Chemical mechanical polishing slurry
    1.
    发明申请
    Chemical mechanical polishing slurry 审中-公开
    化学机械抛光浆

    公开(公告)号:US20080003829A1

    公开(公告)日:2008-01-03

    申请号:US11819942

    申请日:2007-06-29

    摘要: Disclosed is chemical mechanical polishing (CMP) slurry comprising: abrasive particles; an oxidant; a compound having at least two amine groups; a polycarboxylic acid; and water. The CMP slurry comprising a compound having at least two amine groups and a polycarboxylic acid provides an improved removal rate and selectivity of copper, while not adversely affecting the overall polishing rate, increases the planarization, and minimizes dishing and erosion problems.

    摘要翻译: 公开了化学机械抛光(CMP)浆料,其包含:磨料颗粒; 氧化剂 具有至少两个胺基的化合物; 多元羧酸 和水。 包含具有至少两个胺基的化合物和多元羧酸的CMP浆料提供了铜的改进的去除速率和选择性,同时不会不利地影响整体抛光速率,增加了平坦化,并且使凹陷和侵蚀问题最小化。

    Slurry For Chemical Mechanical Polishing
    2.
    发明申请
    Slurry For Chemical Mechanical Polishing 有权
    化学机械抛光用浆料

    公开(公告)号:US20120094490A1

    公开(公告)日:2012-04-19

    申请号:US13260239

    申请日:2010-04-22

    CPC分类号: C09G1/02 C23F1/16 C23F1/18

    摘要: The present invention relates to a slurry for chemical mechanical polishing, comprising an abrasive; an oxidant; an organic acid; and a polymeric additive comprising polyolefin-polyalkyleneoxide copolymer, wherein the polyolefin-polyalkyleneoxide copolymer comprises a polyolefin repeat unit and two or more polyalkyleneoxide repeat units, and at least one polyalkyleneoxide repeat unit is branched.

    摘要翻译: 本发明涉及一种用于化学机械抛光的浆料,其包含研磨剂; 氧化剂 有机酸; 以及包含聚烯烃 - 聚环氧烷烃共聚物的聚合物添加剂,其中所述聚烯烃 - 聚环氧烷共聚物包含聚烯烃重复单元和两个或更多个聚环氧烷重复单元,并且至少一个聚环氧烷烃重复单元是分支的。

    Edible plant oils from which saturated fatty acids were removed and manufacturing process thereof
    4.
    发明授权
    Edible plant oils from which saturated fatty acids were removed and manufacturing process thereof 有权
    去除饱和脂肪酸的食用植物油及其制造方法

    公开(公告)号:US08133518B2

    公开(公告)日:2012-03-13

    申请号:US12305364

    申请日:2007-06-14

    IPC分类号: A23D9/04 C11C3/10

    摘要: The present invention is concerned with an edible plant oils from which saturated fatty acids were removed and manufacturing process thereof. In order to remove saturated fatty acids from the edible plant oils; 1) Saturated and unsaturated fatty acids bound on same triglyceride molecules of edible plant oils were segregated each other as alkylesters of fatty acids by conventional transesterification reaction in which edible plant oils were treated with large excess of absolute C1˜C8 alkanol under the presence of catalytic amount of alkali- or alkali-earth metal-C1˜C8 alkoxide. 2) The alkyl-esters of mixed fatty acids were treated with C1˜C8 alkanol solution of urea to remove the alkylester of saturated fatty acids by conventional fractional crystallization as urea complexes of saturated fatty acid-alkylesters. 3) Finally the resulting alkylesters of unsaturated fatty acids, obtained by removal of saturated fatty acids by urea complexation procedure, was converted to reconstructed triglyceride oil to give edible plant oils completely devoid of saturated fatty acids. This new manufacturing process could be successfully applied to following 22 kinds of edible plant; 1) corn oil, 2) soybean oil, 3) rapeseed oil, 4) grape seed oil, 5) flaxseed oil, 6) sesame oil, 7) olive oil, 8) perilla oil 9) wall nut oil, 10) pine-nut oil, 11) peanuts oil, 12) sunflower oil, 13) safflower oil, 14) cotton seed oil, 15) palm oil, 16) hot pepper oil, 17) rice bran oil, 18) pumpkin oil, 19) green tea seed oil, 20) almond oil, 21) evening primrose oil and 22) hazelnut oil.

