公开(公告)号：US08927907B2

公开(公告)日：2015-01-06

申请号：US13307176

申请日：2011-11-30

Applicant: Steven T. Fink ,  Eric J. Strang

Inventor： Steven T. Fink ,  Eric J. Strang

IPC: H05B3/02 ,  F25B21/02 ,  H01L21/67

CPC classification number: H01L21/67103 ,  Y10T279/23

Abstract: A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature control elements. The insulator is made from an insulting material having a lower coefficient of thermal conductivity than the base (e.g., a gas- or vacuum-filled chamber).

Abstract translation: 一种热分区衬底保持器，其包括基本上圆柱形的基部，其具有构造成支撑衬底的顶表面和底表面。 多个温度控制元件设置在基座内。 绝缘体将温度控制元件热分离。 绝缘体由具有比基底（例如，气体或真空填充的室）更低的导热系数的绝缘材料制成。

公开(公告)号：US20120270304A1

公开(公告)日：2012-10-25

申请号：US13452442

申请日：2012-04-20

Applicant: Wayne L. JOHNSON ,  Steven T. FINK

Inventor： Wayne L. JOHNSON ,  Steven T. FINK

IPC: C12M1/42 ,  F21V7/00 ,  F21V21/00 ,  C12M1/36 ,  C12N1/12

CPC classification number: C12M21/02 ,  C12M27/20 ,  C12M31/10 ,  C12M41/00 ,  C12M41/10 ,  C12M41/26 ,  C12M41/32 ,  C12M41/36 ,  C12M43/02

Abstract: Systems and methods for cultivating photoautotrophic microorganisms are described. The systems and methods include a photo-bioreactor system and method for growing and harvesting algae in a mass production environment.

Abstract translation: 描述了培养光自养微生物的系统和方法。 该系统和方法包括在大规模生产环境中生长和收获藻类的光生物反应器系统和方法。

公开(公告)号：US07601242B2

公开(公告)日：2009-10-13

申请号：US11032101

申请日：2005-01-11

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: C23F1/00 ,  H01L21/306 ,  C23C16/00

CPC classification number: H01J37/32633 ,  H01J37/3244 ,  H01L21/67069

Abstract: The present invention presents a baffle assembly located in a plasma processing system, comprising a baffle carrier attached to the plasma processing system, and at least two baffle inserts having a plurality of passages therethrough, the at least two baffle inserts being supported by the baffle carrier.

Abstract translation: 本发明提供了一种位于等离子体处理系统中的挡板组件，包括附接到等离子体处理系统的挡板载体和至少两个挡板插入件，其具有穿过其中的多个通道，所述至少两个挡板插入件由挡板载体 。

公开(公告)号：US07582186B2

公开(公告)日：2009-09-01

申请号：US10739127

申请日：2003-12-19

Applicant: Eric J. Strang ,  Steven T. Fink

Inventor： Eric J. Strang ,  Steven T. Fink

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/67069 ,  H01J37/32642 ,  H01L21/68735

Abstract: A focus ring configured to be coupled to a substrate holder comprises a first surface exposed to a process; a second surface, opposite the first surface, for coupling to an upper surface of the substrate holder; an inner radial edge for facing a periphery of a substrate; and an outer radial edge. The second surface further comprises one or more contact features, each of which is configured to mate with one or more receiving features formed within the upper surface of the substrate holder. The focus ring can further comprise a clamping feature for mechanically clamping the focus ring to the substrate holder. Furthermore, a gas can be supplied to the contact space residing between the one or more contact features on the focus ring and the one or more receiving features on the substrate holder.

Abstract translation: 被配置为联接到衬底保持器的聚焦环包括暴露于过程的第一表面; 与所述第一表面相对的第二表面，用于联接到所述衬底保持器的上表面; 用于面对衬底的周边的内部径向边缘; 和外部径向边缘。 第二表面还包括一​​个或多个接触特征，每个接触特征被配置为与形成在衬底保持器的上表面内的一个或多个接收特征配合。 聚焦环还可以包括用于将聚焦环机械地夹持到基板保持器的夹紧特征。 此外，可以将气体供应到驻留在聚焦环上的一个或多个接触特征与衬底保持器上的一个或多个接收特征之间的接触空间。

公开(公告)号：US07347901B2

公开(公告)日：2008-03-25

申请号：US10721500

申请日：2003-11-26

Applicant: Steven T. Fink ,  Eric J. Strang

Inventor： Steven T. Fink ,  Eric J. Strang

IPC: C23C16/00 ,  H05B3/68

CPC classification number: H01L21/67103 ,  Y10T279/23

Abstract: A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature control elements. The insulator is made from an insulting material having a lower coefficient of thermal conductivity than the base (e.g., a gas-or vacuum-filled chamber).

