公开(公告)号：USD894679S1

公开(公告)日：2020-09-01

申请号：US29679624

申请日：2019-02-07

Applicant: Han Cheng

Designer： Han Cheng

公开(公告)号：US09774564B2

公开(公告)日：2017-09-26

申请号：US13576213

申请日：2012-05-31

Applicant: Xiao Fei Quan ,  Quirong Xue ,  Lei Zhuo ,  Nan Song ,  Wanli Song ,  Han Cheng

Inventor： Xiao Fei Quan ,  Quirong Xue ,  Lei Zhuo ,  Nan Song ,  Wanli Song ,  Han Cheng

IPC: H04L29/12 ,  G06F17/30 ,  H04L29/08

CPC classification number: H04L61/1582 ,  G06F17/30203 ,  H04L67/06 ,  H04L67/1097

Abstract: A server receives a request to upload a file form a user device. The server may generate a unique file ID associated with the file based on the request, and transmit the file ID to the user device. The user device may divide the file to generate multiple slice files and their corresponding slice IDs. From the user device, the server receives the multiple slice files and the slice IDs. Based on the slice IDs, the server may determine storage addresses at which to store the multiple slice files in a distributed storage system using a consistent hash algorithm. The multiple slice files may be stored based on the corresponding storage addresses of the distrusted storage system.

公开(公告)号：US09721984B2

公开(公告)日：2017-08-01

申请号：US13445766

申请日：2012-04-12

Applicant: Mu-Han Cheng ,  Kuo-Hsiu Wei ,  Kei-Wei Chen ,  Ying-Lang Wang

Inventor： Mu-Han Cheng ,  Kuo-Hsiu Wei ,  Kei-Wei Chen ,  Ying-Lang Wang

IPC: H01L27/146

CPC classification number: H01L27/14623 ,  H01L27/1464 ,  H01L27/14687

Abstract: Semiconductor devices and back side illumination (BSI) sensor manufacturing methods are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes providing a workpiece and forming an integrated circuit on a front side of the workpiece. A grid of a conductive material is formed on a back side of the workpiece using a damascene process.

公开(公告)号：US09335321B2

公开(公告)日：2016-05-10

申请号：US12302732

申请日：2007-01-08

Applicant: Shuk Han Cheng ,  Po Kwok Chan

Inventor： Shuk Han Cheng ,  Po Kwok Chan

IPC: G01N33/50

CPC classification number: G01N33/5014 ,  G01N33/5088 ,  G01N2333/4603 ,  G01N2333/515

Abstract: This invention relates to a method of 3-tier system for screening compounds, herb extract or extract of herb combination in formula with angiogenic-modulating activities using transparent teleost embryos as model.

Abstract translation: 本发明涉及使用透明硬骨鱼胚胎作为模型，筛选化合物，草药提取物或草药组合提取物与血管生成调节活性的3层体系的方法。

公开(公告)号：US09080847B2

公开(公告)日：2015-07-14

申请号：US13810453

申请日：2011-07-27

Applicant: Michel Cattoen ,  Han Cheng Seat

Inventor： Michel Cattoen ,  Han Cheng Seat

IPC: G01B9/02

CPC classification number: G01B9/02 ,  G01B9/02002 ,  G01B9/02027 ,  G01B9/02057 ,  G01B2290/25

Abstract: An extrinsic optical fiber device for measuring a physical parameter, includes: a light source, of central wavelength λ, an optical fiber projecting, a unit for detecting an interferometric signal, the interferometric signal including the information about the physical parameter to be determined, elements for modulating a signal emitted by the light source, elements for calculating the physical parameter on the basis of the interferometric signal measured by the detection unit. The modulated signal from the light source includes an alternating component including a double frequency modulation generated by the modulation elements. The main application of this device is the measurement of the displacement of a target.

