公开(公告)号：US20170129972A1

公开(公告)日：2017-05-11

申请号：US15345910

申请日：2016-11-08

Applicant: Jeong-Ju PARK ,  Seung-Chul KWON ,  Eun-Sung KIM ,  Kyeong-Mi LEE ,  Shi-Yong YI ,  Tsuyosh KUROSAWA ,  Katsumi OHMORI ,  Tasuku MATSUMIYA

Inventor： Jeong-Ju PARK ,  Seung-Chul KWON ,  Eun-Sung KIM ,  Kyeong-Mi LEE ,  Shi-Yong YI ,  Tsuyosh KUROSAWA ,  Katsumi OHMORI ,  Tasuku MATSUMIYA

IPC: C08F12/08 ,  H01L27/108 ,  H01L21/3105 ,  H01L21/02 ,  H01L21/311 ,  C08F299/04 ,  C08F20/28

CPC classification number: G03F7/165 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C08F20/28 ,  C08L53/00 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/2022 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/10844 ,  H01L28/00

Abstract: In a method of forming patterns, an object layer is formed on a substrate. Guide patterns are formed on the object layer. A brush layer is formed using a brush polymer on surfaces of the guide patterns. The brush polymer includes at least one of a first brush polymer and a second brush polymer. The first brush polymer includes a hydrophobic repeating unit and a hydrophilic terminal group having at least two hydroxyl groups. The second brush polymer includes a hydrophobic repeating unit and a hydrophilic random repeating unit having a hydroxyl group. A self-aligned layer is formed using a block copolymer on the brush layer to form blocks aligned around the guide patterns. At least a portion of the blocks is transferred to the object layer.

公开(公告)号：US10101660B2

公开(公告)日：2018-10-16

申请号：US15345910

申请日：2016-11-08

Applicant: Jeong-Ju Park ,  Seung-Chul Kwon ,  Eun-Sung Kim ,  Kyeong-Mi Lee ,  Shi-Yong Yi ,  Tsuyosh Kurosawa ,  Katsumi Ohmori ,  Tasuku Matsumiya

Inventor： Jeong-Ju Park ,  Seung-Chul Kwon ,  Eun-Sung Kim ,  Kyeong-Mi Lee ,  Shi-Yong Yi ,  Tsuyosh Kurosawa ,  Katsumi Ohmori ,  Tasuku Matsumiya

IPC: G03F7/004 ,  G03F7/16 ,  H01L27/108 ,  C08F20/28 ,  B82Y10/00 ,  B82Y40/00 ,  C08L53/00 ,  G03F7/20 ,  G03F7/00 ,  G03F7/40 ,  H01L21/033 ,  H01L21/311 ,  H01L21/3213 ,  H01L49/02

Abstract: In a method of forming patterns, an object layer is formed on a substrate. Guide patterns are formed on the object layer. A brush layer is formed using a brush polymer on surfaces of the guide patterns. The brush polymer includes at least one of a first brush polymer and a second brush polymer. The first brush polymer includes a hydrophobic repeating unit and a hydrophilic terminal group having at least two hydroxyl groups. The second brush polymer includes a hydrophobic repeating unit and a hydrophilic random repeating unit having a hydroxyl group. A self-aligned layer is formed using a block copolymer on the brush layer to form blocks aligned around the guide patterns. At least a portion of the blocks is transferred to the object layer.