公开(公告)号：US20090064934A1

公开(公告)日：2009-03-12

申请号：US12205363

申请日：2008-09-05

申请人： BEOM SOO PARK ,  Young Jin Choi ,  Robin L. Tiner ,  Sam H. Kim ,  Soo Young Choi ,  John M. White ,  Dong-Kil Yim

发明人： BEOM SOO PARK ,  Young Jin Choi ,  Robin L. Tiner ,  Sam H. Kim ,  Soo Young Choi ,  John M. White ,  Dong-Kil Yim

IPC分类号： C23C16/513

CPC分类号： C23C16/45502 ,  C23C16/4401

摘要： The present invention generally comprises a method and an apparatus for guiding the flow of processing gases away from chamber walls and slit valve opening. By controlling the flow path of the process gases within a processing chamber, undesirable deposition upon chamber walls and within slit valve openings may be reduced. By reducing deposition in slit valve openings, flaking may be reduced. By reducing deposition on chamber walls, the time between chamber cleaning may be increased. Thus, guiding the flow of processing gases within the processing chamber may increase substrate throughput.

摘要翻译： 本发明通常包括一种用于将处理气体的流动引导离开室壁和狭缝阀开口的方法和装置。 通过控制处理室内的处理气体的流动路径，可以减少在室壁上和狭缝阀开口内的不期望的沉积。 通过减少狭缝阀开口中的沉积，可能会降低剥落。 通过减少室壁上的沉积，可以增加室清洁之间的时间。 因此，引导处理室内的处理气体的流动可以增加衬底生产量。

公开(公告)号：US20090083953A1

公开(公告)日：2009-04-02

申请号：US12199456

申请日：2008-08-27

申请人： Sam H. KIM ,  Beom Soo PARK ,  William N. STERLING

发明人： Sam H. KIM ,  Beom Soo PARK ,  William N. STERLING

IPC分类号： A44B21/00

CPC分类号： C23C16/4409 ,  H01J37/32458 ,  Y10T24/44043

摘要： Embodiments described herein relate to a clamp mechanism for a backing plate disposed in a PECVD chamber, comprising an upper clamp portion fixed to an interior portion of a chamber lid, and a lower clamp portion in sliding contact with the upper clamp portion and the backing plate, wherein the lower clamp portion comprises at least one fastener disposed through the lower clamp portion and the chamber lid, the at least one fastener comprising an adjustment member, and wherein rotation of the adjustment member causes lateral movement and compression to the backing plate.

摘要翻译： 本文所述的实施例涉及一种用于设置在PECVD室中的背板的夹紧机构，包括固定到室盖的内部的上夹具部分和与上夹板部分和背板滑动接触的下夹具部分 其中所述下夹具部分包括穿过所述下夹具部分和所述腔室盖的至少一个紧固件，所述至少一个紧固件包括调节构件，并且其中所述调节构件的旋转导致横向运动并压缩到所述背板。

公开(公告)号：US4958481A

公开(公告)日：1990-09-25

申请号：US264279

申请日：1988-10-18

申请人： Sam H. Kim

发明人： Sam H. Kim

IPC分类号： B65B20060101 ,  B65B13/02 ,  B65B67/00

CPC分类号： B65B13/02 ,  B65B67/00

摘要： A box-cording apparatus used to cord up a packing box. The apparatus comprises a frame means having a base frame and support members slidably installed thereon, a driving means for moving the support members back and forth, and a frame rotating means having a shaft and a control means for the rotation of the shaft. The support members are bound together with parts of the box loaded on the base frame during the cording work and then pulled and received in the base frame, getting free from the corded parts of the box.

