公开(公告)号：US20160163547A1

公开(公告)日：2016-06-09

申请号：US14957777

申请日：2015-12-03

申请人： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

发明人： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

IPC分类号： H01L21/033

CPC分类号： H01L21/0337 ,  H01L21/0332 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/10855

摘要： The present inventive concept provides a method of forming a fine pattern including forming a plurality of pillar-shaped guides that are regularly arranged on a feature layer.

摘要翻译： 本发明构思提供了一种形成精细图案的方法，包括形成规则地布置在特征层上的多个柱状引导件。

公开(公告)号：US08241820B2

公开(公告)日：2012-08-14

申请号：US12686464

申请日：2010-01-13

申请人： Bong-Cheol Kim ,  Dae-Youp Lee ,  Jae-Han Lee ,  Eun-Sung Kim ,  Byeong-Hwan Son

发明人： Bong-Cheol Kim ,  Dae-Youp Lee ,  Jae-Han Lee ,  Eun-Sung Kim ,  Byeong-Hwan Son

IPC分类号： G03F1/38 ,  G03F1/44

CPC分类号： G03F1/70

摘要： Provided is a photomask used in fabrication of a semiconductor device. The photomask includes first and second regions to be transferred onto a semiconductor substrate having a step difference. The first and second regions have mask patterns. The mask patterns of the first region have a different shape from the mask patterns of the second region. The mask patterns of the second region have concave and convex portions disposed in opposite lateral portions thereof.

摘要翻译： 提供了用于制造半导体器件的光掩模。 光掩模包括要转印到具有台阶差的半导体衬底上的第一和第二区域。 第一和第二区域具有掩模图案。 第一区域的掩模图案具有与第二区域的掩模图案不同的形状。 第二区域的掩模图案具有设置在其相对侧面部分中的凹凸部分。

公开(公告)号：US20120033304A1

公开(公告)日：2012-02-09

申请号：US13264724

申请日：2010-04-13

申请人： Eun Sung Kim

发明人： Eun Sung Kim

IPC分类号： G02B27/02 ,  B32B37/02 ,  B05D3/06 ,  B32B37/06 ,  B05D1/28 ,  B32B37/08 ,  B32B37/14 ,  B32B38/10 ,  B05D1/00 ,  B05D1/02 ,  B05D5/06 ,  B32B37/10

CPC分类号： H04N5/72 ,  G02B5/0257 ,  G02B5/0278 ,  G02B5/3033 ,  G02B2207/123 ,  G06F1/1609 ,  H04N5/65 ,  Y10T156/1052

摘要： The present invention relates to a security screen and a manufacturing method thereof. The security screen comprises: a first film layer; and a blind layer in which shielding partition walls for blocking input images are repeatedly arranged at a distance from each other in parallel or in a lattice configuration at a predetermined angle. The shielding partition walls are constituted by repeatedly printing or transferring a light-absorbing color ink onto one or both surfaces of the first film layer. The security screen is fitted to the displays of image devices such as computer monitors, cash dispensers, navigation devices, mobile phones and PDAs or is fitted to the glass of buildings or the like, thereby making it impossible for the image being output on the display to be viewed by any third party positioned on the left, right, above or below who is not the user of the image device, and which makes the image clearer by preventing the phenomenon of blurring and the phenomenon of glare which occur, for example, when external light shines on devices and on glass or the like.

摘要翻译： 本发明涉及安全屏幕及其制造方法。 安全屏幕包括：第一膜层; 以及盲层，其中用于阻挡输入图像的屏蔽分隔壁以预定角度平行地或以格子形式彼此重叠地布置。 屏蔽分隔壁通过在第一薄膜层的一个或两个表面上重复地印刷或转印吸光颜料墨而构成。 安全屏幕安装在诸如计算机显示器，自动提款机，导航设备，移动电话和PDA的图像设备的显示器上，或者被安装在建筑物玻璃等上，从而使图像不可能在显示器上输出 被位于左，右，上，下的谁不是图像设备的用户的任何第三方观看，并且通过防止模糊现象和发生的眩光现象使得图像更清晰，例如， 当外部光照射在设备和玻璃等上时。

公开(公告)号：US20110228536A1

公开(公告)日：2011-09-22

申请号：US13128857

申请日：2009-09-29

申请人： Jung Hyuk Im ,  Eun Sung Kim

发明人： Jung Hyuk Im ,  Eun Sung Kim

IPC分类号： F21S4/00

CPC分类号： F21S41/192 ,  F21S41/143 ,  F21S43/14 ,  F21S43/195

摘要： Provided is a lamp unit configured such that light emitted from a lamp is irradiated in a constant irradiation direction when the lamp unit is installed on one surface of a vehicle having a curvature. The lamp unit includes . Therefore, the lamp unit can be mounted in an easily modified manner according to the shape of an object on which the lamp unit is to be installed. In addition, since the lamp unit is fabricated in a simplified manner, the fabrication cost can be reduced.

