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    Rotary Substrate Processing System
    1.
    发明申请
    Rotary Substrate Processing System 审中-公开
    旋转底材加工系统

    公开(公告)号：US20130192761A1

    公开(公告)日：2013-08-01

    申请号：US13754733

    申请日：2013-01-30

    申请人： Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

    发明人： Joseph Yudovsky ,  Ralf Hofmann ,  Jeonghoon Oh ,  Li-Qun Xia ,  Toshiaki Fujita ,  Pravin K. Narwankar ,  Nag B, Patibandla ,  Srinivas Satya ,  Banqiu Wu

    IPC分类号： C23C16/54 ,  B05C13/00

    CPC分类号： C23C16/54 ,  B05C13/00 ,  C23C16/45551

    摘要： A substrate processing system for processing multiple substrates is provided and generally includes at least one processing platform and at least one staging platform. Each substrate is positioned on a substrate carrier disposed on a substrate support assembly. Multiple substrate carriers, each is configured to carry a substrate thereon, are positioned on the surface of the substrate support assembly. The processing platform and the staging platform, each includes a separate substrate support assembly, which can be rotated by a separate rotary track mechanism. Each rotary track mechanism is capable of supporting the substrate support assembly and continuously rotating multiple substrates carried by the substrate carriers and disposed on the substrate support assembly. Each substrate is thus processed through at least one shower head station and at least one buffer station, which are positioned at a distance above the rotary track mechanism of the processing platform. Each substrate can be transferred between the processing platform and the staging platform and in and out the substrate processing system.

    摘要翻译： 提供了一种用于处理多个基板的基板处理系统，并且通常包括至少一个处理平台和至少一个分段平台。 每个衬底位于设置在衬底支撑组件上的衬底载体上。 多个衬底载体，每个被配置为在其上承载衬底，位于衬底支撑组件的表面上。 处理平台和分段平台各自包括单独的基板支撑组件，其可以通过单独的旋转轨道机构旋转。 每个旋转轨道机构能够支撑基板支撑组件并且连续旋转由基板载体承载并且设置在基板支撑组件上的多个基板。 因此，每个基板通过至少一个淋浴喷头站和至少一个缓冲站进行处理，所述至少一个缓冲站位于处理平台的旋转轨道机构上方的距离处。 每个基板可以在处理平台和分段平台之间传送并进出基板处理系统。

    METHOD FOR BALANCING GAS FLOW SUPPLYING MULTIPLE CVD REACTORS
    3.
    发明申请
    METHOD FOR BALANCING GAS FLOW SUPPLYING MULTIPLE CVD REACTORS 审中-公开
    用于平衡气体供应多种CVD反应器的方法

    公开(公告)号：US20130104996A1

    公开(公告)日：2013-05-02

    申请号：US13647160

    申请日：2012-10-08

    申请人： JEONGHOON OH ,  Michael S. Cox ,  Alexander S. Polyak

    发明人： JEONGHOON OH ,  Michael S. Cox ,  Alexander S. Polyak

    IPC分类号： F16K11/00

    CPC分类号： F16K11/00 ,  C23C16/45561 ,  Y10T137/0324 ,  Y10T137/877

    摘要： Gas supply systems and methods are disclosed for solar cell production using multiple parallel reactors. A first gas supply control system has a gas panel having a plurality of gas outlet lines, supplying a first main supply line having a main line mass flow meter measuring the combined total gas mass flow rate in the first main supply line. First, second and third branch lines supplied by the first main supply line each branch line having mass flow controller and one or more control loops established between the mass flow meter and the branch line mass flow controllers. The control loop determining a set point for each of the branch mass flow controllers based on dividing the flow rate of the total gas flow by the number of reactors in use. In addition, a second gas supply control system may be coupled to the first gas supply control system to avoid mixing certain gases before they enter the respective reactors to which they are supplied.

