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公开(公告)号:US20100277868A1
公开(公告)日:2010-11-04
申请号:US12433301
申请日:2009-04-30
申请人: Richard Alfred Beaupre , Peter Almern Losee , Xiaochun Shen , John Stanley Glaser , Joseph Lucian Smolenski , Adam Gregory Pautsch
发明人: Richard Alfred Beaupre , Peter Almern Losee , Xiaochun Shen , John Stanley Glaser , Joseph Lucian Smolenski , Adam Gregory Pautsch
IPC分类号: H05K7/20
CPC分类号: H05K7/20927 , H01L23/473 , H01L2924/0002 , H01L2924/00
摘要: A power module includes one or more semiconductor power devices bonded to an insulated metal substrate (IMS). A plurality of cooling fluid channels is integrated into the IMS.
摘要翻译: 功率模块包括结合到绝缘金属基板(IMS)的一个或多个半导体功率器件。 多个冷却流体通道被集成到IMS中。
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公开(公告)号:US08815721B2
公开(公告)日:2014-08-26
申请号:US12971188
申请日:2010-12-17
IPC分类号: H01L21/425 , H01L21/04 , H01L29/66 , H01L29/78
CPC分类号: H01L29/36 , H01L21/046 , H01L29/1608 , H01L29/66068 , H01L29/7816 , H01L29/7827
摘要: A method comprising, introducing a dopant type into a semiconductor layer to define a well region of the semiconductor layer, the well region comprising a channel region, and introducing a dopant type into the well region to define a multiple implant region substantially coinciding with the well region but excluding the channel region.
摘要翻译: 一种方法,包括:将掺杂剂类型引入到半导体层中以限定所述半导体层的阱区,所述阱区包括沟道区,并且将掺杂剂类型引入所述阱区以限定与所述阱大致重合的多个注入区 但不包括渠道区域。
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公开(公告)号:US20130153953A1
公开(公告)日:2013-06-20
申请号:US13328796
申请日:2011-12-16
申请人: Ahmed Elasser , Arthur Stephen Daley , Alexey Vert , Stanislav I. Soloviev , Peter Almern Losee
发明人: Ahmed Elasser , Arthur Stephen Daley , Alexey Vert , Stanislav I. Soloviev , Peter Almern Losee
IPC分类号: H01L27/06 , H01L21/332
CPC分类号: H01L31/1113 , H01L27/0817 , H01L29/74
摘要: A thyristor device includes a semiconductor body and a conductive anode. The semiconductor body has a plurality of doped layers forming a plurality of dopant junctions and includes an optical thyristor, a first amplifying thyristor, and a switching thyristor. The conductive anode is disposed on a first side of the semiconductor body. The optical thyristor is configured to receive incident radiation to generate a first electric current, and the first amplifying thyristor is configured to increase the first electric current from the optical thyristor to at least a threshold current. The switching thyristor switches to the conducting state in order to conduct a second electric current from the anode and through the semiconductor body.
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公开(公告)号:US20120126321A1
公开(公告)日:2012-05-24
申请号:US12952418
申请日:2010-11-23
IPC分类号: H01L29/78 , H01L21/336
CPC分类号: H01L29/1608 , H01L29/0615 , H01L29/1095 , H01L29/66068 , H01L29/66712 , H01L29/7802 , H01L29/7811
摘要: A substrate having semiconductor material and a surface that supports a gate electrode and defines a surface normal direction is provided. The substrate can include a drift region including a first dopant type. A well region can be disposed adjacent to the drift region and proximal to the surface, and can include a second dopant type. A termination extension region can be disposed adjacent to the well region and extend away from the gate electrode, and can have an effective concentration of second dopant type that is generally less than that in the well region. An adjust region can be disposed between the surface and at least part of the termination extension region. An effective concentration of second dopant type may generally decrease when moving from the termination extension region into the adjust region along the surface normal direction.