摘要翻译： 提供一种灯单元，其被配置为使得当灯单元安装在具有曲率的车辆的一个表面上时，从灯发射的光以恒定的照射方向照射。 灯单元包括。 因此，可以根据要安装灯单元的物体的形状，容易地改变灯单元。 此外，由于灯单元以简化的方式制造，所以可以降低制造成本。

公开(公告)号：US07825041B2

公开(公告)日：2010-11-02

申请号：US12068410

申请日：2008-02-06

申请人： Eun-Sung Kim ,  Tae-Kyu Kim ,  Seok-Hwan Oh

发明人： Eun-Sung Kim ,  Tae-Kyu Kim ,  Seok-Hwan Oh

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01L21/31133 ,  H01L21/32139

摘要： A method of reworking a semiconductor substrate and a method of forming a pattern of semiconductor device using the same without damage to an organic anti-reflective coating (ARC) is provided. The method of reworking a semiconductor substrate includes forming a photoresist pattern on a substrate having the organic ARC formed thereon. An entire surface of the substrate having the photoresist pattern formed thereon may be exposed when a defect is present in the photoresist pattern. The entire-surface-exposed photoresist pattern may be removed by performing a developing process without damage to the organic ARC.

摘要翻译： 提供了对半导体衬底进行再加工的方法和使用其形成半导体器件的图案而不损坏有机抗反射涂层（ARC）的方法。 半导体衬底的再加工方法包括在其上形成有机ARC的衬底上形成光致抗蚀剂图案。 当在光致抗蚀剂图案中存在缺陷时，可以暴露出其上形成有光致抗蚀剂图案的基板的整个表面。 可以通过执行显影过程而不损坏有机ARC来去除全表面暴露的光致抗蚀剂图案。

公开(公告)号：US09704722B2

公开(公告)日：2017-07-11

申请号：US14958072

申请日：2015-12-03

申请人： Jeong-ju Park ,  Seung-chul Kwon ,  Eun-sung Kim ,  Jae-woo Nam ,  Shi-yong Yi ,  Hyun-woo Kim

发明人： Jeong-ju Park ,  Seung-chul Kwon ,  Eun-sung Kim ,  Jae-woo Nam ,  Shi-yong Yi ,  Hyun-woo Kim

IPC分类号： G03F7/40 ,  H01L21/311 ,  G03F7/00 ,  C08L53/00 ,  B82Y10/00 ,  G03F7/16 ,  G03F7/20 ,  B82Y40/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/033 ,  H01L21/308 ,  H01L21/3213 ,  H01L27/108

CPC分类号： H01L21/31144 ,  B82Y10/00 ,  B82Y40/00 ,  C08L53/00 ,  G03F7/002 ,  G03F7/0035 ,  G03F7/165 ,  G03F7/2022 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/02112 ,  H01L21/0274 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/32139 ,  H01L27/10855

摘要： A method of forming a fine pattern includes forming pillar-shaped guides regularly arranged on a feature layer, forming a block copolymer layer on the feature layer around the pillar-shaped guides, phase separating the block copolymer layer, forming first domains regularly arranged on the feature layer with the pillar-shaped guides, forming a second domain on the feature layer surrounding the pillar-shaped guides and the first domains, removing the first domains, and forming holes corresponding with the first domains in the feature layer by etching the feature layer using the pillar-shaped guides and the second domain as etch masks. The block copolymer layer includes a polymer blend having first and second polymer blocks having first and second repeat units, respectively, a first homopolymer and a second homopolymer. The first domains include the first polymer block and the first homopolymer, and the second domain includes the second polymer block and the second homopolymer.

