉扎特征，以阻止浸没流体径向向外 方向从空间; 至少部分地围绕所述弯液面钉扎特征并径向向外的气体供应开口; 并且可选地，气体供应开口径向向外的气体回收开口，其中气体供应开口或气体回收开口，或气体供应开口和气体回收开口两者具有每米长度的开放面积，其外围具有变化 在空间周围。

公开(公告)号：US20110194084A1

公开(公告)日：2011-08-11

申请号：US13022319

申请日：2011-02-07

申请人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel RIEPEN ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

摘要翻译： 一种用于光刻设备的流体处理结构，所述流体处理结构在从被构造成包括浸没流体到所述流体处理结构外部的区域的空间的边界处连续地具有：提取器，其具有布置在第一行中的至少一个开口， 在使用中指向基底和/或桌子; 以及在使用中面向基板和/或表的表面上的液体操纵器，以减少表面上的液滴的聚结机会。

公开(公告)号：US20090262318A1

公开(公告)日：2009-10-22

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cedric Desire GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

发明人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Nicolaas Franciscus KOPPELAARS ,  Martinus Hendrikus Antonius LEENDERS ,  Paulus Martinus Maria LIEBREGTS ,  Johannes Catharinus Hubertus MULKENS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Marcel BECKERS ,  Richard MOERMAN ,  Cedric Desire GROUWSTRA ,  Danny Maria Hubertus PHILIPS ,  Remko Jan Peter VERHEES ,  Pieter MULDER ,  Evert VAN VLIET

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US09625828B2

公开(公告)日：2017-04-18

申请号：US13022319

申请日：2011-02-07

申请人： Michel Riepen ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

发明人： Michel Riepen ,  Erik Henricus Egidius Catharina Eummelen ,  Sandra Van Der Graaf ,  Rogier Hendrikus Magdalena Cortie ,  Takeshi Kaneko ,  Nina Vladimirovna Dziomkina ,  Laurentius Johannes Adrianus Van Bokhoven ,  Fabrizio Evangelista ,  David Bessems ,  Cornelius Maria Rops ,  Adrianus Marinus Verdonck ,  Nicolaas Ten Kate

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

公开(公告)号：US09176393B2

公开(公告)日：2015-11-03

申请号：US12472099

申请日：2009-05-26

申请人： Christian Gerardus Norbertus Hendricus Marie Cloin ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

发明人： Christian Gerardus Norbertus Hendricus Marie Cloin ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michaël Christiaan Van Der Wekken

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

摘要： A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

摘要翻译： 公开了一种光刻投影装置，其包括工作台，活门构件，流体处理结构和流体抽出系统。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或者（ii）工作台，或（iii）活门构件的表面，或者（iv）选自（ i） - （iii）。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。

公开(公告)号：US08405817B2

公开(公告)日：2013-03-26

申请号：US12697583

申请日：2010-02-01

申请人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

发明人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。

公开(公告)号：US20110188012A1

公开(公告)日：2011-08-04

申请号：US13017700

申请日：2011-01-31

申请人： Daniel Jozef Maria DIRECKS ,  Erik Henricus Egidius Catharina Eummelen ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Sergei Shulepov ,  Pieter Mulder ,  David Bessems ,  Marco Baragona

发明人： Daniel Jozef Maria DIRECKS ,  Erik Henricus Egidius Catharina Eummelen ,  Clemens Johannes Gerardus Van Den Dungen ,  Maikel Adrianus Cornelis Schepers ,  Sergei Shulepov ,  Pieter Mulder ,  David Bessems ,  Marco Baragona

IPC分类号： G03B27/52

CPC分类号： G03B27/52

摘要： In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.

摘要翻译： 在浸没式光刻设备的液体限制结构中，细长的连续开口形成用于将液体供应到投影系统下方的空间的出口。 细长狭缝形成高剪切和压力梯度的区域，其使气泡偏离图像场。