摘要:
Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.
摘要:
In a plasma processing chamber, a method and an arrangement to stabilize pressure are provided. The method includes providing coarse pressure adjustments in an open-loop manner and thereafter providing fine pressure adjustments in a closed-loop manner. The coarse pressure adjustments are performed by rapidly re-position confinement rings employing an assumed linear relationship between the conductance and the confinement rings position to bring the pressure in the plasma generating region quickly to roughly a desired set point. The fine pressure adjustments are performed by at least employing mechanical vacuum pump(s), turbo pump(s), confinement ring positioning and/or combinations thereof to achieve a derive pressure set point.
摘要:
A disk gripper for gripping an insulating disk, such as a glass disk, at its edge during processing includes a contact device for contacting the edge of the insulating disk and a mechanism for moving the contact device between a contact position, in contact with the edge of the disk, and a retracted position. In a first processing station, a conductive coating is applied to a disk held by the gripper, with the contact device in the retracted position. In a second processing station, ions are generated in a plasma adjacent to the surface of the disk held by the gripper. The contact device is in the contact position in contact with the conductive coating, and a bias voltage is applied to the contact device in the second processing station. The ions are accelerated from the plasma toward the disk by the bias voltage applied to the conductive coating.
摘要:
An oxidation oven for use in the production of carbon fibers from a polyacrylonitrile precursor fiber. The oven has an oven chamber formed by sides and ends. At least one of the ends has a first opening and a second opening. The product passes through the openings for treatment in the oven chamber. The oven is also provided with a first nozzle adjacent the first opening and a second nozzle adjacent the second opening. Each nozzle is effective for discharging air from an air flow pathway into the oven chamber and forming an air curtain at the opening to which it is adjacent. An air bar defines the air flow pathway.
摘要:
A one piece shroud combined with a stack and preferably a pallet. The shroud includes first and second central panels, first and third lateral panels on either side of the first central panel and second and fourth lateral panels on either side of the second central panel.
摘要:
Discloses a machine for feeding groups of bottles in one-by-one fashion onto an outlet conveyor. The machine involves the use of a spacing conveyor interposed between the feed conveyor and an outlet conveyor and channel means disposed over the end of the feed conveyor so as to orient the groups of bottles in side-by-side rows. Spacing guides are positioned on the spacing conveyor at an angle so that a row of the bottles in side-by-side relationship are retained on the spacing conveyor while the foremost row is angled so that the bottles reach the output belt at different times and can then be carried away one at a time. The spacing guides are angled so that the last bottle in one row is fed onto the outlet conveyor before the first bottle of the next row is fed onto the outlet conveyor.
摘要:
TWO NOISE ABATEMENT TECHNIQUES ARE EMPLOYED IN CONNECTION WITH FLAME GENERATION AND THE PRODUCTION OF JETS. ONE OF THESE TECHNIQUES INVOLVES INTRODUCTING A DISRUPTION ROD OF NEEDLE AT THE FOCAL POINT OF THE APRABOLIC SECTION OF THE APEX OF THE INNER COME OF A FLAME. THE OTHER INVOLVES USING A ROD OF RODS FOR CANCELLING THE RESONANT NODE OR NODE DEVELOPED IN A SUPPLY TUBE BY A COMBUSTIBLE MEDIUM PASSING THERETHROUGH TO THE FRAME PRODUCTION ZONE. THE APPARATUS USES THE ABOVE TECHNIQUES SEPARATELY OR IN COMBINATION AND PROVIDES CONTROLS FOR ADJUSTING NODE CANCELLING ROD AND/OR DISRUPTING ROD OF NEEDLE PERFORMING THE AFORESAID FUNCTIONS. THE CONTROLS TAKE INTO ACCOUNT THAT THE NODES AND FOCAL POINT VARY ACCORDING TO FUEL SUPPLY RATE AND OTHER FACTORS RELATING TO AMBIENT AND ASSOCIATED CONDITIONS.
摘要:
Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition on those surfaces. The plasma confinement rings include thermal chokes adapted to localize heating at selected portions of the rings that include the plasma exposed surfaces. The thermal chokes reduce heat conduction from those portions to other portions of the rings, which causes selected portions of the rings to reach desired temperatures during plasma processing.
摘要:
In a plasma processing chamber, a method and an arrangement to stabilize pressure are provided. The method includes providing coarse pressure adjustments in an open-loop manner and thereafter providing fine pressure adjustments in a closed-loop manner. The coarse pressure adjustments are performed by rapidly re-position confinement rings employing an assumed linear relationship between the conductance and the confinement rings position to bring the pressure in the plasma generating region quickly to roughly a desired set point. The fine pressure adjustments are performed by at least employing mechanical vacuum pump(s), turbo pump(s), confinement ring positioning and/or combinations thereof to achieve a derive pressure set point.
摘要:
Described is a cooling system for use in the manufacture of substrates into magnetic disk memory in which cooling plates are positioned dynamically in relation to a substrate to be cooled. This enables positioning the cooling plates closer for more effective cooling. Positioning is controlled by capacitive measurements between the cooling plates and the substrate to be cooled.