Abstract:
The present invention is generally directed to a versatile fluid treatment system which includes: a mobile device; a track system connected to the mobile device; one or more treatment vessels removably attached to the track system, each treatment vessel comprising a treatment material disposed inside the treatment vessel, at least one fluid inlet, and at least one fluid outlet; an input conduit that receives a fluid to be treated, the input conduit in fluid communication with the fluid inlet on the treatment vessel; and an output conduit in fluid communication with the fluid outlet on the treatment vessel, the output conduit receives treated fluid from the treatment vessels via the fluid outlet.
Abstract:
A method for forming group III-N articles includes the steps of providing a single crystal silicon substrate, depositing a zinc oxide (ZnO) layer on the substrate, and depositing a single crystal group III-N layer on the ZnO layer. At least a portion of the group III-N layer is deposited at a temperature of less than 600° C.
Abstract:
A modular projection device. The modular projection device includes a docking interface for selectively coupling the projection device to a content source module that provides the projection device with video content for projection onto a projection surface.
Abstract:
A semiconductor device and method for forming the same includes a silicon (111) single crystal substrate, and an epitaxial boron phosphide (BP) layer disposed on the substrate. A group III-nitride semiconductor epitaxial layer is disposed on the BP epitaxial layer.
Abstract:
The present invention is generally directed to a versatile fluid treatment system which includes: a mobile device; a track system connected to the mobile device; one or more treatment vessels removably attached to the track system, each treatment vessel comprising a treatment material disposed inside the treatment vessel, at least one fluid inlet, and at least one fluid outlet; an input conduit that receives a fluid to be treated, the input conduit in fluid communication with the fluid inlet on the treatment vessel; and an output conduit in fluid communication with the fluid outlet on the treatment vessel, the output conduit receives treated fluid from the treatment vessels via the fluid outlet.
Abstract:
A pesticide composition for applying to soil or plants containing of at least one pesticidally active ingredient, at least one member selected from the group consisting of alkoxylates of C6-C18 alcohol, and mixtures thereof wherein the alkoxylates is with a polyoxyalkylene ranging from POE (1) through POE (20) and/or mixtures of different carbon chain lengths of C6-C18 with POE (1) to up to about POE (20) and POP (1) to POP (10), a counter balanced crop safe solvent, diluent, and an emulsifier.
Abstract:
The subject application relates to a chemical vapor (CV) deposition technique to form CuInxGa1-x(SeyS1-y)2, compounds. As a copper source, solid copper can be used with a HCl transport gas and Cu3Cl3 is expected to be a major Cu-containing vapor species in this system, Liquid indium and HCl transport gas are appropriate for the indium source to provide InCl vapor species. Since selenium and sulphur are relatively highly volatile, their vapor can be carried by an inert gas without an additional transport gas, although H2Se and H2S can be used. Each source temperature can be controlled separately so as to provide a sufficient and stable vapor flux. Also provided by the subject application are CV-deposited substrates and devices, such as electronic devices or solar cells, that contain CV-deposited CuInxGa1-x(SeyS1-y)2 substrates.
Abstract:
A modular projection device. The modular projection device includes a docking interface for selectively coupling the projection device to a content source module that provides the projection device with video content for projection onto a projection surface.
Abstract:
A semiconductor device and method for forming the same includes a silicon (111) single crystal substrate, and an epitaxial boron phosphide (BP) layer disposed on the substrate. A group III-nitride semiconductor epitaxial layer is disposed on the BP epitaxial layer.
Abstract:
The subject invention pertains to a method and device for producing large area single crystalline III-V nitride compound semiconductor substrates with a composition AlxInyGa1-x-y N (where 0≦x≦1, 0≦y≦1, and 0≦x+y≦1). In a specific embodiment, GaN substrates, with low dislocation densities (˜107 cm2) can be produced. These crystalline III-V substrates can be used to fabricate lasers and transistors. Large area free standing single crystals of III-V compounds, for example GaN, can be produced in accordance with the subject invention. By utilizing the rapid growth rates afforded by hydride vapor phase epitaxy (HVPE) and growing on lattice matching orthorhombic structure oxide substrates, good quality III-V crystals can be grown. Examples of oxide substrates include LiGaO2, LiAlO2, MgAlScO4, Al2MgO4, and LiNdO2. The subject invention relates to a method and apparatus, for the deposition of III-V compounds, which can alternate between MOVPE and HVPE, combining the advantages of both. In particular, the subject hybrid reactor can go back and forth between MOVPE and HVPE in situ so that the substrate does not have to be transported between reactor apparatus and, therefore, cooled between the performance of different growth techniques.
Abstract translation:本发明涉及一种用于制备具有组成Al x In y Ga 1-xy N(其中0≤x≤1,0<= y <= 1,和0≤x≤1)的大面积单晶III-V族氮化物化合物半导体衬底的方法和装置, = x + y <= 1)。 在具体实施方案中,可以生产具有低位错密度(〜10 7 cm 2)的GaN衬底。 这些晶体III-V衬底可用于制造激光器和晶体管。 根据本发明可以制备III-V族化合物的大面积自立单晶,例如GaN。 通过利用由氢化物气相外延(HVPE)提供的快速生长速率并在晶格匹配正交结构氧化物衬底上生长,可以生长出优质的III-V晶体。 氧化物基板的实例包括LiGaO 2,LiAlO 2,MgAlScO 4,Al 2 MgO 4和LiNdO 2。 本发明涉及用于沉积III-V化合物的方法和装置,其可以在MOVPE和HVPE之间交替,结合两者的优点。 特别地,目标混合反应器可以在MOVPE和HVPE之间来回地进行原位处理,使得基板不必在反应器装置之间传输,因此在不同生长技术的性能之间进行冷却。