Abstract translation: 用于测量物理参数的外在光纤装置包括：中心波长λ的光源，光纤投射，用于检测干涉信号的单元，干涉信号包括关于待确定的物理参数的信息，元素 用于调制由光源发射的信号，用于根据由检测单元测量的干涉信号来计算物理参数的元件。 来自光源的调制信号包括包括由调制元件产生的双频调制的交替分量。 该装置的主要应用是测量目标的位移。

公开(公告)号：US09070534B2

公开(公告)日：2015-06-30

申请号：US13463942

申请日：2012-05-04

Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/08 ,  H01J37/30 ,  H01L21/265 ,  H01L21/67 ,  H01J37/302 ,  H01L21/687

CPC classification number: H01J37/3171 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3172 ,  H01J2237/12 ,  H01J2237/20228 ,  H01J2237/30477 ,  H01J2237/30483 ,  H01L21/265 ,  H01L21/68764

Abstract: A process control method is provided for ion implantation methods and apparatuses, to produce a high dosage area on a substrate such as may compensate for noted non-uniformities. In an ion implantation tool, separately controllable electrodes are provided as multiple sets of opposed electrodes disposed outside an ion beam. Beam blockers are positionable into the ion beam. Both the electrodes and beam blockers are controllable to reduce the area of the ion beam that is incident upon a substrate. The electrodes and beam blockers also change the position of the reduced-area ion beam incident upon the surface. The speed at which the substrate scans past the ion beam may be dynamically changed during the implantation process to produce various dosage concentrations in the substrate.

Abstract translation: 提供了用于离子注入方法和装置的过程控制方法，以在衬底上产生高剂量区域，例如可以补偿所指出的不均匀性。 在离子注入工具中，分离的可控电极被设置为设置在离子束外部的多组相对的电极。 光束阻挡器可以定位到离子束中。 电极和光束阻挡器都是可控的，以减少入射到基板上的离子束的面积。 电极和光束阻挡器也改变入射在表面上的减小面积的离子束的位置。 衬底扫描通过离子束的速度可以在植入过程期间动态地改变，以在衬底中产生各种剂量浓度。

公开(公告)号：US09048069B2

公开(公告)日：2015-06-02

申请号：US11809644

申请日：2007-06-01

Applicant: Juan-Lin Chen ,  Yung-Fu Yeh ,  Yuk-Tong Lee ,  Nai-Han Cheng

Inventor： Juan-Lin Chen ,  Yung-Fu Yeh ,  Yuk-Tong Lee ,  Nai-Han Cheng

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/24 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/243 ,  H01J37/304 ,  H01J2237/30472 ,  H01J2237/31703

Abstract: An apparatus for monitoring beam currents of an implanter is provided. The apparatus includes a beam-sensing unit for sensing the beam currents; a position-determining unit for determining scan positions; and a computing unit. The computing unit is configured to perform the functions of receiving the beam currents from the beam-sensing unit; receiving the scan positions from the position-determining unit; and determining a drift status of the implanter from the beam currents, wherein the computing unit is configured to receive the beam currents and the scan position periodically between a starting time and an ending time of a scan process of the implanter.

Abstract translation: 提供一种用于监测注入机的束流的装置。 该装置包括用于感测束电流的光束感测单元; 位置确定单元，用于确定扫描位置; 和计算单元。 所述计算单元被配置为执行从所述波束感测单元接收波束电流的功能; 从所述位置确定单元接收扫描位置; 以及从所述束电流确定所述注入器的漂移状态，其中所述计算单元被配置为在所述注入器的扫描处理的开始时间和结束时间之间周期性地接收所述波束电流和所述扫描位置。

公开(公告)号：US09038665B2

公开(公告)日：2015-05-26

申请号：US13986174

申请日：2013-04-09

Applicant: Chi-Han Cheng

Inventor： Chi-Han Cheng

IPC: F16K11/24 ,  F16K11/085 ,  F16K31/40

CPC classification number: F16K11/24 ,  F16K11/085 ,  F16K31/404 ,  Y10T137/87877

Abstract: A valve system oriented for an irrigation system which is activated by a control unit is disclosed. The system comprises a solenoid switch and a manual switch, wherein an electrical wire extends from the valve to the control unit. The manual switch operates as a hand handling rotating lever; another use of manual switch is to serve as a means to force close the solenoid valve's outlet opening so as to provide a mechanism responsive to preventing automatic opening of solenoid valve controlled by control unit.