摘要翻译: 提供具有半导体材料的基板和支撑栅电极并限定表面法线方向的表面。 衬底可以包括包括第一掺杂剂类型的漂移区域。 阱区域可以布置成与漂移区域相邻并且靠近表面,并且可以包括第二掺杂剂类型。 端接延伸区域可以邻近阱区域设置并且远离栅电极延伸,并且可以具有通常小于阱区域中的第二掺杂剂类型的有效浓度。 可以在表面和终止延伸区域的至少一部分之间设置调整区域。 当从终止延伸区域沿着表面法线方向移动到调整区域中时,第二掺杂剂类型的有效浓度通常可以降低。
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公开(公告)号:US20100200931A1
公开(公告)日:2010-08-12
申请号:US12368498
申请日:2009-02-10
申请人: Kevin Sean Matocha , Stephen Daley Arthur , Ramakrishna Rao , Peter Almern Losee , Zachary Matthew Stum
发明人: Kevin Sean Matocha , Stephen Daley Arthur , Ramakrishna Rao , Peter Almern Losee , Zachary Matthew Stum
IPC分类号: H01L29/78 , H01L21/8234
CPC分类号: H01L29/7802 , H01L21/0465 , H01L29/0615 , H01L29/1095 , H01L29/1608 , H01L29/2003 , H01L29/41766 , H01L29/66068 , H01L29/66727
摘要: A MOSFET device and a method for fabricating MOSFET devices are disclosed. The method includes providing a semiconductor device structure including a semiconductor device layer of a first conductivity type, and ion implanting a well structure of a second conductivity type in the semiconductor device layer, where the ion implanting includes providing a dopant concentration profile in a single mask implant sequence.
摘要翻译: 公开了MOSFET器件和用于制造MOSFET器件的方法。 该方法包括提供包括第一导电类型的半导体器件层和在半导体器件层中离子注入第二导电类型的阱结构的半导体器件结构,其中离子注入包括在单个掩模中提供掺杂剂浓度分布 植入序列。
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公开(公告)号:US20130323873A1
公开(公告)日:2013-12-05
申请号:US13960971
申请日:2013-08-07
申请人: AHMED ELASSER , STEPHEN DALEY ARTHUR , ALEXEY VERT , STANISLAV IVANOVICH SOLOVIEV , PETER ALMERN LOSEE
发明人: AHMED ELASSER , STEPHEN DALEY ARTHUR , ALEXEY VERT , STANISLAV IVANOVICH SOLOVIEV , PETER ALMERN LOSEE
IPC分类号: H01L31/111
CPC分类号: H01L31/1113 , H01L27/0817 , H01L29/74
摘要: A thyristor device includes a semiconductor body and a conductive anode. The semiconductor body has a plurality of doped layers forming a plurality of dopant junctions and includes an optical thyristor, a first amplifying thyristor, and a switching thyristor. The conductive anode is disposed on a first side of the semiconductor body. The optical thyristor is configured to receive incident radiation to generate a first electric current, and the first amplifying thyristor is configured to increase the first electric current from the optical thyristor to at least a threshold current. The switching thyristor switches to the conducting state in order to conduct a second electric current from the anode and through the semiconductor body.
摘要翻译: 晶闸管器件包括半导体本体和导电阳极。 半导体本体具有形成多个掺杂剂结的多个掺杂层,并且包括光学晶闸管,第一放大晶闸管和开关晶闸管。 导电阳极设置在半导体本体的第一侧上。 光晶闸管被配置为接收入射辐射以产生第一电流,并且第一放大晶闸管被配置为将来自光晶闸管的第一电流增加到至少阈值电流。 开关晶闸管切换到导通状态,以便从阳极和半导体本体传导第二电流。
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公开(公告)号:US20130221374A1
公开(公告)日:2013-08-29
申请号:US13597299
申请日:2012-08-29
IPC分类号: H01L29/16
CPC分类号: H01L29/1608 , H01L29/0615 , H01L29/1095 , H01L29/66068 , H01L29/66712 , H01L29/7802 , H01L29/7811
摘要: A semiconductor device includes a substrate comprising a semiconductor material. The substrate has a surface that defines a surface normal direction and includes a P-N junction comprising an interface between a first region and a second region, where the first (second) region includes a first (second) dopant type, so as to have a first (second) conductivity type. The substrate includes a termination extension region disposed adjacent to the P-N junction and having an effective concentration of the second dopant type that is generally the effective concentration of the second dopant type in the second doped region. The substrate includes an adjust region disposed adjacent to the surface and between the surface and at least part of the termination extension region, where the effective concentration of the second dopant type generally decreases when moving from the termination extension region into the adjust region along the surface normal direction.