    摘要翻译: 本发明涉及去除饱和脂肪酸的食用植物油及其制造方法。 为了从食用植物油中除去饱和脂肪酸; 1)通过常规酯交换反应将可食用植物油的相同甘油三酯分子上的饱和和不饱和脂肪酸彼此分离为脂肪酸的烷基酯,其中食用植物油在催化剂存在下用大量过量的绝对C1〜C8烷醇处理 碱金属或碱土金属-C1〜C8醇盐的用量。 2)混合脂肪酸的烷基酯用尿素的C 1 -C 8烷醇溶液处理,通过常规分级结晶作为饱和脂肪酸 - 烷基酯的尿素复合物除去饱和脂肪酸的烷基酯。 3)最后,通过尿素络合方法除去饱和脂肪酸得到的不饱和脂肪酸烷基酯转化成重建的甘油三酯油,得到完全没有饱和脂肪酸的食用植物油。 这种新的制造工艺可以成功应用于22种食用植物; 1)玉米油,2)大豆油,3)菜籽油,4)葡萄籽油,5)亚麻籽油,6)芝麻油,7)橄榄油,8)紫苏油9)壁坚果油,10) 坚果油,11)花生油,12)向日葵油,13)红花油,14)棉籽油,15)棕榈油,16)辣椒油,17)米糠油,18)南瓜油,19)绿茶 种子油,20)杏仁油,21)月见草油和22)榛子油。

    Method of manufacturing a superconducting magnesium diboride thin film
    6.
    发明授权
    Method of manufacturing a superconducting magnesium diboride thin film 失效
    制造超导二硼化镁薄膜的方法

    公开(公告)号:US07189425B2

    公开(公告)日:2007-03-13

    申请号:US10781644

    申请日:2004-02-20

    CPC分类号: H01L39/2487 Y10T29/49014

    摘要: A superconducting magnesium diboride (MgB2) thin film having c-axial orientation and a method and apparatus for fabricating the same are provided. The fabrication method includes forming a boron thin film on a substrate and thermally processing the substrate on which the boron thin film is formed along with a magnesium source and cooling the resulting structure. The superconducting magnesium diboride thin film can be used in a variety of electronic devices employing superconducting thin films, such as precision medical diagnosis equipment using superconducting quantum interface devices (SQUIDs) capable of sensing weak magnetic fields, microwave communications equipment used for satellite communications, and Josephson devices. Computer systems with 100 times greater computing speed can be implemented with the superconducting magnesium diboride thin film.

    摘要翻译: 提供了具有c轴取向的超导二硼化镁(MgB 2 N 2)薄膜及其制造方法和装置。 制造方法包括在基板上形成硼薄膜,并与镁源一起热处理形成有硼薄膜的基板,并冷却所得到的结构。 超导二硼化镁薄膜可用于使用超导薄膜的各种电子装置,例如使用能够感测弱磁场的超导量子接口装置(SQUID)的精密医疗诊断装置,用于卫星通信的微波通信设备和 约瑟夫森设备。 使用超导二硼化镁薄膜可以实现计算速度提高100倍的计算机系统。

    Slurry for chemical mechanical polishing
    7.
    发明授权
    Slurry for chemical mechanical polishing 有权
    用于化学机械抛光的浆料

    公开(公告)号:US09080079B2

    公开(公告)日:2015-07-14

    申请号:US13260239

    申请日:2010-04-22

    CPC分类号: C09G1/02 C23F1/16 C23F1/18

    摘要: The present invention relates to a slurry for chemical mechanical polishing, comprising an abrasive; an oxidant; an organic acid; and a polymeric additive comprising polyolefin-polyalkyleneoxide copolymer, wherein the polyolefin-polyalkyleneoxide copolymer comprises a polyolefin repeat unit and two or more polyalkyleneoxide repeat units, and at least one polyalkyleneoxide repeat unit is branched.

    摘要翻译: 本发明涉及一种用于化学机械抛光的浆料,其包含研磨剂; 氧化剂 有机酸; 以及包含聚烯烃 - 聚环氧烷烃共聚物的聚合物添加剂,其中所述聚烯烃 - 聚环氧烷共聚物包含聚烯烃重复单元和两个或更多个聚环氧烷重复单元,并且至少一个聚环氧烷烃重复单元是分支的。

    Slurry composition for CMP, and polishing method
    8.
    发明授权
    Slurry composition for CMP, and polishing method 有权
    用于CMP的浆料组合物和抛光方法

    公开(公告)号:US08822339B2

    公开(公告)日:2014-09-02

    申请号:US13502062

    申请日:2010-10-13

    IPC分类号: H01L21/461

    摘要: The present invention relates to a CMP slurry composition comprising an abrasive particle; a dispersant; an ionic polymer additive; and a non-ionic polymer additive including a polyolefin-polyethylene glycol copolymer including at least two polyethylene glycol repeat unit as a backbone and at least a polyethylene glycol repeating unit as a side chain, and a polishing method with using the slurry composition. The CMP slurry composition shows a low polishing rate to a single-crystalline silicon layer or a polysilicon layer and a high polishing rate to a silicon oxide layer, resulting in having an excellent polishing selectivity.