摘要翻译： PCT No.PCT / KR88 / 00005 Sec。 371日期：1988年10月18日 102（e）日期1988年10月18日PCT提交1988年2月19日PCT公布。 出版物WO88 / 06124 日期1988年8月25日。一种用于打包包装盒的盒装设备。 该装置包括框架装置，该框架装置具有底座和可滑动地安装在其上的支撑构件，用于前后移动支撑构件的驱动装置和具有轴的框架旋转装置和用于轴的旋转的控制装置。 在绳索加工期间，支撑构件与装载在基架上的箱体的一部分结合在一起，然后被拉入并接收在基架中，从箱体的有线部分脱离。

公开(公告)号：US07007919B2

公开(公告)日：2006-03-07

申请号：US10418682

申请日：2003-04-17

申请人： Wendell Blonigan ,  Emanuel Beer ,  Dongchoon Suh ,  Jaime Munoz ,  Sam H. Kim

发明人： Wendell Blonigan ,  Emanuel Beer ,  Dongchoon Suh ,  Jaime Munoz ,  Sam H. Kim

IPC分类号： F16K3/16

CPC分类号： H01L21/67126 ,  F16K51/02

摘要： An actuator assembly for a slit valve door is configured to maintain a slit valve in a closed condition notwithstanding a high pressure differential between adjacent chambers that the slit valve isolates from each other. The slit valve door actuator assembly includes an actuator which moves the slit valve door between open and closed positions, and a locking mechanism to keep the slit valve door in a position to seal the slit valve in resistance to high gas pressure against the slit valve door. The locking mechanism may include a hard stop which is selectively movable into position to block retracting movement of the slit valve door.

摘要翻译： 用于狭缝阀门的致动器组件被配置为使狭缝阀保持在闭合状态，尽管狭缝阀彼此分离的相邻室之间具有高压差。 狭缝阀门致动器组件包括使狭缝阀门在打开和关闭位置之间移动的致动器，以及锁定机构，以将狭缝阀门保持在密封狭缝阀的位置，以抵抗狭缝阀门的高气压 。 锁定机构可以包括硬挡块，其可选择性地移动到位置以阻挡狭缝阀门的缩回运动。

公开(公告)号：US5007145A

公开(公告)日：1991-04-16

申请号：US411451

申请日：1989-09-18

申请人： Sam H. Kim

发明人： Sam H. Kim

IPC分类号： A44B19/38

CPC分类号： A44B19/38 ,  Y10T24/2513 ,  Y10T24/2593

摘要： An end-locking device for slide fasteners which enables the end of a first row of zipper teeth to be releasably locked in a socket terminal which is fixed to the end of a second row of zipper teeth. The device includes locking means mounted to pivot on the socket terminal and engaging means located at the end of the second row of zipper teeth. When the end of the first row of zipper teeth is inserted into the socket terminal in order to fasten the zipper, the locking means and the engaging means are brought into interlocking engagement with each other and held in the socket terminal. In order to unfasten the zipper, the locking means is manually pushed and this causes the ends of the rows of zipper teeth to be disengaged, thereby permitting the end of the second row of zipper teeth to be escaped from the socket terminal.

摘要翻译： PCT No.PCT / KR89 / 00001 Sec。 371日期：1989年9月18日 102（e）1989年9月18日PCT PCT 1月18日PCT公布。 出版物WO89 / 06504 日期：1989年7月27日。一种用于拉链的端锁定装置，其能够将第一排拉链齿的端部可释放地锁定在固定到第二排拉链齿的端部的插座端子中。 该装置包括安装成在插座端子上枢转的锁定装置和位于第二排拉链齿末端处的接合装置。 当第一排拉链齿的端部插入插座端子中以固定拉链时，锁定装置和接合装置彼此互锁并保持在插座端子中。 为了解锁拉链，锁定装置被手动推动，这导致拉链排的端部脱开，从而允许第二排拉链齿的端部从插座端子逸出。

公开(公告)号：US08853098B2

公开(公告)日：2014-10-07

申请号：US13401755

申请日：2012-02-21

申请人： Sam H. Kim ,  John M. White ,  Soo Young Choi ,  Carl A. Sorensen ,  Robin L. Tiner ,  Beom Soo Park