公开(公告)号：US20100178599A1

公开(公告)日：2010-07-15

申请号：US12686464

申请日：2010-01-13

申请人： Bong-Cheol Kim ,  Dae-Youp Lee ,  Jae-Han Lee ,  Eun-Sung Kim ,  Byeong-Hwan Son

发明人： Bong-Cheol Kim ,  Dae-Youp Lee ,  Jae-Han Lee ,  Eun-Sung Kim ,  Byeong-Hwan Son

IPC分类号： G03F1/00

CPC分类号： G03F1/70

摘要： Provided is a photomask used in fabrication of a semiconductor device. The photomask includes first and second regions to be transferred onto a semiconductor substrate having a step difference. The first and second regions have mask patterns. The mask patterns of the first region have a different shape from the mask patterns of the second region. The mask patterns of the second region have concave and convex portions disposed in opposite lateral portions thereof.

摘要翻译： 提供了用于制造半导体器件的光掩模。 光掩模包括要转印到具有台阶差的半导体衬底上的第一和第二区域。 第一和第二区域具有掩模图案。 第一区域的掩模图案具有与第二区域的掩模图案不同的形状。 第二区域的掩模图案具有设置在其相对侧面部分中的凹凸部分。

公开(公告)号：US07697113B2

公开(公告)日：2010-04-13

申请号：US11589720

申请日：2006-10-31

申请人： Eun-Sung Kim

发明人： Eun-Sung Kim

IPC分类号： G03B27/52 ,  G01J1/20 ,  G03B27/42

CPC分类号： G03F9/7026 ,  G03F7/70091

摘要： In a method of determining a focus position for a substrate exposure process and a substrate exposure apparatus capable of performing the same, a reticle having a light-transmitting region may be illuminated by an off-axis illumination light. A projected light, which is transmitted through the reticle and a projection optical system, may be detected by a light sensor disposed on a substrate stage. An intensity of the projected light measured at a light-receiving surface of the light sensor may vary in accordance with positions of the light-receiving surface. The focus position may be determined based on the variations in the intensity of the projected light.

摘要翻译： 在确定用于基板曝光处理的焦点位置的方法和能够执行该曝光处理的基板曝光装置的方法中，具有透光区域的掩模版可以被离轴照明光照亮。 可以通过布置在基板台上的光传感器来检测通过掩模版和投影光学系统透射的投影光。 在光传感器的光接收表面处测量的投射光的强度可以根据受光面的位置而变化。 可以基于投影光的强度的变化来确定聚焦位置。

公开(公告)号：US20060148275A1

公开(公告)日：2006-07-06

申请号：US11325208

申请日：2006-01-03

申请人： Young-Koog Han ,  Dae-Joung Kim ,  Eun-Sung Kim ,  Jae-Hoon Kim

发明人： Young-Koog Han ,  Dae-Joung Kim ,  Eun-Sung Kim ,  Jae-Hoon Kim

IPC分类号： H01L21/00

CPC分类号： H01L23/544 ,  G03F9/708 ,  G03F9/7084 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： Embodiments of the present invention provide, among other things, a method of forming an alignment mark having a stepped structure without an additional process. The alignment mark may be used to prevent formation of a defect source in a semiconductor device.

摘要翻译： 除其他之外，本发明的实施例提供了一种形成具有阶梯结构的对准标记的方法，而没有额外的工艺。 对准标记可以用于防止在半导体器件中形成缺陷源。

公开(公告)号：US08657468B2

公开(公告)日：2014-02-25

申请号：US13128857

申请日：2009-09-29

申请人： Jung Hyuk Im ,  Eun Sung Kim

发明人： Jung Hyuk Im ,  Eun Sung Kim

IPC分类号： F21V21/14 ,  H05K1/02

CPC分类号： F21S41/192 ,  F21S41/143 ,  F21S43/14 ,  F21S43/195

摘要： A lamp unit includes a flexible base member, a conductive pattern layer forming a conductive pattern on the base member and maintaining a bent shape of the base member when the base member is bent, and LED lamps mounted on the conductive pattern layer and emitting light when a current is applied thereto. The lamp unit can be bent according to the shape of an object on which the lamp unit is to be installed.

摘要翻译： 灯单元包括柔性基底构件，在基底构件上形成导电图案的导电图案层，并且当基底构件弯曲时保持基底构件的弯曲形状，并且安装在导电图案层上的LED灯发光 施加电流。 灯单元可以根据要安装灯单元的物体的形状弯曲。