Abstract translation: 一种热分区衬底保持器，其包括基本上圆柱形的基部，其具有构造成支撑衬底的顶表面和底表面。 多个温度控制元件设置在基座内。 绝缘体将温度控制元件热分离。 绝缘体由具有比基底（例如气体或真空填充室）更低的导热系数的绝缘材料制成。

公开(公告)号：US07235155B2

公开(公告)日：2007-06-26

申请号：US10788328

申请日：2004-03-01

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: H01L21/00 ,  C23C16/00

CPC classification number: H01J37/32935

Abstract: A plasma processing system is provided that allows for monitoring a plasma processing system during plasma processing. The plasma processing system includes a processing chamber and a monitoring system for monitoring conditions of the processing chamber. By providing tools within a tool housing that is protected from the plasma environment but still in very close proximity thereto, better process monitoring can be achieved.

Abstract translation: 提供了等离子体处理系统，其允许在等离子体处理期间监视等离子体处理系统。 等离子体处理系统包括处理室和用于监视处理室的状况的监视系统。 通过在工具外壳内提供工具以防止等离子体环境，但仍然非常接近于其，可以实现更好的过程监控。

公开(公告)号：US07088046B2

公开(公告)日：2006-08-08

申请号：US10664903

申请日：2003-09-22

Applicant: Steven T Fink

Inventor： Steven T Fink

IPC: H01J1/52

CPC classification number: H01J37/321

Abstract: A plasma reactor sub-assembly includes both an electrostatic shield and a process tube. Optionally, the electrostatic shield and the process tube are connected. Alternatively, they are configured to fit together without being physically connected. The sub-assembly may be manufactured using a process tube nested within the circumference of an electrostatic shield, an electrostatic shield patterned directly on a process tube using, for example, thin film deposition, or a process tube bonded or not bonded to an electrostatic shield made of a flexible, electrical film material.

Abstract translation: 等离子体反应器子组件包括静电屏蔽和处理管。 可选地，静电屏蔽和处理管被连接。 或者，它们被配置成在没有物理连接的情况下装配在一起。 子组件可以使用嵌套在静电屏蔽体的圆周内的工艺管，使用例如薄膜沉积直接在处理管上图案化的静电屏蔽来制造，或者是将结合或未结合到静电屏蔽的工艺管 由柔性电膜材料制成。

公开(公告)号：US07040032B2

公开(公告)日：2006-05-09

申请号：US10806400

申请日：2004-03-23

Applicant: Steven T. Fink

Inventor： Steven T. Fink

IPC: G01B3/50 ,  G01B3/00

CPC classification number: G01B3/50

Abstract: A go no-go gauge and method for verifying whether a process kit part used within a plasma chamber of a plasma processing tool has accumulated excessive wear or deposits. The gauge includes a component for verifying whether a dimension of a process kit part feature violates a prescribed size tolerance, the violation indicating that the process kit part has accumulated excessive wear or deposits.

Abstract translation: 用于验证等离子体处理工具的等离子体室内使用的处理组件部件是否累积了过多的磨损或沉积物的脱模仪和方法。 仪表包括用于验证过程套件零件特征的尺寸是否违反规定的尺寸公差的部件，表示处理套件部件累积过多磨损或沉积的违规。

公开(公告)号：US07001482B2

公开(公告)日：2006-02-21

申请号：US10705221

申请日：2003-11-12

Applicant: Michael Landis ,  Steven T Fink

Inventor： Michael Landis ,  Steven T Fink

IPC: C23F1/02 ,  C25D3/38 ,  C23C16/00

CPC classification number: H01J37/32642

Abstract: A focus ring assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a focus ring having one or more wear indicators for determining the lifetime of the focus ring, wherein the coupling of the focus ring to the substrate holder facilitates auto-centering of the focus ring in the plasma processing system. For example, a centering ring mounted on the substrate holder can comprise a centering feature configured to couple with a mating feature on the focus ring.

Abstract translation: 配置成耦合到等离子体处理系统中的衬底保持器的聚焦环组件包括具有用于确定聚焦环的寿命的一个或多个磨损指示器的聚焦环，其中聚焦环与衬底保持器的耦合有利于 聚焦环在等离子体处理系统中自动对中。 例如，安装在基板保持器上的定心环可以包括配置成与聚焦环上的配合特征耦合的定心特征。

公开(公告)号：US20120067866A1

公开(公告)日：2012-03-22

申请号：US13307176

申请日：2011-11-30

Applicant: Steven T. FINK ,  Eric J. Strang

Inventor： Steven T. FINK ,  Eric J. Strang

IPC: H05B3/02 ,  F25B21/02

CPC classification number: H01L21/67103 ,  Y10T279/23

Abstract: A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature control elements. The insulator is made from an insulting material having a lower coefficient of thermal conductivity than the base (e.g., a gas- or vacuum-filled chamber).

Abstract translation: 一种热分区衬底保持器，其包括基本上圆柱形的基部，其具有构造成支撑衬底的顶表面和底表面。 多个温度控制元件设置在基座内。 绝缘体将温度控制元件热分离。 绝缘体由具有比基底（例如，气体或真空填充的室）更低的导热系数的绝缘材料制成。