发明人： Sam H. Kim ,  John M. White ,  Soo Young Choi ,  Carl A. Sorensen ,  Robin L. Tiner ,  Beom Soo Park

IPC分类号： H01L21/00 ,  H01L21/44 ,  H01L21/31 ,  H01L21/469 ,  H01L21/687 ,  H01L21/683

CPC分类号： H01L21/68742 ,  H01L21/6831

摘要： Embodiments disclosed herein generally relate to an apparatus and a method for placing a substrate substantially flush against a substrate support in a processing chamber. When a large area substrate is placed onto a substrate support, the substrate may not be perfectly flush against the substrate support due to gas pockets that may be present between the substrate and the substrate support. The gas pockets can lead to uneven deposition on the substrate. Therefore, pulling the gas from between the substrate and the support may pull the substrate substantially flush against the support. During deposition, an electrostatic charge can build up and cause the substrate to stick to the substrate support. By introducing a gas between the substrate and the substrate support, the electrostatic forces may be overcome so that the substrate can be separated from the susceptor with less or no plasma support which takes extra time and gas.

摘要翻译： 本文公开的实施例通常涉及用于将衬底基本上与衬底支撑件齐平地放置在处理室中的装置和方法。 当将大面积基板放置在基板支撑件上时，由于可能存在于基板和基板支撑件之间的气体袋，基板可能不能完全与基板支撑件齐平。 气袋可导致基板上的不均匀沉积。 因此，从衬底和支撑件之间拉动气体可以将衬底基本上与支撑件齐平。 在沉积期间，静电电荷可能积聚并使衬底粘附到衬底支撑件上。 通过在衬底和衬底支撑件之间引入气体，可以克服静电力，使得衬底可以用较少或不需要额外时间和气体的等离子体支架与基座分离。

公开(公告)号：US20120009347A1

公开(公告)日：2012-01-12

申请号：US12831731

申请日：2010-07-07

申请人： Dongsuh Lee ,  Weijie Wang ,  William N. Sterling ,  Sam H. Kim ,  Soo Young Choi ,  Beom Soo Park ,  Beom Soo Kim ,  Qunhua Wang

发明人： Dongsuh Lee ,  Weijie Wang ,  William N. Sterling ,  Sam H. Kim ,  Soo Young Choi ,  Beom Soo Park ,  Beom Soo Kim ,  Qunhua Wang

IPC分类号： C23C16/52 ,  B01F15/06 ,  C23C16/00 ,  B01F15/02

CPC分类号： B01F5/0077 ,  B01F5/0688 ,  B01F15/065 ,  B01F2015/061 ,  C23C16/45512

摘要： Embodiments of the invention generally provide a mixing block for mixing precursors and/or cleaning agent which has the advantage of maintaining the temperature and improving the mixing effect of the precursors, cleaning agent or the mixture thereof to eliminate the substrate-to-substrate variation, thereby providing improved process uniformity.

摘要翻译： 本发明的实施方案通常提供用于混合前体和/或清洁剂的混合块，其具有保持温度并改善前体，清洁剂或其混合物的混合效果以消除基材对基底变化的优点， 从而提供改进的工艺均匀性。

公开(公告)号：US20110185972A1

公开(公告)日：2011-08-04

申请号：US13014113

申请日：2011-01-26

申请人： Jonghoon Baek ,  Sam H. Kim ,  Beom Soo Park

发明人： Jonghoon Baek ,  Sam H. Kim ,  Beom Soo Park

IPC分类号： C23C16/505 ,  C23C16/455

CPC分类号： C23C16/505

摘要： Embodiments disclosed herein generally relate to a PECVD apparatus. When the RF power source is coupled to the electrode at multiple locations, the current and voltage may be different at the multiple locations. In order to ensure that both the current and voltage are substantially identical at the multiple locations, an RF bridge assembly may be coupled between the multiple locations at a location just before connection to the electrode. The RF bridge assembly substantially equalizes the voltage distribution and current distribution between multiple locations. Therefore, a substantially identical current and voltage is applied to the electrode at the multiple locations.

