Stencil mask and method of producing the same
    5.
    发明申请
    Stencil mask and method of producing the same 审中-公开
    模板面膜及其制造方法

    公开(公告)号:US20050100801A1

    公开(公告)日:2005-05-12

    申请号:US10983726

    申请日:2004-11-09

    CPC分类号: G03F1/20 H01J2237/31711

    摘要: To provide a stencil mask that the heat generated in the surface of the stencil mask can be radiated to a supporting substrate supporting a portion around the edge of a thin film quickly and a method of producing the same. A stencil mask has a thin film having an aperture pattern and a supporting substrate supporting a portion around the edge of a thin film and a method of producing the same, and a stencil mask and the method of producing the same has an aspect that a plug that having heat conductance higher than that of a thin film and a supporting substrate is embedded in a state of contacting a thin film and reaches inside of a supporting substrate.

    摘要翻译: 为了提供一种模版掩模,可以将模板掩模表面产生的热量迅速地辐射到支撑薄膜边缘附近的支撑基板上,以及制造该模板的方法。 模板掩模具有具有孔径图案的薄膜和支撑薄膜边缘周围的部分的支撑基板及其制造方法,并且模板掩模及其制造方法具有以下方面:插头 具有高于薄膜和支撑衬底的导热性的薄膜被嵌入到接触薄膜并到达支撑衬底内部的状态。

    COATING APPARATUS AND COATING METHOD
    6.
    发明申请
    COATING APPARATUS AND COATING METHOD 有权
    涂装和涂装方法

    公开(公告)号:US20130280844A1

    公开(公告)日:2013-10-24

    申请号:US13878964

    申请日:2011-10-12

    IPC分类号: H01L31/18

    摘要: A coating apparatus including a coating part which has a nozzle which ejects a liquid material including an oxidizable metal from a tip portion, and a relative driving unit which moves a substrate and the nozzle in relation to each other so that the tip portion passes through the substrate, such that at least the tip portion of the nozzle provides an affinity control part which is formed so that affinity between the affinity control part and the liquid material is less than that between the liquid materials.

    摘要翻译: 一种涂布装置,其具有涂布部,该涂布部具有从顶端部喷射包含可氧化金属的液体材料的喷嘴,以及相对驱动部,其相对于彼此移动基板和喷嘴,使得前端部穿过 使得喷嘴的至少尖端部分提供亲和力控制部分,该亲和控制部分形成为使亲和控制部分和液体材料之间的亲和力小于液体材料之间的亲和力。

    Ion implantation apparatus and ion implanting method
    9.
    发明授权
    Ion implantation apparatus and ion implanting method 有权
    离子注入装置和离子注入方法

    公开(公告)号:US07227159B2

    公开(公告)日:2007-06-05

    申请号:US10950633

    申请日:2004-09-28

    IPC分类号: H01J37/317

    摘要: An ion implantation apparatus includes an ion irradiation unit. The ion irradiation unit irradiates a plurality of areas of a target substrate with ion beams each of which reaches the substrate at corresponding one incident angle. An incident angle measuring instrument measures the incident angle of each of the ion beams. A controller is provided with information from the incident angle measuring instrument and controls the ion irradiation unit in accordance with the information so that a difference among incident angles is set to within ±0.1°.

    摘要翻译: 离子注入装置包括离子照射单元。 离子照射单元以对应的一个入射角度向基板的离子束照射目标基板的多个区域。 入射角测量仪测量每个离子束的入射角。 向控制器提供来自入射角度测量仪器的信息,并根据该信息控制离子照射单元,使得入射角之间的差设定在±0.1°以内。