Abstract translation: 公开了一种针对由控制单元激活的灌溉系统的阀系统。 该系统包括电磁开关和手动开关，其中电线从阀延伸到控制单元。 手动开关作为手动旋转杆操作; 用作手动开关的另一种用途是作为强制关闭电磁阀的出口的装置，以便提供响应于防止由控制单元控制的电磁阀的自动打开的机构。

公开(公告)号：US09031684B2

公开(公告)日：2015-05-12

申请号：US13286337

申请日：2011-11-01

Applicant: Nai-Han Cheng ,  Chin-Hsiang Lin ,  Chi-Ming Yang ,  Chun-Lin Chang ,  Chih-Hong Hwang

Inventor： Nai-Han Cheng ,  Chin-Hsiang Lin ,  Chi-Ming Yang ,  Chun-Lin Chang ,  Chih-Hong Hwang

IPC: G06F19/00 ,  G06F17/50 ,  H01L29/00 ,  H01L27/082 ,  H05K1/00

CPC classification number: G06F17/5063 ,  G06F2217/10

Abstract: A method and system for integrated circuit fabrication is disclosed. In an example, the method includes determining a first process parameter of a wafer and a second process parameter of the wafer, the first process parameter and the second process parameter corresponding to different wafer characteristics; determining a variation of a device parameter of the wafer based on the first process parameter and the second process parameter; constructing a model for the device parameter as a function of the first process parameter and the second process parameter based on the determined variation of the device parameter of the wafer; and performing a fabrication process based on the model.

Abstract translation: 公开了一种用于集成电路制造的方法和系统。 在一个示例中，该方法包括确定晶片的第一工艺参数和晶片的第二工艺参数，对应于不同晶片特性的第一工艺参数和第二工艺参数; 基于所述第一处理参数和所述第二处理参数确定所述晶片的设备参数的变化; 基于确定的晶片的器件参数的变化，构造作为第一工艺参数和第二工艺参数的函数的器件参数的模型; 并基于该模型执行制造过程。

公开(公告)号：US08979040B2

公开(公告)日：2015-03-17

申请号：US13602993

申请日：2012-09-04

Applicant: Chih-Heng Chien ,  Chin-Yi Wu ,  Chun-Han Cheng ,  Kuo-Chou Chiu

Inventor： Chih-Heng Chien ,  Chin-Yi Wu ,  Chun-Han Cheng ,  Kuo-Chou Chiu

IPC: F16M11/00 ,  F16M11/04 ,  F16M13/00 ,  F16M11/10 ,  F16M11/20

CPC classification number: F16M11/041 ,  F16M11/10 ,  F16M11/2014 ,  F16M13/00 ,  F16M2200/08 ,  Y10S248/917 ,  Y10S248/919

Abstract: A supporting device is applied to an electronic device and includes a supporting unit, an adjusting unit and a fixing unit. The supporting unit supports the electronic device. The adjusting unit is connected to the supporting unit for adjusting an angle of the supporting unit. The fixing unit includes a locking part and a fixing part. The fixing part is fixed on a surface, and the locking part connects to the adjusting unit. The locking part is detachably locked with the fixing part so as to fixing the electronic device on the surface. The supporting device is advantageous for providing multiple viewing angles for users, and it is conveniently carried and easily assembled, thereby achieving firmly fixing effect.

Abstract translation: 支撑装置被应用于电子装置，并且包括支撑单元，调节单元和定影单元。 支撑单元支撑电子设备。 调节单元连接到支撑单元，用于调节支撑单元的角度。 固定单元包括锁定部和固定部。 固定部分固定在表面上，并且锁定部分连接到调节单元。 锁定部分与固定部分可拆卸地锁定，以将电子装置固定在表面上。 支撑装置有利于为用户提供多个视角，并且便于携带和容易地组装，从而实现牢固的固定效果。