摘要翻译: 半导体器件包括包含半导体材料的衬底。 衬底具有限定表面法线方向的表面,并且包括PN结,其包括在第一区域和第二区域之间的界面,其中第一(第二)区域包括第一(第二)掺杂剂类型,以便具有第一 (第二)导电类型。 衬底包括邻近P-N结设置并且具有通常为第二掺杂区域中的第二掺杂剂类型的有效浓度的第二掺杂剂类型的有效浓度的终止延伸区域。 衬底包括与表面相邻并且在表面与终止延伸区域的至少一部分之间布置的调节区域,其中当从端接延伸区域沿着表面移动到调节区域中时,第二掺杂剂类型的有效浓度通常降低 正常方向
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公开(公告)号:US08232637B2
公开(公告)日:2012-07-31
申请号:US12433301
申请日:2009-04-30
申请人: Richard Alfred Beaupre , Peter Almern Losee , Xiaochun Shen , John Stanley Glaser , Joseph Lucian Smolenski , Adam Gregory Pautsch
发明人: Richard Alfred Beaupre , Peter Almern Losee , Xiaochun Shen , John Stanley Glaser , Joseph Lucian Smolenski , Adam Gregory Pautsch
IPC分类号: H01L23/34
CPC分类号: H05K7/20927 , H01L23/473 , H01L2924/0002 , H01L2924/00
摘要: A power module includes one or more semiconductor power devices bonded to an insulated metal substrate (IMS). A plurality of cooling fluid channels is integrated into the IMS.
摘要翻译: 功率模块包括结合到绝缘金属基板(IMS)的一个或多个半导体功率器件。 多个冷却流体通道被集成到IMS中。
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公开(公告)号:US20120153362A1
公开(公告)日:2012-06-21
申请号:US12971188
申请日:2010-12-17
IPC分类号: H01L29/772 , H01L21/265
CPC分类号: H01L29/36 , H01L21/046 , H01L29/1608 , H01L29/66068 , H01L29/7816 , H01L29/7827
摘要: A method comprising, introducing a dopant type into a semiconductor layer to define a well region of the semiconductor layer, the well region comprising a channel region, and introducing a dopant type into the well region to define a multiple implant region substantially coinciding with the well region but excluding the channel region.
摘要翻译: 一种方法,包括:将掺杂剂类型引入到半导体层中以限定所述半导体层的阱区,所述阱区包括沟道区,并且将掺杂剂类型引入所述阱区以限定与所述阱大致重合的多个注入区 但不包括渠道区域。
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公开(公告)号:US07829402B2
公开(公告)日:2010-11-09
申请号:US12368498
申请日:2009-02-10
申请人: Kevin Sean Matocha , Stephen Daley Arthur , Ramakrishna Rao , Peter Almern Losee , Zachary Matthew Stum
发明人: Kevin Sean Matocha , Stephen Daley Arthur , Ramakrishna Rao , Peter Almern Losee , Zachary Matthew Stum
IPC分类号: H01L21/336 , H01L21/8234
CPC分类号: H01L29/7802 , H01L21/0465 , H01L29/0615 , H01L29/1095 , H01L29/1608 , H01L29/2003 , H01L29/41766 , H01L29/66068 , H01L29/66727
摘要: A MOSFET device and a method for fabricating MOSFET devices are disclosed. The method includes providing a semiconductor device structure including a semiconductor device layer of a first conductivity type, and ion implanting a well structure of a second conductivity type in the semiconductor device layer, where the ion implanting includes providing a dopant concentration profile in a single mask implant sequence.
摘要翻译: 公开了MOSFET器件和用于制造MOSFET器件的方法。 该方法包括提供包括第一导电类型的半导体器件层和在半导体器件层中离子注入第二导电类型的阱结构的半导体器件结构,其中离子注入包括在单个掩模中提供掺杂剂浓度分布 植入序列。
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