SPIN-CURRENT SWITCHABLE MAGNETIC MEMORY ELEMENT AND METHOD OF FABRICATING THE MEMORY ELEMENT
    2.
    发明申请
    SPIN-CURRENT SWITCHABLE MAGNETIC MEMORY ELEMENT AND METHOD OF FABRICATING THE MEMORY ELEMENT 有权
    旋转电流可切换磁记忆元件和制作记忆元件的方法

    公开(公告)号:US20080025082A1

    公开(公告)日:2008-01-31

    申请号:US11869593

    申请日:2007-10-09

    CPC classification number: G11C11/16 G11C11/161

    Abstract: A spin-current switchable magnetic memory element (and method of fabricating the memory element) includes a plurality of magnetic layers having a perpendicular magnetic anisotropy component, at least one of the plurality of magnetic layers including an alloy of a rare-earth metal and a transition metal, and at least one barrier layer formed adjacent to at least one of the plurality of magnetic layers.

    Abstract translation: 自旋电流可切换磁存储元件(及其制造方法)包括具有垂直磁各向异性分量的多个磁性层,所述多个磁性层中的至少一个包括稀土类金属和 过渡金属以及与所述多个磁性层中的至少一个相邻形成的至少一个阻挡层。

    Enhanced Programming Performance in a Nonvolatile Memory Device Having a Bipolar Programmable Storage Element
    4.
    发明申请
    Enhanced Programming Performance in a Nonvolatile Memory Device Having a Bipolar Programmable Storage Element 审中-公开
    具有双极可编程存储元件的非易失性存储器件中的增强的编程性能

    公开(公告)号:US20070274125A1

    公开(公告)日:2007-11-29

    申请号:US11839239

    申请日:2007-08-15

    Abstract: A nonvolatile memory cell includes a bipolar programmable storage element operative to store a logic state of the memory cell, and a metal-oxide-semiconductor device including first and second source/drains and a gate. A first terminal of the bipolar programmable storage element is adapted for connection to a first bit line. The first source/drain is connected to a second terminal of the bipolar programmable storage element, the second source/drain is adapted for connection to a second bit line, and the gate is adapted for connection to a word line.

    Abstract translation: 非易失性存储单元包括可操作地存储存储单元的逻辑状态的双极可编程存储元件和包括第一和第二源极/漏极和栅极的金属氧化物半导体器件。 双极可编程存储元件的第一端子适于连接到第一位线。 第一源极/漏极连接到双极可编程存储元件的第二端子,第二源极/漏极适于连接到第二位线,并且栅极适于连接到字线。

    Robust self-aligned process for sub-65nm current-perpendicular junction pillars
    8.
    发明授权
    Robust self-aligned process for sub-65nm current-perpendicular junction pillars 有权
    用于sub-65nm电流垂直连接柱的鲁棒自对准工艺

    公开(公告)号:US07993535B2

    公开(公告)日:2011-08-09

    申请号:US11627824

    申请日:2007-01-26

    CPC classification number: H01L43/12

    Abstract: A method for fabricating a device includes forming a first insulation layer to cover a removable mask and a device structure that has been defined by the mask. The device structure is below the mask. The mask is lifted off to expose a top portion of the device structure. A conductive island structure is formed over the first insulation layer and the exposed top portion of the device structure. The first insulation layer and the conductive island structure are covered with a second insulation layer. A contact is formed through the second insulation layer to the conductive island structure.

    Abstract translation: 一种用于制造器件的方法包括形成第一绝缘层以覆盖可去除的掩模和由掩模限定的器件结构。 器件结构在掩模之下。 提起面罩以露出装置结构的顶部。 在第一绝缘层和器件结构的暴露顶部上形成导电岛结构。 第一绝缘层和导电岛结构被第二绝缘层覆盖。 通过第二绝缘层向导电岛结构形成接触。

    Spin-current switchable magnetic memory element and method of fabricating the memory element
    9.
    发明申请
    Spin-current switchable magnetic memory element and method of fabricating the memory element 有权
    旋转电流可切换磁存储元件及其制造方法

    公开(公告)号:US20060104110A1

    公开(公告)日:2006-05-18

    申请号:US10990401

    申请日:2004-11-18

    CPC classification number: G11C11/16 G11C11/161

    Abstract: A spin-current switchable magnetic memory element (and method of fabricating the memory element) includes a plurality of magnetic layers having a perpendicular magnetic anisotropy component, at least one of the plurality of magnetic layers including an alloy of a rare-earth metal and a transition metal, and at least one barrier layer formed adjacent to at least one of the plurality of magnetic layers.

    Abstract translation: 自旋电流可切换磁存储元件(及其制造方法)包括具有垂直磁各向异性分量的多个磁性层,所述多个磁性层中的至少一个包括稀土类金属和 过渡金属以及与所述多个磁性层中的至少一个相邻形成的至少一个阻挡层。

    Robust Self-Aligned Process for Sub-65nm Current-Perpendicular Junction Pillars
    10.
    发明申请
    Robust Self-Aligned Process for Sub-65nm Current-Perpendicular Junction Pillars 有权
    用于子65nm电流 - 垂直接合柱的稳健自对准过程

    公开(公告)号:US20100330707A1

    公开(公告)日:2010-12-30

    申请号:US11627824

    申请日:2007-01-26

    CPC classification number: H01L43/12

    Abstract: A method for fabricating a device includes forming a first insulation layer to cover a removable mask and a device structure that has been defined by the mask. The device structure is below the mask. The mask is lifted off to expose a top portion of the device structure. A conductive island structure is formed over the first insulation layer and the exposed top portion of the device structure. The first insulation layer and the conductive island structure are covered with a second insulation layer. A contact is formed through the second insulation layer to the conductive island structure.

    Abstract translation: 一种用于制造器件的方法包括形成第一绝缘层以覆盖可去除的掩模和由掩模限定的器件结构。 器件结构在掩模之下。 提起面罩以露出装置结构的顶部。 在第一绝缘层和器件结构的暴露顶部上形成导电岛结构。 第一绝缘层和导电岛结构被第二绝缘层覆盖。 通过第二绝缘层向导电岛结构形成接触。

Patent Agency Ranking