    摘要翻译： 公开了使用多个并联反应器的太阳能电池生产的气体供应系统和方法。 第一气体供给控制系统具有具有多个气体出口管线的气体面板，供给具有测量第一主供应管线中的总气体质量流量的总线质量流量计的第一主供应管线。 第一，第二和第三分支线由第一主供应线提供，每个分支线具有质量流量控制器和在质量流量计和分支线质量流量控制器之间建立的一个或多个控制回路。 控制回路基于将总气体流量的流量除以使用的反应堆的数量来确定每个分支质量流量控制器的设定点。 此外，第二气体供应控制系统可以耦合到第一气体供应控制系统，以避免在它们进入它们所供应的相应反应器之前混合某些气体。

    Flexible membrane for carrier head
    4.
    发明授权
    Flexible membrane for carrier head 有权
    用于载体头的柔性膜

    公开(公告)号：US07727055B2

    公开(公告)日：2010-06-01

    申请号：US11741692

    申请日：2007-04-27

    申请人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

    发明人： Steven M. Zuniga ,  Andrew J. Nagengast ,  Jeonghoon Oh

    IPC分类号： B24B5/35

    CPC分类号： B24B37/30 ,  Y10T428/24174 ,  Y10T428/24182

    摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge and an annular recess above the hinge along the outer wall of the outer annular portion.

    摘要翻译： 描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。 柔性膜具有主要部分和外部环形部分，其中主要部分和外部环形部分之间的接合处包括周边边缘铰链和沿着外部环形部分的外壁的铰链上方的环形凹部。

    CARRIER HEAD USING FLEXURE RESTRAINTS FOR RETAINING RING ALIGNMENT
    5.
    发明申请
    CARRIER HEAD USING FLEXURE RESTRAINTS FOR RETAINING RING ALIGNMENT 失效
    携带器头使用弯曲限制器来保持环对准

    公开(公告)号：US20100062694A1

    公开(公告)日：2010-03-11

    申请号：US12206338

    申请日：2008-09-08

    申请人： Jin Yi ,  Jeonghoon Oh ,  Hung Chih Chen ,  Samuel Chu-Chiang Hsu

    发明人： Jin Yi ,  Jeonghoon Oh ,  Hung Chih Chen ,  Samuel Chu-Chiang Hsu

    IPC分类号： B24B5/00 ,  B24B47/02

    CPC分类号： B24B37/32

    摘要： One embodiment provides a retaining ring assembly. The retaining ring assembly comprises a retaining ring configured to circumferentially surround and retain the substrate within an inner surface of the retaining ring, and a flexure coupled to the retaining ring. The flexure is configured to maintain a gap between an inner surface of a carrier ring and an outer surface of the retaining ring, and the carrier ring is circumferentially surrounding the retaining ring.

    摘要翻译： 一个实施例提供一种保持环组件。 保持环组件包括保持环，所述保持环被构造成周向地围绕并保持在保持环的内表面内的基板，以及耦合到保持环的挠曲件。 挠曲构造成在承载环的内表面和保持环的外表面之间保持间隙，并且承载环周向围绕保持环。

    FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP
    8.
    发明申请
    FAST SUBSTRATE LOADING ON POLISHING HEAD WITHOUT MEMBRANE INFLATION STEP 有权
    快速底板装载在无膜渗透步骤的抛光头上

    公开(公告)号：US20070289124A1

    公开(公告)日：2007-12-20

    申请号：US11757069

    申请日：2007-06-01

    申请人： Jeonghoon Oh ,  Andrew Nagengast ,  Steven M. Zuniga ,  Hung Chih Chen

    发明人： Jeonghoon Oh ,  Andrew Nagengast ,  Steven M. Zuniga ,  Hung Chih Chen

    IPC分类号： H05K13/04

    CPC分类号： H01L21/6838 ,  B24B37/30 ,  H01L21/67005 ,  Y10T29/5313 ,  Y10T279/11

    摘要： The present invention relates to an apparatus and method for improving and speeding up substrate loading process. One embodiment provides a method for vacuum chucking a substrate. The method comprises venting a center chamber of a flexible membrane configured for mounting the substrate, moving the substrate such that a backside of the substrate is in full contact with the flexible membrane, and vacuuming the center chamber to vacuum chuck the backside of the substrate to the flexible membrane.

    摘要翻译： 本发明涉及一种用于改善和加速基板加载过程的装置和方法。 一个实施例提供了用于真空吸附衬底的方法。 该方法包括将配置用于安装衬底的柔性膜的中心室排出，移动衬底，使得衬底的背面与柔性膜完全接触，并且抽真空中心室以将衬底的背面真空吸附到 柔性膜。