摘要翻译： 本文公开的实施例一般涉及PECVD装置。 当RF电源在多个位置耦合到电极时，电流和电压在多个位置可能是不同的。 为了确保电流和电压在多个位置处基本上相同，RF桥组件可以在连接到电极之前的位置处耦合在多个位置之间。 RF桥组件基本上均衡多个位置之间的电压分布和电流分布。 因此，在多个位置处对电极施加基本相同的电流和电压。

公开(公告)号：US20100184290A1

公开(公告)日：2010-07-22

申请号：US12686483

申请日：2010-01-13

申请人： Sam H. Kim ,  John M. White ,  Soo Young Choi ,  Carl A. Sorensen ,  Robin L. Tiner ,  Beom Soo Park

发明人： Sam H. Kim ,  John M. White ,  Soo Young Choi ,  Carl A. Sorensen ,  Robin L. Tiner ,  Beom Soo Park

IPC分类号： H01L21/28

CPC分类号： H01L21/68742 ,  H01L21/6831

摘要： Embodiments disclosed herein generally relate to an apparatus and a method for placing a substrate substantially flush against a substrate support in a processing chamber. When a large area substrate is placed onto a substrate support, the substrate may not be perfectly flush against the substrate support due to gas pockets that may be present between the substrate and the substrate support. The gas pockets can lead to uneven deposition on the substrate. Therefore, pulling the gas from between the substrate and the support may pull the substrate substantially flush against the support. During deposition, an electrostatic charge can build up and cause the substrate to stick to the substrate support. By introducing a gas between the substrate and the substrate support, the electrostatic forces may be overcome so that the substrate can be separated from the susceptor with less or no plasma support which takes extra time and gas.

摘要翻译： 本文公开的实施例通常涉及用于将衬底基本上与衬底支撑件齐平地放置在处理室中的装置和方法。 当将大面积基板放置在基板支撑件上时，由于可能存在于基板和基板支撑件之间的气体袋，基板可能不能完全与基板支撑件齐平。 气袋可导致基板上的不均匀沉积。 因此，从衬底和支撑件之间拉动气体可以将衬底基本上与支撑件齐平。 在沉积期间，静电电荷可能积聚并使衬底粘附到衬底支撑件上。 通过在衬底和衬底支撑件之间引入气体，可以克服静电力，使得衬底可以用较少或不需要额外时间和气体的等离子体支架与基座分离。

公开(公告)号：US08875657B2

公开(公告)日：2014-11-04

申请号：US13014113

申请日：2011-01-26

申请人： Jonghoon Baek ,  Sam H. Kim ,  Beom Soo Park

发明人： Jonghoon Baek ,  Sam H. Kim ,  Beom Soo Park

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  C23C16/505

CPC分类号： C23C16/505

摘要： Embodiments disclosed herein generally relate to a PECVD apparatus. When the RF power source is coupled to the electrode at multiple locations, the current and voltage may be different at the multiple locations. In order to ensure that both the current and voltage are substantially identical at the multiple locations, an RF bridge assembly may be coupled between the multiple locations at a location just before connection to the electrode. The RF bridge assembly substantially equalizes the voltage distribution and current distribution between multiple locations. Therefore, a substantially identical current and voltage is applied to the electrode at the multiple locations.

摘要翻译： 本文公开的实施例一般涉及PECVD装置。 当RF电源在多个位置耦合到电极时，电流和电压在多个位置可能是不同的。 为了确保电流和电压在多个位置处基本上相同，RF桥组件可以在连接到电极之前的位置处耦合在多个位置之间。 RF桥组件基本上均衡多个位置之间的电压分布和电流分布。 因此，在多个位置处对电极施加基本相同的电流和电压。