公开(公告)号：US20110095007A1

公开(公告)日：2011-04-28

申请号：US12980579

申请日：2010-12-29

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/06 ,  B23K26/08

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

摘要翻译： 热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。 该台被配置为在其上接收基板。 连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。 该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。 翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。 检测模块位于路径内，被配置为检测连续波电磁辐射。

公开(公告)号：US06183130B2

公开(公告)日：2001-02-06

申请号：US09130253

申请日：1998-08-06

申请人： Bruce Adams ,  Aaron Hunter ,  Alex Rubinchik ,  Mark Yam ,  Paul A. O'Brien

发明人： Bruce Adams ,  Aaron Hunter ,  Alex Rubinchik ,  Mark Yam ,  Paul A. O'Brien

IPC分类号： G01J508

CPC分类号： G01J5/04 ,  G01J5/0003 ,  G01J5/0007 ,  G01J5/046 ,  G01J5/08 ,  G01J5/0806 ,  G01J5/0809 ,  G01J5/0815 ,  G01J5/0818 ,  G01J5/0821 ,  G01J5/0846 ,  G01J5/0862 ,  G01J2005/0048

摘要： A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.

摘要翻译： 描述了用于测量热处理室中的基板的温度的温度传感器。 该腔室包括一反射镜，当该基片定位在腔室中时，该反射器形成具有基底的反射腔。 温度传感器包括探针，其具有定位成接收来自反射腔的辐射的输入端，以及光学耦合到探针的输出端的检测器。 进入探头的辐射包括反射辐射和未反射的辐射。 检测器测量进入探头的辐射的第一部分的强度，以产生第一强度信号并测量进入探头的辐射的第二部分的强度以产生第二强度信号。 检测器被配置为使得反射辐射与非反射辐射的比率在第一部分中比第二部分高。 两个强度信号用于计算衬底的温度和发射率。

公开(公告)号：US08288685B2

公开(公告)日：2012-10-16

申请号：US12980579

申请日：2010-12-29

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

公开(公告)号：US20120205347A1

公开(公告)日：2012-08-16

申请号：US13442128

申请日：2012-04-09

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

摘要翻译： 热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。 该台被配置为在其上接收基板。 连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。 该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。 翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。 检测模块位于路径内，被配置为检测连续波电磁辐射。

公开(公告)号：US07875829B2

公开(公告)日：2011-01-25

申请号：US11561784

申请日：2006-11-20

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08 ,  B23K26/10

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

摘要翻译： 热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。 该台被配置为在其上接收基板。 连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。 该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。 翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。 检测模块位于路径内，被配置为检测连续波电磁辐射。

公开(公告)号：US07872209B2

公开(公告)日：2011-01-18

申请号：US11924298

申请日：2007-10-25

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08 ,  B23K26/10

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

公开(公告)号：US08178819B2

公开(公告)日：2012-05-15

申请号：US11079785

申请日：2005-03-14

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08 ,  B23K26/10

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

摘要翻译： 热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。 该台被配置为在其上接收基板。 连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。 该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。 翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。 检测模块位于路径内，被配置为检测连续波电磁辐射。

公开(公告)号：US06987240B2

公开(公告)日：2006-01-17

申请号：US10325497

申请日：2002-12-18

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08 ,  B23K26/10

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation. The computer system is coupled to the detection module.

公开(公告)号：US06406179B2

公开(公告)日：2002-06-18

申请号：US09756945

申请日：2001-01-08

申请人： Bruce Adams ,  Aaron Hunter ,  Alex Rubinchik ,  Mark Yam ,  Paul A. O'Brien

发明人： Bruce Adams ,  Aaron Hunter ,  Alex Rubinchik ,  Mark Yam ,  Paul A. O'Brien

IPC分类号： G01J508

CPC分类号： G01J5/04 ,  G01J5/0003 ,  G01J5/0007 ,  G01J5/046 ,  G01J5/08 ,  G01J5/0806 ,  G01J5/0809 ,  G01J5/0815 ,  G01J5/0818 ,  G01J5/0821 ,  G01J5/0846 ,  G01J5/0862 ,  G01J2005/0048

摘要： A temperature sensor for measuring a temperature of a substrate in a thermal processing chamber is described. The chamber includes a reflector forming a reflecting cavity with a substrate when the substrate is positioned in the chamber. The temperature sensor includes a probe having an input end positioned to receive radiation from the reflecting cavity, and a detector optically coupled to an output end of the probe. The radiation entering the probe includes reflected radiation and non-reflected radiation. The detector measures an intensity of a first portion of the radiation entering the probe to generate a first intensity signal and measures an intensity of a second portion of the radiation entering the probe to generate a second intensity signal. The detector is configured so that a ratio of the reflected radiation to the non-reflected radiation is higher in the first portion than the second portion. The two intensity signals are used to calculate the temperature and emissivity of the substrate.

摘要翻译： 描述了用于测量热处理室中的基板的温度的温度传感器。 该腔室包括一反射镜，当该基片定位在腔室中时，该反射器形成具有基底的反射腔。 温度传感器包括探针，其具有定位成接收来自反射腔的辐射的输入端，以及光学耦合到探针的输出端的检测器。 进入探头的辐射包括反射辐射和未反射的辐射。 检测器测量进入探头的辐射的第一部分的强度，以产生第一强度信号并测量进入探头的辐射的第二部分的强度以产生第二强度信号。 检测器被配置为使得反射辐射与非反射辐射的比率在第一部分中比第二部分高。 两个强度信号用于计算衬底的温度和发射率。

公开(公告)号：US08829393B2

公开(公告)日：2014-09-09

申请号：US13442128

申请日：2012-04-09

申请人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

发明人： Dean C. Jennings ,  Mark Yam ,  Abhilash J. Mayur ,  Vernon Behrens ,  Paul A. O'Brien ,  Leonid M. Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08 ,  B23K26/00 ,  B23K26/03 ,  B23K26/06 ,  C23C16/04 ,  B23K26/073 ,  H01L21/00 ,  B23K26/42 ,  H01L21/67 ,  C23C8/00 ,  B23K26/34 ,  C23C16/48 ,  B23K26/14 ,  G02B27/09 ,  B23K26/04 ,  B23K26/12 ,  C23C8/22 ,  C23C8/10 ,  H01L21/20

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

摘要翻译： 热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。 该台被配置为在其上接收基板。 连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。 该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。 翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。 检测模块位于路径内，被配置为检测连续波电磁辐射。