公开(公告)号：US20170178863A1

公开(公告)日：2017-06-22

申请号：US15449239

申请日：2017-03-03

Applicant: APPLIED MATERIALS, INC.

Inventor： DMITRY LUBOMIRSKY ,  VLADIMIR KNYAZIK ,  HAMID NOORBAKHSH ,  JASON DELLA ROSA ,  ZHENG JOHN YE ,  JENNIFER Y. SUN ,  SUMANTH BANDA

IPC: H01J37/32 ,  B05B1/18 ,  B05B1/00

CPC classification number: B05B1/005 ,  B05B1/185 ,  C23C16/45565 ,  H01J37/3211 ,  H01J37/32146 ,  H01J37/32183 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32623

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a substrate processing chamber includes a body having a first side and an opposing second side; a gas distribution plate disposed proximate the second side of the body; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the body is electrically coupled to the gas distribution plate through the clamp.

公开(公告)号：US20170092525A1

公开(公告)日：2017-03-30

申请号：US15374702

申请日：2016-12-09

Applicant: APPLIED MATERIALS, INC.

Inventor： JENNIFER Y. SUN ,  SENH THACH, III ,  REN-GUAN DUAN

IPC: H01L21/683 ,  C09J11/04 ,  C09J183/04

CPC classification number: H01L21/6833 ,  C08K3/22 ,  C08K3/28 ,  C08K2003/2227 ,  C08K2003/282 ,  C09D183/04 ,  C09J11/04 ,  C09J183/04 ,  H01L21/6831 ,  H02N13/00 ,  Y10T279/23 ,  Y10T279/34

Abstract: Methods and apparatus for bonding an electrostatic chuck to a component of a substrate support are provided herein. In some embodiments, an adhesive for bonding components of a substrate support may include a matrix of silicon-based polymeric material having a filler dispersed therein. The silicon based polymeric material may be a polydimethylsiloxane (PDMS) structure having a molecular weight with a low molecular weight (LMW) content Σ D3-D10 of less than about 500 ppm. In some embodiments, the filler may comprise between about 50 to about 70 percent by volume of the adhesive layer. In some embodiments, the filler may comprise particles of aluminum oxide (Al2O3), aluminum nitride (AlN), yttrium oxide (Y2O3), or combinations thereof. In some embodiments, the filler may comprise particles having a diameter of about 10 nanometers to about 10 microns.

公开(公告)号：US20140209242A1

公开(公告)日：2014-07-31

申请号：US13838510

申请日：2013-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： JENNIFER Y. SUN ,  BIRAJA PRASAD KANUNGO

IPC: H01L21/02 ,  H01L21/67

CPC classification number: H01L21/67103

Abstract: Substrate processing chamber components for use in substrate processing chambers are provided herein. In some embodiments, a substrate processing chamber component may include a body having a first surface, one or more heat exchangers disposed within the body below the first surface, and one or more anisotropic layers, wherein a separate anisotropic layer is disposed between each of the one or more heat exchangers and the first surface.

Abstract translation: 本文提供了用于基板处理室的基板处理室部件。 在一些实施例中，衬底处理室部件可以包括具有第一表面的主体，设置在第一表面下方的主体内的一个或多个热交换器和一个或多个各向异性层，其中分开的各向异性层设置在每个 一个或多个热交换器和第一表面。

公开(公告)号：US20170213705A1

公开(公告)日：2017-07-27

申请号：US15414555

申请日：2017-01-24

Applicant: APPLIED MATERIALS, INC.

Inventor： OFER AMIR ,  JENNIFER Y. SUN ,  MICHAEL R. RICE ,  MICHAEL C. KUCHAR ,  JOSEPH F. SOMMERS

IPC: H01J37/32 ,  B08B3/12 ,  H01L21/67

CPC classification number: H01J37/32477 ,  B08B3/12 ,  H01J37/32091 ,  H01J37/32853 ,  H01L21/67126

Abstract: Slit valve gates and methods for cleaning are provided. Slit valves include: a slit valve gate configured to seal an opening of a process chamber, the slit valve gate comprising a surface that faces an processing volume of the process chamber; and a non-porous anodized coating on the surface of the slit valve gate. Methods of cleaning include: immersing the slit valve gate in a tank comprising deionized water; sonicating the slit valve gate at a first power density of about 6 W/cm2 to about 15 W/cm2 and a frequency of about 25 kHz to about 40 kHz for a first period of time; sonicating the slit valve gate at a second power density of about 30 W/cm2 to about 45 W/cm2 and a frequency of about 25 kHz to about 40 kHz for a second period of time; and removing the slit valve gate from the tank.

公开(公告)号：US20140209027A1

公开(公告)日：2014-07-31

申请号：US13833257

申请日：2013-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： DMITRY LUBOMIRSKY ,  VLADIMIR KNYAZIK ,  HAMID NOORBAKHSH ,  JASON DELLA ROSA ,  ZHENG JOHN YE ,  JENNIFER Y. SUN ,  SUMANTH BANDA

IPC: H01L21/02 ,  B05B1/00

CPC classification number: B05B1/005 ,  B05B1/185 ,  C23C16/45565 ,  H01J37/3211 ,  H01J37/32146 ,  H01J37/32183 ,  H01J37/3244 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32623

Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side; a gas distribution plate disposed proximate the second side of the base; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed between the base and gas distribution plate.

Abstract translation: 具有可拆卸气体分配板的喷头的实施例在此提供。 在一些实施例中，用于半导体处理室的喷头可包括具有第一侧和第二侧的基座; 设置在所述基座的第二侧附近的气体分配板; 围绕所述气体分配板的周边边缘设置的夹具，以将所述气体分配板可移除地联接到所述基座; 以及设置在基部和气体分配板之间的热垫圈。