    摘要翻译: 本发明涉及包含磨料颗粒的CMP浆料组合物; 分散剂; 离子聚合物添加剂; 以及包含至少包含两个聚乙二醇重复单元作为主链的聚烯烃 - 聚乙二醇共聚物和至少一个作为侧链的聚乙二醇重复单元的非离子聚合物添加剂和使用该浆料组合物的抛光方法。 CMP浆料组合物显示对单晶硅层或多晶硅层的低抛光速率和对氧化硅层的高抛光速率,导致具有优异的抛光选择性。

    AQUEOUS SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD
    9.
    发明申请
    AQUEOUS SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD 审中-公开
    化学机械抛光和化学机械抛光方法的水性浆料组合物

    公开(公告)号:US20100184291A1

    公开(公告)日:2010-07-22

    申请号:US12594798

    申请日:2009-02-26

    摘要: The present invention relates to an aqueous slurry composition for chemical mechanical polishing that can show good polishing rate to the target layer, and yet has a high polishing selectivity and can maintain superior surface condition of the target layer after polishing, and a chemical mechanical polishing method.The aqueous slurry composition for chemical mechanical polishing (CMP) includes abrasives; an oxidant; a complexing agent; and a polymeric additive including at least one selected from the group consisting of a polypropyleneoxide, a propyleneoxide-ethyleneoxide copolymer, and a compound represented by Chemical Formula 1.

    摘要翻译: 本发明涉及一种用于化学机械抛光的水性浆料组合物,其可以对目标层显示出良好的抛光速率,并且具有高的抛光选择性并且可以在抛光后保持目标层的优异的表面状态,以及化学机械抛光方法 。 用于化学机械抛光(CMP)的含水浆料组合物包括研磨剂; 氧化剂 络合剂 以及包含选自由聚环氧丙烷,环氧丙烷 - 环氧乙烷共聚物和化学式1表示的化合物组成的组中的至少一种的聚合物添加剂。

    EDIBLE PLANT OILS FROM WHICH SATURATED FATTY ACIDS WERE REMOVED AND MANUFACTURING PROCESS THEREOF
    10.
    发明申请
    EDIBLE PLANT OILS FROM WHICH SATURATED FATTY ACIDS WERE REMOVED AND MANUFACTURING PROCESS THEREOF 有权
    来自饱和脂肪酸的食用植物油被去除及其制造过程

    公开(公告)号:US20090226593A1

    公开(公告)日:2009-09-10

    申请号:US12305364

    申请日:2007-06-14

    IPC分类号: A23D9/00 C12H1/04

    摘要: The present invention is concerned with an edible plant oils from which saturated fatty acids were removed and manufacturing process thereof. In order to remove saturated fatty acids from the edible plant oils; 1) Saturated and unsaturated fatty acids bound on same triglyceride molecules of edible plant oils were segregated each other as alkylesters of fatty acids by conventional transesterification reaction in which edible plant oils were treated with large excess of absolute C1˜C8 alkanol under the presence of catalytic amount of alkali- or alkali-earth metal-C1˜C8 alkoxide. 2) The alkyl-esters of mixed fatty acids were treated with C1˜C8 alkanol solution of urea to remove the alkylester of saturated fatty acids by conventional fractional crystallization as urea complexes of saturated fatty acid-alkylesters. 3) Finally the resulting alkylesters of unsaturated fatty acids, obtained by removal of saturated fatty acids by urea complexation procedure, was converted to reconstructed triglyceride oil to give edible plant oils completely devoid of saturated fatty acids. This new manufacturing process could be successfully applied to following 22 kinds of edible plant; 1) corn oil, 2) soybean oil, 3) rapeseed oil, 4) grape seed oil, 5) flaxseed oil, 6) sesame oil, 7) olive oil, 8) perilla oil 9) wall nut oil, 10) pine-nut oil, 11) peanuts oil, 12) sunflower oil, 13) safflower oil, 14) cotton seed oil, 15) palm oil, 16) hot pepper oil, 17) rice bran oil, 18) pumpkin oil, 19) green tea seed oil, 20) almond oil, 21) evening primrose oil and 22) hazelnut oil.

    摘要翻译: 本发明涉及去除饱和脂肪酸的食用植物油及其制造方法。 为了从食用植物油中除去饱和脂肪酸; 1)通过常规酯交换反应将可食用植物油的相同甘油三酯分子上的饱和不饱和脂肪酸彼此分离为脂肪酸的烷基酯,其中在催化剂存在下用大量过量的绝对C1〜C8链烷醇处理食用植物油 碱金属或碱土金属-C1〜C8醇盐的量。 2)混合脂肪酸的烷基酯用尿素的C 1 -C 8烷醇溶液处理,通过常规分级结晶作为饱和脂肪酸 - 烷基酯的尿素复合物除去饱和脂肪酸的烷基酯。 3)最后,通过尿素络合方法除去饱和脂肪酸得到的不饱和脂肪酸烷基酯转化成重建的甘油三酯油,得到完全没有饱和脂肪酸的食用植物油。 这种新的制造工艺可以成功应用于22种食用植物; 1)玉米油,2)大豆油,3)菜籽油,4)葡萄籽油,5)亚麻籽油,6)芝麻油,7)橄榄油,8)紫苏油9)壁坚果油,10) 坚果油,11)花生油,12)向日葵油,13)红花油,14)棉籽油,15)棕榈油,16)辣椒油,17)米糠油,18)南瓜油,19)绿茶 种子油,20)杏仁油,21)月见草油和22)榛子油。